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13 条记录 (耗时 0.018 秒)

    Photolithography system and method of monitoring the same
    5.
    发明授权
    Photolithography system and method of monitoring the same 有权
    光刻系统及其监控方法相同

    公开(公告)号：US07161660B2

    公开(公告)日：2007-01-09

    申请号：US11017783

    申请日：2004-12-22

    申请人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

    发明人： Yo-Han Ahn ,  Seok-Ryeul Lee ,  Jung-Sung Hwang ,  Tae-Jin Hwang ,  Byung-Moo Lee

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70558

    摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

    摘要翻译： 公开了一种在曝光过程中的掩模版的管理系统和方法。 计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。 计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。 比较器将计算的累积剂量与预设的参考剂量进行比较。 当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。 最小化掩模版上的雾度污染，从而防止过程故障。

    Air shower head of photolithography equipment for directing air towards a wafer stage
    6.
    发明授权
    Air shower head of photolithography equipment for directing air towards a wafer stage 失效
    用于将空气引向晶片台的光刻设备的空气喷头

    公开(公告)号：US06522385B2

    公开(公告)日：2003-02-18

    申请号：US09848284

    申请日：2001-05-04

    申请人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

    发明人： Yo-Han Ahn ,  Byung-Moo Lee ,  Hyun-Joon Kim ,  Jai-Heung Choi

    IPC分类号： G03B2752

    CPC分类号： G03F7/70908 ,  G03F7/70866 ,  G03F7/70933

    摘要： An air shower head of an exposure device of photolithography equipment is free of chemical substances that could otherwise contaminate a photoresist layer on a semiconductor wafer and degrade the profile of the photoresist pattern. The air shower head is interposed between a lens system of the exposure device and a wafer stage, and has a hole in the middle thereof through which exposure light can pass to a wafer supported on the stage. The air shower head includes an upper frame defining a cavity open at the bottom thereof, and a porous bottom member covering the bottom of the upper frame. The porous member is mechanically secured to bottom ends of both the inner and outer side walls of the upper frame, i.e., without the use of chemical binders, to reduce the ability of the air shower head to serve as a source of contamination.

    摘要翻译： 光刻设备的曝光装置的空气喷头不含化学物质，否则会污染半导体晶片上的光致抗蚀剂层并降低光致抗蚀剂图案的轮廓。 空气喷头插入在曝光装置的透镜系统和晶片台之间，并且在其中间具有曝光光可以通过其到支撑在平台上的晶片的孔。 空气喷头包括限定在其底部开口的空腔的上框架和覆盖上框架的底部的多孔底部构件。 多孔构件机械地固定到上框架的内侧壁和外侧壁的底端，即不使用化学粘合剂，以降低空气淋浴头作为污染源的能力。

    Chemical mechanical polishing apparatus and method of washing contaminants off of the polishing head thereof
    7.
    发明授权
    Chemical mechanical polishing apparatus and method of washing contaminants off of the polishing head thereof 失效
    化学机械抛光装置和从其抛光头洗涤污染物的方法

    公开(公告)号：US06402598B1

    公开(公告)日：2002-06-11

    申请号：US09593931

    申请日：2000-06-15

    申请人： Yo-han Ahn ,  Byung moo Lee ,  Jae-won Choi ,  Tae-ho Kim

    发明人： Yo-han Ahn ,  Byung moo Lee ,  Jae-won Choi ,  Tae-ho Kim

    IPC分类号： B24B722

    CPC分类号： B24B37/345 ,  H01L21/67051

    摘要： A chemical mechanical polishing (CMP) apparatus for planarizing the surface of a semiconductor wafer is provided with a washing unit including first, second and third nozzles installed within a load-cup where the loading and unloading of the wafers takes place. The first nozzles spray deionized water toward the top face of a pedestal on which the wafers are placed in the load cup, thereby washing contaminants off of the pedestal. The second nozzles spray deionized water toward a membrane provided at the bottom of a polishing head, thereby washing the membrane. The third nozzles spray deionized water through purge holes formed in a retainer ring of the polishing head toward a space formed between the outer surface of the membrane and the inner surface of the retainer ring. Consequently, contaminants induced into the space are washed away. The CMP apparatus also includes an exhaust unit having an outlet, an exhaust pump and an exhaust pipe connecting the outlet and the exhaust pump, for exhausting contaminants to the outside of the CMP apparatus through a protective cover thereof. The exhaust outlet is provided at the bottom of a side of the protective cover.

