公开(公告)号：US07355722B2

公开(公告)日：2008-04-08

申请号：US10938408

申请日：2004-09-10

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B11/02 ,  G02B27/10 ,  G02B27/14

CPC分类号： G02B17/086 ,  G01J1/58 ,  G02B17/008 ,  G02B26/06 ,  G02B27/144 ,  G02B27/145

摘要： An imaging system for imaging an object point to an image point, the system including: a beam splitter positioned to receive light rays from the object point and separate each of a plurality of rays into a transmitted portion and a reflected portion, the transmitted portions defining a first set of rays and the reflected portions defining a second set of rays; and an array of independently positionable reflecting elements forming a reflecting surface positioned to receive one of the sets of rays from the beam splitter and focus that set of rays towards the image point via the beam splitter.

摘要翻译： 一种成像系统，用于将物体点成像到图像点，所述系统包括：分束器，其被定位成接收来自所述物体点的光线并将多个光线中的每一个分离成透射部分和反射部分，所述透射部分限定 第一组光线和反射部分限定第二组光线; 以及形成反射表面的可独立定位的反射元件的阵列，其被定位成接收来自分束器的一组射线，并且经由分束器将该组射线聚焦到图像点。

公开(公告)号：US07298496B2

公开(公告)日：2007-11-20

申请号：US11135605

申请日：2005-05-23

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01B9/02002 ,  G01B9/02014 ,  G01B9/02042 ,  G01B9/02072 ,  G01B9/02079 ,  G01B2290/70 ,  G03F9/7034 ,  G03F9/7049

摘要： Methods and apparatus based on optical homodyne displacement interferometry, optical coherent-domain reflectometry (OCDR), and optical interferometric imaging are disclosed for overlay, alignment mark, and critical dimension (CD) metrologies that are applicable to microlithography applications and integrated circuit (IC) and mask fabrication and to the detection and location of defects in/on unpatterned and patterned wafers and masks. The metrologies may also be used in advanced process control (APC), in determination of wafer induced shifts (WIS), and in the determination of optical proximity corrections (OPC).

摘要翻译： 公开了适用于微光刻应用和集成电路（IC）的覆盖，对准标记和临界尺寸（CD）计量的基于光学零差位移干涉测量，光学相干域反射测量（OCDR）和光学干涉成像的方法和装置， 和掩模制造以及在未图案化和图案化的晶片和掩模上/之上的缺陷的检测和定位。 计量学也可用于先进的过程控制（APC），确定晶片诱发位移（WIS）以及在光学邻近校正（OPC）的确定中。

公开(公告)号：US07274468B2

公开(公告)日：2007-09-25

申请号：US11132800

申请日：2005-05-19

申请人： Henry Allen Hill ,  Justin L. Kreuzer

发明人： Henry Allen Hill ,  Justin L. Kreuzer

IPC分类号： G01B9/02

CPC分类号： G01B9/02021 ,  G01B9/02003 ,  G01B9/02027 ,  G01B9/02098 ,  G01B2290/45 ,  G01B2290/70 ,  G01J9/00

摘要： Beam shearing apparatus for introducing a lateral shear between the components of a light beam. The apparatus is an optical assembly having a polarizing interface and input and output facets and two reflecting surfaces one of which is arranged at an angle generally opposite the input facet and the other of which is arranged at an angle generally opposite the output facet.

摘要翻译： 用于在光束的部件之间引入横向剪切的光束剪切装置。 该装置是具有偏振界面和输入和输出小面以及两个反射表面的光学组件，其中一个反射表面以大致与输入小面相对的角度布置，而另一个以大体上与输出小面相对的角度排列。

公开(公告)号：US07133139B2

公开(公告)日：2006-11-07

申请号：US10782057

申请日：2004-02-19

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B9/02

CPC分类号： G01B9/04 ,  G02B21/0024 ,  G02B21/0056 ,  G02B27/108 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145

摘要： A differential interferometric confocal microscope for measuring an object, the microscope including a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spots located in front of an object plane located near where the object is positioned and onto a second array of spots behind the object plane, wherein the first and second arrays of spots are displaced from each other in both a direction normal to the object plane and a direction parallel to the object plane, the interferometer also imaging the first arrays of spots onto a first image plane that is behind the detector-side pinhole array and imaging the second array of spots onto a second image plane that is in front of the detector-side pinhole array wherein each spot of the imaged first array of spots is aligned with a corresponding different spot of the imaged second array of spots and a corresponding different pinhole of the detector-side pinhole array.

