公开(公告)号：US20150227187A1

公开(公告)日：2015-08-13

申请号：US14614492

申请日：2015-02-05

申请人： Tae Min JEONG ,  Hyun Wook LEE ,  Jae Chun PARK ,  Soon Jae WON

发明人： Tae Min JEONG ,  Hyun Wook LEE ,  Jae Chun PARK ,  Soon Jae WON

IPC分类号： G06F1/32

CPC分类号： G06F1/325 ,  G06F1/3203 ,  G06F1/3206 ,  G06F1/3287 ,  Y02D10/171 ,  Y02D50/20

摘要： A data storage device includes a central processing unit (CPU); a peripheral device; a power management unit (PMU) configured to control a power supply to the CPU and the peripheral device; and a receiver configured to transmit a second signal to the PMU through a second transmission path after transmitting a first signal to the CPU through a first transmission path, the receiver being configured such that the first and second signals transmitted by the receiver are signals that were output from a host.

摘要翻译： 数据存储装置包括中央处理单元（CPU）; 外围设备; 电源管理单元（PMU），被配置为控制对CPU和外围设备的电力供应; 以及接收器，被配置为通过第一传输路径将第一信号发送到CPU之后通过第二传输路径将第二信号发送到所述PMU，所述接收器被配置为使得由所述接收器发送的所述第一和第二信号是 从主机输出。

公开(公告)号：US20120056637A1

公开(公告)日：2012-03-08

申请号：US13218323

申请日：2011-08-25

申请人： Young Woo JEONG ,  Hyun Wook LEE

发明人： Young Woo JEONG ,  Hyun Wook LEE

IPC分类号： G01R31/00

CPC分类号： H02H3/44 ,  H02H1/0023 ,  H02H1/0092

摘要： An apparatus for quickly determining a fault in an electric power system includes a current transformer, a current determination unit and a fault determination unit. The current transformer detects current supplied to the electric power system and outputs a current detection voltage. The current determination unit respectively compares the current detection voltage, the first-order differential voltage of the current detection voltage and the second-order differential voltage of the current detection voltage with predetermined first, second and third reference voltages. The fault determination unit determines whether a fault occurs based on the compared result of the current determination unit and generates a trip signal when it is determined that the fault has occurred.

摘要翻译： 用于快速确定电力系统中的故障的装置包括电流互感器，电流确定单元和故障确定单元。 电流互感器检测提供给电力系统的电流并输出电流检测电压。 电流确定单元分别将电流检测电压，电流检测电压的一阶差分电压和电流检测电压的二阶差分电压与预定的第一，第二和第三参考电压进行比较。 故障确定单元基于当前确定单元的比较结果来确定是否发生故障，并且当确定发生故障时，生成跳闸信号。

公开(公告)号：US07677199B2

公开(公告)日：2010-03-16

申请号：US10485900

申请日：2002-12-30

申请人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha

发明人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha

IPC分类号： C23C16/50 ,  C23C16/509 ,  C23C16/458 ,  C23C16/52 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/4411 ,  C23C16/50

摘要： A surface treatment system is disclosed to form a deposition layer at a surface of an object of surface treatment by using a deposition reaction in which an electrode (110) for applying power to form a deposition reaction in the deposition chamber (100) is installed between an inner wall (120) of the deposition chamber (100) and an object of surface treatment (900) and further includes a cooling unit (200) installed at the inner wall (120) of the deposition chamber (100) facing the electrode (110) and cooling ambient thereof.

摘要翻译： 公开了一种表面处理系统，通过使用沉积反应在表面处理对象的表面上形成沉积层，其中用于在沉积室（100）中施加电力以形成沉积反应的电极（110）安装在 沉积室（100）的内壁（120）和表面处理物（900），还包括安装在沉积室（100）的面向电极（100）的内壁（120）处的冷却单元（200） 110）及其冷却环境。

