公开(公告)号：US07138640B1

公开(公告)日：2006-11-21

申请号：US10688839

申请日：2003-10-16

申请人： Gil Delgado ,  John McMurtry ,  James Wiley

发明人： Gil Delgado ,  John McMurtry ,  James Wiley

IPC分类号： G01J1/42

CPC分类号： G02B27/0006 ,  G01J2001/0276 ,  G01N21/15 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/151 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916

摘要： The invention pertains to mechanisms for protecting surfaces of optical components of an optical inspection system. One aspect of the invention relates to a gas purge system that produces a gas stream that blocks contaminants from reaching the optical surfaces of the optical components and that transports contaminants away from the optical surfaces of the optical components. Another aspect of the invention relates to a transparent cover that physically blocks contaminants from reaching the optical surfaces of the optical components. Yet another aspect of the invention relates to a combination of the gas purge system and the transparent cover.

摘要翻译： 本发明涉及用于保护光学检查系统的光学部件的表面的机构。 本发明的一个方面涉及产生气流的气体净化系统，其阻止污染物到达光学部件的光学表面并将污染物从光学部件的光学表面传送出去。 本发明的另一方面涉及一种物理上阻挡污染物到达光学部件的光学表面的透明盖。 本发明的另一方面涉及气体吹扫系统和透明盖的组合。

公开(公告)号：US5578821A

公开(公告)日：1996-11-26

申请号：US371458

申请日：1995-01-11

申请人： Dan Meisberger ,  Alan D. Brodie ,  Anil A. Desai ,  Dennis G. Emge ,  Zhong-Wei Chen ,  Richard Simmons ,  Dave E. A. Smith ,  April Dutta ,  J. Kirkwood H. Rough ,  Leslie A. Honfi ,  Henry Pearce-Percy ,  John McMurtry ,  Eric Munro

发明人： Dan Meisberger ,  Alan D. Brodie ,  Anil A. Desai ,  Dennis G. Emge ,  Zhong-Wei Chen ,  Richard Simmons ,  Dave E. A. Smith ,  April Dutta ,  J. Kirkwood H. Rough ,  Leslie A. Honfi ,  Henry Pearce-Percy ,  John McMurtry ,  Eric Munro

IPC分类号： G01B15/00 ,  G01B15/08 ,  G01N23/04 ,  G01N23/203 ,  G01N23/225 ,  G01R31/28 ,  G01R31/302 ,  G03F1/08 ,  G03F1/16 ,  H01J37/28 ,  H01J37/30 ,  H01L21/027 ,  H01L21/66 ,  H01J37/00

CPC分类号： H01J37/28 ,  H01J37/3005 ,  H01J2237/2817

摘要： A method and apparatus for a charged particle scanning system and an automatic inspection system, including wafers and masks used in microcircuit fabrication. A charged particle beam is directed at the surface of a substrate for scanning that substrate and a selection of detectors are included to detect at least one of the secondary charged particles, back-scattered charged particles and transmitted charged particles from the substrate. The substrate is mounted on an x-y stage to provide at least one degree of freedom while the substrate is being scanned by the charged particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary charged particles. The system facilitates inspection at low beam energies on charge sensitive insulating substrates and has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment system for initially aligning the substrate beneath the charged particle beam. To function most efficiently there is also a vacuum system for evacuating and repressurizing a chamber containing the substrate. The vacuum system can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum system can simultaneously evacuate a plurality of substrates prior to inspection and repressurize the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison system for comparing the pattern on the substrate with a second pattern.

摘要翻译： 一种带电粒子扫描系统和自动检查系统的方法和装置，包括微电路制造中使用的晶片和掩模。 带电粒子束被引导到用于扫描该衬底的衬底的表面，并且包括选择的检测器以检测来自衬底的次级带电粒子，反向散射带电粒子和透射带电粒子中的至少一个。 衬底被安装在x-y平台上以在通过带电粒子束扫描衬底的同时提供至少一个自由度。 衬底也在其表面上经受电场以加速次级带电粒子。 该系统便于对电荷敏感绝缘基板上的近光束能量进行检查，并且能够准确地测量基板相对于带电粒子束的位置。 另外，存在用于使带电粒子束下面的衬底最初对准的光学对准系统。 为了最有效地起作用，还有一个真空系统用于对含有基底的腔室进行抽空和再加压。 真空系统可用于将一个基板保持在真空状态，而第二个基板正在装载/卸载，抽真空或重新加压。 或者，真空系统可以在检查之前同时抽空多个基板，并且在检查之后重新加压相同的​​多个基板。 在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较系统。

公开(公告)号：US5502306A

公开(公告)日：1996-03-26

申请号：US214377

申请日：1994-03-17

申请人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

发明人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

IPC分类号： G01B15/00 ,  G01B15/08 ,  G01N23/04 ,  G01N23/203 ,  G01N23/225 ,  G01R31/307 ,  G03F1/08 ,  G03F1/16 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H01J37/26

CPC分类号： H01J37/28 ,  G01R31/307 ,  H01J2237/063 ,  H01J2237/184 ,  H01J2237/204 ,  H01J2237/24495 ,  H01J2237/30438

摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.

摘要翻译： 公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。 在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。 还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。 衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。 衬底也在其表面上经受电场以加速次级颗粒。 该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。 另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。 为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。 真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。 或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的​​多个基板。 在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。