Silicon nitride powder of low oxygen content
    2.
    发明授权
    Silicon nitride powder of low oxygen content 失效
    低氧含量的氮化硅粉末

    公开(公告)号:US4983371A

    公开(公告)日:1991-01-08

    申请号:US396328

    申请日:1989-08-21

    IPC分类号: C01B21/068

    CPC分类号: C01B21/068 C01P2006/12

    摘要: Si.sub.3 N.sub.4 powder wherein the total oxygen content of the powder is 0.4% by weight or less is produced by preparing an amorphous Si.sub.3 N.sub.4 intermediate by reacting a Si-containing compound with an N-containing compound and the intermediate is then crystallized wherein "P", multiplication product of(i) the specific surface of the amorphous intermediate (BET in m.sup.2 /g),(ii) the moisture content C.sub.H.sbsb.2.sub.O (in volume ppm) of the atmosphere during handling and(iii) the time t in hours required for handling the amorphous intermediate,is kept smaller than the limit value product P.sub.G of 1000 in accordance with the following equation:"P"=BET (m.sup.2 /g).times.C.sub.H.sbsb.2.sub.O (vol ppm).times.t(h)

    摘要翻译: 通过使含Si的化合物与含N的化合物反应制备无定形的Si 3 N 4中间产物,其中粉末的总氧含量为0.4重量%以下的Si 3 N 4粉末,然后使中间体结晶,其中“P” (i)无定形中间体的比表面积(BET / m2 / g),(ii)处理过程中气氛的水分CH 2 O(体积ppm)的产物和(iii)处理所需的时间t 无规中间体根据下式保持小于1000的极限值乘积PG:“P”= BET(m 2 / g)×CH 2 O(体积ppm)×t(h)

    Catalyst for the production of maleic anhydride
    5.
    发明授权
    Catalyst for the production of maleic anhydride 失效
    用于生产马来酸酐的催化剂

    公开(公告)号:US4335018A

    公开(公告)日:1982-06-15

    申请号:US202281

    申请日:1980-10-30

    CPC分类号: C07C51/25 C07C51/252

    摘要: Ethylenically unsaturated C.sub.4 -n-hydrocarbons are oxidized to maleic anhydride by passing a stream of oxygen-containing gas at high temperature over a catalyst of the formulaW.sub.a Mo.sub.b Sb.sub.c Y.sub.d X.sub.e O.sub.xwherein Y=P, Si; X=V, Bi, Te, alkali metal; a and b each =1-12; c=2-20; d=0.2-2; e=0-10; and x is the number of oxygen atoms required to satisfy the remaining valences of the other elements, prepared by reacting an Sb compound and optionally also a V, Bi, Te and/or alkali metal compound, with a solution of a heteropoly acid of Mo and W, drying and tempering the resultant blue complex.

    摘要翻译: 将烯属不饱和C4-n-烃通过使高温含氧气体流在式WaMobSbcYdXeOx的催化剂上氧化成马来酸酐,其中Y = P,Si; X = V,Bi,Te,碱金属; a和b每个= 1-12; c = 2-20; d = 0.2-2; e = 0-10; x是通过使Sb化合物和任选的V,Bi,Te和/或碱金属化合物与Mo的杂多酸的溶液反应而制备的其它元素的剩余价数所需的氧原子数 和W,干燥和回火得到的蓝色络合物。

    APPARATUS FOR THE DESTRUCTION OF TUMOR CELLS OR PATHOGENS IN THE BLOOD STREAM
    6.
    发明申请
    APPARATUS FOR THE DESTRUCTION OF TUMOR CELLS OR PATHOGENS IN THE BLOOD STREAM 审中-公开
    在血液循环中破坏肿瘤细胞或病原体的装置

    公开(公告)号:US20110218474A1

    公开(公告)日:2011-09-08

    申请号:US13059558

    申请日:2009-08-19

    IPC分类号: A61M1/00

    摘要: The invention relates to an apparatus for destroying tumor cells or pathogens in the blood stream, comprising at least one ultrasonic frequency generator (11) and a device for forming an extracorporeal blood circulation (1) which encompasses at least one heat exchanger (3), at least one blood circulation pump (2, 2′), and a treatment vessel (6) for holding blood. The treatment vessel (6) is mounted downstream of the heat exchanger (3), forms a treatment chamber (13), and is connected to at least one ultrasonic transducer head (8) which is coupled to the ultrasonic frequency generator (11) such that a low-frequency ultrasonic vibration can be introduced into the treatment chamber (13).

