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公开(公告)号：US20050045830A1
公开(公告)日：2005-03-03
申请号：US10947262
申请日：2004-09-23
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： Inspection apparatus and method in which laser source emits a laser beam and a coherence of the laser beam emitted from the laser source is reduced by a coherence reducer. A detector detects light from the sample irradiated with the coherence reduced laser beam and a processor processes a signal outputted from the detector and detects a defect on the sample. The coherence reducer has an optical path which includes a plurality of at least one of optical fibers and glass rods.
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公开(公告)号：US06819416B2
公开(公告)日：2004-11-16
申请号：US10295909
申请日：2002-11-18
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A method of inspecting a pattern formed on a substrate, comprising the steps of emitting an ultraviolet laser beam from a light source, polarizing the ultraviolet laser beam, scanning the polarized ultraviolet laser beam on a pupil of an objective lens, illuminating a sample with the polarized ultraviolet laser beam after the polarized ultraviolet light beam has passed through the objective lens, analyzing light reflected from the sample as a result of the illuminating step after the reflected light has passed through the objective lens, detecting an image of the sample formed by the analyzed light with a time delay integration sensor, outputting signals corresponding to the detected image of the sample from the time delay integration sensor in parallel, and processing the parallel signals outputted from the time delay integration sensor to detect a defect of a pattern on the sample.
摘要翻译： 一种检查形成在基板上的图案的方法，包括以下步骤：从光源发射紫外激光束，使紫外激光束偏振，扫描物镜的光瞳上的偏振紫外激光束，照射样品 在偏光紫外光束通过物镜之后，偏振紫外激光束作为反射光通过物镜后的照明步骤的结果分析从样品反射的光，检测由所述物镜形成的样品的图像 用时间延迟积分传感器对光进行分析，并行地从时间延迟积分传感器输出与检测出的样本图像相对应的信号，对从时间延迟积分传感器输出的并行信号进行处理，检测样本上的图案缺陷 。
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公开(公告)号：US06667806B2
公开(公告)日：2003-12-23
申请号：US09796613
申请日：2001-03-02
IPC分类号： G01B1100
CPC分类号： G03F7/70633 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： As the size of the semiconductor devices decreases, the relative positional difference between a circuit at an exposure area and an alignment mark due to the aberrations and distortions of lenses and the reticle writing error can not be neglected. Images of circuit patterns having a very small size which are laminated are detected using lights having two different wavelengths. Alignment error is calculated from the relationship between the phase difference of images and the alignment error at each wavelength. The alignment error which affects the yield can be detected by directly measuring the alignment error of the circuit in the exposure area including the influence of the aberrations and distortions of lenses and the reticle writing error. Proper correction and improvement of the exposure apparatus can be achieved at early phase prior to electrical test.
摘要翻译： 随着半导体器件的尺寸减小，曝光区域之间的电路与由于透镜的像差和失真以及掩模版写入误差引起的对准标记之间的相对位置差不能忽略。 使用具有两个不同波长的光来检测层叠有非常小尺寸的电路图案的图像。 对准误差根据图像的相位差和每个波长的对准误差之间的关系计算。 可以通过直接测量曝光区域中的电路的对准误差来检测影响产量的对准误差，包括透镜的像差和失真的影响以及掩模版写入误差。 曝光装置的正确校正和改进可以在电气测试之前的早期阶段实现。
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公开(公告)号：US06621571B1
公开(公告)日：2003-09-16
申请号：US09698167
申请日：2000-10-30
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Toshihiko Nakata , Hiroaki Shishido , Minoru Yoshida , Sachio Uto
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Toshihiko Nakata , Hiroaki Shishido , Minoru Yoshida , Sachio Uto
IPC分类号： G01N2188
CPC分类号： G01N21/95607 , G01N21/9501 , G01N2021/95615
摘要： In a method and apparatus for detecting pattern defects, a UV laser is focused on a pupil of an objective lens and scanned; the focused and scanned UV lens illuminates a specimen on which patterns are formed; the specimen illuminated by the UV laser is imaged: and the resulting image of the specimen is compared with a previously stored reference image. The specimen illuminated by UV light is imaged using an anti-blooming time delay integration image sensor or a back-illumination time delay integration image sensor; and the resulting specimen image is compared with a previously stored reference image.
