公开(公告)号：US07041431B2

公开(公告)日：2006-05-09

申请号：US10737804

申请日：2003-12-18

申请人： Toshiyuki Urano ,  Kazuhiro Kohori ,  Hideaki Okamoto

发明人： Toshiyuki Urano ,  Kazuhiro Kohori ,  Hideaki Okamoto

IPC分类号： G03F7/30

CPC分类号： G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0388 ,  G03F7/2055 ,  Y10S430/146 ,  Y10S430/148

摘要： A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 μJ/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0

摘要翻译： 感光性平版印刷版包括在支撑体上依次形成的感光层和保护层，其中感光层在390〜430nm的波长范围内具有光谱灵敏度的最大峰值，光敏平版印刷的最小曝光 波长410nm的图像形成用印刷板（S410）为至多100μJ/ cm 2以下，波长为450nm的图像形成的最小曝光（S450）与 波长410nm的图像形成的最小曝光（S410）为0

公开(公告)号：US06861200B2

公开(公告)日：2005-03-01

申请号：US09907611

申请日：2001-07-19

申请人： Yasuhito Oshima

发明人： Yasuhito Oshima

IPC分类号： B41C1/10 ,  C08F2/00 ,  C08F2/44 ,  C08F2/46 ,  C08F4/00 ,  C08F20/26 ,  C08F20/58 ,  C08F265/00 ,  G03F7/00 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033 ,  G03F7/004

CPC分类号： B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/033 ,  Y10S430/111 ,  Y10S430/145 ,  Y10S430/148

摘要： A negative working photosensitive lithographic printing plate is disclosed, which comprises a support having thereon at least one photosensitive layer containing a polymeric binder having repeating units represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a hydrocarbon group which has an alicyclic structure and has 3 to 30 carbon atoms and a valence of n+1; A represents an oxygen atom or —NR3—, wherein R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n is an integer of 1 to 5. The negative working photosensitive lithographic printing plate can attain both high productivity and high printing durability. It is especially suitable for drawing with laser light.

摘要翻译： 公开了一种负性感光性平版印刷版，其包括其上具有至少一层感光层的载体，所述感光层含有具有由式（I）表示的重复单元的聚合物粘合剂：其中R 1表示氢原子或甲基; R 2表示具有脂环结构且具有3〜30个碳原子并且n + 1价的烃基; A表示氧原子或-NR 3 - ，其中R 3表示氢原子或具有1〜10个碳原子的一价烃基; n为1〜5的整数。负性感光性平版印刷版可以实现高生产率和高印刷耐久性。 特别适合用激光进行绘图。

公开(公告)号：USRE38199E1

公开(公告)日：2003-07-22

申请号：US10092912

申请日：2002-03-06

申请人： Seishi Kasai ,  Eiichi Kato

发明人： Seishi Kasai ,  Eiichi Kato

IPC分类号： G03F740

CPC分类号： G03F7/0043 ,  B41C1/1041 ,  G03F7/0757 ,  Y10S430/148

摘要： A method for the preparation of a lithographic printing plate comprises exposing imagewise a lithographic printing plate precursor comprising a support having provided thereon a light-sensitive layer containing fine anatase-type titanium oxide grains and a complex composed of an organo-metallic polymer and an organic polymer containing at least one member selected from the group consisting of an amido bond, a urethane bond, a ureido bond and a hydroxy group to an ultraviolet ray to render a surface of the light-sensitive layer hydrophilic in the exposed area. A lithographic printing plate prepared according to the method is also disclosed.

摘要翻译： 制备平版印刷版的方法包括使包含载体上的平版印刷版前体曝光在其上的含有锐钛矿型氧化钛颗粒的光敏层和由有机金属聚合物和有机金属聚合物组成的复合物 含有选自由酰胺键，氨基甲酸酯键，脲基键和羟基组成的组中的至少一种的紫外线的聚合物，以使感光层的表面在曝光区域中具有亲水性。 还公开了根据该方法制备的平版印刷版。

公开(公告)号：US06258512B1

公开(公告)日：2001-07-10

申请号：US09396851

申请日：1999-09-15

申请人： Seishi Kasai ,  Eiichi Kato

发明人： Seishi Kasai ,  Eiichi Kato

IPC分类号： G03F740

CPC分类号： G03F7/0043 ,  B41C1/1041 ,  G03F7/0757 ,  Y10S430/148

摘要： A method for the preparation of a lithographic printing plate comprises exposing imagewise a lithographic printing plate precursor comprising a support having provided thereon a light-sensitive layer containing fine anatase-type titanium oxide grains and a complex composed of an organo-metallic polymer and an organic polymer containing at least one member selected from the group consisting of an amido bond, a urethane bond, a ureido bond and a hydroxy group to an ultraviolet ray to render a surface of the light-sensitive layer hydrophilic in the exposed area. A lithographic printing plate prepared according to the method is also disclosed.

