公开(公告)号：US07786403B2

公开(公告)日：2010-08-31

申请号：US10927956

申请日：2004-08-27

申请人： Hans Koops ,  Klaus Edinger ,  Sergey Babin ,  Thorsten Hofmann ,  Petra Spies

发明人： Hans Koops ,  Klaus Edinger ,  Sergey Babin ,  Thorsten Hofmann ,  Petra Spies

IPC分类号： B23K15/00 ,  H01L21/302 ,  H01L21/461

CPC分类号： G03F1/74 ,  C23F1/12 ,  H01J2237/31744 ,  H01L21/32135

摘要： A method for etching a chromium layer in a vacuum chamber which may comprise introducing a halogen compound into the vacuum chamber, directing an electron beam onto the area of the chromium layer to be etched and/or introducing an oxygen including compound into the vacuum chamber. A further method for the highly resolved removal of a layer out of metal and/or metal oxide which may be arranged on an isolator or a substrate having poor thermal conductivity, may comprise arranging the layer inside a vacuum chamber, bombarding the layer with a focused electron beam with an energy of 3-30 keV, wherein the electron beam may be guided such that the energy transfer per time and area causes a localized heating of the layer above its melting and/or vaporization point and wherein the removal of the layer may be performed without the supply of reaction gases into the vacuum chamber.

摘要翻译： 一种用于在真空室中蚀刻铬层的方法，其可以包括将卤素化合物引入真空室，将电子束引导到要蚀刻的铬层的区域和/或将含氧化合物引入真空室中。 用于高分辨率地去除可以布置在具有差热导率的隔离器或基板上的金属和/或金属氧化物层的另外的方法可以包括将层布置在真空室内，用聚焦的方式轰击该层 电子束的能量为3-30keV，其中电子束可被引导，使得每时间和面积的能量传递导致该层在其熔化和/或蒸发点之上的局部加热，并且其中该层的去除可以 在没有将反应气体供应到真空室中的情况下进行。

公开(公告)号：US20080011718A1

公开(公告)日：2008-01-17

申请号：US11772755

申请日：2007-07-02

申请人： HANS KOOPS ,  KLAUS EDINGER

发明人： HANS KOOPS ,  KLAUS EDINGER

IPC分类号： B44C1/22

CPC分类号： H01L21/31122 ,  G03F1/74 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01L21/31105

摘要： The invention refers to a procedure for etching of materials at the surface by focussed electron beam induced chemical reactions at said surface. The invention is characterized in that in a vacuum atmosphere the material which is to be etched is irradiated with at least one beam of molecules, at least one beam of photons and at least one beam of electrons, whereby the irradiated material and the molecules of the beam of molecules are excited in a way that a chemical reaction predetermined by said material and said molecules composition takes place and forms a reaction product and said reaction product is removed from the material surface—irradiation and removal step.

摘要翻译： 本发明涉及通过在所述表面处聚焦的电子束诱导的化学反应在表面处蚀刻材料的方法。 本发明的特征在于，在真空气氛中，待蚀刻的材料用至少一束分子，至少一束光子和至少一束电子照射，由此照射的材料和 分子束以使得由所述材料和所述分子组合物预定的化学反应发生并形成反应产物的方式被激发，并且从材料表面照射和去除步骤中除去所述反应产物。

公开(公告)号：US20060284090A1

公开(公告)日：2006-12-21

申请号：US11499776

申请日：2006-08-07

申请人： Hans Koops ,  Peter Hoffrogge

发明人： Hans Koops ,  Peter Hoffrogge

IPC分类号： G21K7/00

CPC分类号： H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

公开(公告)号：US20050103272A1

公开(公告)日：2005-05-19

申请号：US10923814

申请日：2004-08-24

申请人： Hans Koops ,  Peter Hoffrogge

发明人： Hans Koops ,  Peter Hoffrogge

IPC分类号： C23C16/00

CPC分类号： H01J37/3056 ,  H01J2237/006 ,  H01J2237/162 ,  H01J2237/166 ,  H01J2237/31732 ,  H01J2237/31744

摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

摘要翻译： 提供了一种用于处理工件的材料处理系统。 材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。 辐射优选由电子显微镜提供。 电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。 材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。 气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

公开(公告)号：US20050087514A1

公开(公告)日：2005-04-28

申请号：US10927956

申请日：2004-08-27

申请人： Hans Koops ,  Klaus Edinger ,  Sergey Babin ,  Thorsten Hofmann ,  Petra Spies

发明人： Hans Koops ,  Klaus Edinger ,  Sergey Babin ,  Thorsten Hofmann ,  Petra Spies

