公开(公告)号：US06701724B2

公开(公告)日：2004-03-09

申请号：US10165758

申请日：2002-06-06

Applicant: Douglas M. Smith ,  Veronica Natividad ,  Tamara L. O'Brien ,  Kevin H. Roderick ,  Loix X. Warren ,  Richard G. Perkes ,  Vanessa Sinclair

Inventor： Douglas M. Smith ,  Veronica Natividad ,  Tamara L. O'Brien ,  Kevin H. Roderick ,  Loix X. Warren ,  Richard G. Perkes ,  Vanessa Sinclair

IPC: F25B1700

CPC classification number: C09K5/047 ,  F25B17/02 ,  F25B17/08 ,  F25D11/003 ,  F25D2201/126 ,  F25D2201/14 ,  F25D2331/804 ,  Y02B40/34

Abstract: Novel sorption cooling devices capable of providing cooling over an extended period of time are disclosed. The sorption cooling devices are particularly useful for temperature-controlled shipping containers that are required to maintain a temperature below ambient for a time sufficient to complete delivery of the container and its contents. The shipping containers can be utilized to cost-effectively transport temperature-sensitive products.

Abstract translation: 公开了能够在长时间内提供冷却的小型吸附冷却装置。 吸附冷却装置对于温度低于环境温度所需的温度控制运输容器特别有用，时间足以完成容器及其内容物的输送。 运输集装箱可用于成本有效地运输温度敏感的产品。

公开(公告)号：US06688132B2

公开(公告)日：2004-02-10

申请号：US09970094

申请日：2001-10-02

Applicant: Douglas M. Smith ,  Kevin H. Roderick ,  Richard G. Perkes ,  Vanessa Sinclair ,  Lois X. Warren

Inventor： Douglas M. Smith ,  Kevin H. Roderick ,  Richard G. Perkes ,  Vanessa Sinclair ,  Lois X. Warren

IPC: F25D398

CPC classification number: C09K5/047 ,  F25B17/02 ,  F25B17/08 ,  F25D11/003 ,  F25D2201/126 ,  F25D2201/14 ,  F25D2331/804 ,  Y02B40/34

Abstract: A sorption cooling device capable of providing cooling over an extended period of time. The sorption cooling device is particularly useful in a temperature-controlled shipping container that is required to maintain a temperature below ambient for an extended period of time. In one embodiment, the cooling device includes a means for restricting the flow of refrigerant liquid to control the degree of cooling over an extended period of time.

Abstract translation: 吸附冷却装置能够在长时间内提供冷却。 吸附冷却装置在温度控制的运输容器中特别有用，该容器需要将温度维持在低于环境温度的时间内。 在一个实施例中，冷却装置包括用于限制制冷剂液体的流动以控制延长的时间段内的冷却程度的装置。

公开(公告)号：US06601404B1

公开(公告)日：2003-08-05

申请号：US10046661

申请日：2001-10-26

Applicant: Kevin H. Roderick

Inventor： Kevin H. Roderick

IPC: F25B1708

CPC classification number: A62B9/003 ,  F25B17/08 ,  F25B35/04 ,  Y02A30/276

Abstract: A sorption cooling device adapted to cool a gas or liquid flowing through a conduit. The cooling device has a high cooling density and a user can independently control the cooling rate. The cooling device can be incorporated in a number of apparatus and in one embodiment is incorporated in a personnel cooling apparatus, such as a closed-loop breathing apparatus or a body cooler.

Abstract translation: 适于冷却流过导管的气体或液体的吸附冷却装置。 冷却装置具有高冷却密度，用户可独立控制冷却速度。 冷却装置可以并入多个装置中，并且在一个实施例中并入人造冷却装置中，例如闭环呼吸装置或体冷却器。

公开(公告)号：US06591630B2

公开(公告)日：2003-07-15

申请号：US09932264

申请日：2001-08-17

Applicant: Douglas M. Smith ,  Kevin H. Roderick ,  Ezra L. Merrill ,  Charles J. Call

Inventor： Douglas M. Smith ,  Kevin H. Roderick ,  Ezra L. Merrill ,  Charles J. Call

IPC: F25B1708

CPC classification number: A62B9/003 ,  F25B17/08 ,  F25B35/04 ,  Y02A30/276

Abstract: A sorption cooling device adapted to cool a gas or liquid flowing through a conduit. The cooling device has a high cooling density and a user can independently control the cooling rate. The cooling device can be incorporated in a number of apparatus and in one embodiment is incorporated in a personnel cooling apparatus, such as a closed-loop breathing apparatus or a body cooler.

