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    Highly durable and abrasion-resistant dielectric coatings for lenses
    1.
    发明授权
    Highly durable and abrasion-resistant dielectric coatings for lenses 失效

    公开(公告)号：US5846649A

    公开(公告)日：1998-12-08

    申请号：US632610

    申请日：1996-04-15

    申请人： Bradley J. Knapp ,  Fred M. Kimock ,  Rudolph Hugo Petrmichl ,  Brian Kenneth Daniels

    发明人： Bradley J. Knapp ,  Fred M. Kimock ,  Rudolph Hugo Petrmichl ,  Brian Kenneth Daniels

    IPC分类号： B05D7/24 ,  B29C59/16 ,  C23C14/02 ,  C23C16/02 ,  C23C16/30 ,  C23C16/32 ,  C23C16/34 ,  C23C16/44 ,  C23C16/513 ,  G02B1/10 ,  B32B9/04

    CPC分类号： B05D1/62 ,  C08J7/123 ,  C23C14/02 ,  C23C14/024 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/30 ,  C23C16/308 ,  C23C16/325 ,  C23C16/345 ,  C23C16/513 ,  G02B1/105 ,  B29C59/16 ,  Y10T428/263 ,  Y10T428/31507 ,  Y10T428/31551 ,  Y10T428/31598 ,  Y10T428/31663

    摘要： An abrasion-resistant dielectric composite product is described comprising a substrate and an abrasion wear resistant coating material comprising carbon, hydrogen, silicon, and oxygen and a dielectric material. An improved method is provided for the deposition of highly durable and abrasion-resistant multilayer dielectric antireflective coatings and reflective colored mirror coatings onto plastic lenses such as ophthalmic lenses, safety lenses, sunglass lenses, and sports optics. An adhesion-enhancing polymer layer may be deposited onto the plastic substrate prior to deposition of the abrasion-resistant first coating layer. The multilayer dielectric coating structure consists of a transparent, highly abrasion-resistant first coating, and a second dielectric coating composed of at least one layer of dielectric material. The abrasion-resistant first coating layer is deposited by ion-assisted plasma deposition from mixtures of organosiloxane or organosilazane precursor gases and oxygen, and has the properties of Nanoindentation hardness in the range of about 2 GPa to about 5 GPa, a strain to microcracking greater than about 1.5% and less than about 3.5%, a transparency greater than 85% throughout the visible spectrum, and an abrasion resistance greater than or equal to the abrasion resistance of glass. The preferred method for deposition of the abrasion-resistant first coating layer is plasma ion beam deposition using an organosiloxane precursor gas and oxygen. Optimum abrasion-resistance is obtained when the first coating layer thickness is in the range of about 5 microns to about 20 microns. The thickness, refractive index, and number of the dielectric layers in the second coating are chosen to produce the desired optical effects of either antireflection, or reflected color. Optimum environmental durability and abrasion-resistance is obtained by producing highly dense dielectric coatings by ion beam assisted electron beam evaporation, magnetron sputtering, ion beam assisted magnetron sputtering, ion beam sputtering, and ion-assisted plasma deposition, including plasma ion beam deposition, from precursor gases.

    Gridless ion source for the vacuum processing of materials
    3.
    发明授权
    Gridless ion source for the vacuum processing of materials 失效
    无级离子源用于真空处理材料

    公开(公告)号：US5973447A

    公开(公告)日：1999-10-26

    申请号：US901036

    申请日：1997-07-25

    申请人： Leonard Joseph Mahoney ,  Brian Kenneth Daniels ,  Rudolph Hugo Petrmichl ,  Florian Joseph Fodor ,  Ray Hays Venable, III

    发明人： Leonard Joseph Mahoney ,  Brian Kenneth Daniels ,  Rudolph Hugo Petrmichl ,  Florian Joseph Fodor ,  Ray Hays Venable, III

    IPC分类号： H05H1/24 ,  C23C14/48 ,  C23C16/26 ,  C23C16/40 ,  C23C16/48 ,  G11B5/84 ,  H01J37/32 ,  H01L21/203 ,  H01L21/265 ,  H01L21/302 ,  H05H1/46 ,  H01J1/52

    CPC分类号： H01J27/143

    摘要： Plasma beam apparatus and method for the purpose of vacuum processing temperature sensitive materials at high discharge power and high processing rates. A gridless, closed or non-closed Hall-Current ion source is described which features a unique fluid-cooled anode with a shadowed gap through which ion source feed gases are introduced while depositing feed gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. Thin vacuum gaps are also used between anode and non-anode components in order to preserve electrical isolation of the anode when depositing conductive coatings. The magnetic field of the Hall-Current ion source is produced by an electromagnet driven either by the discharge current or a periodically alternating current.

    摘要翻译： 等离子体束装置和方法，用于真空处理温度敏感材料的高放电功率和高加工速率。 描述了一种无栅，闭合或非闭合的霍尔电流离子源，其特征在于具有阴影间隙的独特的流体冷却阳极，通过该阴极间隙引入离子源进料气体，同时将原料气体注入到等离子体束中。 阴影间隙在阳极表面处提供良好维护的电活性区域，其保持相对不含非导电沉积物。 阳极放电区被绝对密封，以防止放电进入离子源的内部。 在阳极和非阳极组件之间也使用薄的真空间隙，以便在沉积导电涂层时保持阳极的电绝缘。 霍尔电流离子源的磁场由通过放电电流或周期性交流电驱动的电磁体产生。