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公开(公告)号:US06558869B1
公开(公告)日:2003-05-06
申请号:US09558110
申请日:2000-04-25
申请人: Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
发明人: Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
IPC分类号: G03F7039
CPC分类号: B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , B41M5/46 , B41M5/465 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要: This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.
摘要翻译: 本发明涉及通过热模式成像来制备抗蚀剂图案的前体,前体包括热敏组合物,其热溶性在碱性显影剂的水溶液中被设置为增加加热区域, 热敏组合物的非加热区域溶解在含水碱性显影剂(“显影剂阻挡装置”)中,其中所述显影剂阻力装置包括一种或多种选自以下的化合物:(A)包括聚 (环氧烷)单元;(B)硅氧烷; 和(C)多元醇的酯,醚和酰胺,其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质(即“活性聚合物”)和降低聚合物质的碱性显影剂水溶液的化合物( 即“可逆不溶物化合物”),使得组合物的碱性显影剂水溶液在加热时增加,并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。
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公开(公告)号:US6077645A
公开(公告)日:2000-06-20
申请号:US155019
申请日:1999-01-26
CPC分类号: G03F7/0755 , G03F7/0752
摘要: There is described a water-less lithographic plate precursor which comprises on an aluminium plate a light-sensitive composition which comprises a polymer with hydroxy functional groups, an acid generator which when light exposed yields an acid together with a silyl ether of general formula (I), where Rf is a fluoroaliphatic group having 3 to 10 carbon atoms, Y is oxygen, SO.sub.2, carbonyl or a direct link, X is N R.sub.4 where R.sub.4 is hydrogen or lower alkyl having up to six carbon atoms or is a direct link, each of R.sub.1, R.sub.2 and R.sub.3 are lower alkyl groups having up to six carbon atoms and R.sub.5 is a lower alkyl group having up to six carbon atoms. ##STR1##
摘要翻译: PCT No.PCT / GB97 / 00758 Sec。 371日期1999年1月26日 102(e)日期1999年1月26日PCT 1997年3月19日PCT公布。 公开号WO97 / 36208 日期1997年10月2日描述了一种无水平版印刷版前体,其在铝板上包含含有具有羟基官能团的聚合物的光敏组合物,当曝光时产生酸与甲硅烷基醚一起产生的酸产生剂 其中R f是具有3至10个碳原子的氟代脂族基,Y是氧,SO 2,羰基或直链,X是N R 4,其中R 4是氢或具有至多6个碳原子的低级烷基或 是直链,R 1,R 2和R 3各自是具有至多6个碳原子的低级烷基,R 5是具有至多6个碳原子的低级烷基。
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公开(公告)号:US06551763B1
公开(公告)日:2003-04-22
申请号:US09587224
申请日:2000-06-02
申请人: Anthony Paul Kitson , Peter Andrew Reath Bennett , Christopher David McCullough , Stuart Bayes , Kevin Barry Ray
发明人: Anthony Paul Kitson , Peter Andrew Reath Bennett , Christopher David McCullough , Stuart Bayes , Kevin Barry Ray
IPC分类号: G03F7039
CPC分类号: B41M5/368 , H05K3/0082 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/145 , Y10S430/146
摘要: A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by pattemwise delivery of heat, comprises a polymer and optionally an infrared absorbing compound. However in contrast to conventional compositions no compound is present which alters the solubility of the polymer in an aqueous developer.
摘要翻译: 在电子部件例如印刷电路的制造中用作抗蚀剂的组合物,其通过温度传递热量而变得可溶于显影剂,包括聚合物和任选的红外吸收化合物。 然而,与常规组合物不同,不存在改变聚合物在含水显影剂中的溶解度的化合物。
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公开(公告)号:US06303271B1
公开(公告)日:2001-10-16
申请号:US09194822
申请日:1999-06-29
IPC分类号: G03F730
CPC分类号: B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , Y10S430/145 , Y10S430/146
摘要: A method for preparing a printing form and a method of printing are disclosed. A coating of a radiation sensitive ink on a lithographic support having a hydrophilic surface is imaged. The unexposed areas of the coating are removed to produce a printing form, which is used for printing. Preferably, the same radiation sensitive ink is used for printing as is used in the coating, and, preferably, the desired printing run length is predetermined and the thickness of the coating determined according to the desired run length.