摘要翻译： 在用于检测图案缺陷的方法和装置中，UV激光聚焦在物镜的光瞳上并进行扫描; 聚焦和扫描的UV透镜照亮形成图案的样本; 对由UV激光照射的样品进行成像：将样品的所得图像与先前存储的参考图像进行比较。 使用抗起霜时间延迟积分图像传感器或反照明时间延迟积分图像传感器对由UV光照射的样本进行成像; 并将所得样品图像与先前存储的参考图像进行比较。
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公开(公告)号：US4725737A
公开(公告)日：1988-02-16
申请号：US797131
申请日：1985-11-12
CPC分类号： G03F9/7076
摘要： An alignment method and apparatus for reduction projection type aligner in which the rough detection of reticle position in the reticle alignment process at the time of mounting a reticle and the fine detection of reticle position in the wafer alignment for the alignment between a wafer and the reticle are performed automatically by the same reticle alignment pattern and the same optical alignment detection system. A plurality of one- or two-dimensional Fresnel zone plates having different shapes of diffraction patterns formed outside of a reticle circuit pattern and arranged at a position outward of the entrance pupil of the reduction projection lens are used as a reticle alignment pattern to detect the absolute position of the reticle. The detection field of view of the optical alignment detection system is thus effectively widened to make pattern detection possible with high magnification for an improved detection accuracy. The same reticle alignment pattern and the same optical alignment detection system are used for rough detection of reticle position in reticle alignment and fine detection of reticle position in wafer alignment. In the optical alignment detection system, on the other hand, the image position of the diffraction pattern from the reticle alignment pattern and the image position of the wafer alignment pattern are located at the same distance from the reticle surface.
摘要翻译： 用于还原投影型对准器的对准方法和装置，其中在安装光罩时在光罩对准过程中对光罩位置进行粗略检测，并且在晶片对准中精确检测标线片位置以用于晶片和掩模版之间的对准 通过相同的掩模版对准图案和相同的光学对准检测系统自动执行。 使用在分划板电路图案之外形成并且布置在还原投影透镜的入射光瞳外侧的位置处具有不同形状的衍射图案的多个一维或二维菲涅尔区域板作为掩模版对准图案，以检测 掩模版的绝对位置。 因此光学对准检测系统的检测视场被有效地加宽，以便以高放大率进行图案检测以提高检测精度。 相同的掩模版对准图案和相同的光学对准检测系统用于粗略检测掩模版对准中的掩模版位置和精确检测晶片对准中的掩模版位置。 另一方面，在光学对准检测系统中，衍射图案的标线片取向图案的图像位置和晶片对准图案的图像位置位于与标线片表面相同的距离处。
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86.发明授权公开(公告)号：US09182592B2
公开(公告)日：2015-11-10
申请号：US13983310
申请日：2012-02-03
申请人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
发明人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
IPC分类号： G01N21/00 , G02B26/02 , G01N21/956 , G01N21/95
CPC分类号： G02B26/02 , G01N21/9501 , G01N21/956
摘要： An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.
摘要翻译： 使用光学滤波装置来检测高灵敏度的缺陷的光学滤波装置和光学检查装置，该光学滤波装置包括在SOI晶片和SOI晶片上制造的光学不透明薄膜上二维地形成的快门阵列 在闸板图案的下侧的部分处形成穿孔部分，同时在SOI晶片的剩余部分处形成工作电极，在其表面上形成有安装有快门阵列的电极图案的玻璃基板，以及 电源部分，用于向形成在玻璃基板上的电极图案和SOI晶片的工作电极提供电力。 并且控制工作电极以使快门图案相对于穿孔部分进行打开和关闭运动以进行光学过滤。
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公开(公告)号：US08885037B2
公开(公告)日：2014-11-11
申请号：US13375239
申请日：2010-07-01
CPC分类号： G01N21/956 , G01N21/9501
摘要： To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
摘要翻译： 为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振 仰角和波长相同但偏振不同。 根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。 在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像 传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。
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公开(公告)号：US08804112B2
公开(公告)日：2014-08-12
申请号：US13265935
申请日：2010-04-22
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译： 一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。 在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的 照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测 和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。
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公开(公告)号：US08634069B2
公开(公告)日：2014-01-21
申请号：US12992903
申请日：2009-05-13
申请人： Hiroyuki Nakano , Shunji Maeda , Toshihiko Nakata
发明人： Hiroyuki Nakano , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N21/9501 , G01N2021/9563
摘要： A defect inspection device, which inspects defects such as foreign materials existing on a specimen on which a circuit pattern of wiring or the like is formed, is provided with an illumination optical system which illuminates a plurality of different areas the specimen with a plurality of linear shaped beams and an image forming optical system that forms images of the plurality of the illuminated areas on a plurality of detectors, and the detectors are configured to receive a plurality of polarization components substantially at the same time and individually, wherein the polarization components are different from each other and are contained in each of the plurality of the optical images formed by the image forming optical system, thereby detecting a plurality of signals corresponding to the polarization components and carrying out the inspection at high speed under a plurality of optical conditions.
摘要翻译： 检查存在于其上形成有布线等的电路图案的样本上存在的异物的缺陷检查装置设置有照明光学系统，该照明光学系统用多个线性照射多个不同的区域 以及形成在多个检测器上的多个照明区域的图像的图像形成光学系统，并且检测器被配置为基本上同时和单独地接收多个偏振分量，其中偏振分量是不同的 并且被包含在由图像形成光学系统形成的多个光学图像的每一个中，从而检测对应于偏振分量的多个信号，并且在多个光学条件下高速执行检查。
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公开(公告)号：US20120176602A1
公开(公告)日：2012-07-12
申请号：US13423862
申请日：2012-03-19
申请人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio UTO , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/88
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译： 用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。 紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。
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