公开(公告)号：US08856694B2

公开(公告)日：2014-10-07

申请号：US13481564

申请日：2012-05-25

申请人： Jun Ye ,  Yu Cao ,  James Patrick Koonmen

发明人： Jun Ye ,  Yu Cao ,  James Patrick Koonmen

IPC分类号： G06F17/50 ,  G05B13/04 ,  G03F7/20

CPC分类号： G03F7/70525 ,  B29C64/386 ,  G03F9/7096 ,  G05B13/04

摘要： The present invention provides a number of innovations in the area of computational process control (CPC). CPC offers unique diagnostic capability during chip manufacturing cycle by analyzing temporal drift of a lithography apparatus/ process, and provides a solution towards achieving performance stability of the lithography apparatus/process. Embodiments of the present invention enable optimized process windows and higher yields by keeping performance of a lithography apparatus and/or parameters of a lithography process substantially close to a pre-defined baseline condition. This is done by comparing the measured temporal drift to a baseline performance using a lithography process simulation model. Once in manufacturing, CPC optimizes a scanner for specific patterns or reticles by leveraging wafer metrology techniques and feedback loop, and monitors and controls, among other things, overlay and/or CD uniformity (CDU) performance over time to continuously maintain the system close to the baseline condition.

摘要翻译： 本发明提供了计算过程控制（CPC）领域的许多创新。 CPC通过分析光刻设备/工艺的时间漂移​​，在芯片制造周期中提供独特的诊断功能，并为实现光刻设备/工艺的性能稳定性提供了解决方案。 本发明的实施例通过保持光刻设备的性能和/或基本上接近预定义基线条件的光刻工艺的参数来实现优化的工艺窗口和更高的产量。 这通过使用光刻过程模拟模型将测量的时间漂移​​与基线性能进行比较来完成。 一旦制造，CPC通过利用晶片计量技术和反馈回路来优化扫描仪的特定图案或掩模版，以及监视和控制其他方面的覆盖和/或CD均匀性（CDU）性能，以持续保持系统接近 基线条件。

公开(公告)号：US08806387B2

公开(公告)日：2014-08-12

申请号：US12475095

申请日：2009-05-29

申请人： Yu Cao ,  Wenjin Shao ,  Ronaldus Johannes Gijsbertus Goossens ,  Jun Ye ,  James Patrick Koonmen

发明人： Yu Cao ,  Wenjin Shao ,  Ronaldus Johannes Gijsbertus Goossens ,  Jun Ye ,  James Patrick Koonmen

IPC分类号： G06F17/50

CPC分类号： B29C67/0088 ,  B29C64/386 ,  G03F7/70091 ,  G03F7/70458 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70525 ,  G06F17/50 ,  G06F17/5009 ,  G06F17/5081

摘要： Systems and methods for process simulation are described. The methods may use a reference model identifying sensitivity of a reference scanner to a set of tunable parameters. Chip fabrication from a chip design may be simulated using the reference model, wherein the chip design is expressed as one or more masks. An iterative retuning and simulation process may be used to optimize critical dimension in the simulated chip and to obtain convergence of the simulated chip with an expected chip. Additionally, a designer may be provided with a set of results from which an updated chip design is created.

摘要翻译： 描述了过程仿真的系统和方法。 这些方法可以使用标识参考扫描仪对一组可调谐参数的灵敏度的参考模型。 可以使用参考模型来模拟来自芯片设计的芯片制造，其中芯片设计被表示为一个或多个掩模。 可以使用迭代重调和仿真过程来优化模拟芯片中的关键尺寸，并获得模拟芯片与预期芯片的收敛。 此外，可以向设计者提供一组结果，从中创建更新的芯片设计。

公开(公告)号：US20140033145A1

公开(公告)日：2014-01-30

申请号：US14046778

申请日：2013-10-04

申请人： Hanying FENG ,  Yu Cao ,  Jun Ye

发明人： Hanying FENG ,  Yu Cao ,  Jun Ye

IPC分类号： G03F1/00

CPC分类号： G03F1/144 ,  G03F1/02 ,  G03F1/20 ,  G03F1/24 ,  G03F1/26 ,  G03F1/38 ,  G03F1/50 ,  G03F1/72 ,  G03F7/70141 ,  G03F7/70258 ,  G03F7/70525 ,  G06F17/10 ,  G06F17/5009 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G21K5/00 ,  Y02P90/265

摘要： Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).

