Integrated solar power module
    2.
    发明授权
    Integrated solar power module 有权
    集成太阳能发电模块

    公开(公告)号:US06300158B1

    公开(公告)日:2001-10-09

    申请号:US09649726

    申请日:2000-08-28

    IPC分类号: H01L2100

    摘要: Multiple layers of a clear insulating material, such as clear polyimide, with horizontal metalization layers therebetween and with vertical feed through metal traces therethrough form a flexible three dimension circuit printed circuit board upon which semiconductor devices, such as thin film solar cell can be directly deposited for forming a flexible electronic module, and upon which electronic discrete component can be bonded and electrically connected. In one exemplar configuration, a flexible thin film solar cell power module has thin film solar cells deposited on one side and power converters bonded on the other for a solar array power system. The flexible printed circuit board is well suited for forming electronic systems about a curved surface such as a power sphere nanosatellite.

    摘要翻译: 多层透明绝缘材料,例如透明聚酰亚胺,其间具有水平金属化层并且穿过穿过金属迹线的垂直进料通过其形成柔性三维电路印刷电路板,半导体器件(例如薄膜太阳能电池)可以直接沉积在其上 用于形成柔性电子模块,并且可以将电子分立元件结合并电连接。 在一个示例性配置中,柔性薄膜太阳能电池功率模块具有沉积在一侧的薄膜太阳能电池和用于太阳能阵列电力系统的另一个电力转换器。 柔性印刷电路板非常适合于围绕弯曲表面形成电子系统,例如功率球纳米卫星。

    Multi-chamber deposition system
    4.
    发明授权
    Multi-chamber deposition system 失效
    多室沉积系统

    公开(公告)号:US4874631A

    公开(公告)日:1989-10-17

    申请号:US157238

    申请日:1988-02-16

    IPC分类号: C23C16/02 C23C16/54

    CPC分类号: C23C16/54 C23C16/0245

    摘要: A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

    摘要翻译: 公开了一种用于将不同涂层同时沉积到大体积真空室内的薄腹板上的系统,其中室具有多个沉积室,其中不同层在从供给辊移动到其上时沉积在膜上 涂布网的成品卷取辊。 设置在大真空室内的沉积室设置有分离的密封件,其使来自相邻沉积室的任何掺杂气体的反向扩散最小化。

    Flexible panel display having thin film transistors driving polymer
light-emitting diodes
    5.
    发明授权
    Flexible panel display having thin film transistors driving polymer light-emitting diodes 失效
    具有驱动聚合物发光二极管的薄膜晶体管的柔性面板显示器

    公开(公告)号:US5747928A

    公开(公告)日:1998-05-05

    申请号:US320029

    申请日:1994-10-07

    IPC分类号: H01L27/32 H01L51/50 H05B33/12

    摘要: A non-planar electronic light-emitting display has a display area divided into a matrix of pixels. Each pixel includes two primary elements, an electronic driver and a light-emitting diode based on a light-emitting polymer. The electronic driver is a thin film transistor device of amorphous silicon formed on the insulating substrate. The diode has a first electrode connected to and driven by the electronic transistor, a layer of light-emitting polymer deposited on the electrode, and an overlying electrode normally biased on. Energization of the driver biases the diode to cause the polymer to emit light. Each pixel is configured with the two-component structure described above, and row and column lines to the matrix of pixels are decoded by the drivers to cause selective illumination of the pixels.

    摘要翻译: 非平面型电子发光显示器具有划分为像素矩阵的显示区域。 每个像素包括两个主要元件,电子驱动器和基于发光聚合物的发光二极管。 电子驱动器是形成在绝缘基板上的非晶硅薄膜晶体管器件。 二极管具有连接到电子晶体管并由电子晶体管驱动的第一电极,沉积在电极上的发光聚合物层和通常偏置的上覆电极。 驱动器的通电会偏压二极管,使聚合物发光。 每个像素被配置有上述双组分结构,并且由像素矩阵对行和列线进行解码以引起像素的选择性照明。

    RF Sputtering for preparing substantially pure amorphous silicon
monohydride
    7.
    发明授权
    RF Sputtering for preparing substantially pure amorphous silicon monohydride 失效
    RF溅射用于制备基本上纯的无定形一硅氢化物

    公开(公告)号:US4353788A

    公开(公告)日:1982-10-12

    申请号:US181410

    申请日:1980-08-26

    摘要: A process for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicon produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous silicon hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

    摘要翻译: 一种通过非晶硅靶的反应性溅射法制备的氢化非晶硅中二氢化物和一氢键的密度的控制方法。 提供了具有非晶硅靶和其中衬底的室,其中衬底和靶被定位成使得当对靶施加射频功率时,衬底与由此产生的溅射等离子体接触。 氢气和氩气被供给到室中,并且在腔室中的压力降低到足以在其中维持溅射等离子体的值,然后将rf功率施加到硅靶,以提供在约7瓦特范围内的功率密度 每平方英寸至约22瓦特/平方英寸以将无定形硅氢化物溅射到衬底上,二氢键密度随rf功率密度的增加而降低。 可以生产基本上纯一价的膜。

    Plasma processing of large workpieces
    9.
    发明申请
    Plasma processing of large workpieces 审中-公开
    大型工件的等离子体处理

    公开(公告)号:US20070204957A1

    公开(公告)日:2007-09-06

    申请号:US11364550

    申请日:2006-03-01

    IPC分类号: C23F1/00 H01L21/306

    摘要: An apparatus includes a chamber having a process zone. The chamber is configured to contain a substrate, an etching substance, and an antenna. The antenna is configured to activate the etching substance. The substrate includes a material formulated to be etched by the etching substance when the etching substance is activated. The apparatus also includes a transfer mechanism. The transfer mechanism is configured to move the substrate from a first position to a second position. A first portion of the substrate is disposed within the process zone and a second portion of the substrate is disposed outside the process zone when the substrate is in its first position. The first portion of the substrate is disposed outside the process zone and the second portion of the substrate is disposed inside the process zone when the substrate is in its second position. The size and geometry of the antenna can be chosen to allow the etching of a grounded substrate.

    摘要翻译: 一种装置包括具有处理区的室。 该室被配置为容纳基板,蚀刻物质和天线。 天线被配置为激活蚀刻物质。 衬底包括当蚀刻物质被激活时配制成被蚀刻物质蚀刻的材料。 该装置还包括传送机构。 传送机构被配置为将基板从第一位置移动到第二位置。 衬底的第一部分设置在工艺区域内,并且当衬底处于其第一位置时,衬底的第二部分设置在工艺区域外部。 衬底的第一部分设置在处理区域的外部,并且当衬底处于其第二位置时,衬底的第二部分设置在处理区域内。 可以选择天线的尺寸和几何形状以允许蚀刻接地的基板。