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218 条记录 (耗时 0.036 秒)

    Magnetic recording medium
    81.
    发明授权
    Magnetic recording medium 失效
    磁记录介质

    公开(公告)号：US5795642A

    公开(公告)日：1998-08-18

    申请号：US742815

    申请日：1996-11-01

    申请人： Akira Ishikawa ,  Hidehiko Nakayama ,  Kazutaka Yamashita

    发明人： Akira Ishikawa ,  Hidehiko Nakayama ,  Kazutaka Yamashita

    IPC分类号： C09D5/23 ,  G11B5/70 ,  G11B5/735 ,  G11B5/738 ,  G11B5/66

    CPC分类号： G11B5/738 ,  G11B5/735 ,  Y10S428/90 ,  Y10T428/24355 ,  Y10T428/265

    摘要： Magnetic recording media comprising a nonmagnetic substrate, a surface layer and a back layer, the surface layer having an intermediate layer provided on the surface side of the nonmagnetic substrate and a magnetic layer as a top layer, the back layer having a backcoating layer provided on the back side of the nonmagnetic substrate, the magnetic layer containing a ferromagnetic metal powder and a binder, wherein the surface layer has a residual solvent content of 5 to 1000 ppm, the ferromagnetic metal powder is a ferromagnetic metal powder mainly comprising iron and containing 0.8 to 20 parts by weight of at least one element selected from Group IIIa elements, inclusive of lanthanides, of the Periodic Table per 100 parts by weight of Fe atoms, the magnetic layer has a thickness of 0.05 to 0.6 .mu.m, the magnetic layer has a center-line surface roughness Ra of 1 to 5 nm, the back layer has a residual solvent content of 5 to 800 ppm, and the backcoating layer has a center-line surface roughness Ra of 2 to 8 nm, exhibit excellent electromagnetic characteristics and storage stability.

    摘要翻译： 包含非磁性基底，表面层和背层的磁记录介质，所述表面层具有设置在所述非磁性基底的表面侧上的中间层和作为顶层的磁性层，所述背层具有背涂层 非磁性基板的背面，含有铁磁性金属粉末和粘合剂的磁性层，其中表面层的残留溶剂含量为5〜1000ppm，强磁性金属粉末是主要由铁构成的铁磁性金属粉末，含有0.8 相对于100重量份的Fe原子，含有20重量份的选自元素周期表的IIIa族元素，包括镧系元素中的至少一种元素，磁性层的厚度为0.05〜0.6μm，磁性层具有 中心线表面粗糙度Ra为1〜5nm，背层的残留溶剂含量为5〜800ppm，背涂层具有中心线表面粗糙度 2〜8nm的亮度Ra表现出优异的电磁特性和储存稳定性。

    4,6 Di-t-butyl-5-hydroxy-2,3-dihydrobenzothiophene
    82.
    发明授权
    4,6 Di-t-butyl-5-hydroxy-2,3-dihydrobenzothiophene 失效
    4,6二叔丁基-2,3-二氢苯并噻吩衍生物

    公开(公告)号：US5789436A

    公开(公告)日：1998-08-04

    申请号：US727652

    申请日：1996-10-09

    申请人： Yoshiaki Kato ,  Akira Ishikawa ,  Kunio Tamura

    发明人： Yoshiaki Kato ,  Akira Ishikawa ,  Kunio Tamura

    IPC分类号： C07C333/04 ,  C07D333/50 ,  C07D333/54 ,  C07D333/56 ,  C07D333/58 ,  A61K31/38 ,  C07C321/00 ,  C07D333/52 ,  C07D333/64

    CPC分类号： C07D333/50 ,  C07C333/04 ,  C07D333/54 ,  C07D333/56 ,  C07D333/58

    摘要： A compound represented by formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom, a lower alkyl group or an acyl group; R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted alkenyl group; R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted alkenyl group, or R.sub.4 forms a double bond between the carbon atom to which R.sub.3 is bonded and the adjacent carbon atom to form a benzothiophene skeleton, or R.sub.3 and R.sub.4 are taken together to form a 5- to 8-membered spiro ring which may contain a hetero atom, e.g., oxygen, sulfur or nitrogen; and n represents an integer of 0 to 2, or a pharmaceutically acceptable salt thereof. The compound of formula (I) exhibits an inhibitory action on the oxidative modification of LDL and is useful as therapeutics of arteriosclerosis.