摘要翻译： 制备平版印刷版的方法包括使包含载体上的平版印刷版前体曝光在其上的含有锐钛矿型氧化钛颗粒的光敏层和由有机金属聚合物和有机金属聚合物组成的复合物 含有选自由酰胺键，氨基甲酸酯键，脲基键和羟基组成的组中的至少一种的紫外线的聚合物，以使感光层的表面在曝光区域中具有亲水性。 还公开了根据该方法制备的平版印刷版。

公开(公告)号：US06191062B1

公开(公告)日：2001-02-20

申请号：US08849645

申请日：1997-05-15

申请人： Makoto Hayakawa ,  Makoto Chikuni ,  Toshiya Watanabe

发明人： Makoto Hayakawa ,  Makoto Chikuni ,  Toshiya Watanabe

IPC分类号： B01J3106

CPC分类号： B01J35/004 ,  B01J35/002 ,  Y10S430/148 ,  Y10T428/249967 ,  Y10T428/249969 ,  Y10T428/24997

摘要： A photocatalytic functional material having an excellent photocatalytic activity even by a low temperature heat treatment and having a high mechanical strength of the surface. The photocatalytic functional material of the present invention comprises a surface layer (a photocatalytic functional layer) containing a photocatalyst, an electron trapping metal and a photodegradation-resistant matrix. Though the major proportion of the photocatalyst (TiO2 particles, and the like) in the photocatalytic functional layer are covered with the photodegradation-resistant matrix (a thermosetting resin, and the like), the electron-trapping metal effectively traps the electrons generated by the photocatalytic reaction, retains positive holes and generates active oxygen species, so that the photocatalytic function such as deodorant and antimicrobial activities can be fully exhibited.

摘要翻译： 一种光催化功能材料，即使通过低温热处理也具有优异的光催化活性，并且具有高的表面机械强度。本发明的光催化功能材料包括含有光催化剂的表面层（光催化功能层），电子 捕获金属和抗光降解基质。 尽管光催化功能层中的光催化剂（TiO 2颗粒等）的主要部分被光降解抗性基质（热固性树脂等）覆盖，但是电子俘获金属有效捕获由 光催化反应，保留空穴并产生活性氧，从而可以充分发挥除臭和抗菌活性等光催化功能。

公开(公告)号：US6162577A

公开(公告)日：2000-12-19

申请号：US158943

申请日：1998-09-21

申请人： T. E. Felter ,  G. D. Kubiak

发明人： T. E. Felter ,  G. D. Kubiak

IPC分类号： G03F7/004 ,  G03F7/09

CPC分类号： G03F7/094 ,  G03F7/0042 ,  Y10S430/148

摘要： A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

摘要翻译： 使用投影光刻和极紫外（EUV）辐射，在0.4-0.05μm的尺寸范围内产生特征图案阵列，特别是栅极孔的方法。 使用高能激光束来蒸发目标材料以产生等离子体，其进而产生用于光刻应用的约13nm的特征波长的极紫外辐射。 辐射通过一系列反射镜传送到具有待印刷图案的掩模。 通过适当的光学元件和单次曝光将缩小的聚焦掩模图案透射到涂覆有被设计为对EUV辐射透明的光致抗蚀剂的基底，并且还满足常规的加工方法。

公开(公告)号：US6093518A

公开(公告)日：2000-07-25

申请号：US245028

申请日：1999-02-05

申请人： Genji Imai ,  Hideo Kogure

发明人： Genji Imai ,  Hideo Kogure

IPC分类号： C08F2/50 ,  G03F7/029 ,  G03C1/675 ,  G03F7/028 ,  G03F7/031 ,  G03F7/30

CPC分类号： G03F7/029 ,  C08F2/50 ,  Y10S430/126 ,  Y10S430/127 ,  Y10S430/146 ,  Y10S430/148

摘要： The present invention provides a visible laser-curable photosensitive composition wherein a photocuring resin having photosensitive group which is crosslinkable or polymerizable upon light exposure, is mixed with a photopolymerization inititor system consisting of a coumarin type pigment of particular structure and a titanocene compound. This composition has an unexpectedly high sensitivity to visible laser.

摘要翻译： 本发明提供一种可见光激光固化型感光性组合物，其中具有可曝光或可聚合的光敏基团的光固化树脂与由特定结构的香豆素型颜料和二茂钛化合物组成的光聚合引发剂体系混合。 该组合物对可见激光具有出乎意料的高灵敏度。

公开(公告)号：US6007963A

公开(公告)日：1999-12-28

申请号：US877031

申请日：1997-06-17

申请人： T. E. Felter ,  Glenn D. Kubiak

发明人： T. E. Felter ,  Glenn D. Kubiak

IPC分类号： G03F7/004 ,  G03F7/09 ,  G03C1/492

CPC分类号： G03F7/094 ,  G03F7/0042 ,  Y10S430/148

摘要： A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

公开(公告)号：US5976735A

公开(公告)日：1999-11-02

申请号：US615293

申请日：1996-03-21

申请人： Alan Stanley Victor Monk ,  Peter Andrew Reath Bennett ,  Christopher David McCullogh ,  Geoffrey Horne