摘要翻译： 这里描述的是将光刻投影设备的特性与参考光刻投影设备进行匹配的方法，其中匹配包括优化投影光学特性。 投影光学元件可用于在光刻投影装置中形成波前。 根据本文的实施例，可以通过使用线性拟合算法或使用使用传输交叉系数（TCC）的偏导数的泰勒级数扩展来加速该方法。

公开(公告)号：US08570485B2

公开(公告)日：2013-10-29

申请号：US12475071

申请日：2009-05-29

申请人： Jun Ye ,  Peng Liu ,  Yu Cao

发明人： Jun Ye ,  Peng Liu ,  Yu Cao

IPC分类号： G03B27/52

CPC分类号： G03F7/70441 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/70533 ,  G03F7/706 ,  G03F7/70891 ,  G06F17/50

摘要： Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.

摘要翻译： 公开了用于校准光刻系统的方法。 生成用于掩模版设计的冷透镜轮廓和用于掩模版设计的至少一个热透镜轮廓，由此定义处理窗口。 由透镜操纵器诱导的畸变在机械手模型中表征，并且使用机械手模型优化过程窗口。 像差的特征在于识别由多个操纵器设置的透镜操纵引起的关键尺寸的变化，以及通过将操纵器的行为建模为机械手设置和像差之间的关系。 可以通过最小化一组关键位置的成本函数来优化过程窗口。

公开(公告)号：US08560978B2

公开(公告)日：2013-10-15

申请号：US13293113

申请日：2011-11-09

申请人： Hanying Feng ,  Yu Cao ,  Jun Ye

发明人： Hanying Feng ,  Yu Cao ,  Jun Ye

IPC分类号： G06F17/50 ,  G06F19/00 ,  G21K5/00 ,  G03F1/26 ,  G03F1/00

CPC分类号： G03F1/144 ,  G03F1/02 ,  G03F1/20 ,  G03F1/24 ,  G03F1/26 ,  G03F1/38 ,  G03F1/50 ,  G03F1/72 ,  G03F7/70141 ,  G03F7/70258 ,  G03F7/70525 ,  G06F17/10 ,  G06F17/5009 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G21K5/00 ,  Y02P90/265

摘要： Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).

摘要翻译： 这里描述的是将光刻投影设备的特性与参考光刻投影设备进行匹配的方法，其中匹配包括优化投影光学特性。 投影光学元件可用于在光刻投影装置中形成波前。 根据本文的实施例，可以通过使用线性拟合算法或使用使用传输交叉系数（TCC）的偏导数的泰勒级数扩展来加速该方法。

公开(公告)号：US08536851B2

公开(公告)日：2013-09-17

申请号：US13288821

申请日：2011-11-03

申请人： Yuan Lin ,  Jun Ye ,  Lieyi Fang

发明人： Yuan Lin ,  Jun Ye ,  Lieyi Fang

IPC分类号： G05F5/00 ,  H02M3/335

CPC分类号： H02M3/33507 ,  H02M2001/0022 ,  Y02B70/1433

摘要： Switch-mode power conversion system and method thereof. The switch-mode power conversion system includes a primary winding configured to receive an input voltage, and a secondary winding coupled to the primary winding and configured to, with one or more other components, generate an output signal. Additionally, the switch-mode power conversion system includes a feedback component configured to receive the output signal and generate a feedback signal based on at least information associated with the output signal, and a voltage detector configured to receive the input voltage and output a detection signal. Moreover, the switch-mode power conversion system includes a mode controller configured to receive the detection signal and the feedback signal and generate a switch signal based on at least information associated with the detection signal and the feedback signal, and a switch configured to receive the switch signal and affect a first current flowing through the primary winding.

