公开(公告)号：US07705331B1

公开(公告)日：2010-04-27

申请号：US11771430

申请日：2007-06-29

申请人： Greg Kirk ,  Rich Solarz ,  Chris Kirk ,  Gil Delgado ,  Anatoly Schemelinin ,  Jim Li ,  Qibiao Chen ,  Charles Nenghe Wang

发明人： Greg Kirk ,  Rich Solarz ,  Chris Kirk ,  Gil Delgado ,  Anatoly Schemelinin ,  Jim Li ,  Qibiao Chen ,  Charles Nenghe Wang

IPC分类号： G21G4/00

CPC分类号： G03F7/70616 ,  G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8825 ,  G01N2201/061 ,  G03F7/70033 ,  G03F7/70575 ,  H01J65/04

摘要： Methods and systems for providing illumination of a specimen for a process performed on the specimen are provided. One system configured to provide illumination of a specimen for a process performed on the specimen includes a laser configured to generate excitation light. The system also includes focusing optics configured to focus the excitation light to a plasma in an electrodeless lamp such that the plasma generates light. The system is also configured such that the light illuminates the specimen during the process.

摘要翻译： 提供了用于提供用于对样本进行的处理的样本的照明的方法和系统。 被配置为提供对于在样本上执行的处理的样本的照明的一个系统包括被配置为产生激发光的激光器。 该系统还包括配置成将激发光聚焦到无电极灯中的等离子体的聚焦光学元件，使得等离子体产生光。 该系统还被配置为使得该光在该过程期间照射样本。

公开(公告)号：US5502306A

公开(公告)日：1996-03-26

申请号：US214377

申请日：1994-03-17

申请人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

发明人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

IPC分类号： G01B15/00 ,  G01B15/08 ,  G01N23/04 ,  G01N23/203 ,  G01N23/225 ,  G01R31/307 ,  G03F1/08 ,  G03F1/16 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H01J37/26

CPC分类号： H01J37/28 ,  G01R31/307 ,  H01J2237/063 ,  H01J2237/184 ,  H01J2237/204 ,  H01J2237/24495 ,  H01J2237/30438

摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.

摘要翻译： 公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。 在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。 还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。 衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。 衬底也在其表面上经受电场以加速次级颗粒。 该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。 另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。 为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。 真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。 或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的​​多个基板。 在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。

公开(公告)号：US20130123976A1

公开(公告)日：2013-05-16

申请号：US13535395

申请日：2012-06-28

申请人： Guerin James McClure ,  Franklin Flurry ,  Austin Hobbs ,  Jason Stewart ,  Rendall Koski ,  Kirk Vlastakis ,  Chris Kirk ,  Kien Lao ,  Chris Church ,  David Rankin ,  Stephen Cukiernik ,  Greg Tetrualt

发明人： Guerin James McClure ,  Franklin Flurry ,  Austin Hobbs ,  Jason Stewart ,  Rendall Koski ,  Kirk Vlastakis ,  Chris Kirk ,  Kien Lao ,  Chris Church ,  David Rankin ,  Stephen Cukiernik ,  Greg Tetrualt

IPC分类号： G06F17/00

CPC分类号： G07F9/023 ,  G06F17/00 ,  G06Q20/387 ,  G07F11/002 ,  G07F17/0035

摘要： A method and apparatus for fulfilling a product offer are described herein. An offer of a product sample is made in exchange for a shopper checking in at a vending machine on asocial networking site. Information associated with a check-in is passed to a vending machine which dispenses a product sample.