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    Positive resist composition and pattern forming method using the same
    1.
    发明授权
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07887988B2

    公开(公告)日：2011-02-15

    申请号：US11717645

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern forming method using the same
    2.
    发明授权
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07625690B2

    公开(公告)日：2009-12-01

    申请号：US11717618

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

    发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern forming method using the same
    3.
    发明申请
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US20070218407A1

    公开(公告)日：2007-09-20

    申请号：US11717645

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern formation method using the positive resist composition
    4.
    发明授权
    Positive resist composition and pattern formation method using the positive resist composition 有权
    使用正性抗蚀剂组合物的正性抗蚀剂组成和图案形成方法

    公开(公告)号：US07632623B2

    公开(公告)日：2009-12-15

    申请号：US11717083

    申请日：2007-03-13

    申请人： Kaoru Iwato ,  Kunihiko Kodama ,  Yuko Yoshida ,  Kei Yamamoto

    发明人： Kaoru Iwato ,  Kunihiko Kodama ,  Yuko Yoshida ,  Kei Yamamoto

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.

    摘要翻译： 一种正性抗蚀剂组合物，其包含：通过酸的作用增加在碱性显影液中的溶解度的树脂，其包含含有内酯结构和氰基的重复单元，含有选自下式 （pI）至（pV）和含有选自如本文定义的与第一组不同的由式（pI）至（pV）表示的基团的第二基团的重复单元; 在光化射线或辐射照射时产生酸的化合物; 和溶剂。

    POSITIVE PHOTOSENSITIVE COMPOSITION AND A PATTERN-FORMING METHOD USING THE SAME
    5.
    发明申请
    POSITIVE PHOTOSENSITIVE COMPOSITION AND A PATTERN-FORMING METHOD USING THE SAME 有权
    正性感光性组合物和使用其的图案形成方法

    公开(公告)号：US20090081581A1

    公开(公告)日：2009-03-26

    申请号：US12055359

    申请日：2008-03-26

    申请人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    发明人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C08F220/26

    CPC分类号： G03F7/0397 ,  C08F220/26 ,  C08F220/28 ,  Y10S430/111

    摘要： A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.

    摘要翻译： 正型光敏组合物包含：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）通过酸的作用增加其在碱性显影剂中的溶解度的树脂，其中树脂（B）具有具有酸分解性基团并由式（I）表示的重复单元：其中Xa1表示 氢原子，烷基，氰基或卤素原子; Ry1和Ry2各自独立地表示烷基或环烷基; Rx表示具有2个以上碳原子的烷基或环烷基; Z表示亚烷基。

    Positive photosensitive composition and a pattern-forming method using the same
    7.
    发明授权
    Positive photosensitive composition and a pattern-forming method using the same 有权
    正型光敏组合物和使用其的图案形成方法

    公开(公告)号：US07700261B2

    公开(公告)日：2010-04-20

    申请号：US12055359

    申请日：2008-03-26

    申请人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    发明人： Kunihiko Kodama ,  Kaoru Iwato ,  Hideaki Tsubaki ,  Norihiko Taguchi

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F220/26 ,  C08F220/28 ,  Y10S430/111

    摘要： A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.

    摘要翻译： 正型光敏组合物包含：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）通过酸的作用增加其在碱性显影剂中的溶解度的树脂，其中树脂（B）具有具有酸分解性基团并由式（I）表示的重复单元：其中Xa1表示 氢原子，烷基，氰基或卤素原子; Ry1和Ry2各自独立地表示烷基或环烷基; Rx表示具有2个以上碳原子的烷基或环烷基; Z表示亚烷基。