摘要翻译： 开关电源转换系统及其方法。 开关模式功率转换系统包括被配置为接收输入电压的初级绕组和耦合到初级绕组的次级绕组，并且被配置成与一个或多个其他部件一起产生输出信号。 另外，开关模式功率转换系统包括被配置为接收输出信号并基于至少与输出信号相关联的信息产生反馈信号的反馈分量，以及被配置为接收输入电压并输出检测信号的电压检测器 。 此外，开关模式电力转换系统包括模式控制器，其被配置为接收检测信号和反馈信号，并且至少基于与检测信号和反馈信号相关联的信息产生开关信号，以及开关，被配置为接收 开关信号并影响流经初级绕组的第一电流。

公开(公告)号：US20130066716A1

公开(公告)日：2013-03-14

申请号：US13230720

申请日：2011-09-12

申请人： Luoqi Chen ,  Jun Ye ,  Ya Luo ,  Yu Cao ,  Wei Zhuang ,  Hanying Feng

发明人： Luoqi Chen ,  Jun Ye ,  Ya Luo ,  Yu Cao ,  Wei Zhuang ,  Hanying Feng

IPC分类号： G06Q30/00

CPC分类号： G06Q30/00

摘要： The various embodiments described in the present disclosure, in at least one aspect, relate to computer-implemented methods of online advertisement. In one embodiment, a method includes, in response to receiving a request for an ad to be provided to a user in an online session, identifying a plurality of ads as candidates for consideration, determining one or more sentiments of a content of the online session, and ranking the plurality of identified ads based at least in part on (i) a correlation between the content of the online session and a content of each identified ad, and (ii) a correlation between the one or more sentiments of the content of the online session and the content of each identified ad.

摘要翻译： 在至少一个方面，在本公开中描述的各种实施例涉及计算机实现的在线广告的方法。 在一个实施例中，一种方法包括响应于在在线会话中接收到要提供给用户的广告的请求，将多个广告标识为候选作为考虑，确定在线会话的内容的一个或多个情绪 并且至少部分地基于（i）在线会话的内容与每个所识别的广告的内容之间的相关性，以及（ii）所述内容的一个或多个情绪之间的相关性来对多个所识别的广告进行排名 在线会话和每个已识别广告的内容。

公开(公告)号：US20130014065A1

公开(公告)日：2013-01-10

申请号：US13542625

申请日：2012-07-05

申请人： Hanying Feng ,  Yu Cao ,  Jun Ye ,  Youping Zhang

发明人： Hanying Feng ,  Yu Cao ,  Jun Ye ,  Youping Zhang

IPC分类号： G06F17/50

CPC分类号： G03F7/706 ,  G03F7/70683

摘要： The present invention relates to methods and systems for designing gauge patterns that are extremely sensitive to parameter variation, and thus robust against random and repetitive measurement errors in calibration of a lithographic process utilized to image a target design having a plurality of features. The method may include identifying most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD (or other lithography response parameter) changes against lithography process parameter variations, such as wavefront aberration parameter variation. The method may also include designing gauges which have more than one test patterns, such that a combined response of the gauge can be tailored to generate a certain response to wavefront-related or other lithographic process parameters. The sensitivity against parameter variation leads to robust performance against random measurement error and/or any other measurement error.

