公开(公告)号：US08304262B2

公开(公告)日：2012-11-06

申请号：US13029824

申请日：2011-02-17

申请人： Ben-Li Sheu ,  Rajinder Dhindsa ,  Vinay Pohray ,  Eric A. Hudson ,  Andrew D. Bailey, III

发明人： Ben-Li Sheu ,  Rajinder Dhindsa ,  Vinay Pohray ,  Eric A. Hudson ,  Andrew D. Bailey, III

IPC分类号： H01L21/00 ,  H01L21/4763 ,  H01L21/461 ,  H01L21/302

CPC分类号： H01L21/31116 ,  H01L21/31144

摘要： A method for etching features in an etch layer. A conditioning for a patterned pseudo-hardmask of amorphous carbon or polysilicon disposed over the etch layer is provided, where the conditioning comprises providing a fluorine free deposition gas comprising a hydrocarbon gas, forming a plasma from the fluorine free deposition gas, providing a bias less than 500 volts, and forming a deposition on top of the patterned pseudo-hardmask. The etch layer is etched through the patterned pseudo-hardmask.

摘要翻译： 一种用于蚀刻蚀刻层中的特征的方法。 提供了一种用于设置在蚀刻层上的非晶碳或多晶硅的图案化伪硬掩模的调理，其中调节包括提供包含烃气体的无氟沉积气体，从无氟沉积气体形成等离子体， 超过500伏，并且在图案化伪硬掩模的顶部上形成沉积物。 蚀刻层通过图案化伪硬掩模进行蚀刻。

公开(公告)号：US07621713B2

公开(公告)日：2009-11-24

申请号：US11505859

申请日：2006-08-18

申请人： Ben-Li Pen ,  Gou-Hao Tsao ,  Tzu-Chung Yenn ,  Dah-Ping Wang

发明人： Ben-Li Pen ,  Gou-Hao Tsao ,  Tzu-Chung Yenn ,  Dah-Ping Wang

IPC分类号： B65G1/18

CPC分类号： G21F5/14 ,  G21Y2002/202 ,  G21Y2002/501 ,  G21Y2004/40

摘要： An automatic pallet loading/unloading method for radioactive waste drums is disclosed, which comprises the steps of: (a) providing a conveying pallet accommodating six radioactive waste drums; (b) arranging the pallet on a specific importing carrier; (c) performing a two-dimensional fetching position adjustment upon the pallet by the importing carrier; and (d) using a grabber crane to grab and carry the radioactive waste drums in a specific order so as to apply an continuous inspection process upon each radioactive waste drum successively. In a preferred aspect, the two-dimensional fetching position adjustment uses a transverse positioning operation cooperating with a lengthwise positioning operation to successively place each radioactive waste drum in a specific position to be grabbed by the grabber crane and thus to be inspected by the inspection process. In addition, an exporting carrier with two-dimensional position adjustment ability similar to that of the importing carrier is provided for receiving those radioactive waste drums after each has completed the inspection process, whereas an empty pallet placed on the carrier is moved with respect to the two-dimensional position adjustment of the exporting carrier so as to enable the radioactive waste drums after being inspected to set on the pallet in order appropriately. By the method of the invention, an automatic inspection process for radioactive waste drums can be achieved so as to prevent operators from getting radiation damage due to the exposure in radiation environment while operating inspection.

摘要翻译： 公开了一种用于放射性废物桶的自动托盘装载/卸载方法，其包括以下步骤：（a）提供容纳六个放射性废物桶的传送托盘; （b）将货盘安排在特定的进口货物上; （c）由进口承运人对托盘执行二维取出位置调整; 和（d）使用抓取式起重机以特定的顺序抓放放放废物桶，以便对每个放射性废料桶连续地进行连续检查。 在优选的方面，二维取样位置调整使用与纵向定位操作协作的横向定位操作，以将每个放射性废料滚筒连续地放置在由抓取式起重机抓住的特定位置，从而由​​检查过程检查 。 另外，提供了一种具有与进口承运人类似的二维位置调整能力的出口承运人，用于在每个完成检查过程之后接收这些放射性废物桶，而放置在承运人上的空托盘相对于 出口承运人的二维位置调整，使得放射性废物桶在检查后能够适当地放置在托盘上。 通过本发明的方法，可以实现放射性废物桶的自动检查过程，以防止操作者在操作检查时由于辐射环境中的暴露而受到辐射损伤。

