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    Method of cooling an optical element, lithographic apparatus and method for manufacturing a device
    7.
    发明授权
    Method of cooling an optical element, lithographic apparatus and method for manufacturing a device 有权
    冷却光学元件的方法，光刻设备及其制造方法

    公开(公告)号：US08817229B2

    公开(公告)日：2014-08-26

    申请号：US13081190

    申请日：2011-04-06

    申请人： Franciscus Johannes Joseph Janssen ,  Erik Roelof Loopstra

    发明人： Franciscus Johannes Joseph Janssen ,  Erik Roelof Loopstra

    IPC分类号： G03B27/52 ,  G02B7/18 ,  G03F7/20 ,  F28D15/00

    CPC分类号： G03B27/52 ,  F28D15/00 ,  G02B7/181 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/709

    摘要： A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.

    摘要翻译： 一种对在真空环境中工作的光学元件进行热调节的方法。 光学元件包括具有至少一个光学表面和至少一个传热表面的第一主体。 第一个身体在位置和/或方向上动态控制。 该方法包括将第二主体的温度控制到期望的温度，第二主体包括第二传热表面; 将所述第二主体定位在所述第一主体附近并且在位置和/或方向上动态地控制所述第二主体，以便将所述第一和第二传热表面保持为基本上恒定的布置，而不会在所述主体之间接触; 并且将作为传热介质的气体输送到由第一和第二传热表面限定的传热空间中，同时将传热空间中的气体的压力控制在约30Pa和约300Pa之间。