Method of making siloxane-based polymides
    4.
    再颁专利
    Method of making siloxane-based polymides 有权
    制造硅氧烷基聚酰亚胺的方法

    公开(公告)号:USRE38116E1

    公开(公告)日:2003-05-06

    申请号:US10035497

    申请日:2001-11-08

    CPC classification number: A61K8/898 A61Q5/00 A61Q19/00 C08G69/42 C08G77/455

    Abstract: A method of making siloxane-based polyamides which includes at least one repeating unit represented by the formula wherein X is a linear or branched C1-C30 alkylene chain; Y is a linear or branched C1-C20 alkylene chain; DP is an integer having a value of 10-500; n is an integer having a value 1-500. The method involves heating an intimate reaction mixture containing an olefinic acid and an organic diamine at a temperature greater than 100° C. and forming an organic diamide; and thereafter reacting the organic diamide with a hydride-terminated polydimethylsiloxane in the presence of a hydrosilylation catalyst to form the siloxane-based polyamide.

    Abstract translation: 一种制备基于硅烷的聚酰胺的方法,其包括至少一个由式(Ⅳ)所代表的重复单元是直链或支链的C 1 -C 30亚烷基链; Y是直链或支链的C 1 -C 20亚烷基链; DP是值为10-500的整数; n是值为1-500的整数。 该方法包括在大于100℃的温度下加热含有烯属酸和有机二胺的紧密反应混合物并形成有机二酰胺; 然后在氢化硅烷化催化剂存在下使有机二酰胺与氢化物封端的聚二甲基硅氧烷反应,形成硅氧烷基聚酰胺。

    Lithography processes using phase change compositions
    10.
    发明授权
    Lithography processes using phase change compositions 失效
    使用相变组合物进行平版印刷

    公开(公告)号:US08147742B2

    公开(公告)日:2012-04-03

    申请号:US11661028

    申请日:2005-09-23

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00

    Abstract: A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.

    Abstract translation: 光刻方法包括以下步骤:A)在相变组合物的相变温度以上的温度下填充具有相变组成的图案化表面的模具; B)硬化相变组合物以形成图案化特征; C)分离模具和图案特征; 任选地D)蚀刻图案特征; 可选E)清洁模具; 并且可选地F)重复步骤A)至D)重复使用模具。 PCC可以包括有机官能硅蜡。

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