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    METHOD AND APPARATUS FOR FLUID PROCESSING A WORKPIECE
    3.
    发明申请
    METHOD AND APPARATUS FOR FLUID PROCESSING A WORKPIECE 有权
    流体加工工艺的方法和装置

    公开(公告)号：US20120103799A1

    公开(公告)日：2012-05-03

    申请号：US13275158

    申请日：2011-10-17

    申请人： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

    发明人： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

    IPC分类号： C25D17/00

    CPC分类号： C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

    摘要： A workpiece holder for fluid processing a workpiece including a transportable frame, a flexible member connected to the frame and defining at least one retaining feature, and a ring comprising at least one engagement feature engageable with the at least one retaining feature of the flexible member, wherein the flexible member is flexed to provide a force to the at least one engagement feature to cause the ring to form a barrier to fluid entry with the workpiece.

    摘要翻译： 一种用于流体处理工件的工件保持器，包括可运输框架，连接到框架并限定至少一个保持特征的柔性构件，以及包括可与柔性构件的至少一个保持结构接合的至少一个接合特征的环， 其中所述柔性构件弯曲以向所述至少一个接合特征提供力，以使所述环形成与所述工件的流体入口的阻挡。

    Balancing pressure to improve a fluid seal
    4.
    发明申请
    Balancing pressure to improve a fluid seal 失效
    平衡压力以改善流体密封

    公开(公告)号：US20060110536A1

    公开(公告)日：2006-05-25

    申请号：US11265543

    申请日：2005-11-02

    申请人： Arthur Keigler ,  Qunwei Wu ,  Zhenqiu Liu ,  John Harrell

    发明人： Arthur Keigler ,  Qunwei Wu ,  Zhenqiu Liu ,  John Harrell

    IPC分类号： B05D5/00 ,  B05D1/18 ,  B05D3/00

    CPC分类号： H01L21/67126 ,  C25D5/003 ,  C25D7/123 ,  C25D17/001 ,  C25D21/12 ,  H01L21/67023

    摘要： A method and apparatus for fluid sealing a workpiece retained by a workpiece holder are described. A pressure differential can be formed across a fluid seal to counteract fluid attempting to penetrate the fluid seal, which can contaminate the underside of the workpiece. The apparatus can include a ring forming a barrier to fluid entry with the workpiece and a source providing pressure to form the pressure differential. The pressure or the pressure differential can counteract hydroscopic fluid pressure or hydrostatic fluid pressure that is acting to force fluid through the barrier between the ring and the workpiece.

    摘要翻译： 描述了用于流体密封由工件保持器保持的工件的方法和装置。 可以跨流体密封件形成压力差，以抵消试图渗透流体密封件的流体，这可能污染工件的下侧。 该装置可以包括形成与流体进入工件的阻挡物的环和提供压力以形成压力差的源。 压力或压力差可抵消吸入液体压力或静压流体压力，其作用是迫使流体通过环和工件之间的阻挡层。

    Method and apparatus for fluid processing a workpiece
    6.
    发明授权
    Method and apparatus for fluid processing a workpiece 有权
    流体处理工件的方法和装置

    公开(公告)号：US08277624B2

    公开(公告)日：2012-10-02

    申请号：US13275158

    申请日：2011-10-17

    申请人： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

    发明人： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

    IPC分类号： C25B9/02

    CPC分类号： C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

    摘要： A workpiece holder for fluid processing a workpiece including a transportable frame, a flexible member connected to the frame and defining at least one retaining feature, and a ring comprising at least one engagement feature engageable with the at least one retaining feature of the flexible member, wherein the flexible member is flexed to provide a force to the at least one engagement feature to cause the ring to form a barrier to fluid entry with the workpiece.

    摘要翻译： 一种用于流体处理工件的工件保持器，包括可运输框架，连接到框架并限定至少一个保持特征的柔性构件，以及包括可与柔性构件的至少一个保持结构接合的至少一个接合特征的环， 其中所述柔性构件弯曲以向所述至少一个接合特征提供力，以使所述环形成与所述工件的流体入口的阻挡。

    Method for fluid processing a workpiece
    9.
    发明授权
    Method for fluid processing a workpiece 有权
    流体处理工件的方法

    公开(公告)号：US08512543B2

    公开(公告)日：2013-08-20

    申请号：US12963991

    申请日：2010-12-09

    申请人： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

    发明人： Arthur Keigler ,  John Harrell ,  Zhenqiu Liu ,  Qunwei Wu

    IPC分类号： C25D5/08 ,  C25D7/12 ,  H01L21/00

    CPC分类号： C25D17/001 ,  C25D5/003 ,  C25D7/123 ,  C25D17/005 ,  C25D17/06 ,  C25D21/10 ,  C25D21/12 ,  H01L21/67023 ,  H01L21/67126

    摘要： A method of fluid processing a semiconductor workpiece, including disposing a workpiece holder with a housing capable of containing a fluid, the workpiece holder retaining the workpiece, providing an agitation system connected to the housing and comprising a member disposed within the housing adjacent the workpiece holder, and agitating the fluid by moving the member substantially parallel to a surface of the workpiece with a non-uniform oscillatory motion, the non-uniform oscillatory motion being a series of substantially continuous geometrically asymmetric oscillations wherein each consecutive oscillation of the series is geometrically asymmetric having at least two substantially continuous opposing strokes wherein reversal positions of each substantially continuous stroke of the substantially continuous asymmetric oscillation are disposed asymmetrically with respect to a center point of each immediately preceding substantially continuous stroke of the oscillation.

    摘要翻译： 一种流体处理半导体工件的方法，包括将具有能够容纳流体的壳体布置在工件夹持器上，保持工件的工件保持器，提供连接到壳体的搅拌系统，并且包括设置在壳体内的邻近工件保持器的构件 并且通过以非均匀的振荡运动基本上平行于工件的表面移动构件来搅动流体，该非均匀振荡运动是一系列基本上连续的几何非对称振荡，其中该系列的每个连续振荡是几何不对称的 具有至少两个基本上连续的相对冲程，其中基本上连续的不对称振荡的每个基本上连续行程的反转位置相对于振荡的每个紧接在前的基本上连续的行程的中心点非对称地设置。