    摘要翻译： PCT No.PCT / JP95 / 00706 Sec。 371日期1996年10月9日第 102（e）日期1996年10月9日PCT提交1995年4月11日PCT公布。 公开号WO95 / 27710 日期：1995年10月19日由式（I）表示的化合物：其中R 1表示氢原子，低级烷基或酰基; R 2和R 3可以相同或不同，各自表示氢原子，任选取代的烷基或任选取代的烯基; R4表示氢原子，任选取代的烷基或任选取代的烯基，或R 4在与R 3键合的碳原子和相邻碳原子之间形成双键，以形成苯并噻吩骨架，或者R3和R4为 一起形成可含有杂原子（例如氧，硫或氮）的5-至8-元螺环; 和n表示0〜2的整数，或其药学上可接受的盐。 式（I）化合物对LDL的氧化修饰具有抑制作用，可用作动脉硬化的治疗剂。

    Semiconductor element, semiconductor device and methods for manufacturing thereof
    86.
    发明授权
    Semiconductor element, semiconductor device and methods for manufacturing thereof 有权
    半导体元件，半导体器件及其制造方法

    公开(公告)号：US09171919B2

    公开(公告)日：2015-10-27

    申请号：US13484301

    申请日：2012-05-31

    申请人： Akira Ishikawa

    发明人： Akira Ishikawa

    IPC分类号： H01L21/3205 ,  H01L21/4763 ,  H01L29/417 ,  H01L29/66 ,  H01L29/786 ,  H01L21/84 ,  H01L27/12

    CPC分类号： H01L29/41733 ,  H01L21/84 ,  H01L27/1203 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78675

    摘要： The present invention provides a method of manufacturing a semiconductor element having a miniaturized structure and a semiconductor device in which the semiconductor element having a miniaturized structure is integrated highly, by overcoming reduction of the yield caused by alignment accuracy, accuracy of a processing technique by reduced projection exposure, a finished dimension of a resist mask, an etching technique and the like. An insulating film covering a gate electrode is formed, and a source region and a drain region are exposed, a conductive film is formed thereover, a resist having a different film thickness is formed by applying the resist over the conductive film, the entire surface of the resist is exposed to light and developed, or the entire surface of the resist is etched to form a resist mask, and the conductive film is etched by using the resist mask to form a source and drain electrode.

    摘要翻译： 本发明提供一种制造具有小型结构的半导体元件和半导体器件的方法，其中具有小型结构的半导体元件被高度集成，通过克服由对准精度引起的成品率的降低，加工技术的精度降低 投影曝光，抗蚀剂掩模的成品尺寸，蚀刻技术等。 形成覆盖栅电极的绝缘膜，并且源极区域和漏极区域露出，在其上形成导电膜，通过在导电膜上涂覆抗蚀剂，形成具有不同膜厚度的抗蚀剂，整个表面 将抗蚀剂曝光并显影，或者蚀刻抗蚀剂的整个表面以形成抗蚀剂掩模，并且通过使用抗蚀剂掩模来蚀刻导电膜以形成源极和漏极。

    Inkjet recording apparatus
    87.
    发明授权
    Inkjet recording apparatus 有权
    喷墨记录装置

    公开(公告)号：US09004627B2

    公开(公告)日：2015-04-14

    申请号：US13928434

    申请日：2013-06-27

    申请人： Hideo Izawa ,  Takao Namiki ,  Akira Ishikawa ,  Wataru Itabashi

    发明人： Hideo Izawa ,  Takao Namiki ,  Akira Ishikawa ,  Wataru Itabashi

    IPC分类号： B41J2/175

    CPC分类号： B41J2/17596 ,  B41J2/175

    摘要： An inkjet recording apparatus which can make a distribution tank compact and has excellent pressure-control precision is provided with an inkjet portion A having a recording head 11 for applying ink to a recording medium 1 and a distribution tank 12 for supplying ink to the recording head 11, an ink supply means B having a main tank 21 for supplying ink to the distribution tank 12, and an air supply means C having an air chamber 31 communicating with a space 12ain the distribution tank 12 and a pressure adjustment mechanism provided on the air chamber 31 via a solenoid valve, where the pressure of the space 12a and the internal pressure of the air chamber 31 are equal to each other.

    摘要翻译： 具有能够使分配罐紧凑并且具有优异的压力控制精度的喷墨记录装置设置有具有用于将油墨施加到记录介质1的记录头11的喷墨部A和用于向记录头供墨的分配槽12 如图11所示，具有用于向分配罐12供给墨水的主罐21的供墨装置B和具有与分配罐12的空间12连通的空气室31的空气供给装置C和设置在空气中的压力调节机构 通过电磁阀，空间12a的压力和空气室31的内部压力彼此相等。

    Pressure purging device for inkjet recording apparatus
    88.
    发明授权
    Pressure purging device for inkjet recording apparatus 有权
    用于喷墨记录装置的压力清洗装置

