公开(公告)号：US20120210931A1

公开(公告)日：2012-08-23

申请号：US13315769

申请日：2011-12-09

申请人： David L. Bender ,  Gary Janik ,  David E.A. Smith

发明人： David L. Bender ,  Gary Janik ,  David E.A. Smith

IPC分类号： C30B15/20 ,  C30B15/14 ,  C30B15/02

CPC分类号： C30B29/06 ,  C30B15/02 ,  C30B15/14 ,  C30B15/20 ,  Y10T117/1008

摘要： In a Czochralski process for growing single crystal silicon ingots, a system is provided for adding solid material to the liquid silicon during crystal growth for the purpose of directly controlling the latent heat of fusion with respect to a crystal melt interface. In contrast to the standard method for controlling power to the crucible heater, the present system has been found to be much more effective for controlling melt temperature in the crucible, especially in heavily insulated systems. The system provides the advantage of reducing the electric power required to operate a Czochralski grower, while increasing the speed with which the melt temperature can be raised or lowered in a controlled manner.

摘要翻译： 在用于生长单晶硅锭的切克劳斯（Czochralski）工艺中，提供了一种用于在晶体生长期间将固体材料添加到液态硅的系统，用于直接控制熔融相对于晶体熔融界面的潜热。 与用于控制坩埚加热器的功率的标准方法相比，本系统已经被发现对于控制坩埚中的熔融温度更有效，特别是在高度绝缘的系统中。 该系统提供了降低操作切克劳斯基斯种植者所需的电力的优点，同时提高以可控方式升高或降低熔体温度的速度。

公开(公告)号：US07359052B2

公开(公告)日：2008-04-15

申请号：US10846053

申请日：2004-05-14

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J4/00

CPC分类号： G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N2021/213

摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。 该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。 另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。 在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。 该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。 光学子系统设置在净化的环境中。 在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

公开(公告)号：US08257496B1

公开(公告)日：2012-09-04

申请号：US12315452

申请日：2008-12-03

申请人： David L. Bender ,  Gary Janik ,  Roy P. Crawford ,  David E. A. Smith

发明人： David L. Bender ,  Gary Janik ,  Roy P. Crawford ,  David E. A. Smith

IPC分类号： C30B35/00

CPC分类号： C30B15/02 ,  C30B15/28 ,  C30B29/06 ,  Y10T117/10 ,  Y10T117/1004 ,  Y10T117/1008 ,  Y10T117/1024 ,  Y10T117/1056

摘要： A weighing system is provided for a continuous Czochralski process that accurately measures the weight of the crucible and melt during crystal growth to control the introduction of feedstock in order to keep the weight approximately constant. The system can measure the weight of the crucible while the crucible is rotating, and is insensitive to vibrations of the melt surface as well as variable torques on the crucible shaft induced by the rotation. The system also measures the weight of the crucible and its contents in order to control the amount of feedstock recharged after an ingot is withdrawn.

摘要翻译： 为连续的切克劳斯基（Czochralski）工艺提供了称重系统，可精确测量坩埚的重量，并在晶体生长过程中熔化，以控制原料的引入，以保持重量大致恒定。 该系统可以在坩埚旋转时测量坩埚的重量，并且对熔体表面的振动以及由旋转引起的坩埚轴上的可变转矩不敏感。 该系统还测量坩埚的重量及其含量，以便控制在锭被取出之后再充电的原料的量。

公开(公告)号：US07564552B2

公开(公告)日：2009-07-21

申请号：US10845958

申请日：2004-05-14

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J4/00

CPC分类号： G03F7/70933 ,  G03F7/70916

摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

公开(公告)号：US20050254050A1

公开(公告)日：2005-11-17

申请号：US10846053

申请日：2004-05-14

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J3/10 ,  G01J3/36 ,  G01J4/00 ,  G01N21/21

CPC分类号： G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N2021/213

摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。 该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。 另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。 在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。 该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。 光学子系统设置在净化的环境中。 在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

公开(公告)号：US20050252752A1

公开(公告)日：2005-11-17

申请号：US10845958

申请日：2004-05-14

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G03F7/20 ,  H01H27/00

CPC分类号： G03F7/70933 ,  G03F7/70916

摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

公开(公告)号：US06788760B1

公开(公告)日：2004-09-07

申请号：US10317607

申请日：2002-12-11

申请人： Gary Janik ,  Roger Kroeze ,  Murali Narsimhan

发明人： Gary Janik ,  Roger Kroeze ,  Murali Narsimhan

IPC分类号： G01N23223

CPC分类号： G01N23/2252 ,  H01J2237/2445

摘要： Methods and apparatus are providing for characterizing thin films in an integrated circuit device. A target including multiple layers is scanned using an x-ray emission inducer. X-ray emissions characteristic of materials in the target are measured. In one example, multiple beam energies are used to conduct the scan. In another example, continuously varying beam energies are used. Information such as K-ratios or the intensity of the x-ray emissions is provided to determine the thickness and/or composition of layers in the scan target.

摘要翻译： 提供用于在集成电路器件中表征薄膜的方法和装置。 使用x射线发射诱导器扫描包括多个层的靶。 测量目标材料的X射线发射特性。 在一个示例中，使用多个光束能量来进行扫描。 在另一示例中，使用连续变化的束能。 提供诸如K比率或x射线发射强度的信息以确定扫描目标中的层的厚度和/或组成。

公开(公告)号：US07764376B2

公开(公告)日：2010-07-27

申请号：US12506019

申请日：2009-07-20

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J4/00

CPC分类号： G03F7/70933 ,  G03F7/70916

摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

公开(公告)号：US07623239B2

公开(公告)日：2009-11-24

申请号：US12103320

申请日：2008-04-15

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J4/00

CPC分类号： G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N2021/213

摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。 该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。 另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。 在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。 该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。 光学子系统设置在净化的环境中。 在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

公开(公告)号：US07369233B2

公开(公告)日：2008-05-06

申请号：US10718126

申请日：2003-11-19

申请人： Mehrdad Nikoonahad ,  Shing Lee ,  Hidong Kwak ,  Sergio Edelstein ,  Guoheng Zhao ,  Gary Janik

发明人： Mehrdad Nikoonahad ,  Shing Lee ,  Hidong Kwak ,  Sergio Edelstein ,  Guoheng Zhao ,  Gary Janik

IPC分类号： G01N21/17

CPC分类号： G01N21/9501 ,  G01N21/8806

摘要： In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.

摘要翻译： 在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量， 可以减少波长分量。 这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。 在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品不需要放置在真空中，从而提高系统产量。