公开(公告)号：US06864190B2

公开(公告)日：2005-03-08

申请号：US10271549

申请日：2002-10-17

申请人： Yujie Han ,  Suwas Nikumb ,  Ben Li Luan ,  John Nagata

发明人： Yujie Han ,  Suwas Nikumb ,  Ben Li Luan ,  John Nagata

IPC分类号： B23K26/362 ,  H01L21/31

CPC分类号： B23K26/0006 ,  B23K2103/16 ,  B23K2103/172 ,  B23K2103/50 ,  Y10T428/249967 ,  Y10T428/249969

摘要： Disclosed is a process for fabricating luminescent porous material, the process comprising pre-treating a substrate (e.g. crystalline silicon) with laser radiation (e.g from a Nd:YAG laser) in a predetermined pattern followed by exposing the irradiated substrate to a chemical stain etchant (e.g. HF:HNO3:H2O) to produce a luminescent nanoporous material. Luminescent porous material having a luminescence maximum greater than about 2100 meV may be produced by this method. Such nanoporous materials are useful in optoelectronic and other semiconductor devices.

摘要翻译： 公开了一种制造发光多孔材料的方法，该方法包括以预定图案用激光辐射（例如从Nd：YAG激光器）预处理衬底（例如晶体硅），随后将照射的衬底暴露于化学污渍蚀刻剂 （例如HF：HNO 3 :H 2 O）以产生发光纳米多孔材料。 通过该方法可以产生具有大于约2100meV的发光最大值的发光多孔材料。 这种纳米多孔材料可用于光电子器件和其它半导体器件。

公开(公告)号：US07998439B2

公开(公告)日：2011-08-16

申请号：US12655343

申请日：2009-12-29

申请人： Chen-Te Lin ,  Kuo-Hao Tsao ,  Ben-Li Pen

发明人： Chen-Te Lin ,  Kuo-Hao Tsao ,  Ben-Li Pen

IPC分类号： C01G56/00

CPC分类号： C22B60/0278 ,  G21C19/46 ,  G21F9/125 ,  Y02P10/212 ,  Y02W30/883

摘要： A separation and recycling method for recycling uranium and fluoride from a waste liquid sequentially and separately is disclosed. The method comprises a uranium-recycling process and a fluoride-recycling process. In the uranium-recycling process, an alkali metal compound or monovalent cation and a coagulant aid are added into the waste liquid to promote the precipitation of uranium. In the fluoride-recycling process, an alkaline earth metal compound, a strong acid and a coagulant aid are added into the uranium-removed waste liquid to precipitate fluoride. By means of the method of the present invention, the uranium and fluoride contents of the uranium-removed and fluoride-removed waste liquid are compliant with the effluent standards of the environmental laws.

摘要翻译： 公开了一种从废液中依次分开回收铀和氟化物的分离回收方法。 该方法包括铀再循环过程和氟化物再循环过程。 在铀再循环过程中，将碱金属化合物或一价阳离子和助凝剂加入到废液中以促进铀沉淀。 在氟化物再循环过程中，将碱土金属化合物，强酸和助凝剂加入去除铀的废液中以沉淀氟化物。 通过本发明的方法，除去铀和排出氟化物的废液中的铀和氟化物含量符合环境法规的废水标准。

公开(公告)号：US20110117749A1

公开(公告)日：2011-05-19

申请号：US12620335

申请日：2009-11-17

申请人： Ben-Li SHEU ,  Martin SHIM ,  Jonathan KIM

发明人： Ben-Li SHEU ,  Martin SHIM ,  Jonathan KIM

IPC分类号： H01L21/306 ,  C23F1/08

CPC分类号： H01J37/32935 ,  H01J37/32091 ,  H01L21/0338

摘要： A method for reducing line width roughness (LWR) of a feature in an etch layer below a patterned photoresist mask having mask features is provided. The method includes (a) non-etching plasma pre-etch treatment of the photoresist mask, and (b) etching of a feature in the etch layer through the pre-treated photoresist mask using an etching gas. The non-etching plasma pre-etch treatment includes (a1) providing a treatment gas containing H2 and COS, (a2) forming a plasma from the treatment gas, and (a3) stopping the treatment gas.