    公开(公告)号：US08777383B2

    公开(公告)日：2014-07-15

    申请号：US13134897

    申请日：2011-06-20

    申请人： Hideo Izawa ,  Akira Ishikawa ,  Wataru Itabashi

    发明人： Hideo Izawa ,  Akira Ishikawa ,  Wataru Itabashi

    IPC分类号： B41J2/175

    CPC分类号： B41J2/16526 ,  B41J2/175 ,  Y10T137/2564

    摘要： A pressure purging device for an inkjet recording apparatus includes a back pressure tank 21, a distribution tank 12, ink opening/closing electromagnetic valves 13, and recording heads 14, and in which the distribution tank 12 is connected to the back pressure tank 21 via an ink supply path 24, the ink opening/closing electromagnetic valves 13 are attached to the distribution tank 12 while being connected to the recording heads 14 via the distribution supply pipe 15, the ink opening/closing electromagnetic valves 13 are directly attached to the distribution tank 12, and there is provided an air switching three-port electromagnetic valve 61 connected to an upper part inside of the back pressure tank 21 via an air path 63 while being connected to a compressed air supply path 62.

    摘要翻译： 用于喷墨记录装置的压力清洗装置包括背压罐21，分配箱12，油墨打开/关闭电磁阀13和记录头14，并且其中分配罐12经由 供墨路径24，油墨打开/关闭电磁阀13在经由分配供给管15连接到记录头14的同时附接到分配罐12，油墨打开/关闭电磁阀13直接附接到分配 并且设置有一个空气切换三端口电磁阀61，该空气切换三端口电磁阀61连接到压缩空气供应路径62上，该空气切换三端口电磁阀61经由空气通道63连接到背压罐21的上部。

    CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device
    89.
    发明授权
    CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device 有权
    CMP抛光方法，CMP抛光装置以及半导体装置的制造方法

    公开(公告)号：US08241426B2

    公开(公告)日：2012-08-14

    申请号：US11795697

    申请日：2005-12-21

    申请人： Syozo Takada ,  Hisanori Matsuo ,  Akira Ishikawa

    发明人： Syozo Takada ,  Hisanori Matsuo ,  Akira Ishikawa

    IPC分类号： B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  B08B7/02

    CPC分类号： H01L21/02074 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/0047 ,  H01L21/76826 ,  H01L21/76828

    摘要： When the remaining slurry and polishing residue are removed by cleaning with a cleaning liquid (preferably a cleaning liquid containing a surfactant), organic matter in the cleaning liquid containing a surfactant seeps into the interlayer insulating film 3. Therefore, the substrate is subsequently washed with an organic solvent or a solution containing an organic solvent, thus washing away the organic matter that has seeped into the interlayer insulating film 3. Although the interlayer insulating film 3 is subjected to a hydrophobic treatment, since the solvent used is an organic solvent, this solvent is able to seep into the interlayer insulating film 3, dissolve the organic matter, and wash the organic matter away without being affected by this hydrophobic treatment. Afterward, the substrate 1 is dried, and the organic solvent or solution containing an organic solvent that is adhering to the surface is removed.

    摘要翻译： 当通过用清洗液（优选含有表面活性剂的清洗液）清洗剩余的浆料和抛光残渣时，含有表面活性剂的清洗液中的有机物渗入层间绝缘膜3.因此，随后用 有机溶剂或含有有机溶剂的溶液，从而洗去已经渗透到层间绝缘膜3中的有机物质。尽管对层间绝缘膜3进行疏水处理，但由于使用的溶剂是有机溶剂，因此 溶剂能够渗透到层间绝缘膜3中，溶解有机物质，并且在不受这种疏水处理的影响的情况下洗涤有机物质。 之后，干燥基板1，除去附着在表面上的有机溶剂的有机溶剂或溶液。

    WEB PRINTING PRESS
    90.
    发明申请
    WEB PRINTING PRESS 有权
    WEB打印机

    公开(公告)号：US20110239882A1

    公开(公告)日：2011-10-06

    申请号：US13075048

    申请日：2011-03-29

    申请人： Akira Ishikawa

    发明人： Akira Ishikawa

    IPC分类号： B41L41/00

    CPC分类号： B41F23/0409 ,  B41F7/26 ,  B41F23/0443 ,  B41M7/0045 ,  B41M7/0081

    摘要： A web printing apparatus includes a transfer device which transfers highly reactive ink/varnish onto a web, and a fixing device which fixes, on the web, the highly reactive ink/varnish transferred by the transfer device. The fixing device includes only a light irradiation device which irradiates the web with light in the wavelength range, in which no ozone is generated, to cure the highly reactive ink/varnish on the web without thermal drying of the web.

    摘要翻译： 纸幅印刷装置包括将高反应性油墨/清漆转印到纸幅上的转印装置和在纸幅上固定由转印装置转印的高反应性油墨/清漆的定影装置。 定影装置仅包括光纤照射装置，其在没有产生臭氧的波长范围内照射纸幅，以在幅材上没有热干燥来固化幅材上的高反应性油墨/清漆。