公开(公告)号：US6086796A

公开(公告)日：2000-07-11

申请号：US886922

申请日：1997-07-02

申请人： David Ward Brown ,  Edward George Thear ,  Leonard Joseph Mahoney ,  Rudolph Hugo Petrmichl

发明人： David Ward Brown ,  Edward George Thear ,  Leonard Joseph Mahoney ,  Rudolph Hugo Petrmichl

IPC分类号： C23C14/02 ,  C23C14/06 ,  B29D17/00

CPC分类号： C23C14/024 ,  C23C14/0605 ,  Y10S428/913

摘要： A method is provided for manufacturing a diamond-like carbon (DLC) coated optical phase-change recording medium for use with near-field optical head devices and which exhibits superior wear resistance and improved lifetime. According to the method, the surface of a composite optical phase-change media structure deposited onto a substrate is subjected to ion beam deposition of a DLC over-coat to a thickness of no greater than about 450 .ANG.. Preferably the DLC is ion beam deposited onto the phase-change recording layer at the surface of the medium structure or onto a germanium-containing adhesion-promoting interlayer to achieve the desired adhesion of the DLC to the surface of the medium structure.

摘要翻译： 提供一种用于制造用于近场光学头装置的类金刚石碳（DLC）涂层光学相变记录介质的方法，其表现出优异的耐磨性和改善的寿命。 根据该方法，将沉积在基板上的复合光学相变介质结构的表面进行DLC覆盖层的离子束沉积至不大于约450的厚度。 优选地，DLC是在介质结构的表面上沉积到相变记录层上的离子束或者含有含锗粘附促进中间层的离子束，以实现DLC对介质结构表面的期望的粘附。

公开(公告)号：US5973447A

公开(公告)日：1999-10-26

申请号：US901036

申请日：1997-07-25

申请人： Leonard Joseph Mahoney ,  Brian Kenneth Daniels ,  Rudolph Hugo Petrmichl ,  Florian Joseph Fodor ,  Ray Hays Venable, III

发明人： Leonard Joseph Mahoney ,  Brian Kenneth Daniels ,  Rudolph Hugo Petrmichl ,  Florian Joseph Fodor ,  Ray Hays Venable, III

IPC分类号： H05H1/24 ,  C23C14/48 ,  C23C16/26 ,  C23C16/40 ,  C23C16/48 ,  G11B5/84 ,  H01J37/32 ,  H01L21/203 ,  H01L21/265 ,  H01L21/302 ,  H05H1/46 ,  H01J1/52

CPC分类号： H01J27/143

摘要： Plasma beam apparatus and method for the purpose of vacuum processing temperature sensitive materials at high discharge power and high processing rates. A gridless, closed or non-closed Hall-Current ion source is described which features a unique fluid-cooled anode with a shadowed gap through which ion source feed gases are introduced while depositing feed gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. Thin vacuum gaps are also used between anode and non-anode components in order to preserve electrical isolation of the anode when depositing conductive coatings. The magnetic field of the Hall-Current ion source is produced by an electromagnet driven either by the discharge current or a periodically alternating current.

摘要翻译： 等离子体束装置和方法，用于真空处理温度敏感材料的高放电功率和高加工速率。 描述了一种无栅，闭合或非闭合的霍尔电流离子源，其特征在于具有阴影间隙的独特的流体冷却阳极，通过该阴极间隙引入离子源进料气体，同时将原料气体注入到等离子体束中。 阴影间隙在阳极表面处提供良好维护的电活性区域，其保持相对不含非导电沉积物。 阳极放电区被绝对密封，以防止放电进入离子源的内部。 在阳极和非阳极组件之间也使用薄的真空间隙，以便在沉积导电涂层时保持阳极的电绝缘。 霍尔电流离子源的磁场由通过放电电流或周期性交流电驱动的电磁体产生。

公开(公告)号：US5888593A

公开(公告)日：1999-03-30

申请号：US631170

申请日：1996-04-12

申请人： Rudolph Hugo Petrmichl ,  Leonard Joseph Mahoney ,  Ray Hays Venable III ,  Norman Donald Galvin ,  Bradley J. Knapp ,  Fred Michael Kimock

发明人： Rudolph Hugo Petrmichl ,  Leonard Joseph Mahoney ,  Ray Hays Venable III ,  Norman Donald Galvin ,  Bradley J. Knapp ,  Fred Michael Kimock

IPC分类号： C23C16/02 ,  C23C16/30 ,  C23C16/32 ,  C23C16/34 ,  C23C16/36 ,  C23C16/513 ,  H05H1/20 ,  C23C14/00 ,  H05H1/02 ,  H05H1/24

CPC分类号： C23C16/345 ,  C23C16/0245 ,  C23C16/30 ,  C23C16/308 ,  C23C16/325 ,  C23C16/36 ,  C23C16/513

摘要： An ion beam deposition method is provided for manufacturing a coated substrate with improved wear-resistance, and improved lifetime. The substrate is first chemically cleaned to remove contaminants. Secondly, the substrate is inserted into a vacuum chamber onto a substrate holder, and the air therein is evacuated via pump. Then the substrate surface is bombarded with energetic ions from an ion beam source supplied from inert or reactive gas inlets to assist in removing residual hydrocarbons and surface oxides, and activating the surface. After sputter-etching the surface, a protective, wear-resistant coating is deposited by plasma ion beam deposition where a portion of the precursor gases are introduced into the ion beam downstream of the ion source, and hydrogen is introduced directly into the ion source plasma chamber. The plasma ion beam-deposited coating may contain one or more layers. Once the chosen coating thickness is achieved, deposition is terminated, vacuum chamber pressure is increased to atmospheric and the coated substrate products having wear-resistance greater than glass are removed from the chamber. These coated products may be ceramics, architectural glass, analytical instrument windows, automotive windshields, and laser bar code scanners for use in retail stores and supermarkets.

