公开(公告)号：US3628177A

公开(公告)日：1971-12-14

申请号：US3628177D

申请日：1965-06-29

申请人： RCA CORP

发明人： HAMMER JACOB M

IPC分类号： H01S3/097 ,  H01S3/104 ,  H01S3/10

CPC分类号： H01S3/09707 ,  H01S3/104

摘要： Intensity, color and/or spatial modulation of a laser light beam is accomplished by providing within the resonant cavity of a gas laser, pump means for the gas which comprises at least in part an electron beam, in which the electron beam current, electron beam voltage and electron beam position are independently controllable by means of a first grid between a cathode and anode, a second grid between the first grid and the anode, and deflection plates, respectively.

公开(公告)号：US3467914A

公开(公告)日：1969-09-16

申请号：US3467914D

申请日：1964-04-23

申请人： SIEMENS AG

发明人： MULLER RUDOLF A

IPC分类号： H01S3/0975 ,  H01S3/104 ,  H01S3/22 ,  H01S3/09

CPC分类号： H01S3/104 ,  H01S3/0975

公开(公告)号：US3464024A

公开(公告)日：1969-08-26

申请号：US3464024D

申请日：1963-10-21

申请人： SPECTRA PHYSICS

发明人： BELL WILLIAM E ,  BLOOM ARNOLD L

IPC分类号： H01S3/0975 ,  H01S3/104 ,  H01S3/134 ,  H01S1/00

CPC分类号： H01S3/134 ,  H01S3/0975 ,  H01S3/104

公开(公告)号：US20240297476A1

公开(公告)日：2024-09-05

申请号：US18647199

申请日：2024-04-26

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Chun-Lin Louis Chang ,  Henry Tong Yee Shian ,  Alan Tu ,  Han-Lung Chang ,  Tzung-Chi Fu ,  Bo-Tsun Liu ,  Li-Jui Chen ,  Po-Chung Cheng

IPC分类号： H01S3/104 ,  H01S3/00 ,  H01S3/04 ,  H01S3/041 ,  H01S3/10 ,  H01S3/1123 ,  H01S3/223 ,  H01S3/23 ,  H05G2/00

CPC分类号： H01S3/104 ,  H01S3/1001 ,  H01S3/2316 ,  H05G2/008 ,  H01S3/005 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/1123 ,  H01S3/2232

摘要： The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.

公开(公告)号：US11855406B2

公开(公告)日：2023-12-26

申请号：US17710424

申请日：2022-03-31

申请人： Xemed LLC

发明人： F. William Hersman ,  Jan H. Distelbrink

IPC分类号： H01S3/0941 ,  H01S3/104 ,  H01S3/03 ,  H01S3/0943 ,  H01S3/034

CPC分类号： H01S3/104 ,  H01S3/031 ,  H01S3/034 ,  H01S3/0941 ,  H01S3/0943

摘要： Gaseous laser systems and related techniques are disclosed. Techniques disclosed herein may be utilized, in accordance with some embodiments, in providing a gaseous laser system with a configuration that provides (A) pump illumination with distinct edge surfaces for an extended depth and (B) an output beam illumination from a resonator cavity with distinct edges in its reflectivity profile, thereby providing (C) pump beam and output beam illumination on a volume so that the distinct edge surfaces of its pump and beam illumination are shared-edge surfaces with (D) further edge surfaces of the amplifier volume at the surfaces illuminated directly by the pump or output beams, as defined by optical windows and (optionally) by one or more flowing gas curtains depleted of the alkali vapor flowing along those optical windows. Techniques disclosed herein may be implemented, for example, in a diode-pumped alkali laser (DPAL) system, in accordance with some embodiments.