摘要翻译: 公开了一种制备印刷方法和印刷方法。 对具有亲水表面的光刻支架上的辐射敏感油墨的涂层进行成像。 去除涂层的未曝光区域以产生用于印刷的印刷形式。 优选地,相同的辐射敏感油墨用于如涂层中使用的印刷,并且优选地,期望的印刷行程长度是预定的,并且涂层的厚度根据期望的行程长度确定。
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公开(公告)号:US20100247931A1
公开(公告)日:2010-09-30
申请号:US12718042
申请日:2010-03-05
CPC分类号: A61L31/10 , Y10T428/31663
摘要: Described is a method of treating an article having at its surface oxide or hydroxide moieties, as well as the resulting treated article. The method includes priming the surface of the article by contact with an alkoxysilane in an aprotic organic solvent in the presence of an acid catalyst so that the alkoxysilane reacts with the oxide or hydroxide moieties of the surface. This yields a primed surface. A polymer is then reacted with one or more amino, hydroxyl, carboxylic acid and/or acid anhydride groups on the surface to covalently couple the polymer to the primed surface via the alkoxysilane. The reaction with the polymer is not a free-radical reaction.
摘要翻译: 描述了一种处理其表面具有氧化物或氢氧化物部分的物品以及所得到的经处理制品的方法。 该方法包括在酸催化剂存在下,通过在非质子有机溶剂中与烷氧基硅烷接触来引发制品的表面,使得烷氧基硅烷与表面的氧化物或氢氧化物部分反应。 这产生了底漆表面。 然后将聚合物与表面上的一个或多个氨基,羟基,羧酸和/或酸酐基团反应,以通过烷氧基硅烷将聚合物共价连接到底漆表面。 与聚合物的反应不是自由基反应。
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公开(公告)号:US06218083B1
公开(公告)日:2001-04-17
申请号:US09263605
申请日:1999-03-05
IPC分类号: G03F730
CPC分类号: G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.
摘要翻译: 一种制备例如预定抗蚀剂图案的方法。 平版印刷版,电路板或掩模包括将辐射敏感的含二氮化物的涂层(通常被认为是UV敏感材料)成像曝光于非UV辐射,例如直接热辐射或红外辐射。 曝光图像的积极性在开发中被揭示。 此外,已经发现在成像曝光到非UV辐射之后的紫外线辐射的泛滥暴露意味着在显影时显露出曝光图像的负面。
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公开(公告)号:US06537735B1
公开(公告)日:2003-03-25
申请号:US09477893
申请日:2000-01-05
申请人: Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
发明人: Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
IPC分类号: G03F730
CPC分类号: G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要: The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.
摘要翻译: 本发明涉及一种在基板上制造预定抗蚀剂图案的方法。 该方法包括将红外辐射图案化地应用于含有基材的前体,其上具有涂层,其中涂层含有正性工作组合物; 并使用开发人员开发模式。 该组合物含有其上具有官能团Q的聚合物质,使得官能化聚合物质具有在红外辐射传递之前是显影剂不溶性的特性,此后可显影剂可溶。
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公开(公告)号:US06777164B2
公开(公告)日:2004-08-17
申请号:US09828075
申请日:2001-04-06
IPC分类号: G03C177
CPC分类号: B41N3/00 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/262 , B41N1/083 , B41N3/036 , Y10S430/106 , Y10S430/11 , Y10S430/127 , Y10S430/145
摘要: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.
摘要翻译: 本发明提供了一种用于前体的平版印刷,其具有在铝支架上的可成像涂层,其中可成像涂层包含包含着色剂基团的聚合物质,并且其中提供涂层的铝载体被阳极氧化,但后来不通过 后阳极处理化合物,并且涂层不包含着色剂染料。 聚合物还可以包含悬滴红外或显色剂溶解抑制基团,这些基团本身也可以是着色剂基团。
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