摘要翻译： 用于测量物体的差分干涉式共焦显微镜，显微镜包括源极针孔阵列; 检测器侧针孔阵列; 以及干涉仪，其将源侧针孔阵列的针孔阵列成像到位于物体平面附近的物体平面前方的位于第一阵列的位置上，并且位于物平面后面的第二阵列上，其中， 第一和第二阵列阵列在垂直于物平面的方向和平行于物平面的方向上彼此移位，干涉仪还将第一阵列阵列成像到检测器侧后面的第一图像平面上 针孔阵列并将第二阵列阵列成像到位于检测器侧针孔阵列前面的第二图像平面上，其中所成像的第一阵列阵列的每个点与成像的第二阵列阵列的相应不同点对准，以及 检测器侧针孔阵列的相应不同针孔。

公开(公告)号：US06795197B2

公开(公告)日：2004-09-21

申请号：US10175166

申请日：2002-06-19

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B902

CPC分类号： G03F7/70775 ,  G01B9/02003 ,  G01B9/02045 ,  G01B9/02083

摘要： Interferometric apparatus and methodology for monitoring the relative motion among objects, preferably that of mask and wafer stages in photolithographic processes. The apparatus comprises a plurality of interferometers with each operating to provide a mixed optical interference signal containing phase information indicative of the motion of a corresponding object. Electrical interference signals are generated from the optical interference signals, and one of these is modified to compensate for any Doppler shift differences among the electrical interference signals caused by differences in preferred relative rates of motion in the objects. A mixer receives the electrical interference signals and the modified electrical interference signal and generates an output electrical interference signal containing information about the relative motion between objects. In another aspect of the invention the plurality of interferometers are configured to optically compensate for any Doppler shift differences among the mixed optical interference signals.

摘要翻译： 用于监测物体之间的相对运动的干涉仪和方法，优选在光刻工艺中的掩模和晶片台的相对运动。 该装置包括多个干涉仪，每个干涉仪各自操作以提供包含指示相应对象的运动的相位信息的混合光学干涉信号。 电干扰信号是从光学干涉信号产生的，其中之一被修改以补偿由对象中优选的相对运动速度的差异引起的电干扰信号之间的任何多普勒频移差。 混合器接收电干扰信号和修改的电干扰信号，并产生包含关于对象之间的相对运动的信息的输出电干扰信号。 在本发明的另一方面，多个干涉仪被配置为光学地补偿混合光学干涉信号之间的任何多普勒频移差异。

公开(公告)号：US06710884B2

公开(公告)日：2004-03-23

申请号：US09853114

申请日：2001-05-10

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B902

CPC分类号： G03F7/70591 ,  G01B11/2441 ,  G01B11/306 ,  G03F7/70775

摘要： Interferometric apparatus and methods by which the local surface characteristics of photolithographic mirrors or the like may be interferometrically measured in-situ to provide correction signals for enhanced distance and angular measurement accuracy. Surface characterizations along one or multiple datum lines in one or more directions may be made by measuring the angular changes in beams reflected off the surfaces during scanning operations to determine local slope and then integrating the slope to arrive at surface topology. The mirrors may be mounted either on the photolithographic stages or off the photolithographic stages on a reference frame.

摘要翻译： 干涉测量设备和光刻反射镜等的局部表面特性可通过其原位进行干涉测量，以提供用于增强距离和角度测量精度的校正信号。 可以通过在扫描操作期间通过测量从表面反射的光束中的角度变化来测量在一个或多个方向上的一个或多个基准线上的表面特征，以确定局部斜率，然后积分斜率以得到表面拓扑。 反射镜可以安装在光刻平台上或从参考框架上的光刻台上安装。

公开(公告)号：US5917844A

公开(公告)日：1999-06-29

申请号：US960881

申请日：1997-10-30

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G02F1/11 ,  H01S3/106 ,  H01S3/10

CPC分类号： G02F1/116 ,  G02F1/11 ,  G02F2203/07 ,  H01S3/1068

摘要： Electro-optical devices for transforming a single-frequency, linearly polarized input beam from a light source introduced into a multifaceted anisotropic acousto-optical crystal into an output beam having two orthogonally polarized, output beam components that differ in frequency from each other and may be parallel or have a predetermined angle of divergence between them. The energy flux profiles of the output beam components may be spatially separated, partially coextensive, or substantially coextensive in accordance with the birefringence, acoustical, and optical properties of the acousto-optical crystal and/or the use of external elements for particular device embodiments. The input beam is introduced to the acousto-optical crystal for travel through an interactive region where it experiences an acoustic beam that diffracts it via small angle Bragg diffraction to form two orthogonally polarized internal beam components that are separated by a small angle of divergence and subsequently are controlled to become beam components available outside of the acousto-optical crystal for use in downstream applications. Thermal compensation may be provided via the use external phase retardation plates and principles of symmetry, and high diffraction efficiency may be achieved via the use of multiple passes through the interaction zone.