摘要翻译： 提供了一种用于减少具有掩模特征的图案化光刻胶掩模下方的蚀刻层中的特征的线宽粗糙度（LWR）的方法。 该方法包括（a）对光致抗蚀剂掩模的非蚀刻等离子体预蚀刻处理，以及（b）使用蚀刻气体通过预处理的光致抗蚀剂掩模蚀刻蚀刻层中的特征。 非蚀刻等离子体预蚀刻处理包括（a1）提供含有H 2和COS的处理气体，（a2）从处理气体形成等离子体，（a3）停止处理气体。

公开(公告)号：US20070161634A1

公开(公告)日：2007-07-12

申请号：US11634808

申请日：2006-12-06

申请人： Gang Pei ,  Dawei Ma ,  Li Chen ,  Shanghai Yu ,  Ben Li ,  Fang Dong ,  Yanhui Lv ,  Renhai Chen ,  Jin Zhang

发明人： Gang Pei ,  Dawei Ma ,  Li Chen ,  Shanghai Yu ,  Ben Li ,  Fang Dong ,  Yanhui Lv ,  Renhai Chen ,  Jin Zhang

IPC分类号： A61K31/5377 ,  A61K31/454 ,  A61K31/4025 ,  C07D413/02 ,  C07D407/14 ,  C07D403/02

CPC分类号： C07D405/14 ,  C07D401/06 ,  C07D405/04

摘要： The present invention discloses the compounds of formula I or their pharmaceutically acceptable salts, which are useful as CCR5 antagonists. The preparation and use of the compounds of formula I, pharmaceutical composition containing the same are also disclosed. Furthermore, the present invention discloses an intermediate for the preparation of the compounds of formula I.

摘要翻译： 本发明公开了可用作CCR5拮抗剂的式I化合物或其药学上可接受的盐。 还公开了式I化合物的制备和使用，其含有其的药物组合物。 此外，本发明公开了制备式I化合物的中间体。

公开(公告)号：US20140220772A1

公开(公告)日：2014-08-07

申请号：US14169937

申请日：2014-01-31

申请人： Annamalai Lakshmanan ,  Ben-Li Sheu ,  Guodan Wei ,  Nicole Lundy ,  Paul F. Ma

发明人： Annamalai Lakshmanan ,  Ben-Li Sheu ,  Guodan Wei ,  Nicole Lundy ,  Paul F. Ma

IPC分类号： H01L21/768

CPC分类号： H01L21/76856 ,  H01L21/28562 ,  H01L21/76831 ,  H01L21/76841 ,  H01L21/76844 ,  H01L21/76862 ,  H01L21/76867 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/00

摘要： Described are methods for controlling the doping of metal nitride films such as TaN, TiN and MnN. The temperature during deposition of the metal nitride film may be controlled to provide a film density that permits a desired amount of doping. Dopants may include Ru, Cu, Co, Mn, Mo, Al, Mg, Cr, Nb, Ta, Ti and V. The metal nitride film may optionally be exposed to plasma treatment after doping.

摘要翻译： 描述了用于控制诸如TaN，TiN和MnN的金属氮化物膜的掺杂的方法。 可以控制沉积金属氮化物膜期间的温度以提供允许期望量的掺杂的膜密度。 掺杂剂可以包括Ru，Cu，Co，Mn，Mo，Al，Mg，Cr，Nb，Ta，Ti和V.金属氮化物膜可以任选地在掺杂后暴露于等离子体处理。

公开(公告)号：US20120214310A1

公开(公告)日：2012-08-23

申请号：US13029824

申请日：2011-02-17

申请人： Ben-Li Sheu ,  Rajinder Dhindsa ,  Vinay Pohray ,  Eric A. Husdon ,  Andrew D. Bailey, III

发明人： Ben-Li Sheu ,  Rajinder Dhindsa ,  Vinay Pohray ,  Eric A. Husdon ,  Andrew D. Bailey, III

IPC分类号： H01L21/311 ,  C23F1/08

CPC分类号： H01L21/31116 ,  H01L21/31144

摘要： A method for etching features in an etch layer. A conditioning for a patterned pseudo-hardmask of amorphous carbon or polysilicon disposed over the etch layer is provided, where the conditioning comprises providing a fluorine free deposition gas comprising a hydrocarbon gas, forming a plasma from the fluorine free deposition gas, providing a bias less than 500 volts, and forming a deposition on top of the patterned pseudo-hardmask. The etch layer is etched through the patterned pseudo-hardmask.

