公开(公告)号：US08097473B2

公开(公告)日：2012-01-17

申请号：US12323312

申请日：2008-11-25

Applicant: Satoru Oishi ,  Hideki Ina

Inventor： Satoru Oishi ,  Hideki Ina

IPC: H01L21/00

CPC classification number: G03F9/7076 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7084

Abstract: An alignment method is provided in which a substrate including first and second layers is aligned in forming a second pattern in the second layer. The method includes storing first alignment measurement data to be used in alignment performed in forming a first pattern and a second alignment mark in the second layer, the first alignment measurement data obtained by measuring a first alignment mark provided in the first layer; obtaining second alignment measurement data by measuring the second alignment mark through a resist applied over the second layer; obtaining third alignment measurement data by measuring the first alignment mark through the resist; and performing alignment of the substrate in accordance with a first difference between the first and second alignment measurement data, or in accordance with the first difference and a second difference between the first and third alignment measurement data.

Abstract translation: 提供了一种对准方法，其中包括第一和第二层的基板在第二层中形成第二图案。 该方法包括存储在第二层中形成第一图案和第二对准标记时所进行对准中使用的第一对准测量数据，通过测量设置在第一层中的第一对准标记获得的第一对准测量数据; 通过在第二层上施加的抗蚀剂测量第二对准标记来获得第二对准测量数据; 通过测量通过抗蚀剂的第一对准标记获得第三对准测量数据; 以及根据第一和第二对准测量数据之间的第一差异，或者根据第一差异和第一和第三对准测量数据之间的第二差异来执行衬底的对准。

公开(公告)号：US08047828B2

公开(公告)日：2011-11-01

申请号：US11719434

申请日：2006-10-18

Applicant: Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina

Inventor： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina

IPC: G01B11/14 ,  G03F7/00

CPC classification number: G03F7/0002 ,  B29C35/08 ,  B29C59/16 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G03F9/703 ,  G03F9/7042 ,  G03F9/7065

Abstract: An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

Abstract translation: 用于将提供给模具的图案压印到基板或基板上的部件上的印模装置包括用于照射与基板相对设置的模具的表面的光源和具有光的基板的表面; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。 分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

公开(公告)号：US07924426B2

公开(公告)日：2011-04-12

申请号：US12032205

申请日：2008-02-15

Applicant: Tomoyuki Miyashita ,  Takahiro Matsumoto ,  Hideki Ina

Inventor： Tomoyuki Miyashita ,  Takahiro Matsumoto ,  Hideki Ina

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G01B11/2441 ,  G03F7/70641

Abstract: A shape measuring apparatus for measuring the shape of a measurement target surface includes an interferometer and computer. The interferometer senses interference light formed by measurement light from the measurement target surface and reference light by a photoelectric converter, while changing the light path length of the measurement light or the reference light. The computer Fourier-transforms a first interference signal sensed by the photoelectric converter to obtain a phase distribution and an amplitude distribution, shapes the amplitude distribution, inversely Fourier-transforms the phase distribution and the shaped amplitude distribution to obtain a second interference signal, and determines the shape of the measurement target surface based on the second interference signal.

Abstract translation: 用于测量测量对象表面的形状的形状测量装置包括干涉仪和计算机。 在改变测量光或参考光的光路长度的同时，干涉仪通过光电转换器感测来自测量对象表面的测量光和参考光所形成的干涉光。 计算机对由光电转换器感测到的第一干涉信号进行傅立叶变换以获得相位分布和幅度分布，对幅度分布进行整形，对相位分布和形状振幅分布进行逆傅立叶变换，以获得第二干涉信号，并确定 基于第二干涉信号的测量对象表面的形状。

公开(公告)号：US20100031833A1

公开(公告)日：2010-02-11

申请号：US12536317

申请日：2009-08-05

Applicant: Kazuyuki Kasumi ,  Hideki Ina

Inventor： Kazuyuki Kasumi ,  Hideki Ina

IPC: B41F19/02 ,  B41F33/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: There is provided an imprint apparatus configured to perform an imprint in which a resin on a substrate is molded using a mold and a pattern is formed on the substrate. The apparatus includes a press unit configured to press the resin on the substrate and the mold to each other, a cure unit configured to irradiate light to the resin molded by the mold to cure the resin, and a movement unit configured to move the mold and the substrate, from a position at which the press is performed by the press unit to a position at which the light is irradiated by the cure unit, and from the position at which the light is irradiated by the cure unit to a position at which the mold is released.

Abstract translation: 提供了一种压印装置，其被配置为执行压印，其中使用模具模制基板上的树脂并且在基板上形成图案。 该装置包括：压制单元，其构造成将基板和模具上的树脂彼此挤压;固化单元，被配置为将光照射到由模具成型的树脂上以使树脂固化;以及移动单元，其构造成使模具和 基板，从通过压制单元执行压制的位置到由固化单元照射光的位置以及从固化单元被光照射的位置到达位置 模具被释放。

公开(公告)号：US20090219499A1

公开(公告)日：2009-09-03

申请号：US12393767

申请日：2009-02-26

Applicant: Wataru Yamaguchi ,  Takahiro Matsumoto ,  Hideki Ina

Inventor： Wataru Yamaguchi ,  Takahiro Matsumoto ,  Hideki Ina

IPC: G01B9/02

CPC classification number: G01B11/2441 ,  G01B9/02063 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/0608 ,  G01B2290/70 ,  G03F9/7026 ,  G03F9/7049

Abstract: A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element.