IPC分类号： C23F1/12 ,  H01L21/3213 ,  C23F1/00

CPC分类号： G03F1/74 ,  C23F1/12 ,  H01J2237/31744 ,  H01L21/32135

摘要： A method for etching a chromium layer in a vacuum chamber which may comprise introducing a halogen compound into the vacuum chamber, directing an electron beam onto the area of the chromium layer to be etched and/or introducing an oxygen including compound into the vacuum chamber. A further method for the highly resolved removal of a layer out of metal and/or metal oxide which may be arranged on an isolator or a substrate having poor thermal conductivity, may comprise arranging the layer inside a vacuum chamber, bombarding the layer with a focused electron beam with an energy of 3-30 keV, wherein the electron beam may be guided such that the energy transfer per time and area causes a localized heating of the layer above its melting and/or vaporization point and wherein the removal of the layer may be performed without the supply of reaction gases into the vacuum chamber.

摘要翻译： 一种用于在真空室中蚀刻铬层的方法，其可以包括将卤素化合物引入真空室，将电子束引导到要蚀刻的铬层的区域和/或将含氧化合物引入真空室中。 用于高分辨率地去除可以布置在具有差热导率的隔离器或基板上的金属和/或金属氧化物层的另外的方法可以包括将层布置在真空室内，用聚焦的方式轰击该层 电子束的能量为3-30keV，其中电子束可被引导，使得每时间和面积的能量传递导致该层在其熔化和/或蒸发点之上的局部加热，并且其中该层的去除可以 在没有将反应气体供应到真空室中的情况下进行。

公开(公告)号：US5917747A

公开(公告)日：1999-06-29

申请号：US906620

申请日：1997-08-07

申请人： Hans Koops ,  Gerhard Hanke

发明人： Hans Koops ,  Gerhard Hanke

IPC分类号： G11C11/30 ,  H03K19/06 ,  G11C13/00

CPC分类号： G11C11/30

摘要： A digital memory element having three miniaturized electron tubes, which is faster and smaller by at least one further order of magnitude than known digital memory elements, can be produced through conventional and additive lithography. The digital memory element is a small memory capacitor linked to the anode of a write-in tube, to the cathode of an erase tube, and to a deflection element of a read-out tube which deflects an electron beam, in dependence upon the charge state, to one of two detectors.

摘要翻译： 具有三个小型化电子管的数字存储元件可以通过常规和附加光刻技术制造，该电子管比已知数字存储元件更快更小一个数量级。 数字存储元件是连接到写入管的阳极到擦除管的阴极以及依赖于电荷而偏转电子束的读出管的偏转元件的小存储器电容器 状态，到两个检测器之一。

公开(公告)号：US5973823A

公开(公告)日：1999-10-26

申请号：US896915

申请日：1997-07-22

申请人： Hans Koops ,  Wolfgang Dultz ,  Manfred Eich

发明人： Hans Koops ,  Wolfgang Dultz ,  Manfred Eich

IPC分类号： G02F1/01 ,  G02F1/03

CPC分类号： G02F1/01

摘要： A method for mechanically stabilizing and for tuning a filter having a photonic crystal structureThe cavities of the filter fabricated as a photonic crystal structure are filled with optically transparent material having an adjustable refractive index. The optical properties of the filter and, thus, the filtering action are adjusted by way of an electric field having a variable field strength.It is possible to produce small-dimensioned, narrow-band filter elements, which are finely tunable and tunable within a broad range, and to realize them as filter elements which are integrated with a high packaging density.

摘要翻译： 用于机械稳定和调谐具有光子晶体结构的滤光器的方法用光子晶体结构制造的滤光器的空腔填充有具有可调折射率的光学透明材料。 通过具有可变场强的电场来调节滤光器的光学特性，并因此调节滤光作用。 可以生产小尺寸的窄带滤光元件，它们可在宽范围内精细调谐和调谐，并将其实现为以高封装密度集成的滤光元件。

公开(公告)号：US6064506A

公开(公告)日：2000-05-16

申请号：US142405

申请日：1998-12-24

申请人： Hans Koops

发明人： Hans Koops

IPC分类号： G02F1/31 ,  B81B1/00 ,  G01Q80/00 ,  G02B6/122 ,  G02F1/01 ,  G02F1/061 ,  G02F1/29 ,  G02F1/295 ,  G02F1/313 ,  G02F1/35 ,  G02B26/00