    摘要翻译: 本发明涉及一种用于破坏血液中的肿瘤细胞或病原体的装置,包括至少一个超声频率发生器(11)和用于形成体外血液循环的装置(1),其包含至少一个热交换器(3), 至少一个血液循环泵(2,2')和用于保持血液的治疗容器(6)。 处理容器(6)安装在热交换器(3)的下游,形成处理室(13),并连接至至少一个与超声频率发生器(11)相连的超声波换能器头(8) 可以将低频超声波振动引入到处理室(13)中。

    Closure for a container that holds a free-flowing product
    7.
    发明授权
    Closure for a container that holds a free-flowing product 有权
    关闭一个容纳自由流动产品的容器

    公开(公告)号:US07681750B2

    公开(公告)日:2010-03-23

    申请号:US10590069

    申请日:2005-03-04

    IPC分类号: B65D5/72 B65D41/20 B65D41/62

    摘要: The invention relates to a closure for a container that holds a free-flowing product. The container is characterized by the following: a fixed lower part which can be fastened to a container neck that surrounds a container opening in order to seal said neck; a cover comprising a protruding connecting piece that forms a passage for the free-flowing product; a displaceable upper part which can be coaxially displaced on the lower part in and against the direction of the container between an outer resting position and an inner actuating position; a breaker or dish-shaped diaphragm valve which has a base consisting at least of a flexible elastic material and whose upper edge seals the underside of the upper part; perforations in the base of the diaphragm valve which are closed in the testing position of the upper part; and a diameter of the base that is greater than the inner cross section of the connecting piece. The outer end of the connecting piece continuously supports the base of the diaphragm valve, and the latter continuously pre-tensions the upper part in the direction of its resting position in such a way that, when axial pressure is exerted on the upper part in the direction of the container, the diaphragm valve is bent outwards, thus opening the perforations in the base.

    摘要翻译: 本发明涉及一种用于容纳自由流动产品的容器盖。 容器的特征在于:固定的下部,其可以紧固到围绕容器开口的容器颈部以便密封所述颈部; 包括形成用于自由流动产品的通道的突出连接件的盖; 可移动的上部,其可以在外部静止位置和内部致动位置之间在容器的下方同轴位移并且抵靠容器的方向; 破碎器或碟形隔膜阀,其具有至少由柔性弹性材料构成的基部,并且其上边缘密封上部的下侧; 隔膜阀底部的穿孔在上部测试位置处封闭; 并且所述基部的直径大于所述连接件的内部横截面。 连接件的外端连续地支撑隔膜阀的底部,并且后者在其静止位置的方向上连续地张紧上部,使得当轴向压力施加在上部 容器的方向,隔膜阀向外弯曲,从而打开底座中的穿孔。

    Means and method for patterning a substrate with a mask
    9.
    发明申请
    Means and method for patterning a substrate with a mask 审中-公开
    用掩模图案化衬底的方法和方法

    公开(公告)号:US20050020072A1

    公开(公告)日:2005-01-27

    申请号:US10489632

    申请日:2001-09-11

    CPC分类号: H01L21/32139 H01L21/0331

    摘要: A multilayer mask for patterning a platinum (or other) layer formed on a substrate. The multilayer mask includes a first dielectric layer formed on the platinum layer, a bottom resist layer formed over the first dielectric layer, a second dielectric layer formed on the bottom resist layer, and a top (structure) resist layer formed on the second dielectric layer. The second dielectric layer is patterned using the top resist layer, and serves to prevent photoresist rounding. The first dielectric layer prevents “micro-masking” by acting as an etch stop during subsequent patterning of the bottom resist layer, which is performed using dry etching techniques. The first dielectric layer is then wet etched to expose the platinum layer.

    摘要翻译: 用于图案化形成在基板上的铂(或其它)层的多层掩模。 多层掩模包括形成在铂层上的第一介质层,形成在第一介电层上的底部抗蚀剂层,形成在底部抗蚀剂层上的第二介电层和形成在第二介电层上的顶部(结构)抗蚀剂层 。 使用顶部抗蚀剂层对第二介电层进行图案化,并且用于防止光致抗蚀剂倒圆。 第一电介质层通过在使用干蚀刻技术进行的底部抗蚀剂层的后续图案化期间用作蚀刻停止来防止“微掩模”。 然后湿法蚀刻第一介电层以露出铂层。