公开(公告)号：US4672318A

公开(公告)日：1987-06-09

申请号：US696909

申请日：1985-01-31

Applicant: Kensuke Sekihara ,  Etsuji Yamamoto ,  Shigeru Matsui ,  Hideki Kohno

Inventor： Kensuke Sekihara ,  Etsuji Yamamoto ,  Shigeru Matsui ,  Hideki Kohno

IPC: G01R33/20 ,  A61B5/055 ,  A61B10/00 ,  G01R33/24 ,  G01R33/38 ,  G01R33/387

CPC classification number: G01R33/24

Abstract: A method of measuring a static magnetic field distribution in a nuclear magnetic resonance (NMR) inspection system which comprises magnetic field generator for producing a static magnetic field, inclination or gradient magnetic fields and a high-frequency magnetic field, a signal detector for sensing nuclear magnetic resonance signals from an inspection sample, a computer for processing output signals from the signal detector and an output device for providing a computational result of the computer, wherein a time interval t.sub.1 from the center of a 90.degree.-pulse high-frequency magnetic field to the center of a 180.degree.-pulse high-frequency magnetic field is made different by a time difference t.sub.0 from a time interval t.sub.2 from the center of the 180.degree.-pulse high-frequency magnetic field to a peak of a spin echo, so that static magnetic field distribution is calculated based on the computer output which corresponds to the difference of the two time intervals.

Abstract translation: 一种在核磁共振（NMR）检查系统中测量静磁场分布的方法，其包括用于产生静磁场，倾斜或梯度磁场和高频磁场的磁场发生器，用于感测核的信号检测器 来自检查样本的磁共振信号，用于处理来自信号检测器的输出信号的计算机和用于提供计算机的计算结果的输出装置，其中从90°脉冲高频磁场的中心起的时间间隔t1 从180°脉冲高频磁场的中心到从180°脉冲高频磁场的中心到自旋回波的峰值的时间间隔t2由时间差t0变化到180°脉冲高频磁场的中心，因此 基于对应于两个时间间隔的差的计算机输出来计算静态磁场分布。

公开(公告)号：US4117658A

公开(公告)日：1978-10-03

申请号：US721146

申请日：1976-09-07

Applicant: Tsutomu Miyasaka ,  Yoshiaki Fujimori ,  Shigeru Matsui ,  Tetsuo Komaki

Inventor： Tsutomu Miyasaka ,  Yoshiaki Fujimori ,  Shigeru Matsui ,  Tetsuo Komaki

IPC: G04B37/08 ,  G04B39/00

CPC classification number: G04B37/084

Abstract: A waterproof watch case construction depends on gaskets alone for waterproofing and is free of cement. The construction is such that a broken crystal can be readily replaced, and the watch case itself can be of any shape, including square, ovoid and hexagonal, as well as circular. The watch crystal is located positively by means of a bezel and a ring which compress a gasket both axially and radially against the watch crystal.

Abstract translation: 防水表壳的构造取决于垫片单独用于防水，并且不含水泥。 该结构使得可以容易地更换破碎的晶体，并且表壳本身可以是任何形状，包括方形，卵形和六边形以及圆形。 手表晶体通过一个边框和一个环来定位，该表圈将垫圈沿轴向和径向压靠在手表晶体上。

公开(公告)号：US4079651A

公开(公告)日：1978-03-21

申请号：US762558

申请日：1977-01-25

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G10H1/055 ,  G10H3/00

CPC classification number: G10H1/0558 ,  Y10S84/07

Abstract: This invention relates to a touch response sensor for an electronic musical instrument which may control the volume, pitch, tone-color or the like of the musical tones produced by the instrument upon depression of the key responsive to the key depressing pressure. In order to detect the key depressing pressure, the touch response sensor has an electrically conductive resilient member having two legs downwardly extending therefrom for producing resistance variations between contact pieces provided on a base plate under the resilient member in response to the key depressing pressure. The contact pieces are, for example, connected via lines to a voltage-controlled variable-frequency oscillator circuit, voltage-controlled variable filter circuit, voltage-controlled variable gain amplifier circuit or the like so as to vary the volume and the like of the tones in accordance with the key depressing pressure.

Abstract translation: 本发明涉及一种用于电子乐器的触摸响应传感器，其可以响应于按键按压而按下按键时可以控制由乐器产生的乐音的音量，音高，色调等。 为了检测键按压压力，触摸响应传感器具有导电弹性构件，其具有从其向下延伸的两个腿，用于响应于按键压力而产生设置在弹性构件下方的底板上的接触片之间的电阻变化。 接触片例如通过线路连接到压控可变频率振荡器电路，压控可变滤波器电路，压控可变增益放大器电路等，以便改变其容量等 音调按照按键压力。

公开(公告)号：US08743357B2

公开(公告)日：2014-06-03

申请号：US13058081

申请日：2009-07-15

Applicant: Shigeru Matsui ,  Mizuki Oku

Inventor： Shigeru Matsui ,  Mizuki Oku

IPC: G01N21/00 ,  G02B27/20

CPC classification number: G01N21/93 ,  G01N21/94 ,  G01N21/9501

Abstract: A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.

