公开(公告)号：US20090153823A1

公开(公告)日：2009-06-18

申请号：US12340362

申请日：2008-12-19

申请人： Carlo Cornelis Maria LUIJTEN ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria LUIJTEN ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。

公开(公告)号：US20110013157A1

公开(公告)日：2011-01-20

申请号：US12735823

申请日：2009-02-19

申请人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

发明人： Johannes Hubertus Josephina Moors ,  Norbertus Benedictus Koster ,  Erik Roelof Loopstra ,  Martin Frans Pierre Smeets ,  Antonius Theodorus Wilhelmus Kempen

IPC分类号： G03B27/32 ,  H01F7/02

CPC分类号： G03F7/70933 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70916

摘要： A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.

摘要翻译： 光刻设备包括容纳在保护壳体中的磁体，保护壳体被布置成保护磁体免受含H2或含H原子气体的接触。 外壳还可以包含氢气吸气剂，例如磁体表面改性气体或非含氢气体。 可以提供不含氢的气流，或者可以通过保护外壳的至少一部分提供非氢吸气剂气流。

公开(公告)号：US07593096B2

公开(公告)日：2009-09-22

申请号：US11433767

申请日：2006-05-15

申请人： Erik Roelof Loopstra ,  Joost Jeroen Ottens

发明人： Erik Roelof Loopstra ,  Joost Jeroen Ottens

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

摘要： An article support constructed to support an article for lithographic processing purposes is described. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also described.

摘要翻译： 描述了用于支持用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还描述了并入物品支撑件的光刻设备和设备制造。

公开(公告)号：US08269949B2

公开(公告)日：2012-09-18

申请号：US12563838

申请日：2009-09-21

申请人： Marcus Martinus Petrus Adrianus Vermeulen ,  Andre Bernardus Jeunink ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Rene Theodorus Petrus Compen ,  Peter Smits ,  Martijn Houben ,  Hendrikus Johannes Marinus Van Abeelen ,  Antonius Arnoldus Meulendijks ,  Rene Wilhelmus Antonius Hubertus Leenaars

发明人： Marcus Martinus Petrus Adrianus Vermeulen ,  Andre Bernardus Jeunink ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Rene Theodorus Petrus Compen ,  Peter Smits ,  Martijn Houben ,  Hendrikus Johannes Marinus Van Abeelen ,  Antonius Arnoldus Meulendijks ,  Rene Wilhelmus Antonius Hubertus Leenaars

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70775

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。

公开(公告)号：US20110170078A1

公开(公告)日：2011-07-14

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/54

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US09164401B2

公开(公告)日：2015-10-20

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US08817229B2

公开(公告)日：2014-08-26

申请号：US13081190

申请日：2011-04-06

申请人： Franciscus Johannes Joseph Janssen ,  Erik Roelof Loopstra

发明人： Franciscus Johannes Joseph Janssen ,  Erik Roelof Loopstra

IPC分类号： G03B27/52 ,  G02B7/18 ,  G03F7/20 ,  F28D15/00

CPC分类号： G03B27/52 ,  F28D15/00 ,  G02B7/181 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/709

摘要： A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.

摘要翻译： 一种对在真空环境中工作的光学元件进行热调节的方法。 光学元件包括具有至少一个光学表面和至少一个传热表面的第一主体。 第一个身体在位置和/或方向上动态控制。 该方法包括将第二主体的温度控制到期望的温度，第二主体包括第二传热表面; 将所述第二主体定位在所述第一主体附近并且在位置和/或方向上动态地控制所述第二主体，以便将所述第一和第二传热表面保持为基本上恒定的布置，而不会在所述主体之间接触; 并且将作为传热介质的气体输送到由第一和第二传热表面限定的传热空间中，同时将传热空间中的气体的压力控制在约30Pa和约300Pa之间。

公开(公告)号：US20080316441A1

公开(公告)日：2008-12-25

申请号：US11812507

申请日：2007-06-19

申请人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

发明人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

IPC分类号： G03B27/42

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。

公开(公告)号：US08537330B2

公开(公告)日：2013-09-17

申请号：US13004557

申请日：2011-01-11

申请人： Erik Roelof Loopstra ,  Marius Ravensbergen ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Marius Ravensbergen ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03B27/52 ,  G03B27/54 ,  G03F7/70266 ,  G03F7/70891

摘要： In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.

摘要翻译： 在光刻设备中，反射器的一部分被加热和冷却。 调节加热速率和/或冷却速率以调节部件的温度。 部件的温度变化在反射器上施加力，其改变其形状。

公开(公告)号：US07561250B2

公开(公告)日：2009-07-14

申请号：US11812507

申请日：2007-06-19

申请人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

发明人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。