公开(公告)号：US08733592B2

公开(公告)日：2014-05-27

申请号：US13376179

申请日：2010-06-02

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： B67D1/00 ,  B67D7/14

CPC分类号： B67D1/1281 ,  B08B9/055 ,  B67D1/0005 ,  B67D1/07 ,  B67D1/0842 ,  B67D1/0888 ,  B67D1/1245 ,  B67D1/1247

摘要： A liquid supply system capable of being serviced and hygienically maintained easily. A beer storage barrel switching device (12) uninterruptedly supplies beer by switching between beer storage barrels (21-1, 21-2). A first connection tube (23-1) is provided with a fluid stopper device (31-1) including a loop section. The fluid stopper device (31-1) switches between a suppliable state in which it is possible to supply the beer to a dispenser (11) through the first connection tube (23-1) and a non-suppliable state in which it is not possible to supply the beer. Using the fluid stopper device (31-1) eliminates the need to provide a conventional valve in the middle of the first connection tube (23-1), the conventional valve having a structural element which comes in direct contact with the beer. Accordingly, the case that a cleaning member, such as a sponge, is caught by the valve does not occur, and this enables the inner wall of the first connection tube (23-1) to be cleaned using the cleaning member. As a result, a beverage, such as beer, can be easily maintained hygienically and served.

摘要翻译： 能够容易地维护和卫生维护的液体供应系统。 啤酒储存桶切换装置（12）通过在啤酒储存桶（21-1,21-2）之间切换来不间断地供应啤酒。 第一连接管（23-1）设置有包括环路部分的流体阻塞装置（31-1）。 流体阻塞装置（31-1）在可以通过第一连接管（23-1）向分配器（11）供应啤酒的可供应状态和不可供应状态之间切换 可能供应啤酒。 使用流体阻塞装置（31-1）消除了在第一连接管（23-1）的中间提供常规阀的需要，常规阀具有与啤酒直接接触的结构元件。 因此，不会发生诸如海绵等清洁部件被阀卡住的情况，这使得能够使用清洁部件清洁第一连接管（23-1）的内壁。 因此，诸如啤酒之类的饮料可以容易地保持卫生和服务。

公开(公告)号：US08703400B2

公开(公告)日：2014-04-22

申请号：US13041935

申请日：2011-03-07

申请人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

发明人： Kenji Tsutsumi ,  Junichi Kitano ,  Osamu Miyahara ,  Hideharu Kyouda

IPC分类号： G03F7/26

CPC分类号： H01L21/67225 ,  H01L21/67051 ,  H01L21/6715 ,  Y10S414/136 ,  Y10S414/141

摘要： In the coating treatment apparatus, in a first treatment chamber, the front and rear surfaces of the substrate held by a transfer arm are inverted by a turning mechanism, and a coating solution is applied from a coating nozzle to the rear surface of the substrate. The substrate is transferred into a second treatment chamber, in which the coating solution on the rear surface is heated by a heating unit to cure, thereby forming a coating film on the rear surface of the substrate. The formation of the coating film by the coating treatment apparatus is performed before exposure processing, whereby the rear surface of the substrate can be flat for the exposure processing.

摘要翻译： 在涂布处理装置中，在第一处理室中，由转印臂保持的基板的前表面和后表面通过转动机构反转，并且涂布溶液从涂布喷嘴施加到基板的后表面。 将基板转移到第二处理室中，其中通过加热单元将后表面上的涂布溶液加热固化，从而在基板的后表面上形成涂膜。 在曝光处理之前，通过涂布处理装置形成涂膜，由此基板的后表面可以平坦地进行曝光处理。

公开(公告)号：US20120161906A1

公开(公告)日：2012-06-28

申请号：US13332709

申请日：2011-12-21

申请人： Junichi KITANO ,  Haruo IKEDA ,  Shunsaku KOGA

发明人： Junichi KITANO ,  Haruo IKEDA ,  Shunsaku KOGA

IPC分类号： H01P7/04

CPC分类号： H01P1/2053

摘要： A resonant circuit includes a plurality of cables, each of which including: an outer conductor made of a conductive material in a cylindrical manner; an inner conductor, made of a conductive material in an elongated manner, and disposed inside of the outer conductor; and an insulator disposed between the outer conductor and the inner conductor. The plurality of cables is disposed in series in a circular manner. The inner conductor, provided in one of adjacently disposed cables among the plurality of cables, is conductively connected to the outer conductor of another of the adjacently disposed cable.

