Method for producing a multilayer interconnection structure
    5.
    发明授权
    Method for producing a multilayer interconnection structure 失效
    多层互连结构的制造方法

    公开(公告)号:US6030854A

    公开(公告)日:2000-02-29

    申请号:US111268

    申请日:1998-07-06

    IPC分类号: H01L21/56 H01L21/60 H01L23/48

    摘要: An apparatus and method for forming solder interconnection structures that reduce thermo-mechanical stresses at the solder joints of a semiconductor device and its supporting substrate. In one embodiment, the solder interconnection structure of the present invention comprises a semiconductor device and a substrate having a plurality of solder connections extending from the substrate to electrodes or bond pads on the semiconductor device. A multilayer structure is disposed between the semiconductor device and substrate filling the gap formed by the solder connections. The multilayer structure includes a first layer and a second layer, each having a different coefficient of thermal expansion. Thus, in accordance with the present invention, the stress concentration points are moved away from the solder joints of the semiconductor device and substrate to a point located between the first and second layers of the filler structure.

    摘要翻译: 一种用于形成焊接互连结构的装置和方法,其减少半导体器件及其支撑衬底的焊点处的热机械应力。 在一个实施例中,本发明的焊料互连结构包括半导体器件和具有从衬底延伸到半导体器件上的电极或接合焊盘的多个焊接连接的衬底。 在半导体器件和填充由焊料连接形成的间隙的衬底之间设置多层结构。 多层结构包括第一层和第二层,每层具有不同的热膨胀系数。 因此,根据本发明,应力集中点从半导体器件和衬底的焊接点移动到位于填料结构的第一和第二层之间的点。

    Multiregion solder interconnection structure
    7.
    发明授权
    Multiregion solder interconnection structure 失效
    多轨焊料互连结构

    公开(公告)号:US5880530A

    公开(公告)日:1999-03-09

    申请号:US625797

    申请日:1996-03-29

    摘要: An apparatus and method for forming solder interconnection structures that reduce thermo-mechanical stresses at the solder joints of a semiconductor device and its supporting substrate. In one embodiment, the solder interconnection structure of the present invention comprises a semiconductor device and a substrate having a plurality of solder connections extending from the substrate to electrodes or bond pads on the semiconductor device. A multilayer structure is disposed between the semiconductor device and substrate filling the gap formed by the solder connections. The multilayer structure includes a first layer and a second layer, each having a different coefficient of thermal expansion. Thus, in accordance with the present invention, the stress concentration points are moved away from the solder joints of the semiconductor device and substrate to a point located between the first and second layers of the filler structure.

    摘要翻译: 一种用于形成焊接互连结构的装置和方法,其减少半导体器件及其支撑衬底的焊点处的热机械应力。 在一个实施例中,本发明的焊料互连结构包括半导体器件和具有从衬底延伸到半导体器件上的电极或接合焊盘的多个焊接连接的衬底。 在半导体器件和填充由焊料连接形成的间隙的衬底之间设置多层结构。 多层结构包括第一层和第二层,每层具有不同的热膨胀系数。 因此,根据本发明,应力集中点从半导体器件和衬底的焊接点移动到位于填料结构的第一和第二层之间的点。