公开(公告)号：US07779527B2

公开(公告)日：2010-08-24

申请号：US12245762

申请日：2008-10-05

申请人： Joseph Yudovsky ,  Tai T Ngo ,  Leon Volfovski ,  Anne-Douce M P Coulin

发明人： Joseph Yudovsky ,  Tai T Ngo ,  Leon Volfovski ,  Anne-Douce M P Coulin

IPC分类号： B23Q3/00

CPC分类号： H01L21/67046 ,  Y10T29/49826 ,  Y10T29/49895

摘要： In a first aspect, an apparatus is provided for forming a scrubber brush assembly. The apparatus includes a mandrel adapted to be inserted into a scrubber brush so as to form a scrubber brush assembly, the mandrel having: a first end; a second end; and one or more position guides adjacent at least one of the first and second ends and adapted to position a scrubber brush on the mandrel. Numerous other aspects are provided.

摘要翻译： 在第一方面，提供一种用于形成洗涤器刷组件的装置。 所述设备包括适于插入洗涤器刷中以形成洗涤器刷组件的心轴，心轴具有：第一端; 第二端 以及与所述第一和第二端中的至少一个相邻的一个或多个位置导向器，并且适于将洗涤刷固定在所述心轴上。 提供了许多其他方面。

公开(公告)号：US07754518B2

公开(公告)日：2010-07-13

申请号：US12032475

申请日：2008-02-15

申请人： Blake Koelmel ,  Robert C. McIntosh ,  David D L Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

发明人： Blake Koelmel ,  Robert C. McIntosh ,  David D L Larmagnac ,  Alexander N. Lerner ,  Abhilash J. Mayur ,  Joseph Yudovsky

IPC分类号： H01L21/00

CPC分类号： H01L21/67115 ,  H01L21/268 ,  H01L21/68735 ,  H01L21/68742

摘要： A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.

摘要翻译： 提供了一种用于热处理衬底的方法和装置。 衬底被布置在处理室内，其被配置用于通过将电磁能量引导到衬底的表面进行热处理。 提供能量阻挡器以阻挡朝向衬底的能量的至少一部分。 当入射能量接近衬底的边缘时，阻挡剂防止由于热应力而损坏衬底。

公开(公告)号：US07748542B2

公开(公告)日：2010-07-06

申请号：US11216969

申请日：2005-08-31

申请人： Joseph Yudovsky ,  Robert C. Cook ,  Nir Merry

发明人： Joseph Yudovsky ,  Robert C. Cook ,  Nir Merry

IPC分类号： A47G19/08

CPC分类号： H01L21/67309 ,  H01L21/67757

摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.

摘要翻译： 本发明的方面包括用于处理一批基底的方法和装置。 在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。 压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。 可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。 在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。 可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。 可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。 本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

公开(公告)号：US20090314762A1

公开(公告)日：2009-12-24

申请号：US12485160

申请日：2009-06-16

申请人： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob W. Smith ,  R. Suryanarayanan Iyer ,  Joseph Yudovsky ,  Sean M. Seutter

发明人： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob W. Smith ,  R. Suryanarayanan Iyer ,  Joseph Yudovsky ,  Sean M. Seutter

IPC分类号： H05B3/68

CPC分类号： H01L21/67103 ,  H01L21/67248 ,  H05B3/68

摘要： Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

摘要翻译： 公开了用于加热基底的装置，反应器和方法。 该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件 设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

公开(公告)号：US07377002B2

公开(公告)日：2008-05-27

申请号：US10976012

申请日：2004-10-28

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B1/04

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20070259111A1

公开(公告)日：2007-11-08

申请号：US11464121

申请日：2006-08-11

申请人： Kaushal K. Singh ,  Maitreyee Mahajani ,  Steve G. Ghanayem ,  Joseph Yudovsky ,  Brendan McDougall

发明人： Kaushal K. Singh ,  Maitreyee Mahajani ,  Steve G. Ghanayem ,  Joseph Yudovsky ,  Brendan McDougall

IPC分类号： C23C16/00

CPC分类号： H01J37/32009 ,  C23C16/0209 ,  C23C16/0245 ,  C23C16/045 ,  C23C16/34 ,  C23C16/403 ,  C23C16/405 ,  C23C16/4405 ,  C23C16/45504 ,  C23C16/45508 ,  C23C16/45574 ,  C23C16/45591 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/482 ,  C23C16/509

摘要： The invention generally provides a method for depositing materials, and more particularly, embodiments of the invention relate to chemical vapor deposition processes and atomic layer deposition processes utilizing photoexcitation techniques to deposit barrier layers, seed layers, conductive materials, and dielectric materials. Embodiments of the invention generally provide methods of the assisted processes and apparatuses, in which the assisted processes may be conducted for providing uniformly deposited material.

