SEMICONDUCTOR MANUFACTURING SYSTEM AND METHOD
    1.
    发明申请
    SEMICONDUCTOR MANUFACTURING SYSTEM AND METHOD 审中-公开
    半导体制造系统和方法

    公开(公告)号:US20090299512A1

    公开(公告)日:2009-12-03

    申请号:US12469716

    申请日:2009-05-21

    IPC分类号: G05B13/04 G06F17/00 G06N5/04

    CPC分类号: G05B17/02

    摘要: In the manufacturing system and the manufacturing method of a semiconductor device using a plasma treatment apparatus, a plasma treatment condition is controlled so that a desired shape is obtained after the plasma processing by using a processing shape prediction model for calculating the shape after the plasma processing from the inspection data of a wafer to be treated prior to the treatment and a response surface model for calculating the processing shape depending on a plasma treatment condition. In this configuration, the processing shape prediction model has an adjustable prediction model coefficient, and this prediction model coefficient is automatically calibrated.

    摘要翻译: 在使用等离子体处理装置的半导体装置的制造系统和制造方法中,通过使用等离子体处理后的形状计算处理形状预测模型等离子体处理后,控制等离子体处理条件,从而获得期望的形状 从处理前的待处理晶片的检查数据和根据等离子体处理条件计算处理形状的响应面模型。 在该配置中,处理形状预测模型具有可调节的预测模型系数,并且该预测模型系数被自动校准。

    Manufacturing method of semiconductor device
    6.
    发明授权
    Manufacturing method of semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US07915055B2

    公开(公告)日:2011-03-29

    申请号:US11693776

    申请日:2007-03-30

    IPC分类号: H01L21/66 G01R31/26

    摘要: The present invention provides a manufacturing technique of a semiconductor device that reduces fluctuation of electric characteristic and a working size of a semiconductor device and can manufacture semiconductor devices at high quality and at high yield. In a semiconductor device manufacturing system, a control method for a manufacturing process of a semiconductor device having a function (a data collecting unit) of collecting examination data at a plurality of examining steps including an examining step of setting a length of a measurement region in a wiring direction to at least 10 times a wire width to measure the wire width and an examining step of examining the wire width, a function (a data analyzing unit) of generating a prediction model of electric characteristic or working size of a semiconductor device using the examination data to generate a control model from the prediction model, and a function (a process control unit) of properly controlling processing conditions for a control process based upon examination data of the plurality of examining steps in the manufacturing process of a semiconductor device and the control model is realized.

    摘要翻译: 本发明提供一种能够降低半导体装置的电气特性和工作尺寸的波动的半导体装置的制造技术,能够高质量,高产率地制造半导体装置。 在半导体器件制造系统中,具有在多个检查步骤中收集检查数据的功能(数据收集单元)的半导体器件的制造过程的控制方法包括将测量区域的长度设置在 布线方向为线宽的至少10倍以测量线宽度和检查线宽度的检查步骤,产生半导体器件的电特性或工作尺寸的预测模型的功能(数据分析单元),其使用 根据预测模型生成控制模型的检查数据和根据半导体装置的制造过程中的多个检查步骤的检查数据适当地控制用于控制处理的处理条件的功能(过程控制单元),以及 实现了控制模型。

    Dimension measuring apparatus and dimension measuring method for semiconductor device
    7.
    发明授权
    Dimension measuring apparatus and dimension measuring method for semiconductor device 有权
    半导体器件的尺寸测量装置和尺寸测量方法

    公开(公告)号:US07720632B2

    公开(公告)日:2010-05-18

    申请号:US12128364

    申请日:2008-05-28

    IPC分类号: G01B15/00 G01N23/00

    CPC分类号: H01L22/12 H01J2237/2813

    摘要: A dimension measuring apparatus used for measuring a dimension of a semiconductor device having a first pattern of repeated structure and a second pattern that is linear and formed on the first pattern to extend over the repeated structure. The invention includes a shape information acquisition unit which acquires information on a shape of the first pattern; a width value acquisition unit which acquires a width value of each portion of the second pattern; an analytic area setting unit, which sets a plurality of analytic areas on the second pattern; and a dimension determining unit, which extracts, for each of the set analytic areas, width values of portions included in the analytic area, and uses the extracted width values to determine a dimension of the second pattern at portions overlapping the first pattern.

    摘要翻译: 一种尺寸测量装置,用于测量具有重复结构的第一图案和第二图案的半导体器件的尺寸,该第二图案是线性的并形成在第一图案上以在重复结构上延伸。 本发明包括获取关于第一图案的形状的信息的形状信息获取单元; 宽度值获取单元,其获取所述第二图案的每个部分的宽度值; 分析区域设置单元,其设置所述第二图案上的多个分析区域; 以及尺寸确定单元,其针对每个所述分析区域提取包括在所述分析区域中的部分的宽度值,并且使用所提取的宽度值来确定与所述第一图案重叠的部分处的所述第二图案的尺寸。

    Method for controlling supercharging pressure in an automotive engine
    8.
    发明授权
    Method for controlling supercharging pressure in an automotive engine 失效
    用于控制汽车发动机中的增压压力的方法

    公开(公告)号:US5289683A

    公开(公告)日:1994-03-01

    申请号:US86616

    申请日:1993-07-01

    申请人: Masaru Kurihara

    发明人: Masaru Kurihara

    IPC分类号: F02B37/12 F02B37/18 F02D41/00

    摘要: An automotive engine has a turbocharger, a wastegate valve for controlling flow rate of exhaust gas applied to a turbine of the turbocharger, and an actuator for controlling the wastegate valve. A standard supercharging pressure is determined dependent on characteristics of the wastegate valve, and a desired supercharging pressure is set in accordance with engine operating conditions. A difference between the desired supercharging pressure and the standard supercharging pressure is calculated, and a ratio of the difference to a detected actual supercharging pressure is calculated. From the calculated ratio, a control value applied to the actuator is calculated.

    摘要翻译: 汽车发动机具有涡轮增压器,用于控制施加到涡轮增压器的涡轮机的废气的流量的废气门阀以及用于控制废气门阀的致动器。 取决于废气门阀的特性来确定标准增压压力,并且根据发动机操作条件设定所需的增压压力。 计算出期望的增压压力和标准增压压力之间的差异,并且计算该差值与检测到的实际增压压力之比。 根据计算出的比例,计算施加到致动器的控制值。

    Automatic transmission system for an alcohol engine
    10.
    发明授权
    Automatic transmission system for an alcohol engine 失效
    汽油发动机自动变速系统

    公开(公告)号:US5088350A

    公开(公告)日:1992-02-18

    申请号:US643569

    申请日:1991-01-18

    IPC分类号: F16H61/10 F16H59/74 F16H61/02

    摘要: An automatic transmission for an alcohol engine is upshifted in accordance with one of first and second shift patterns. The transmission is upshifted at a higher vehicle speed in accordance with the first shift pattern, and the transmission is upshifted at a lower vehicle speed by the second shift pattern. Concentration of the alcohol is detected by an alcohol concentration sensor. The second shift pattern is provided when the detected alcohol concentration is higher than a reference value.

    摘要翻译: 根据第一和第二换档模式之一,用于酒精发动机的自动变速器被升档。 变速器根据第一变速模式以更高的车速升档,并且变速器以较低的车速通过第二换档模式升档。 通过酒精浓度传感器检测酒精浓度。 当检测到的醇浓度高于参考值时,提供第二移位模式。