公开(公告)号：US06395651B1

公开(公告)日：2002-05-28

申请号：US09111084

申请日：1998-07-07

Applicant: Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Roderick ,  Stephen Wallace ,  James Drage ,  Hui-Jung Wu ,  Neil Viernes ,  Lisa B. Brungardt

Inventor： Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Roderick ,  Stephen Wallace ,  James Drage ,  Hui-Jung Wu ,  Neil Viernes ,  Lisa B. Brungardt

IPC: H01L2131

CPC classification number: H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/02359 ,  H01L21/3105 ,  H01L21/3125 ,  H01L21/31695 ,  Y10T428/31663

Abstract: The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.

公开(公告)号：US6022812A

公开(公告)日：2000-02-08

申请号：US111083

申请日：1998-07-07

Applicant: Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Roderick

Inventor： Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Roderick

IPC: C23C16/42 ,  B05D3/04 ,  B05D7/24 ,  C23C18/12 ,  H01L21/314 ,  H01L21/316

CPC classification number: C23C18/1212 ,  B05D1/60 ,  B05D3/046 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02263 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/31695

Abstract: A process for the manufacture of nanoporous silica dielectric films by vapor deposition of silica precursors on a substrate. The process provides for vaporizing at least one alkoxysilane composition; depositing the vaporized alkoxysilane composition onto a substrate; exposing the deposited alkoxysilane composition to a water vapor, and either an acid or a base vapor; and drying the exposed alkoxysilane composition, thereby forming a relatively high porosity, low dielectric constant, silicon containing polymer composition on the substrate.

Abstract translation: 一种用于通过在基底上气相沉积二氧化硅前体来制造纳米多孔二氧化硅介电膜的方法。 该方法提供了蒸发至少一种烷氧基硅烷组合物; 将蒸发的烷氧基硅烷组合物沉积到基底上; 将沉积的烷氧基硅烷组合物暴露于水蒸汽，以及酸或碱蒸气; 并干燥暴露的烷氧基硅烷组合物，由此在基材上形成相对较高的孔隙率低介电常数的含硅聚合物组合物。

公开(公告)号：US06968711B2

公开(公告)日：2005-11-29

申请号：US10165753

申请日：2002-06-06

Applicant: Douglas M. Smith ,  Tamara L. O'Brien ,  Kevin H. Roderick ,  Lois X. Warren ,  Richard G. Perkes ,  Vanessa Sinclair ,  Quentin Shrimpton

Inventor： Douglas M. Smith ,  Tamara L. O'Brien ,  Kevin H. Roderick ,  Lois X. Warren ,  Richard G. Perkes ,  Vanessa Sinclair ,  Quentin Shrimpton

IPC: F25D9/00 ,  C09K5/04 ,  F25B17/02 ,  F25B17/08 ,  F25D11/00 ,  F25D3/08 ,  F17C13/00 ,  F25B21/00

CPC classification number: C09K5/047 ,  F25B17/02 ,  F25B17/08 ,  F25D11/003 ,  F25D2201/126 ,  F25D2201/14 ,  F25D2331/804 ,  Y02B40/34

Abstract: Novel sorption cooling devices capable of providing cooling over an extended period of time are disclosed. The sorption cooling devices are particularly useful for temperature-controlled shipping containers that are required to maintain a temperature below ambient for a time sufficient to complete delivery of the container and its contents. The shipping containers can be utilized to cost-effectively transport temperature-sensitive products.

