摘要:
Implementations of data compilers may include: a physical device including a physical parameter, the physical parameter including at least three states. The data compiler may also include a data stream generated from the physical parameter. The data stream may include a plurality of bits. Each bit may be coded with one of a 0, a 1, and an X; the 0, the 1, and the X may correspond with one of the at least three states of the physical parameter, respectively. The data compiler may also include an exclusive OR (XOR) data processor. The XOR processor may be configured to randomize the at least three states of the data stream and output a randomized output data stream.
摘要:
The present disclosure concerns a MRAM cell comprising a first tunnel barrier layer comprised between a soft ferromagnetic layer having a free magnetization and a first hard ferromagnetic layer having a first storage magnetization; a second tunnel barrier layer comprised between the soft ferromagnetic layer and a second hard ferromagnetic layer having a second storage magnetization; the first storage magnetization being freely orientable at a first high predetermined temperature threshold and the second storage magnetization being freely orientable at a second predetermined high temperature threshold; the first high predetermined temperature threshold being higher than the second predetermined high temperature threshold. The MRAM cell can be used as a ternary content addressable memory (TCAM) and store up to three distinct state levels. The MRAM cell has a reduced size and can be made at low cost.
摘要:
A metal or silicide buried layer in MOS semiconductor devices provides a drain contact on the upper surface of the device with a greatly reduced resistance. The methods of manufacture include depositing the buried layer, rather than diffusing, so that interference with other components is greatly reduced and spacing between components is reduced to reduce the over-all size of the device.
摘要:
The present disclosure concerns a multilevel magnetic element comprising a first tunnel barrier layer between a soft ferromagnetic layer having a magnetization that can be freely aligned and a first hard ferromagnetic layer having a magnetization that is fixed at a first high temperature threshold and freely alignable at a first low temperature threshold. The magnetic element further comprises a second tunnel barrier layer and a second hard ferromagnetic layer having a magnetization that is fixed at a second high temperature threshold and freely alignable at a first low temperature threshold; the soft ferromagnetic layer being comprised between the first and second tunnel barrier layers. The magnetic element disclosed herein allows for writing four distinct levels using only a single current line.
摘要:
The present disclosure concerns a multilevel magnetic element comprising a first tunnel barrier layer between a soft ferromagnetic layer having a magnetization that can be freely aligned and a first hard ferromagnetic layer having a magnetization that is fixed at a first high temperature threshold and freely alignable at a first low temperature threshold. The magnetic element further comprises a second tunnel barrier layer and a second hard ferromagnetic layer having a magnetization that is fixed at a second high temperature threshold and freely alignable at a first low temperature threshold; the soft ferromagnetic layer being comprised between the first and second tunnel barrier layers. The magnetic element disclosed herein allows for writing four distinct levels using only a single current line.
摘要:
A semiconductor structure for high power integrated circuits is fabricated having a substrate, a first and second epitaxial layer, each having a patterned buried layer, and a third epitaxial layer in which power, logic and analogic devices are formed. The power device is formed in an isolated region of the third epitaxial layer over the buried layers, which provide for good electrical contact to the back of the substrate. The analogic and logic devices are formed in the third epitaxial layer outside the isolated region of the power device. The thickness of the first and second epitaxial layers reduces the NPN parasitic transistor effect. The first epitaxial layer may be fabricated with a lower resistivity to further reduce the parasitic NPN transistor effect. The second epitaxial layer can be of a higher resistivity in order to reduce autodoping of the third epitaxial layer.
摘要:
Implementations of data compilers may include: a physical device including a physical parameter, the physical parameter including at least three states. The data compiler may also include a data stream generated from the physical parameter. The data stream may include a plurality of bits. Each bit may be coded with one of a 0, a 1, and an X; the 0, the 1, and the X may correspond with one of the at least three states of the physical parameter, respectively. The data compiler may also include an exclusive OR (XOR) data processor. The XOR processor may be configured to randomize the at least three states of the data stream and output a randomized output data stream.
摘要:
The present disclosure concerns a MRAM cell comprising a first tunnel barrier layer comprised between a soft ferromagnetic layer having a free magnetization and a first hard ferromagnetic layer having a first storage magnetization; a second tunnel barrier layer comprised between the soft ferromagnetic layer and a second hard ferromagnetic layer having a second storage magnetization; the first storage magnetization being freely orientable at a first high predetermined temperature threshold and the second storage magnetization being freely orientable at a second predetermined high temperature threshold; the first high predetermined temperature threshold being higher than the second predetermined high temperature threshold. The MRAM cell can be used as a ternary content addressable memory (TCAM) and store up to three distinct state levels. The MRAM cell has a reduced size and can be made at low cost.