Abstract translation: 表面检查装置可以通过使用较小粒径的PSL来检查较小的缺陷。 然而，PSL的粒径受到限制。 因此，在传统的表面检查装置中，在半导体制造步骤的检查中，不考虑如何检查在不久的将来需要的PSL中未设置的这种小粒径的缺陷 。 本发明具有用于产生光的光源装置，其模拟由检查对象散射，衍射或反射的光的波长，光强度，时间依赖性变化和光的偏振中的至少一个 并且光被输入到表面检查装置的光电检测器。 可以检查较小的缺陷。

公开(公告)号：US20140092384A1

公开(公告)日：2014-04-03

申请号：US14118375

申请日：2012-05-17

Applicant: Yoshisada Ebata ,  Shigeru Matsui ,  Norio Hasegawa ,  Kazuyuki Kakuta ,  Toshihiko Onozuka

Inventor： Yoshisada Ebata ,  Shigeru Matsui ,  Norio Hasegawa ,  Kazuyuki Kakuta ,  Toshihiko Onozuka

IPC: G02B5/18 ,  H01L21/26

CPC classification number: G02B5/1857 ,  G01J3/0262 ,  G01J3/18 ,  G01J3/42 ,  G02B5/18 ,  G02B5/1814 ,  G02B5/1861 ,  G03F1/50 ,  G03F1/54 ,  G03F7/0005 ,  H01L21/26

Abstract: The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.

Abstract translation: 发明内容本发明是鉴于上述问题而完成的，其目的在于提供一种制造技术，其能够制造适用于分光光度计的衍射光栅，并具有约90°的凸部的顶角和 可以满足高衍射效率和低杂散光量。 一种制造衍射光栅的方法，该方法包括：设置曝光条件，使得通过曝光形成的基板上的抗蚀剂的凸部的截面形状相对于开口部形状为不对称三角形 具有周期性结构的开口部分和由三角形的长边和短边形成的角度的面具为约90°; 并进行曝光。

公开(公告)号：US08542354B2

公开(公告)日：2013-09-24

申请号：US12361954

申请日：2009-01-29

Applicant: Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

Inventor： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

Abstract: The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

Abstract translation: 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US08462327B2

公开(公告)日：2013-06-11

申请号：US13432153

申请日：2012-03-28

Applicant: Kenji Oka ,  Shigeru Matsui

Inventor： Kenji Oka ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/8851 ,  G01N21/9501

Abstract: An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section.

公开(公告)号：US08248594B2

公开(公告)日：2012-08-21

申请号：US12814518

申请日：2010-06-14

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01N22/00

CPC classification number: G01N21/9501 ,  G01N21/4738

Abstract: A surface inspection method and a surface inspection apparatus in which a plurality of photodetectors are arranged in a plurality of directions so that light scattered, diffracted or reflected on a surface of an object to be inspected or in the vicinity of the surface is detected and a plurality of signals obtained by this are subjected to weighted addition processing or weighted averaging processing by linear combination.

Abstract translation: 表面检查方法和表面检查装置，其中多个光电检测器被布置在多个方向上，使得在被检测物体的表面或表面附近检测到散射，衍射或反射的光，并且 通过这样获得的多个信号通过线性组合进行加权相加处理或加权平均处理。

公开(公告)号：US08169606B2

公开(公告)日：2012-05-01

申请号：US12823290

申请日：2010-06-25

Applicant: Kenji Oka ,  Shigeru Matsui

Inventor： Kenji Oka ,  Shigeru Matsui

IPC: G01N21/00

CPC classification number: G01N21/8851 ,  G01N21/9501

Abstract: An appearance inspection apparatus analyzes a difference in detection characteristics of detection signals obtained by detectors to flexibly meet various inspection purposes without changing a circuit or software. The apparatus includes a signal synthesizing section that synthesizes detection signals from the detectors in accordance with a set condition. An input operating section sets a synthesizing condition of the detection signal by the signal synthesizing section, and an information display section displays a synthesizing map structured based on a synthesized signal which is synthesized by the signal synthesizing section in accordance with a condition set by the input operating section.

Abstract translation: 外观检查装置分析由检测器获得的检测信号的检测特性的差异，以灵活地满足各种检查目的，而不改变电路或软件。 该装置包括信号合成部，其根据设定条件合成来自检测器的检测信号。 输入操作部分通过信号合成部分设置检测信号的合成条件，并且信息显示部分显示由信号合成部分根据由输入设置的条件合成的合成信号构成的合成图 操作部分。

公开(公告)号：US20120044505A1

公开(公告)日：2012-02-23

申请号：US13202681

申请日：2010-01-22

Applicant: Shigeru Matsui

Inventor： Shigeru Matsui

IPC: G01B11/24

CPC classification number: G01N21/9501 ,  G01N2201/103

Abstract: A surface inspecting apparatus rotates a semiconductor wafer 100 (inspection object) as a main scan while translating the semiconductor wafer 100 as an auxiliary scan, illuminates the surface of the semiconductor wafer 100 with illuminating light 21, thereby forms an illumination spot 3 as the illumination area of the illuminating light 21, detects scattered or diffracted or reflected light from the illumination spot, and detects a foreign object existing on the surface of the semiconductor wafer 100 or in a part of the semiconductor wafer 100 in the vicinity of the surface based on the result of the detection. In the surface inspecting apparatus, the translation speed of the auxiliary scan is controlled according to the distance from the rotation center of the semiconductor wafer 100 in the main scan to the illumination spot. With this control, the inspection time can be shortened while the deterioration in the detection sensitivity and the increase in the thermal damage during the surface inspection are suppressed.

Abstract translation: 表面检查装置将作为辅助扫描的半导体晶片100作为主扫描旋转半导体晶片100（检查对象），用照明光21照射半导体晶片100的表面，从而形成照明点3作为照明 照射光21的区域，检测来自照明光点的散射或衍射或反射的光，并且基于以下方式检测存在于半导体晶片100的表面上的异物或半导体晶片100的表面附近的异物 检测结果。 在表面检查装置中，根据从主扫描中的半导体晶片100的旋转中心到照明点的距离来控制辅助扫描的平移速度。 通过该控制，可以在检测灵敏度的劣化和表面检查时的热损伤的增加被抑制的同时缩短检查时间。