摘要:
The method of preparing synthetic powders containing emulsifiers having good paste qualities by spray-drying polymer dispersions through a two-fluid atomizer having a spray ratio of about 1.6 to 5.0 kg. of spray air for each kg. of dispersion is improved. The polymer dipersions are prepared by emulsifying vinyl chloride monomer or a mixture of vinyl chloride monomer and unsaturated polymerizable compounds and polymerizing the monomers to produce polymers and copolymers of vinyl chloride. The improvement in paste qualities of the powders is achieved by introducing the spray dried powder into an air jet having a velocity from about 330 to 550 meters per second and having a weight ratio of gas to solids ranging from 1:10 to 5:1.
摘要:
The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
摘要:
The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
摘要:
A clocked power supply circuit is proposed which includes a control arrangement (20) which outputs switching signals (21) to switching means (13) as a function of a load condition present on the output side and which includes at least one inductive element (12). Provided on the output side is a load (22) which is independent of the electric consumer (18), preferably a gas discharge lamp, and is at least temporarily active. It is possible using the load (22) specifically to avoid no-load operation of the clocked power supply by means of a load, as a result of which the system-induced reaction time can be substantially shortened in the case of a short-term energy requirement of the consumer (18). The energy required in the short term can be supplied by the magnetic energy stored in the inductive element (12). The clocked power supply circuit according to the invention is suitable, in particular, for the energy supply of high-pressure gas discharge lamps (18) which are arranged, for example, as headlight lamps in a motor vehicle.
摘要:
The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
摘要:
Carriers for substrates and to methods for assembling the same in the field of vacuum deposition of thin films. In particular, a carrier for a substrate to be coated in a vacuum chamber includes a first frame comprising two vertical sections and two horizontal sections being dimensioned to surround the substrate; a second dimensioned to define an area of the substrate to be coated, and to cover at least a first part of the first frame to prevent the first part of the first frame from being coated when the second frame is mounted to the first frame. The second frame is detachably mounted to the first frame.
摘要:
The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.