摘要翻译： 提供了一种离子束沉积方法，用于制造具有改善的耐磨性和改善寿命的涂覆基材。 首先对基材进行化学清洗以除去污染物。 其次，将衬底插入到真空室中到衬底保持器上，并且其中的空气经由泵抽真空。 然后用来自惰性或反应性气体入口的离子束源的能量离子轰击衬底表面，以帮助去除残留的烃和表面氧化物，并激活表面。 在溅射蚀刻表面之后，通过等离子体离子束沉积沉积保护性耐磨涂层，其中一部分前体气体被引入到离子源下游的离子束中，并将氢直接引入离子源等离子体 房间。 等离子体离子束沉积涂层可以包含一层或多层。 一旦实现所选择的涂层厚度，沉积终止，真空室压力增加到大气压，并且具有大于玻璃的耐磨性的涂覆的基底产品从腔室中去除。 这些涂层产品可以是用于零售商店和超市的陶瓷，建筑玻璃，分析仪器窗，汽车挡风玻璃和激光条码扫描仪。

公开(公告)号：US06504294B1

公开(公告)日：2003-01-07

申请号：US09613684

申请日：2000-07-11

申请人： Leonard Joseph Mahoney ,  David Ward Brown ,  Rudolph Hugo Petrmichl

发明人： Leonard Joseph Mahoney ,  David Ward Brown ,  Rudolph Hugo Petrmichl

IPC分类号： H01J152

CPC分类号： C23C16/401 ,  C23C16/26 ,  C23C16/486 ,  G11B5/8408 ,  Y10S427/103 ,  Y10S427/104

摘要： A unique Hall-Current ion source apparatus is used for direct ion beam deposition of DLC coatings with hardness values greater than 10 GPa and at deposition rates greater than 10 Å per second. This ion source has a unique fluid-cooled anode with a shadowed gap through which ion sources feed gases are introduced while depositing gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. A method is described in which a substrate is disposed within a vacuum chamber, coated with a coating of DLC or Si-DLC at a high deposition rate using a Hall-Current ion source operating on carbon-containing or carbon-containing and silicon-containing precursor gases, respectively. The method is particularly advantageous for producing thin, hard, wear resistant DLC and Si-DLC coatings for magnetic transducers and media used for magnetic data storage applications.

摘要翻译： 独特的霍尔电流离子源设备用于DLC涂层的直接离子束沉积，硬度值大于10 GPa，沉积速率大于每秒10埃。 该离子源具有独特的流体冷却阳极，其具有阴影间隙，通过该阴极间隙引入离子源进料气体，同时将等离子体束注入沉积气体。 阴影间隙在阳极表面处提供良好维护的电活性区域，其保持相对不含非导电沉积物。 阳极放电区被绝对密封，以防止放电进入离子源的内部。 描述了一种方法，其中使用在含碳或含碳和含硅的操作的霍尔电流离子源，将衬底设置在真空室内，以高沉积速率涂覆DLC或Si-DLC的涂层 前体气体。 该方法特别有利于生产用于磁性数据存储应用的磁性换能器和介质的薄的，硬的耐磨DLC和Si-DLC涂层。

公开(公告)号：US6086962A

公开(公告)日：2000-07-11

申请号：US243913

申请日：1999-02-03

申请人： Leonard Joseph Mahoney ,  David Ward Brown ,  Rudolph Hugo Petrmichl

发明人： Leonard Joseph Mahoney ,  David Ward Brown ,  Rudolph Hugo Petrmichl

IPC分类号： H05H1/24 ,  C23C14/06 ,  C23C14/32 ,  C23C14/48 ,  C23C16/26 ,  C23C16/40 ,  C23C16/48 ,  G11B5/84 ,  H01J37/32 ,  H01L21/203 ,  H01L21/265 ,  H01L21/302 ,  H05H1/46

CPC分类号： C23C16/401 ,  C23C16/26 ,  C23C16/486 ,  G11B5/8408 ,  Y10S427/103 ,  Y10S427/104

摘要： A unique Hall-Current ion source apparatus is used for direct ion beam deposition of DLC coatings with hardness values greater than 10 GPa and at deposition rates greater than 10 .ANG. per second. This ion source has a unique fluid-cooled anode with a shadowed gap through which ion sources feed gases are introduced while depositing gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. A method is described in which a substrate is disposed within a vacuum chamber, coated with a coating of DLC or Si-DLC at a high deposition rate using a Hall-Current ion source operating on carbon-containing or carbon-containing and silicon-containing precursor gases, respectively. The method is particularly advantageous for producing thin, hard, wear resistant DLC and Si-DLC coatings for magnetic transducers and media used for magnetic data storage applications.

摘要翻译： 独特的霍尔电流离子源设备用于DLC涂层的直接离子束沉积，其硬度值大于10GPa，沉积速率大于10 ANGSTROM /秒。 该离子源具有独特的流体冷却阳极，其具有阴影间隙，通过该阴极间隙引入离子源进料气体，同时将等离子体束注入沉积气体。 阴影间隙在阳极表面处提供良好维护的电活性区域，其保持相对不含非导电沉积物。 阳极放电区被绝对密封，以防止放电进入离子源的内部。 描述了一种方法，其中使用在含碳或含碳和含硅的操作的霍尔电流离子源，将衬底设置在真空室内，以高沉积速率涂覆DLC或Si-DLC的涂层 前体气体。 该方法特别有利于生产用于磁性数据存储应用的磁性换能器和介质的薄的，硬的耐磨DLC和Si-DLC涂层。