    摘要翻译： 用于平坦化半导体晶片的表面的化学机械抛光（CMP）设备设置有洗涤单元，其包括安装在发生晶片的装载和卸载的负载杯内的第一，第二和第三喷嘴。 第一喷嘴将去离子水喷射到基座的顶面上，晶片放置在负载杯中，从而从基座上清除污染物。 第二喷嘴将去离子水喷射到设置在抛光头底部的膜上，从而洗涤膜。 第三喷嘴通过形成在抛光头的保持环中的吹扫孔将去离子水喷射到形成在膜的外表面和保持环的内表面之间的空间。 因此，被吸入空间的污染物被冲走。 CMP设备还包括排气单元，其具有出口，排气泵和连接出口和排气泵的排气管，用于通过其保护盖将污染物排出到CMP设备的外部。 排气口设置在保护罩侧面的底部。

    Refrigerator
    8.
    发明申请
    Refrigerator 审中-公开
    冰箱

    公开(公告)号：US20070085457A1

    公开(公告)日：2007-04-19

    申请号：US11581365

    申请日：2006-10-17

    申请人： Sung-cheul Park ,  Byung-moo Lee ,  Jae-sek Oh ,  Bu-kil Jeong

    发明人： Sung-cheul Park ,  Byung-moo Lee ,  Jae-sek Oh ,  Bu-kil Jeong

    IPC分类号： A47B88/00

    CPC分类号： F25D25/025 ,  F25D23/067

    摘要： A refrigerator, with an inner casing forming a drawer type storage compartment and a drawer unit being received in and combined with the drawer type storage compartment, the refrigerator having: at least a pair of rail units provided between the inner casing and the drawer unit enabling the drawer unit to slide against the inner casing; a support part positioned at the inner casing, supporting the rail unit, and preventing the rail unit from moving upward and downward; and a combining part combining the rail unit with the support part, the combining part enabling the support part to move relative to the rail unit in a direction approximately perpendicular to a surface of the inner casing.

    摘要翻译： 一种冰箱，具有形成抽屉式储藏室的内壳和与所述抽屉式储藏室接合并组合的抽屉单元，所述冰箱具有：设置在所述内壳和所述抽屉单元之间的至少一对轨道单元，使得能够 抽屉单元相对于内壳滑动; 位于内壳体的支撑部，支撑轨道单元，防止轨道单元上下移动; 以及组合部分，其将轨道单元与支撑部分组合，组合部分使得支撑部分能够在大致垂直于内壳的表面的方向上相对于轨道单元移动。

    CENTRAL CONTROL APPARATUS AND METHOD FOR ENERGY EFFICIENCY OF A BASE STATION IN A MOBILE COMMUNICATION SYSTEM
    10.
    发明申请
    CENTRAL CONTROL APPARATUS AND METHOD FOR ENERGY EFFICIENCY OF A BASE STATION IN A MOBILE COMMUNICATION SYSTEM 有权
    移动通信系统中基站的能量效率的中心控制装置和方法

    公开(公告)号：US20140185509A1

    公开(公告)日：2014-07-03

    申请号：US14199316

    申请日：2014-03-06

    申请人： Jin Hyeock CHOI ,  Byung Chang KANG ,  Jong Ho BANG ,  Byung Moo LEE

    发明人： Jin Hyeock CHOI ,  Byung Chang KANG ,  Jong Ho BANG ,  Byung Moo LEE

    IPC分类号： H04W52/02

    CPC分类号： H04W52/0232 ,  H04W16/26 ,  H04W24/00 ,  H04W40/12 ,  H04W52/0206 ,  H04W72/1231 ,  Y02D70/00

    摘要： A central control apparatus and method thereof include a traffic demand receiving unit, a traffic demand calculating unit, a base station efficiency calculating unit, and a base station management unit. The traffic demand receiving unit is configured to receive a required traffic demand and a current location of each of terminals. The traffic demand calculating unit is configured to calculate traffic of each of base stations to which a terminal is unassigned. The base station efficiency calculating unit is configured to calculate an energy efficiency of each of the base stations. The base station management unit configured to verify a base station with an optimum energy efficiency, to activate the base station with the optimum energy efficiency, and to assign the terminals of a corresponding region to the base station with the optimum energy efficiency.

    摘要翻译： 中央控制装置及其方法包括业务需求接收单元，业务需求计算单元，基站效率计算单元和基站管理单元。 交通需求接收单元被配置为接收所需的交通需求和每个终端的当前位置。 业务需求计算单元被配置为计算终端未被分配到的每个基站的业务。 基站效率计算单元被配置为计算每个基站的能量效率。 所述基站管理单元被配置为以最佳能量效率来验证基站，以最佳能量效率来激活所述基站，并且以最佳的能量效率为基站分配对应的区域的终端。