公开(公告)号：US07572339B2

公开(公告)日：2009-08-11

申请号：US10486031

申请日：2002-12-28

申请人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha ,  Hyun-Woo Jun

发明人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha ,  Hyun-Woo Jun

IPC分类号： C23C16/00

CPC分类号： C23C16/458 ,  C23C16/54

摘要： Disclosed are a surface treatment system that includes a deposition chamber (100) for forming a deposition layer at a surface of an object of surface treatment (900); a carrier (910) for carrying the object of surface treatment (900) by mounting thereon, and a power applying unit (230) for forming a deposition reaction by applying a power to the object in the deposition chamber (100), wherein the power applying unit (230) includes a fixed power applying unit (220) installed in the deposition chamber (100) and connected to an external power source (210); and a movable power applying unit (230) installed at the carrier (910) for being electrically connected to the fixed power applying unit (220) movably as the carrier on which the object of surface treatment (900) is mounted goes into the deposition chamber and thereby applying a power to the object of surface treatment mounted on the carrier by contacting thereto.

摘要翻译： 公开了一种表面处理系统，其包括用于在表面处理物体（900）的表面处形成沉积层的沉积室（100）; 用于通过安装其上承载表面处理物体（900）的载体（910）和用于通过向沉积室（100）中的物体施加电力来形成沉积反应的动力施加单元（230），其中， 施加单元（230）包括安装在所述沉积室（100）中并连接到外部电源（210）的固定供电单元（220）。 以及安装在所述载体（910）上的用于电连接到所述固定电力施加单元（220）的可动电力施加单元（230），所述固定电力施加单元（220）可移动地作为其上安装有所述表面处理（900）的物体的载体进入所述沉积室 从而通过与载体接触而对安装在载体上的表面处理对象施加电力。

公开(公告)号：USD683630S1

公开(公告)日：2013-06-04

申请号：US29422237

申请日：2012-05-17

申请人： Hyun Wook Lee ,  Hyuk Lyul Kwon ,  Seo Young Kim ,  Soo Kyung Lee

设计人： Hyun Wook Lee ,  Hyuk Lyul Kwon ,  Seo Young Kim ,  Soo Kyung Lee

公开(公告)号：US07597109B2

公开(公告)日：2009-10-06

申请号：US11360417

申请日：2006-02-24

申请人： Hyun-Wook Lee

发明人： Hyun-Wook Lee

IPC分类号： B08B3/02

CPC分类号： H01L21/67766 ,  H01L21/67742 ,  H01L21/67748 ,  Y10S134/902

摘要： A spin scrubber apparatus has an index unit configured to support one or more cassettes, a processing unit having one or more cleaning stations facing the index unit across a transfer space, and a substrate transfer device disposed in the transfer space for transferring substrates one-by-one between the index unit and the processing unit. The transfer device includes a transfer block, and an index arm and a transfer arm unit supported by the transfer block. The transfer block is movable in the transfer space to position the index arm or the transfer arm unit in front of a cassette or a spin scrubber. The index arm loads/unloads substrates into/from a cassette mounted to the index unit. The transfer arm loads/unloads substrates into/from the processing unit. All of the movement takes place in the transfer space. Thus, the apparatus is compact, and it takes relatively little time to clean the substrates.

摘要翻译： 旋转洗涤器装置具有构造成支撑一个或多个盒的标号单元，具有一个或多个清洁站的处理单元，所述清洁站在传送空间上面向着折射单元，以及设置在传送空间中的基板传送装置，用于一次性地传送基板 在索引单元和处理单元之间。 传送装置包括传送块和由传送块支撑的分度臂和传送臂单元。 传送块可在传送空间中移动，以将索引臂或传送臂单元定位在盒或旋转洗涤器的前面。 索引臂装载/卸载安装到索引单元的盒中/从装载到盒的盒中卸载基板。 传送臂将基板装入/卸载处理单元。 所有的运动发生在传送空间。 因此，该装置是紧凑的，并且清洁基板所需的时间相对较少。

公开(公告)号：US20070110636A1

公开(公告)日：2007-05-17

申请号：US11439292

申请日：2006-05-24

申请人： Hyun-Wook Lee ,  Bong-Chun Cho

发明人： Hyun-Wook Lee ,  Bong-Chun Cho

IPC分类号： B32B5/02

CPC分类号： H01L21/67253 ,  G05D7/0635 ,  H01L21/67017 ,  H01L21/67288

摘要： A reaction gas supplying comprising an MFC and adapted to sense when there is an error in the MFC, and a related method are disclosed. The reaction gas supplying device comprises a gas supply line disposed between a process chamber and a gas supplying element, a mass flow controller adapted to control a supply amount and a supply time of a gas, and a digital pressure gauge adapted to measure the pressure of the gas. The device further comprises a database, and a controller adapted to generate and output a first flow rate control signal, compare the measured pressure value of the gas with a standard pressure value stored in the database corresponding to the first flow rate control signal, and output an alarm generation control signal when the measured pressure value of the gas is outside of a set error range around the standard pressure value.

