公开(公告)号：US09164401B2

公开(公告)日：2015-10-20

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US20110170078A1

公开(公告)日：2011-07-14

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/54

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US20110223543A1

公开(公告)日：2011-09-15

申请号：US12994930

申请日：2009-05-05

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70575

摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

公开(公告)号：US09097982B2

公开(公告)日：2015-08-04

申请号：US12994930

申请日：2009-05-05

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70575

摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

公开(公告)号：US20140085619A1

公开(公告)日：2014-03-27

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US20120262690A1

公开(公告)日：2012-10-18

申请号：US13518301

申请日：2010-11-29

申请人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

发明人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/70075

摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

摘要翻译： 照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。 场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。 其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。 其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。 这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从 瞳孔面反射镜。

公开(公告)号：US08300208B2

公开(公告)日：2012-10-30

申请号：US12616312

申请日：2009-11-11

申请人： Erik Roelof Loopstra ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

发明人： Erik Roelof Loopstra ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

摘要： Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object.

摘要翻译： 本发明的实施例提供了一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成 图案化的辐射束，被构造成保持衬底的衬底台，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统，用于支撑投影系统的主动空气支架，主动空气支架包括至少一个 致动器和前馈装置，所述前馈装置被配置为基于可移动物体的设定点信号提供到所述至少一个致动器的前馈信号，其中所述前馈信号 被设计成由于可移动物体的移动而减小对投影系统的干扰效应。

公开(公告)号：US08289498B2

公开(公告)日：2012-10-16

申请号：US12483703

申请日：2009-06-12

申请人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Leon Martin Levasier ,  Bernardus Antonius Johannes Luttikhuis ,  Josephus Jacobus Smits ,  Anthonie Aantjes ,  Maurice Willem Jozef Etiënne Wijckmans ,  Johannes Bernardus Ridder ,  Andre Schreuder ,  Dennis Jozef Maria Paulussen ,  Peter Gerardus Jonkers ,  Hugues Poincelin ,  Fransiscus Theresia Noel Heusschen

发明人： Erik Roelof Loopstra ,  Petrus Rutgerus Bartray ,  Leon Martin Levasier ,  Bernardus Antonius Johannes Luttikhuis ,  Josephus Jacobus Smits ,  Anthonie Aantjes ,  Maurice Willem Jozef Etiënne Wijckmans ,  Johannes Bernardus Ridder ,  Andre Schreuder ,  Dennis Jozef Maria Paulussen ,  Peter Gerardus Jonkers ,  Hugues Poincelin ,  Fransiscus Theresia Noel Heusschen

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/709 ,  G03F7/70808

摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。

公开(公告)号：US09152058B2

公开(公告)日：2015-10-06

申请号：US13194136

申请日：2011-07-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolensnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.

摘要翻译： 一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统 被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。