摘要翻译： 用于将引入多方向各向异性声光晶体的光源的单频线性偏振输入光束变换成具有彼此不同频率的两个正交偏振输出光束分量的输出光束的电光装置，并且可以是 平行或具有预定的发散角。 输出光束分量的能量通量分布可以根据声光晶体的双折射，声学和光学性质和/或特定器件实施例的外部元件的使用而在空间上分开，部分共延伸或基本共同延伸。 输入光束被引入到声光晶体中，用于行进通过交互区域，其中它经历通过小角度布拉格衍射衍射它的声束，以形成两个正交偏振的内部光束分量，该分量由小的发散角分隔，随后 被控制成在用于下游应用的声光晶体之外可用的光束分量。 可以通过使用外部相位相位板和对称原理来提供热补偿，并且可以通过使用多次通过相互作用区域来实现高的衍射效率。

公开(公告)号：US07324216B2

公开(公告)日：2008-01-29

申请号：US11208424

申请日：2005-08-19

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B11/02 ,  G03B27/42

CPC分类号： G03F7/70633 ,  G03F7/38 ,  G03F7/70625

摘要： A method of processing a substrate on which a layer of photoresist has been applied, the method involving: exposing the layer of photoresist to radiation that carries spatial information to generate exposure-induced changes in the layer of photoresist that form a pattern having one or more features; and before developing the exposed photoresist, interferometrically obtaining measurements of the pattern in the exposed layer of photoresist for determining at least one of (1) locations of the one or more features of the pattern and (2) magnitudes of the exposure-induced changes.

摘要翻译： 一种处理其上施加有光致抗蚀剂层的基板的方法，所述方法包括：将所述光致抗蚀剂层暴露于承载空间信息的辐射以在所述光致抗蚀剂层中产生曝光引起的变化，所述光致抗蚀剂层形成具有一个或多个 特征; 并且在显影曝光的光致抗蚀剂之前，干涉地获得曝光的光致抗蚀剂层中的图案的测量，以确定（1）图案的一个或多个特征的位置和（2）曝光诱发的变化的大小中的至少一个。

公开(公告)号：US07145663B2

公开(公告)日：2006-12-05

申请号：US11229314

申请日：2005-09-16

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B9/02

CPC分类号： G01B9/02028 ,  G01B9/02022 ,  G01B9/02056 ,  G01J1/58 ,  G01J3/04 ,  G01J3/2823 ,  G01N21/45 ,  G01N21/9501

摘要： An interferometry system including: a first imaging system that directs a measurement beam at an object to produce a return measurement beam from the object, that directs the return measurement beam onto an image plane, and that delivers a reference beam to the image plane; and a beam combining element in the image plane, said beam combining element comprising a first layer containing an array of sagittal slits and a second layer containing an array of tangential slits, wherein each slit of the array of sagittal slits is aligned with a corresponding different slit of the array of tangential slits, wherein the beam combining element combines the return measurement beam with the reference beam to produce an array of interference beams.

公开(公告)号：US06947148B2

公开(公告)日：2005-09-20

申请号：US10201510

申请日：2002-07-23

申请人： Henry Allen Hill

发明人： Henry Allen Hill

IPC分类号： G01B9/02 ,  G01B11/02 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G01B9/02018 ,  G01B9/02061 ,  G01B11/026 ,  G01B2290/15 ,  G01B2290/70

摘要： Interferometric apparatus and method for measuring changes in distance to an object are compensated for the presence of undesirable phase shifts in measurement beams that result from their interacting with non-polarization preserving optical elements in at least one interferometer measurement leg. Compensation is provided by phase plates, multi-order phase plates set at a predetermined angle with respect to beam components, coatings on reflecting surfaces, or a segmented phase plate at least part of which is rotated with respect to polarized beam components, and combinations thereof. Compensation is provided in interferometers having measurement legs folded with reflecting surfaces that cause relative phase shifts in propagating polarized beams because of non-normal incidence. Compensation is also provided in upward and downward looking interferometers for measuring altitude and changes in altitude to a surface such as a translating wafer stage of a photolithographic exposure apparatus.

摘要翻译： 用于测量到物体的距离的变化的干涉测量装置和方法被补偿在与至少一个干涉仪测量腿中的非偏振保留光学元件相互作用的测量光束中存在不期望的相移。 补偿由相位板，相对于光束分量预定角度设置的多阶相位板，反射表面上的涂层或至少部分相对于偏振光束分量旋转的分段相位板及其组合提供 。 在具有被反射表面折叠的测量腿的干涉仪中提供补偿，这些反射表面由于非正常入射而引起传播偏振光束的相对相移。 向上和向下观察的干涉仪还提供用于测量高度和高度变化到诸如光刻曝光设备的平移晶片台的表面的补偿。