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81.发明授权Fluid handling structure, a lithographic apparatus and a device manufacturing method 失效流体处理结构，光刻设备和装置制造方法公开(公告)号：US08711326B2
公开(公告)日：2014-04-29
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板或两者的台。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
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公开(公告)号：US08681311B2
公开(公告)日：2014-03-25
申请号：US13154008
申请日：2011-06-06
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov , Sjoerd Nicolaas Lambertus Donders
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08514365B2
公开(公告)日：2013-08-20
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或使排水管内的气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
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公开(公告)号：US08432531B2
公开(公告)日：2013-04-30
申请号：US12893875
申请日：2010-09-29
申请人： Kornelis Tijmen Hoekerd , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
发明人： Kornelis Tijmen Hoekerd , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
CPC分类号： G03F7/70925 , G03F7/70341
摘要： A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
摘要翻译： 公开了一种清洗液供应系统。 清洁液体供应系统可以提供乳化清洁液体以清洁浸没式光刻设备。 还公开了一种光刻设备。
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公开(公告)号：US20120140192A1
公开(公告)日：2012-06-07
申请号：US13369982
申请日：2012-02-09
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
摘要翻译： 公开了一种浸没式光刻设备，其中液体被供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔，其中具有通孔以减小板的存在的阻尼效果，并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响。
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公开(公告)号：US20120013873A1
公开(公告)日：2012-01-19
申请号：US13242004
申请日：2011-09-23
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US08023101B2
公开(公告)日：2011-09-20
申请号：US11798928
申请日：2007-05-17
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： H01L21/0274 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.
摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。
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公开(公告)号：US08003968B2
公开(公告)日：2011-08-23
申请号：US12219606
申请日：2008-07-24
申请人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Johannes Henricus Wilhelmus Jacobs , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders
CPC分类号： G03F7/70341
摘要： A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
摘要翻译： 公开了一种有助于防止液体到达衬底的方法，其包括在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液，有助于保持存在于顶部的浸没液体，以及 衬底的边缘远离衬底的底表面。
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89.发明申请LIQUID FILLED LENS ELEMENT, LITHOGRAPHIC APPARATUS COMPRISING SUCH AN ELEMENT AND DEVICE MANUFACTURING METHOD 有权液体填充镜头元件，包含这些元件的平面设备和设备制造方法公开(公告)号：US20110194096A1
公开(公告)日：2011-08-11
申请号：US13043192
申请日：2011-03-08
申请人： Herman BOOM , Borgert Kruizinga , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Huibert Visser , Peter Julian Pollard
发明人： Herman BOOM , Borgert Kruizinga , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Huibert Visser , Peter Julian Pollard
CPC分类号： G03B27/522 , G03F7/70341 , G03F7/70808 , G03F7/70958
摘要： A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.
摘要翻译： 用于投影系统的透镜元件包括凹面。 透镜元件还包括膜和喷嘴，所述膜至少覆盖透镜元件的凹面。 喷嘴布置成用于在凹面和膜之间提供和/或去除液体和/或气体。
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公开(公告)号：US20110080567A1
公开(公告)日：2011-04-07
申请号：US12893875
申请日：2010-09-29
申请人： Kornelis Tijmen HOEKERD , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
发明人： Kornelis Tijmen HOEKERD , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
CPC分类号： G03F7/70925 , G03F7/70341
摘要： A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
摘要翻译： 公开了一种清洗液供给系统。 清洁液体供应系统可以提供乳化清洁液体以清洁浸没式光刻设备。 还公开了一种光刻设备。
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