公开(公告)号：US20230318251A1

公开(公告)日：2023-10-05

申请号：US17710424

申请日：2022-03-31

申请人： Xemed LLC

发明人： F. William Hersman ,  Jan H. Distelbrink

IPC分类号： H01S3/104 ,  H01S3/03 ,  H01S3/034 ,  H01S3/0943 ,  H01S3/0941

CPC分类号： H01S3/104 ,  H01S3/031 ,  H01S3/034 ,  H01S3/0943 ,  H01S3/0941

摘要： Gaseous laser systems and related techniques are disclosed. Techniques disclosed herein may be utilized, in accordance with some embodiments, in providing a gaseous laser system with a configuration that provides (A) pump illumination with distinct edge surfaces for an extended depth and (B) an output beam illumination from a resonator cavity with distinct edges in its reflectivity profile, thereby providing (C) pump beam and output beam illumination on a volume so that the distinct edge surfaces of its pump and beam illumination are shared-edge surfaces with (D) further edge surfaces of the amplifier volume at the surfaces illuminated directly by the pump or output beams, as defined by optical windows and (optionally) by one or more flowing gas curtains depleted of the alkali vapor flowing along those optical windows. Techniques disclosed herein may be implemented, for example, in a diode-pumped alkali laser (DPAL) system, in accordance with some embodiments.

公开(公告)号：US20230208092A1

公开(公告)日：2023-06-29

申请号：US18171609

申请日：2023-02-20

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Chun-Lin Louis Chang ,  Henry Tong Yee Shian ,  Alan Tu ,  Han-Lung Chang ,  Tzung-Chi Fu ,  Bo-Tsun Liu ,  Li-Jui Chen ,  Po-Chung Cheng

IPC分类号： H01S3/10 ,  H05G2/00 ,  H01S3/104 ,  H01S3/23

CPC分类号： H01S3/1001 ,  H05G2/008 ,  H01S3/104 ,  H01S3/2316 ,  H01S3/0407

摘要： The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.

公开(公告)号：US20220285902A1

公开(公告)日：2022-09-08

申请号：US17641142

申请日：2020-09-10

申请人： Cymer, LLC

发明人： Yingbo Zhao

IPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/104

摘要： Provided is a gas control system and method for online control of a gas compartment of a radiation source. The method includes measuring a parameter of a radiation source such as an excimer laser, the parameter describing an electrical stimulation applied to the laser and/or a characteristic of radiation generated by the laser and/or an amount of a consumable in the gas compartment. A function of the parameter is compared a to a threshold and if the parameter breaches the threshold, an amount of gas is calculated based on the parameter. An instruction is provided to provide or remove the amount of gas to or from, the gas compartment. Gases may be injected or bled into the compartment during use of the radiation source thereby reducing or negating the need to take the radiation source offline to purge and refill the gas compartment.

公开(公告)号：US11079686B2

公开(公告)日：2021-08-03

申请号：US16871758

申请日：2020-05-11

申请人： Gigaphoton Inc.

发明人： Keisuke Ishida ,  Masato Moriya ,  Natsuhiko Kouno ,  Takeshi Asayama ,  Takashi Kusama

IPC分类号： G03F7/20 ,  G01J3/26 ,  H01S3/036 ,  H01S3/104 ,  H01S3/225

摘要： An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.

公开(公告)号：US10897118B2

公开(公告)日：2021-01-19

申请号：US16052658

申请日：2018-08-02

申请人： Gigaphoton Inc.

发明人： Yoshiaki Kurosawa

IPC分类号： H01S3/23 ,  H01S3/104 ,  H01S3/10 ,  H01S5/0683 ,  H01S3/00 ,  H01S5/34 ,  H01S3/223 ,  H01S5/40 ,  H01S3/134 ,  H05G2/00 ,  G03F7/20

摘要： The laser apparatus includes a master oscillator, an amplifier, a power source, and a controller to control the power source. The controller controls the power source such that an excitation intensity of the amplifier in a burst oscillation period performing the burst oscillation is a first excitation intensity, controls the power source such that, if the predetermined repetition frequency is a first repetition frequency, an excitation intensity of the amplifier in a suspension period suspending the burst oscillation is a second excitation intensity equal to or lower than the first excitation intensity, and controls the power source such that, if the predetermined repetition frequency is a second repetition frequency higher than the first repetition frequency, the excitation intensity of the amplifier in the suspension period is a third excitation intensity lower than the second excitation intensity.