Abstract translation: 公开了能够在长时间内提供冷却的小型吸附冷却装置。 吸附冷却装置对于温度低于环境温度所需的温度控制运输容器特别有用，时间足以完成容器及其内容物的输送。 运输集装箱可用于成本有效地运输温度敏感的产品。

公开(公告)号：US20090001086A1

公开(公告)日：2009-01-01

申请号：US12102703

申请日：2008-04-14

Applicant: Kevin H. Roderick ,  Brian Glover ,  Douglas M. Smith

Inventor： Kevin H. Roderick ,  Brian Glover ,  Douglas M. Smith

IPC: B65D83/72

CPC classification number: B65D81/3851

Abstract: A container insert for providing a thermally insulated enclosure. The container insert includes a bottom panel, side panels and end panels that are interconnected by a plastic backing sheet. The side panels and end panels can be pivoted upwardly to form side walls and end walls. The plastic backing sheet covers the seams between adjacent insulation panels to provide a moisture barrier. The plastic backing sheet can also urge adjacent panels together to reduce the gap between adjacent panels and improve thermal performance.

Abstract translation: 一种用于提供绝热外壳的容器插入件。 容器插入件包括底板，侧板和端板，其通过塑料背衬片相互连接。 侧板和端板可以向上枢转以形成侧壁和端壁。 塑料背衬板覆盖相邻绝缘板之间的接缝以提供防潮层。 塑料背衬片还可以将相邻的面板推到一起以减少相邻面板之间的间隙并改善热性能。

公开(公告)号：US06858068B2

公开(公告)日：2005-02-22

申请号：US10672479

申请日：2003-09-26

Applicant: Douglas M. Smith ,  Kevin H. Roderick

Inventor： Douglas M. Smith ,  Kevin H. Roderick

IPC: B01D53/04 ,  B01D53/26 ,  F25D23/12 ,  F28F7/00

CPC classification number: B01D53/02 ,  A41D13/0056 ,  B01D53/0415 ,  B01D53/0438 ,  B01D53/261 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/108 ,  B01D2253/112 ,  B01D2253/25 ,  B01D2257/80 ,  B01D2259/4148 ,  B01D2259/4541 ,  B01D2259/4583 ,  B01D2259/657 ,  Y10S165/902

Abstract: A device for adsorbing water vapor from a gas stream. The device can be incorporated with an enclosure or garment in such a manner so as to enable water vapor to be adsorbed, thereby decreasing the relative humidity in the micrlimate surrounding the user. The water adsorption device is light-weight, has a high mass and volumetric energy capacity. A desiccant material is included within the water adsorption device to adsorb water vapor and a phase-change material is located in thermal communication with the desiccant to increase the loading capacity of the desiccant and maintain a cool gas stream by extracting the heat of adsorption from the desiccant.

Abstract translation: 用于从气流中吸附水蒸气的装置。 该装置可以以这样的方式与外壳或衣服结合，以便能够吸附水蒸气，从而降低使用者周围的微气候中的相对湿度。 水吸附装置重量轻，质量高，体积容量大。 水吸附装置中包含干燥剂材料以吸附水蒸汽，相变材料位于与干燥剂热连通以增加干燥剂的负载能力，并通过从吸附装置中提取吸附热量来维持冷气流 干燥剂

公开(公告)号：US06503850B1

公开(公告)日：2003-01-07

申请号：US09046473

申请日：1998-03-25

Applicant: Stephen Wallace ,  Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Roderick ,  James S. Drage ,  Lisa Beth Brungardt

Inventor： Stephen Wallace ,  Douglas M. Smith ,  Teresa Ramos ,  Kevin H. Roderick ,  James S. Drage ,  Lisa Beth Brungardt

IPC: H01L21469

CPC classification number: H01L21/02203 ,  B01J13/0091 ,  C01B33/1585 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/31695

Abstract: The present invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. A precursor of an alkoxysilane, and low and high volatility solvents are mixed at a pH of about 2-5, raised to a pH of about 8 or above with a low volatility base and deposited on a semiconductor substrate. After exposure to atmospheric moisture, a nanoporous dielectric film is produced on the substrate.

Abstract translation: 本发明涉及纳米多孔介电膜及其制造方法。 这种膜可用于集成电路的生产。 将烷氧基硅烷的前体和低挥发性溶剂和低挥发性溶剂以约2-5的pH混合，以低挥发性碱升高至约8或更高的pH并沉积在半导体衬底上。 在暴露于大气湿度之后，在衬底上产生纳米多孔介电膜。