公开(公告)号：US09195147B2

公开(公告)日：2015-11-24

申请号：US12606539

申请日：2009-10-27

申请人： Koen Steffens ,  Ronald Van Der Ham ,  Erik Henricus Egidius Catharina Eummelen

发明人： Koen Steffens ,  Ronald Van Der Ham ,  Erik Henricus Egidius Catharina Eummelen

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A seal between a table and a component in a lithographic apparatus is disclosed. The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment is attached to the table. The seal may be integral with the component or the table.

摘要翻译： 公开了一种在光刻设备中的工作台与部件之间的密封。 当组件处于相对于桌子的位置时，密封件桥接部件和工作台之间的间隙。 组件在使用中相对于表是可移动的，并且在一个实施例中附加到表。 密封件可能与组件或工作台成一体。

公开(公告)号：US08681308B2

公开(公告)日：2014-03-25

申请号：US11898637

申请日：2007-09-13

申请人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

发明人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/42 ,  G03B27/32 ,  G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

公开(公告)号：US08421993B2

公开(公告)日：2013-04-16

申请号：US12437433

申请日：2009-05-07

申请人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Koen Steffens ,  Arnold Jan Van Putten

发明人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Koen Steffens ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

摘要翻译： 公开了一种流体处理结构，其中指定了流体提取开口的尺寸和布置，以便减少由于两相抽取而被传送到流体处理结构的振动。 可以控制每个流体提取开口的面积和/或所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 振动的减少增加了曝光的准确性。

公开(公告)号：US08351018B2

公开(公告)日：2013-01-08

申请号：US12436626

申请日：2009-05-06

申请人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Koen Steffens ,  Arnold Jan Van Putten

发明人： Daniel Jozef Maria Direcks ,  Danny Maria Hubertus Philips ,  Clemens Johannes Gerardus Van Den Dungen ,  Koen Steffens ,  Arnold Jan Van Putten

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  Y10T29/49401 ,  Y10T137/8593

摘要： A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其中采取措施来提高发生弯月面破裂的速度。 措施包括多个流体提取开口的形状以及流体处理结构中的多个流体供应开口的形状和密度。

公开(公告)号：US20110005603A1

公开(公告)日：2011-01-13

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

IPC分类号： F03B11/00

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US20100214543A1

公开(公告)日：2010-08-26

申请号：US12697583

申请日：2010-02-01

申请人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

发明人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。

公开(公告)号：US20100110410A1

公开(公告)日：2010-05-06

申请号：US12606539

申请日：2009-10-27

申请人： KOEN STEFFENS ,  RONALD VAN DER HAM ,  ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN

发明人： KOEN STEFFENS ,  RONALD VAN DER HAM ,  ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN

IPC分类号： G03B27/58

CPC分类号： G03F7/70341

摘要： A seal between a table and a component in a lithographic apparatus is disclosed. The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment is attached to the table. The seal may be integral with the component or the table.

摘要翻译： 公开了一种在光刻设备中的工作台与部件之间的密封。 当组件处于相对于桌子的位置时，密封件桥接部件和工作台之间的间隙。 组件在使用中相对于表是可移动的，并且在一个实施例中附加到表。 密封件可能与组件或工作台成一体。

公开(公告)号：US20100045950A1

公开(公告)日：2010-02-25

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20090279062A1

公开(公告)日：2009-11-12

申请号：US12437433

申请日：2009-05-07

申请人： Daniel Jozef Maria DIRECKS ,  Danny Maria Hubertus PHILIPS ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Maikel Adrianus Cornelis SCHEPERS ,  Paul Petrus Joannes BERKVENS ,  Koen STEFFENS ,  Arnold Jan VAN PUTTEN

发明人： Daniel Jozef Maria DIRECKS ,  Danny Maria Hubertus PHILIPS ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Maikel Adrianus Cornelis SCHEPERS ,  Paul Petrus Joannes BERKVENS ,  Koen STEFFENS ,  Arnold Jan VAN PUTTEN

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

摘要翻译： 公开了一种流体处理结构，其中指定了流体提取开口的尺寸和布置，以便减少由于两相抽取而被传送到流体处理结构的振动。 可以控制每个流体提取开口的面积和/或所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 振动的减少增加了曝光的准确性。

公开(公告)号：US20220121131A1

公开(公告)日：2022-04-21

申请号：US17565144

申请日：2021-12-29

申请人： Marco Koert STAVENGA ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

发明人： Marco Koert STAVENGA ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC分类号： G03F7/20 ,  H01L21/687 ,  H01L21/68

摘要： A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.