摘要翻译： 谐振电路包括多个电缆，每个电缆包括：由导电材料制成的外导体，其为圆柱形; 由导电材料制成的内导体，并且设置在外导体的内部; 以及设置在外导体和内导体之间的绝缘体。 多个电缆以圆形方式串联布置。 设置在多个电缆中的相邻布置的电缆之一中的内部导体导电地连接到相邻布置的电缆的另一个的外部导体。

公开(公告)号：US20120085781A1

公开(公告)日：2012-04-12

申请号：US13376179

申请日：2010-06-02

申请人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

发明人： Junichi Kitano ,  Takashi Wada ,  Kenji Kusunoki

IPC分类号： B67D1/00

CPC分类号： B67D1/1281 ,  B08B9/055 ,  B67D1/0005 ,  B67D1/07 ,  B67D1/0842 ,  B67D1/0888 ,  B67D1/1245 ,  B67D1/1247

摘要： A liquid supply system capable of being serviced and hygienically maintained easily. A beer storage barrel switching device (12) uninterruptedly supplies beer by switching between beer storage barrels (21-1, 21-2). A first connection tube (23-1) is provided with a fluid stopper device (31-1) including a loop section. The fluid stopper device (31-1) switches between a suppliable state in which it is possible to supply the beer to a dispenser (11) through the first connection tube (23-1) and a non-suppliable state in which it is not possible to supply the beer. Using the fluid stopper device (31-1) eliminates the need to provide a conventional valve in the middle of the first connection tube (23-1), the conventional valve having a structural element which comes in direct contact with the beer. Accordingly, the case that a cleaning member, such as a sponge, is caught by the valve does not occur, and this enables the inner wall of the first connection tube (23-1) to be cleaned using the cleaning member. As a result, a beverage, such as beer, can be easily maintained hygienically and served.

摘要翻译： 能够容易地维护和卫生维护的液体供应系统。 啤酒储存桶切换装置（12）通过在啤酒储存桶（21-1,21-2）之间切换来不间断地供应啤酒。 第一连接管（23-1）设置有包括环路部分的流体阻塞装置（31-1）。 流体阻塞装置（31-1）在可以通过第一连接管（23-1）向分配器（11）供应啤酒的可供应状态和不可供应状态之间切换 可能供应啤酒。 使用流体阻塞装置（31-1）消除了在第一连接管（23-1）的中间提供常规阀的需要，常规阀具有与啤酒直接接触的结构元件。 因此，不会发生诸如海绵等清洁部件被阀卡住的情况，这使得能够使用清洁部件清洁第一连接管（23-1）的内壁。 因此，诸如啤酒之类的饮料可以容易地保持卫生和服务。

公开(公告)号：US08083959B2

公开(公告)日：2011-12-27

申请号：US11958839

申请日：2007-12-18

申请人： Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

发明人： Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

IPC分类号： B44C1/22

CPC分类号： H01L21/31144 ,  H01L21/67207

摘要： In the present invention, a plurality of rounds of patterning are performed on a substrate. In a patterning system, the substrate on which a first round of patterning has been performed is transferred to a planarizing film forming unit, where a planarizing film is formed above the substrate. The substrate is then transferred to the patterning system and subjected to a second round of patterning. The time from the completion of the forming processing of the planarizing film to the start of the second round of patterning is managed to be constant among the substrates. According to the present invention, in the pattern forming processing of performing a plurality of rounds of patterning, a pattern with a desired dimension can be stably formed above the substrate.

摘要翻译： 在本发明中，在基板上进行多次图案化。 在图案形成系统中，已经进行了第一轮图案化的基板被转印到平坦化膜形成单元，其中在基板上形成平坦化膜。 然后将衬底转移到图案化系统并进行第二轮图案化。 从平面化膜的成形处理完成到第二轮图案化开始的时间被控制为在基板之间是恒定的。 根据本发明，在进行多次图案化的图案形成处理中，可以稳定地在基板上方形成具有期望尺寸的图案。

公开(公告)号：US20080284989A1

公开(公告)日：2008-11-20

申请号：US12216751

申请日：2008-07-10

申请人： Yuko Ono ,  Junichi Kitano

发明人： Yuko Ono ,  Junichi Kitano

IPC分类号： G03B27/52

CPC分类号： G03D5/00 ,  G03F7/3028 ,  G03F7/322 ,  Y10S134/902

摘要： In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

公开(公告)号：US07401988B2

公开(公告)日：2008-07-22

申请号：US11673257

申请日：2007-02-09

申请人： Takayuki Katano ,  Hidefumi Matsui ,  Junichi Kitano ,  Yo Suzuki ,  Masami Yamashita ,  Toru Aoyama ,  Hiroyuki Iwaki ,  Satoru Shimura

发明人： Takayuki Katano ,  Hidefumi Matsui ,  Junichi Kitano ,  Yo Suzuki ,  Masami Yamashita ,  Toru Aoyama ,  Hiroyuki Iwaki ,  Satoru Shimura

IPC分类号： G03D5/00 ,  B05C11/00

CPC分类号： H01L21/67178 ,  G03F7/70991 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67778 ,  Y10T29/41

摘要： On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective areas are provided at the bottom of the respective areas. The atmospheres in the respective areas are maintained in a clean condition by supplying the inert gas not containing impurities such as oxygen and fine particles from the respective gas supply sections into the respective areas and exhausting the atmospheres in the respective areas from the exhaust pipes.