摘要翻译： 本发明通常提供一种用于沉积材料的方法，更具体地说，本发明的实施方案涉及利用光激发技术沉积阻挡层，种子层，导电材料和电介质材料的化学气相沉积方法和原子层沉积方法。 本发明的实施方案通常提供了辅助方法和装置的方法，其中可以进行辅助过程以提供均匀沉积的材料。

公开(公告)号：US20070259110A1

公开(公告)日：2007-11-08

申请号：US11381970

申请日：2006-05-05

申请人： Maitreyee Mahajani ,  Joseph Yudovsky ,  Brendan McDougall

发明人： Maitreyee Mahajani ,  Joseph Yudovsky ,  Brendan McDougall

IPC分类号： C23C16/00 ,  H05H1/24

CPC分类号： H01J37/32009 ,  C23C16/45508 ,  C23C16/45574 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/509

摘要： A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.

摘要翻译： 批处理室包括：室壳体，用于在处理区域中容纳一批衬底的衬底舟和用于激发加工气体种类的激发组件。 激发组件定位在腔室内，并且可以包括等离子体，UV或离子辅助。

公开(公告)号：US20070059128A1

公开(公告)日：2007-03-15

申请号：US11216969

申请日：2005-08-31

申请人： Joseph Yudovsky ,  Robert Cook ,  Nir Merry

发明人： Joseph Yudovsky ,  Robert Cook ,  Nir Merry

IPC分类号： H01L21/677

CPC分类号： H01L21/67309 ,  H01L21/67757

摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.

摘要翻译： 本发明的方面包括用于处理一批基底的方法和装置。 在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。 压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。 可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。 在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。 可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。 可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。 本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

公开(公告)号：US06818094B2

公开(公告)日：2004-11-16

申请号：US10354790

申请日：2003-01-29

申请人： Joseph Yudovsky

发明人： Joseph Yudovsky

IPC分类号： H01L21306

CPC分类号： C23C16/45544

摘要： A gas valve for pulsing a gas comprises a housing assembly having at least one inlet port, an outlet port, and a selector plate mounted within the housing assembly and comprising at least one timing slot, wherein reciprocation motion of the selector plate periodically couples at least one inlet port to the outlet port through the timing slot.

摘要翻译： 用于脉冲气体的气阀包括壳体组件，其具有安装在壳体组件内的至少一个入口端口，出口端口和选择器板，并且包括至少一个定时槽，其中选择器板的往复运动至少周期性地耦合 通过定时槽到出口的一个入口端口。

公开(公告)号：US06767176B2

公开(公告)日：2004-07-27

申请号：US09895441

申请日：2001-06-29

申请人： Joseph Yudovsky ,  Salvador P. Umotoy

发明人： Joseph Yudovsky ,  Salvador P. Umotoy

IPC分类号： B66F1100

CPC分类号： H01L21/67748 ,  H01L21/68742 ,  Y10S414/135

摘要： A set of lift pins defines a storage location for a substrate in a substrate processing chamber. Each lift pin has an actuating mechanism including a translating mechanism that translates vertical actuation into horizontal motion. The actuating mechanism may include a base, a mechanism adapted to raise and lower the base, and a lever pivotally mounted on the base. The lift pin may be fixedly mounted on the lever. A stop may be adjacent the base and adapted to engage the lever to pivot the lever as the base is lowered.

摘要翻译： 一组提升销限定了衬底处理室中的衬底的存储位置。 每个提升销具有致动机构，其包括将垂直致动转换成水平运动的平移机构。 致动机构可以包括基座，适于升高和降低基座的机构，以及枢转地安装在基座上的杠杆。 提升销可以固定地安装在杠杆上。 止挡件可以邻近基座并且适于接合杠杆以在基座降低时枢转杠杆。