摘要翻译： 一种反应气体供给，包括MFC并适于检测MFC中是否存在误差的反应气体，以及相关方法。 反应气体供给装置包括设置在处理室和气体供给元件之间的气体供给管线，适于控制气体的供给量和供给时间的质量流量控制器，以及适于测量气体的压力的数字式压力计 气体。 该装置还包括数据库，以及控制器，其适于生成并输出第一流量控制信号，将测得的气体压力值与存储在与第一流量控制信号对应的数据库中的标准压力值进行比较，并输出 当所测量的气体压力值在围绕标准压力值的设定误差范围之外时的报警发生控制信号。

公开(公告)号：US07175880B2

公开(公告)日：2007-02-13

申请号：US10496219

申请日：2002-12-28

申请人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha ,  Hyun-Woo Jun

发明人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha ,  Hyun-Woo Jun

IPC分类号： C23C16/00

CPC分类号： C23C16/45563 ,  C23C16/4412 ,  C23C16/455 ,  C23C16/54

摘要： A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object or surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.

摘要翻译： 一种表面处理系统，其中用于沉积反应的气体被注入沉积室并施加功率以形成沉积反应以在物体表面处理沉积层或表面处理，其中所述沉积室具有多个沉积 平行布置的空间和用于将沉积反应之后的每个沉积空间的一个或多个表面处理物体输送到每个沉积空间或排放表面处理物体的输送单元。

公开(公告)号：US20060231127A1

公开(公告)日：2006-10-19

申请号：US11360417

申请日：2006-02-24

申请人： Hyun-Wook Lee

发明人： Hyun-Wook Lee

IPC分类号： B08B3/02

CPC分类号： H01L21/67766 ,  H01L21/67742 ,  H01L21/67748 ,  Y10S134/902

摘要： A spin scrubber apparatus has an index unit configured to support one or more cassettes, a processing unit having one or more cleaning stations facing the index unit across a transfer space, and a substrate transfer device disposed in the transfer space for transferring substrates one-by-one between the index unit and the processing unit. The transfer device includes a transfer block, and an index arm and a transfer arm unit supported by the transfer block. The transfer block is movable in the transfer space to position the index arm or the transfer arm unit in front of a cassette or a spin scrubber. The index arm loads/unloads substrates into/from a cassette mounted to the index unit. The transfer arm loads/unloads substrates into/from the processing unit. All of the movement takes place in the transfer space. Thus, the apparatus is compact, and it takes relatively little time to clean the substrates.

公开(公告)号：US20050051090A1

公开(公告)日：2005-03-10

申请号：US10496219

申请日：2002-12-28

申请人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha ,  Hyun-Woo Jun

发明人： Cheon-Soo Cho ,  Dong-Sik Youn ,  Hyun-Wook Lee ,  Samchul Ha ,  Hyun-Woo Jun

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/54 ,  C23C16/00

CPC分类号： C23C16/45563 ,  C23C16/4412 ,  C23C16/455 ,  C23C16/54

摘要： A surface treatment system in which gas for a deposition reaction is injected into a deposition chamber and power is applied to form a deposition reaction to form a deposition layer at a surface of an object or surface treatment, wherein the deposition chamber has a plurality of deposition spaces disposed in parallel and a convey unit for conveying one or more objects of surface treatment to each deposition space or discharging the objects of surface treatment from each deposition space after a deposition reaction.

摘要翻译： 一种表面处理系统，其中用于沉积反应的气体被注入沉积室并施加功率以形成沉积反应以在物体表面处理沉积层或表面处理，其中所述沉积室具有多个沉积 平行布置的空间和用于将沉积反应之后的每个沉积空间的一个或多个表面处理物体输送到每个沉积空间或排放表面处理物体的输送单元。