摘要翻译： 在涂覆和显影处理系统中由分隔板，即盒式磁带站，加工站和界面部分划分的各个区域之上，提供用于向各个区域供应惰性气体的气体供应部分。 在各个区域的底部设置用于各区域的排气的排气管。 通过将不含杂质的惰性气体（例如氧气和细颗粒）从各个气体供应区域供应到各个区域中并且从排气管排出各个区域中的气氛，将各个区域中的气氛保持在清洁状态。

公开(公告)号：US07208066B2

公开(公告)日：2007-04-24

申请号：US10649780

申请日：2003-08-28

申请人： Junichi Kitano ,  Yuji Matsuyama ,  Takahiro Kitano ,  Takayuki Katano ,  Hidefumi Matsui ,  Yo Suzuki ,  Masami Yamashita ,  Toru Aoyama ,  Hiroyuki Iwaki ,  Satoru Shimura ,  Masatoshi Deguchi ,  Kousuke Yoshihara ,  Naruaki Iida

发明人： Junichi Kitano ,  Yuji Matsuyama ,  Takahiro Kitano ,  Takayuki Katano ,  Hidefumi Matsui ,  Yo Suzuki ,  Masami Yamashita ,  Toru Aoyama ,  Hiroyuki Iwaki ,  Satoru Shimura ,  Masatoshi Deguchi ,  Kousuke Yoshihara ,  Naruaki Iida

IPC分类号： C23F1/00 ,  H01L21/306 ,  B05C11/00

CPC分类号： H01L21/67178 ,  G03F7/70991 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67161 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67778 ,  Y10T29/41

摘要： On top of respective areas divided by partition plates, that is, a cassette station, a processing station, and an interface section in a coating and developing processing system, gas supply sections for supplying an inert gas into the respective areas are provided. Exhaust pipes for exhausting atmospheres in the respective areas are provided at the bottom of the respective areas. The atmospheres in the respective areas are maintained in a clean condition by supplying the inert gas not containing impurities such as oxygen and fine particles from the respective gas supply sections into the respective areas and exhausting the atmospheres in the respective areas from the exhaust pipes.

摘要翻译： 在涂覆和显影处理系统中由分隔板，即盒式磁带站，加工站和界面部分划分的各个区域之上，提供用于向各个区域供应惰性气体的气体供应部分。 在各个区域的底部设置用于各区域的排气的排气管。 通过将不含杂质的惰性气体（例如氧气和细颗粒）从各个气体供应区域供应到各个区域中并且从排气管排出各个区域中的气氛，将各个区域中的气氛保持在清洁状态。

公开(公告)号：US20070072092A1

公开(公告)日：2007-03-29

申请号：US11515800

申请日：2006-09-06

申请人： Takeshi Shimoaoki ,  Junichi Kitano

发明人： Takeshi Shimoaoki ,  Junichi Kitano

IPC分类号： B08B3/00 ,  B08B7/00 ,  G03F1/00

CPC分类号： H01L21/67051 ,  G03F7/425 ,  H01L21/6715

摘要： In the present invention, in a rinse treatment method of cleaning a substrate after an exposed pattern thereon has been subjected to developing treatment, the following steps are performed such as supplying pure water onto the substrate to clean the substrate with the pure water; supplying a first rinse solution composed of a surfactant with a predetermined concentration onto the substrate to clean the substrate with the first rinse solution; and supplying a second rinse solution composed of a surfactant with a concentration lower than that of the first rinse solution onto the substrate to clean the substrate with the second rinse solution. According to the present invention, in the rinse treatment of the substrate after developing treatment, it is possible to dry the substrate without causing pattern collapse to restrain variation in pattern line width, and to reduce the remaining precipitation-based defects to increase the productivity.

摘要翻译： 在本发明中，在对曝光图案进行显影处理后的基板的清洗处理方法中，进行如下步骤，例如向基板供给纯水，用纯水清洗基板; 将由预定浓度的表面活性剂组成的第一冲洗溶液供应到所述基材上以用所述第一冲洗溶液清洗所述基材; 以及将由表面活性剂组成的浓度低于第一冲洗溶液的表面活性剂的第二冲洗溶液供应到基材上，以用第二冲洗溶液清洗基材。 根据本发明，在显影处理后的基板的漂洗处理中，可以在不引起图案塌陷的情况下干燥基板，抑制图​​案线宽度的变化，并且减少剩余的基于沉淀的缺陷以提高生产率。

公开(公告)号：US20050130445A1

公开(公告)日：2005-06-16

申请号：US11042199

申请日：2005-01-26

申请人： Hidefumi Matsui ,  Junichi Kitano

发明人： Hidefumi Matsui ,  Junichi Kitano

IPC分类号： G03F7/38 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  C23C16/00 ,  H01L21/31 ,  H01L21/469 ,  H01L21/84

CPC分类号： H01L21/67178 ,  H01L21/67748 ,  H01L21/67751

摘要： The wafer coated with the resist is deliberately placed in the vapor before being transferred to an aligner that exposes the resist on the wafer, the vapor, for example, the moisture, uniformly adheres onto the resist on the wafer. As a result, the substrate can uniformly be exposed in the following exposing process, and the uniformity of the line width and the like can be improved.