摘要翻译： 本发明涉及用于设计对参数变化非常敏感的规格图案的方法和系统，因此对于用于对具有多个特征进行成像的目标设计的光刻工艺的校准中的随机和重复的测量误差是鲁棒的。 该方法可以包括以最佳辅助特征放置来识别最敏感的线宽/间距组合，其导致针对光刻过程参数变化（例如波前像差参数变化）的最敏感的CD（或其他光刻响应参数）变化。 该方法还可以包括设计具有多于一个测试图案的计量器，使得量规的组合响应可以被调整以产生对波前相关或其它光刻工艺参数的特定响应。 对参数变化的敏感性导致对随机测量误差和/或任何其他测量误差的鲁棒性能。

公开(公告)号：US08344715B2

公开(公告)日：2013-01-01

申请号：US12850537

申请日：2010-08-04

申请人： Jun Ye ,  Zhen Zhu ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

发明人： Jun Ye ,  Zhen Zhu ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

IPC分类号： G05F1/575

CPC分类号： H02M3/156 ,  H02M2001/0032 ,  H03K3/0231 ,  H04Q2213/1308 ,  H04Q2213/13098 ,  H04Q2213/1332 ,  Y02B70/16

摘要： System and method for providing frequency control to a power converter. The system includes a controller configured to receive a load signal and generate a first control signal. The load signal indicates an output load for a power converter. Additionally, the system includes a signal generator configured to receive the first control signal and generates at least a first output signal. The first output signal is associated with a first signal strength and a first frequency. The first frequency is inversely proportional to a sum of a first time period, a second time period, and a third time period. The first signal strength increases with the time during the first time period, the first signal strength decreases with the time during the second time period, and the first signal strength is constant with respect to the time during the third time period.

摘要翻译： 向功率转换器提供频率控制的系统和方法。 该系统包括被配置为接收负载信号并产生第一控制信号的控制器。 负载信号表示电源转换器的输出负载。 另外，该系统包括被配置为接收第一控制信号并产生至少第一输出信号的信号发生器。 第一输出信号与第一信号强度和第一频率相关联。 第一频率与第一时间段，第二时间段和第三时间段的和成反比。 第一信号强度随着第一时间段期间的时间增加，第一信号强度随着第二时间段期间的时间而减小，并且第一信号强度相对于第三时间段内的时间是恒定的。

公开(公告)号：US20120287656A1

公开(公告)日：2012-11-15

申请号：US13263014

申请日：2010-09-07

申请人： Zhenxing Mi ,  Jun Ye

发明人： Zhenxing Mi ,  Jun Ye

IPC分类号： B62J6/00

CPC分类号： B60R1/12 ,  B60Q1/2665 ,  B60R1/1207 ,  B62J6/005 ,  B62J29/00

摘要： The present invention relates to a front turn light on rear view mirror of motorcycle, which comprises a rear view mirror housing and a front turn light amounted at the front part of the rear view mirror housing, the front turn light is provided with a LED light source(s) and a condenser lens(es) which is amounted in front of the LED light source(s), preferably the front turn light further comprises a front turn light face-plate and a front turn light housing which is amounted on the front turn light face-plate so as to form an internal cavity between the front turn light housing and the front turn light face-plate, the LED light source(s) is amounted in the internal cavity and the condenser lens(es) is amounted in the front turn light face-plate, the front turn light is amounted inside the rear view mirror housing, the front turn light on rear view mirror of motorcycle of the present invention has a novel and beautiful design, a concise structure and a low use cost, can be maintained simply and meet the optical requirements of the turn signal lights, therefore the present invention is suitable for large-scale popularization.

摘要翻译： 本发明涉及摩托车后视镜上的前转向灯，其包括后视镜壳体和位于后视镜壳体前部的前转向灯，前转向灯设置有LED灯 光源和聚光透镜，优选地，前转向灯还包括前转向灯面板和前转向灯壳体，前转向灯壳体 前转灯面板，以在前转灯壳体和前转向光面板之间形成内腔，LED光源被分配在内腔中，并且聚光透镜 在前转灯面板中，前转向灯位于后视镜外壳的内部，本发明的摩托车的后视镜上的前转灯具有新颖美观的设计，简洁的结构和低使用 成本可维持 简单地满足转向信号灯的光学要求，因此本发明适用于大规模普及。