发明人： Alan Stanley Victor Monk ,  Peter Andrew Reath Bennett ,  Christopher David McCullogh ,  Geoffrey Horne

IPC分类号： G03F7/004 ,  C09D4/00 ,  C09D4/06 ,  C09D101/10 ,  C09D155/00 ,  C09D171/00 ,  G03F7/00 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033

CPC分类号： G03F7/031 ,  G03F7/029 ,  Y10S430/107 ,  Y10S430/112 ,  Y10S430/116 ,  Y10S430/12 ,  Y10S430/124 ,  Y10S430/127 ,  Y10S430/146 ,  Y10S430/148

摘要： There is described a lithographic plate which comprises a base coated with a photopolymerisable composition which comprises a polymeric binder, at least one free-radically polymerisable ethylenically unsaturated compound and as the photoinitiator combination a metallocene compound, N-phenyl glycine or a substituted N-phenyl glycine or an N-phenyl glycine derivative together with a third component which is a substance which helps in the reaction initiation but also increases the sensitivity of the photopolymerisable composition to a desired region of the spectrum.

摘要翻译： PCT No.PCT / GB94 / 02056 Sec。 371日期1996年3月21日 102（e）1996年3月21日PCT PCT 1994年9月22日PCT公布。 出版物WO95 / 09383 日期1995年4月6日描述了一种平版印刷版，其包括涂覆有可光聚合组合物的基底，其包含聚合物粘合剂，至少一种可自由基聚合的烯键式不饱和化合物，并且作为光引发剂组合，茂金属化合物，N-苯基甘氨酸或 取代的N-苯基甘氨酸或N-苯基甘氨酸衍生物以及作为有助于反应引发的物质的第三组分，但也增加可光聚合组合物对光谱的所需区域的敏感性。

公开(公告)号：US5501942A

公开(公告)日：1996-03-26

申请号：US304643

申请日：1994-09-12

申请人： Roger P. Salvin ,  Adrian Schulthess

发明人： Roger P. Salvin ,  Adrian Schulthess

IPC分类号： C08F299/02 ,  C08F2/50 ,  C08F4/00 ,  C08F290/00 ,  C08L101/00 ,  C09D4/00 ,  C09D4/02 ,  C09D4/06 ,  G03F7/027 ,  G03F7/032 ,  G03F7/033 ,  H05K3/06 ,  H05K3/28 ,  G03C1/73

CPC分类号： G03F7/033 ,  G03F7/027 ,  G03F7/032 ,  Y10S430/111 ,  Y10S430/148

摘要： There are disclosed photosensitive compositions based on water as solvent and/or dispersant for the components of said compositions, comprising 10-50% by weight of water-soluble and/or water-dispersible solid, crosslinkable film-forming polymers as binder, 4-50% by weight of water-soluble and/or water-dispersible photopolymerisable acrylate and/or methacrylate monomers and/or corresponding oligomers, 0.1 to 10% by weight of water-soluble and/or water-dispersible photoinitiator compounds for the photopolymerisable acrylate and/or methacrylate monomers and/or corresponding oligomers, and if the binder contains non-selfcrosslinking polymers, 2.5-40% by weight of water-soluble and/or water-dispersible crosslinking agents for the polymeric binder as thermal hardener, selected from the group consisting of epoxy resins, melamine resins and blocked polyisocyanates.Preferred compositions contain carboxyl group-containing acrylate and methacrylate polymers and copolymers as binder, the carboxyl groups of which composition are reacted with ammonia and/or amines in an amount sufficient to ensure the water-solubility of the polymers and copolymers.The novel compositions are photoimageable and are particularly suitable for use as solder resists.

摘要翻译： 公开了基于水作为所述组合物组分的溶剂和/或分散剂的光敏组合物，其包含10-50重量％的水溶性和/或水分散性固体，可交联成膜聚合物作为粘合剂，4- 50重量％的水溶性和/或水分散性可光聚合丙烯酸酯和/或甲基丙烯酸酯单体和/或相应的低聚物，0.1至10重量％的可光聚合丙烯酸酯的水溶性和/或水分散性光引发剂化合物，以及 /或甲基丙烯酸酯单体和/或相应的低聚物，并且如果粘合剂含有非自交联聚合物，则将2.5-40重量％的聚合粘合剂作为热硬化剂的水溶性和/或水分散性交联剂选自组 由环氧树脂，三聚氰胺树脂和封端的多异氰酸酯组成。 优选的组合物含有含羧基的丙烯酸酯和甲基丙烯酸酯和共聚物作为粘合剂，其组合物的羧基与氨和/或胺反应，其量足以确保聚合物和共聚物的水溶性。 该新型组合物是可光成像的并且特别适合用作阻焊剂。