公开(公告)号：US06586733B1

公开(公告)日：2003-07-01

申请号：US09579867

申请日：2000-05-25

申请人： Lee Veneklasen ,  David L. Adler

发明人： Lee Veneklasen ,  David L. Adler

IPC分类号： G01N23225

CPC分类号： H01J37/26 ,  H01J37/29 ,  H01J2237/0044 ,  H01J2237/2538 ,  H01J2237/2817

摘要： Disclosed is an apparatus for inspecting a sample. The apparatus includes a first electron beam generator arranged to direct a first electron beam having a first range of energy levels toward a first area of the sample and a second electron beam generator arranged to direct a second electron beam having a second range of energy levels toward a second area of the sample. The second area of the sample at least partly overlaps with the first area, and the second range of energy levels are different from the first range such that charge build up caused by the first electron beam is controlled. The apparatus further includes a detector arranged to detect secondary electrons originating from the sample as a result of the first and second electron beam interacting with the sample

摘要翻译： 公开了一种用于检查样品的装置。 该装置包括第一电子束发生器，其布置成将具有第一能级范围的第一电子束朝向样品的第一区域引导，第二电子束发生器被布置成将具有第二能级范围的第二电子束导向 样品的第二个区域。 样品的第二区域与第一区域至少部分重叠，第二能级范围与第一范围不同，从而控制由第一电子束引起的电荷积聚。 该装置还包括检测器，其被布置成检测作为第一和第二电子束与样品相互作用的结果的源自样品的二次电子

公开(公告)号：US4788431A

公开(公告)日：1988-11-29

申请号：US36731

申请日：1987-04-10

申请人： William A. Eckes ,  Lee Veneklasen ,  Glen E. Howard ,  Donald J. McCarthy ,  Allen M. Carroll ,  Daniel L. Cavan

发明人： William A. Eckes ,  Lee Veneklasen ,  Glen E. Howard ,  Donald J. McCarthy ,  Allen M. Carroll ,  Daniel L. Cavan

IPC分类号： G01B15/00 ,  G01Q20/04 ,  G01Q30/02 ,  H01J37/20 ,  H01J37/244 ,  H01J37/304 ,  H01L21/027

CPC分类号： H01J37/244 ,  H01J37/20 ,  H01J37/304 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/24475 ,  H01J2237/24578

摘要： A specimen distance measuring system uses a plate (36) to obstruct the flux of backscattered electrons produced by an electron beam (18), and to cast a shadow across a measurement detector (32) which is sensitive to the position of the shadow. The shadow plate (36) and measurement detector (32) are aligned at an angle of approximately 45 degrees with a substrate (14) in order to allow calibration of the distance measuring system by scanning the electron beam (18). The measuring system is particularly useful as a height sensor (10) in an electron beam lithography apparatus (12) for sensing the height of a substrate (14). The distance measuring system may also include a reference detector (34) which is positioned in order to receive backscattered electron flux without obstruction from the shadow plate (36). The use of such a reference detector (32) is advantageous in allowing compensation of the signals obtained by the measurement detector, in order to allow the height sensor to operate independently of variations in electron beam current, and variations in substrate backscatter coefficient. The reference and measurement detectors (34,32) may be aligned in a vertical or horizontal plane to be either parallel to or perpendicular to the bombardment electron beam (18). Active feedback may be provided from the height sensor (10) to a vertical stage actuator for adjusting the height of the substrate (14).

摘要翻译： 样本距离测量系统使用板（36）来阻挡由电子束（18）产生的背向散射电子的通量，并且跨越对阴影位置敏感的测量检测器（32）投射阴影。 阴影板（36）和测量检测器（32）以大约45度的角度与衬底（14）对准，以便允许通过扫描电子束（18）校准距离测量系统。 该测量系统特别适用于用于感测衬底（14）的高度的电子束光刻设备（12）中的高度传感器（10）。 距离测量系统还可以包括参考检测器（34），其被定位以便接收反向散射的电子通量而不受到遮挡板（36）的阻碍。 使用这种参考检测器（32）有利于允许补偿由测量检测器获得的信号，以便允许高度传感器独立于电子束电流的变化以及衬底反向散射系数的变化而工作。 参考和测量检测器（34,32）可以在垂直或水平平面中对准以与轰击电子束（18）平行或垂直于轰击电子束（18）。 主动反馈可以从高度传感器（10）提供到用于调节基板（14）的高度的垂直级致动器。

公开(公告)号：US06720565B2

公开(公告)日：2004-04-13

申请号：US10057324

申请日：2001-10-26

申请人： Robert Innes ,  Sergey Babin ,  Robin Teitzel ,  Lee Veneklasen

发明人： Robert Innes ,  Sergey Babin ,  Robin Teitzel ,  Lee Veneklasen

IPC分类号： G21K510

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/304 ,  H01J2237/31769 ,  Y10S430/143

摘要： The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds by scalar product of the kernel with a graded cell size coverage map. A shifted impulse response function is shown to give the kernel values accurate to within a few percent.