Abstract translation: 表面形状测量装置包括照明系统和光接收系统。 照明系统将来自光源的宽带光分解为测量光和参考光，照射测量光以倾斜地进入胶片的表面，并照亮参考光以倾斜地进入参考镜。 光接收系统将由膜的表面反射的测量光与由参考反射镜反射的参考光相互组合，并将组合的光引入光电转换元件。 在薄膜表面上的测量光的入射角和参考反射镜上的参考光的入射角均大于布鲁斯特角。 入射到衬底表面的测量光中包括的S偏振光和p偏振光在光电转换元件上具有相等的强度。

公开(公告)号：US07497111B2

公开(公告)日：2009-03-03

申请号：US11249295

申请日：2005-10-12

Applicant: Hideki Ina

Inventor： Hideki Ina

IPC: G01B5/28

CPC classification number: G01Q20/02 ,  G01Q70/06 ,  G03F9/7034 ,  G03F9/7061 ,  G03F9/7088

Abstract: An apparatus measures a surface position of an object. The apparatus includes an array of members, each of which comprises a probe for an atomic force from the object and is configured to move in accordance with the atomic force, an optical system configured to project a measurement light onto each of the array of members and to receive the measurement light reflected off each of the array of members, and a detector configured to detect the measurement light directed through the optical system with respect to each of the array of members.

Abstract translation: 设备测量物体的表面位置。 该装置包括一组构件，每个构件包括用于来自物体的原子力的探针，并被配置成根据原子力移动;光学系统，被配置为将测量光投影到每个构件阵列上;以及 以接收从每个构件阵列反射的测量光;以及检测器，被配置为检测相对于每个构件阵列指向的光学系统的测量光。

公开(公告)号：US20070237253A1

公开(公告)日：2007-10-11

申请号：US11688408

申请日：2007-03-20

Applicant: Satoru Oishi ,  Hideki Ina

Inventor： Satoru Oishi ,  Hideki Ina

IPC: H04L23/02

CPC classification number: G01M11/0292

Abstract: A transfer characteristic calculation apparatus for calculating a transfer characteristic of an imaging optical system includes a light source, a generation unit which generates a second signal by converting a first signal obtained by stretching an impulse signal on a space axis into a positive value using a light from the light source, a sensor which obtains an image that is output from the imaging optical system as an output signal when a light intensity distribution is inputted as the second signal, and a calculation unit which calculates the transfer characteristic of the imaging optical system by convolution of a third signal with a fourth signal that is obtained by canceling a bias component of the output signal obtained by the sensor, the third signal being an impulse signal upon convolution with the first signal.

Abstract translation: 用于计算成像光学系统的传送特性的传送特性计算装置包括光源，生成单元，其通过将使用空间轴将空间轴上的脉冲信号拉伸获得的第一信号转换成正值而产生第二信号 从所述光源接收作为所述第二信号输入光强度分布时的从所述摄像光学系统输出的图像作为输出信号的传感器，以及计算所述摄像光学系统的传送特性的计算单元， 第三信号与通过消除由传感器获得的输出信号的偏置分量获得的第四信号进行卷积，第三信号是与第一信号卷积的脉冲信号。

公开(公告)号：US20070090574A1

公开(公告)日：2007-04-26

申请号：US11468862

申请日：2006-08-31

Applicant: Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina

Inventor： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina

IPC: B29C35/08

CPC classification number: B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In order to provide a mold and an imprint apparatus which permit adjustment of a depth of an imprint pattern after the imprint pattern is formed, the mold is constituted by a mold substrate including a first material and a surface layer, constituting a projection of the mold and including a second material, for forming a pattern on the photocurable resin material. The first material is more etchable than the second material. The first material and the second material have optical transmittances capable of curing the photocurable resin material with respect to at least a part of wavelength range of ultraviolet light.

Abstract translation: 为了提供能够在压印图案形成之后调整印痕图案的深度的模具和压印装置，模具由包括第一材料和表面层的模具基板构成，构成模具的突出部 并且包括用于在可光固化树脂材料上形成图案的第二材料。 第一种材料比第二种材料更可蚀刻。 第一材料和第二材料具有能够相对于紫外线的至少一部分波长范围固化光固化性树脂材料的光透射率。

公开(公告)号：US07123414B2

公开(公告)日：2006-10-17

申请号：US10869558

申请日：2004-06-16

Applicant: Koichi Sentoku ,  Hideki Ina

Inventor： Koichi Sentoku ,  Hideki Ina

IPC: G02B27/44 ,  G02B5/18

CPC classification number: G01B11/24

Abstract: A method for producing a library includes the steps of calculating a plurality of conditions for a reflection light from a periodic pattern by changing the sectional shape of the periodic pattern, a condition of an incident light which is emitted to the periodic pattern, an optical constant of a material which forms the periodic pattern, relating a plurality of the libraries to the plurality of the reflection light's conditions, and the optical constant corresponding to the plurality of the reflection light's conditions respectively.

Abstract translation: 一种用于制作库的方法包括以下步骤：通过改变周期性图案的截面形状，发射到周期图案的入射光的条件，光学常数来计算来自周期性图案的反射光的多个条件 形成周期性图案的材料，将多个库与多个反射光的条件相关联，以及分别对应于多个反射光的条件的光学常数。

公开(公告)号：US07110116B2

公开(公告)日：2006-09-19

申请号：US10279924

申请日：2002-10-25

Applicant: Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

Inventor： Satoru Oishi ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku

IPC: G01B21/00 ,  G03B27/42

CPC classification number: G03F9/7065 ,  G03F7/70233 ,  G03F7/70283 ,  G03F9/7011 ,  G03F9/7015 ,  G03F9/7088

Abstract: An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.

Abstract translation: 用于对准反射标线的对准装置包括用于发射对准光的光源，设置在光罩上的光学对准标记，以及设置在保持光罩的标线片台上的参考标记。 检测单元检测从对准标记和参考标记反射的对准光，并且基于检测单元的检测结果对准标线。