CPC分类号： G02F1/2955 ,  B81B1/008 ,  B82Y20/00 ,  G02B6/1225 ,  G02F1/3132 ,  B82Y15/00 ,  G02F1/0126 ,  G02F1/061 ,  G02F1/293 ,  G02F2202/022 ,  G02F2202/32 ,  Y10S977/778 ,  Y10S977/781 ,  Y10S977/887

摘要： An optical multipath switch with electrically switchable photonic crystals.The invention involves the construction of optical multipath switches based on electrically switchable photonic crystals.A filled photonic crystal, switchable electrically and/or by light, is used as a tunable mirror. By creating selective optical deformations in the photonic crystal, its properties can be influenced in selected areas in terms of transmission capability. This is done preferably by application of a strong electrical field. Light is coupled in and out via fixed photonic mirrors located at an angle to the photonic crystal.The optical switches of the invention find application in switching networks and serve the purpose of service selection. A very high packing density may be achieved.

摘要翻译： PCT No.PCT / EP97 / 01064 Sec。 371日期1998年12月24日第 102（e）日期1998年12月24日PCT 1997年3月3日PCT公布。 公开号WO97 / 33192 PCT 日期1997年9月12日具有电开关光子晶体的光学多路开关。 本发明涉及基于电可开关的光子晶体的光学多径开关的构造。 可以用电和/或光进行切换的填充光子晶体作为可调镜。 通过在光子晶体中产生选择性光学变形，其在传输能力方面可以在所选区域中影响其性质。 这可以优选地通过施加强电场来实现。 光通过与光子晶体成角度的固定光子镜耦合进出。 本发明的光开关在切换网络中应用，服务于服务选择的目的。 可以实现非常高的包装密度。

公开(公告)号：US20050072753A1

公开(公告)日：2005-04-07

申请号：US10628174

申请日：2003-07-28

申请人： Hans Koops ,  Klaus Edinger

发明人： Hans Koops ,  Klaus Edinger

IPC分类号： H01L21/302 ,  C23F1/00 ,  H01J20060101 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC分类号： H01J37/317 ,  H01J37/3056 ,  H01J2237/31744

摘要： The invention relates to a procedure for etching of materials at the surface by focussed electron beam induced chemical reaction at the surface, with the following steps: a) in a vacuum atmosphere the material which is to be etched is irradiated with at least one beam of molecules and at least one first beam of electrons, whereby the irradiated material and the molecules of the beam of molecules are excited in a way that a chemical reaction takes place and forms a reaction product, which is not gaseous/not volatile—reaction step. The invention is characterized in that b) the reaction product is evaporated from said surface by an second beam of electrons, which heats the material locally to a temperature above the vaporisation temperature of the reaction product —removal step—.

摘要翻译： 本发明涉及通过聚焦电子束在表面引起的化学反应在表面上蚀刻材料的步骤，其具有以下步骤：a）在真空气氛中，待蚀刻的材料用至少一束 分子和至少一个第一电子束，由此照射的材料和分子束的分子以发生化学反应的方式被激发，并形成不是气体/非挥发性反应步骤的反应产物。 本发明的特征在于b）通过第二电子束从所述表面蒸发反应产物，其将该材料局部加热到高于反应产物 - 蒸发步骤的蒸发温度的温度。

公开(公告)号：US06198557B1

公开(公告)日：2001-03-06

申请号：US08882638

申请日：1997-06-25

申请人： Wolfgang Dultz ,  Hans Koops ,  Erna Frins ,  Gerald Meltz

发明人： Wolfgang Dultz ,  Hans Koops ,  Erna Frins ,  Gerald Meltz

IPC分类号： H04J1402

CPC分类号： H04L27/28 ,  H04B10/2504

摘要： A telecommunication system having frequency-dividing optical components where light pulses having different frequencies are coupled out of a optical fiber by fiber grating and/or photonic crystals and imaged by focusing elements outside of the optical fiber. The fiber grating for different frequencies can be used in a single period or in different periods disposed one after the other. The photonic crystals can be used at the optical fiber extremity or etched in a channel or trench in a glass fiber. Delay elements are added to ensure that different frequency light pulses are imaged simultaneously in a given and desired time relation as required for further parallel processing.

摘要翻译： 具有分频光学部件的电信系统，其中具有不同频率的光脉冲通过光纤光栅和/或光子晶体从光纤耦合出来，并通过光纤外部的聚焦元件成像。 用于不同频率的光纤光栅可以在一个接一个地布置的单个周期或不同周期中使用。 光子晶体可以在光纤末端使用或在玻璃纤维中的通道或沟槽中蚀刻。 添加延迟元件以确保按照进一步并行处理所需的给定和期望的时间关系同时对不同频率的光脉冲进行成像。