摘要翻译： 一种用于蚀刻蚀刻层中的特征的方法。 提供了一种用于设置在蚀刻层上的非晶碳或多晶硅的图案化伪硬掩模的调理，其中调节包括提供包含烃气体的无氟沉积气体，从无氟沉积气体形成等离子体， 超过500伏，并且在图案化伪硬掩模的顶部上形成沉积物。 蚀刻层通过图案化伪硬掩模进行蚀刻。

公开(公告)号：US20100316543A1

公开(公告)日：2010-12-16

申请号：US12655343

申请日：2009-12-29

申请人： Cheng-Te Lin ,  Kuo-Hao Tsao ,  Ben-Li Pen

发明人： Cheng-Te Lin ,  Kuo-Hao Tsao ,  Ben-Li Pen

IPC分类号： C22B60/02

CPC分类号： C22B60/0278 ,  G21C19/46 ,  G21F9/125 ,  Y02P10/212 ,  Y02W30/883

摘要： A separation and recycling method for recycling uranium and fluoride from a waste liquid sequentially and separately is disclosed. The method comprises a uranium-recycling process and a fluoride-recycling process. In the uranium-recycling process, an alkali metal compound or monovalent cation and a coagulant aid are added into the waste liquid to promote the precipitation of uranium. In the fluoride-recycling process, an alkaline earth metal compound, a strong acid and a coagulant aid are added into the uranium-removed waste liquid to precipitate fluoride. By means of the method of the present invention, the uranium and fluoride contents of the uranium-removed and fluoride-removed waste liquid are compliant with the effluent standards of the environmental laws.

摘要翻译： 公开了一种从废液中依次分开回收铀和氟化物的分离回收方法。 该方法包括铀再循环过程和氟化物再循环过程。 在铀再循环过程中，将碱金属化合物或一价阳离子和助凝剂加入到废液中以促进铀沉淀。 在氟化物再循环过程中，将碱土金属化合物，强酸和助凝剂加入去除铀的废液中以沉淀氟化物。 通过本发明的方法，除去铀和排出氟化物的废液中的铀和氟化物含量符合环境法规的废水标准。

公开(公告)号：US06798300B2

公开(公告)日：2004-09-28

申请号：US10374502

申请日：2003-02-25

申请人： Masayuki Katakura ,  Yoshihiro Komatsu ,  Kenji Hiromoto ,  Tsuyoshi Kousaka ,  Ping Fai Ben Li

发明人： Masayuki Katakura ,  Yoshihiro Komatsu ,  Kenji Hiromoto ,  Tsuyoshi Kousaka ,  Ping Fai Ben Li

IPC分类号： H03B520

CPC分类号： H03C3/095 ,  H03C3/0958 ,  H03K3/0315 ,  H03L7/0995 ,  H03L7/18

摘要： An oscillator having a modulation function capable of controlling a frequency by adding a signal to a control signal and a PLL circuit using the same, wherein the oscillator forms a ring comprised of a plurality of cascade connected delay stages controlled in delay value by an inverter or a buffer and a control signal and forming a closed loop by an inverted phase and comprises a modulation function modulating an oscillation frequency by adding a modulation signal to the control signal in a part of the plurality of delay stages.

摘要翻译： 具有调制功能的振荡器，其能够通过向控制信号添加信号来控制频率，并且使用该振荡器形成由逆变器控制在延迟值中的多个级联连接的延迟级的环， 缓冲器和控制信号，并且通过反相形成闭环，并且包括通过在多个延迟级的一部分中对控制信号添加调制信号来调制振荡频率的调制函数。