摘要:
This disclosure provides systems, methods and apparatus for providing illumination by using a light guide to distribute light. In one aspect, a passivation layer is attached to the light guide of an illumination device. The passivation layer may be an optically transparent moisture barrier and may have a thickness and refractive index which allows it to function as an anti-reflective coating. The passivation layer may protect moisture-sensitive underlying features, such as metallized light turning features that may be present in the light guide. The light turning features may be configured to redirect light out of the light guide. In some implementations, the redirected light may be applied to illuminate a display.
摘要:
This disclosure provides systems, methods and apparatus for a front illumination device with metalized light-turning features. In one aspect, an illumination device includes a light guide having light-turning features that include recesses formed on the light guide and that extend down into the light guide. The recesses may be coated with a material where the material also forms an auxiliary structure outside of the recesses on the light guide. The auxiliary structure may be conductive and may form, for example, an electrode.
摘要:
The present invention provides articles and methods for affecting the self-assembly of materials. In some cases, the invention provides an approach for facilitating the self-assembly of various materials, including polymeric materials (e.g., block polymers), nanoparticles, other materials capable of self-assembly, and the like, over relatively large surface areas. Some embodiments of the invention provide articles (e.g., substrates) which, when contacted with a material capable of self-assembly, may produce greater control of self-assembly through the bulk of the material.
摘要:
Illumination devices and methods of making same are disclosed. In one embodiment, a display device includes a light modulating array and a light guide configured to receive light into at least one edge of the light guide. The light guide can be characterized by a first refractive index. The display device can also include a light turning layer disposed such that the light guide is at least partially between the turning layer and the array. The turning layer can comprise an inorganic material characterized by a second refractive index that is substantially the same as the first refractive index.
摘要:
This disclosure provides systems and methods for illumination systems with one or more reflective structures over a light guide. In one aspect, each reflective structure can have an absorber structure with a width greater than a width of the reflective structure. The absorber structure can have overhanging portions that are in parallel with and laterally protrude past one or more edges of the reflective structure, or the absorber structure can have enclosing portions that substantially enclose the reflective structure. The reflective structures can include light-turning features, such as facets, and/or conductive wires, such as touch sensor wires.
摘要:
This disclosure provides systems, methods and apparatus related to an electromechanical display device. In one aspect, an analog interferometric modulator (AIMOD) includes a reflective display pixel having a movable reflective layer and a stationary absorber layer, the reflective layer and absorber layer defining a cavity therebetween. A color notch filter may be employed to produce an improved white state. In some implementations, the color notch filter is positioned on a side of the substrate opposite the absorber layer. In some other implementations, the color notch filter is positioned between the substrate and the movable reflective layer.
摘要:
This disclosure provides systems and methods for illumination systems with one or more reflective structures over a light guide. In one aspect, each reflective structure can have an absorber structure with a width greater than a width of the reflective structure. The absorber structure can have overhanging portions that are in parallel with and laterally protrude past one or more edges of the reflective structure, or the absorber structure can have enclosing portions that substantially enclose the reflective structure. The reflective structures can include light-turning features, such as facets, and/or conductive wires, such as touch sensor wires.
摘要:
This disclosure provides systems, methods and apparatus related to an illumination system for a display device. In one aspect, the illumination system includes a light guide having a view region, which directly overlies display elements of a display, and a ledge region between the view region and a light source that injects light into the light guide. The ledge region is coated with an at least partially non-transmissive layer. The layer can be at least partially absorptive and/or at least partially reflective. In some implementations, the layer can include microstructures configured to turn steep-angle light such that it is redirected across the light guide at a shallower angle. In some implementations, the boundary between the ledge region and the view region of the light guide can have a nonlinear shape.
摘要:
This disclosure provides systems, methods and apparatus for improving brightness, contrast, and viewable angle of a reflective display. In one aspect, a display includes a structure having a steering layer including steering features. The steering features are configured to direct light away from inactive regions of a display and towards active regions of the display. The structure may also include a diffuser for scattering light incident on the display and reflected by the display.
摘要:
The efficiency of an etching process may be increased in various ways, and the cost of an etching process may be decreased. Unused etchant may be isolated and recirculated during the etching process. Etching byproducts may be collected and removed from the etching system during the etching process. Components of the etchant may be isolated and used to general additional etchant. Either or both of the etchant or the layers being etched may also be optimized for a particular etching process.