摘要翻译： 本发明涉及随着写入的进行，在写入期间在电流和/或停留时间内实现光束补偿，实时地预测电子束光刻中抗蚀剂的接近加热的方法。 一种使用能够进行邻近抗蚀剂温度评估的预计算核心的方法，因为波束写入是通过内核的标量积与分级单元大小覆盖图进行的。 显示了移位的脉冲响应函数，使内核值精确到几个百分点。

公开(公告)号：US06803572B2

公开(公告)日：2004-10-12

申请号：US10610722

申请日：2003-07-01

申请人： Lee Veneklasen ,  David L. Adler

发明人： Lee Veneklasen ,  David L. Adler

IPC分类号： G01N23225

CPC分类号： H01J37/26 ,  H01J37/29 ,  H01J2237/0044 ,  H01J2237/2538 ,  H01J2237/2817

摘要： Disclosed is an apparatus for inspecting a sample. The apparatus includes a first electron beam generator arranged to direct a first electron beam having a first range of energy levels toward a first area of the sample and a second electron beam generator arranged to direct a second electron beam having a second range of energy levels toward a second area of the sample. The second area of the sample at least partly overlaps with the first area, and the second range of energy levels are different from the first range such that charge build up caused by the first electron beam is controlled. The apparatus further includes a detector arranged to detect secondary electrons originating from the sample as a result of the first and second electron beam interacting with the sample

公开(公告)号：US5784925A

公开(公告)日：1998-07-28

申请号：US766271

申请日：1996-12-13

申请人： David Trost ,  Lee Veneklasen

发明人： David Trost ,  Lee Veneklasen

IPC分类号： F16C29/00 ,  F16C29/02 ,  F16C32/06 ,  G03F7/20 ,  H01J37/20 ,  H01J37/305 ,  H01L21/027 ,  G05G11/00 ,  F16C33/06 ,  F16J15/52

CPC分类号： F16C32/06 ,  F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  G03F7/70716 ,  G03F7/70816 ,  H01J37/20 ,  F16C2300/62 ,  H01J2237/20221 ,  H01J2237/3175 ,  Y10S277/913 ,  Y10T74/20354

摘要： A vacuum compatible linear motion device having a fluid bearing is contained within a vacuum chamber having a working pressure of significantly less than one atmosphere. The fluid bearing is contained within a vacuum enclosure within the vacuum chamber and is maintained at a pressure higher than that of the vacuum chamber but less than one atmosphere, thus essentially isolating the fluid bearing. A moveable payload is coupled to the linear motion device such that linear motion in the direction of the long axis of the device is provided to the moveable payload.

摘要翻译： 具有流体轴承的真空兼容的直线运动装置包含在具有明显小于一个大气压的工作压力的真空室内。 流体轴承包含在真空室内的真空外壳内，并保持在比真空室高的压力，但小于一个大气压，因此基本上隔离流体轴承。 可移动有效载荷耦合到线性运动装置，使得在装置的长轴方向上的线性运动被提供给可移动的有效载荷。

公开(公告)号：US06610980B2

公开(公告)日：2003-08-26

申请号：US09854332

申请日：2001-05-11

申请人： Lee Veneklasen ,  David L. Adler ,  Matthew Marcus

发明人： Lee Veneklasen ,  David L. Adler ,  Matthew Marcus

IPC分类号： G01N2300

CPC分类号： H01J37/256 ,  H01J37/26 ,  H01J2237/0044 ,  H01J2237/2538 ,  H01J2237/262

摘要： A novel dual beam low energy electron microscope (LEEM) apparatus for inspecting semiconductor circuits or masks. Direct imaging records many pixels in parallel, offering higher inspection rates than prior art scanning methods. A low energy flood beam is superimposed with a second, higher energy flood beam. The use of two beams avoids charging effects upon insulating or partially insulating substrates. Under appropriate conditions, the net charging flux to each image element can be balanced on a pixel by pixel, as well as global basis. Either the low energy or the higher energy beam may be used to form an image of the surface. An electron optical apparatus and configuration for this dual beam LEEM is described.

公开(公告)号：US06563124B2

公开(公告)日：2003-05-13

申请号：US09814373

申请日：2001-03-21

申请人： Lee Veneklasen ,  Vidhya Krishnamurthi ,  Gil Winograd

发明人： Lee Veneklasen ,  Vidhya Krishnamurthi ,  Gil Winograd

IPC分类号： H01J3706

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/30 ,  H01J37/3174 ,  H01J2237/03

摘要： An electron beam apparatus is capable of registering an image on a substrate. The apparatus comprises a vacuum chamber having a wall. Electron beam source, modulator, and detector components are adapted to generate, modulate and detect an array of electron beams in the vacuum chamber. A circuit board passing through the wall of the vacuum chamber has a plurality of electrical traces to connect to the electron beam source, modulator, and detector components.

公开(公告)号：US06373071B1

公开(公告)日：2002-04-16

申请号：US09343960

申请日：1999-06-30

申请人： Robert Innes ,  Sergey Babin ,  Robin Teitzel ,  Lee Veneklasen

发明人： Robert Innes ,  Sergey Babin ,  Robin Teitzel ,  Lee Veneklasen

IPC分类号： G03C502

CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/78 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/31769

摘要： The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A shifted impulse response function is shown to give proximity heating results accurate to within a few percent. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds.

摘要翻译： 本发明涉及随着写入的进行，在写入期间在电流和/或停留时间内实现光束补偿，实时地预测电子束光刻中抗蚀剂的接近加热的方法。 显示了移位的脉冲响应函数，使接近加热结果精确到百分之几。 一种使用能够进行光束写入的实时接近抗蚀剂温度评估的预计算核的方法。

公开(公告)号：US5502306A

公开(公告)日：1996-03-26

申请号：US214377

申请日：1994-03-17

申请人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

发明人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

IPC分类号： G01B15/00 ,  G01B15/08 ,  G01N23/04 ,  G01N23/203 ,  G01N23/225 ,  G01R31/307 ,  G03F1/08 ,  G03F1/16 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H01J37/26

CPC分类号： H01J37/28 ,  G01R31/307 ,  H01J2237/063 ,  H01J2237/184 ,  H01J2237/204 ,  H01J2237/24495 ,  H01J2237/30438

摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.

摘要翻译： 公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。 在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。 还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。 衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。 衬底也在其表面上经受电场以加速次级颗粒。 该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。 另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。 为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。 真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。 或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的​​多个基板。 在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。