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公开(公告)号：US20060160099A1
公开(公告)日：2006-07-20
申请号：US11015257
申请日：2004-12-16
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
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公开(公告)号：US20120071361A1
公开(公告)日：2012-03-22
申请号：US13273399
申请日：2011-10-14
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20090062148A1
公开(公告)日：2009-03-05
申请号：US11500411
申请日：2006-08-08
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn Mcgall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn Mcgall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20050181431A1
公开(公告)日：2005-08-18
申请号：US11090876
申请日：2005-03-25
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
IPC分类号： B01J19/00 , C07B61/00 , C07H21/00 , C07K1/04 , C40B40/06 , C40B40/10 , C40B60/14 , C12Q1/68 , B05D3/00 , C12M1/34 , G01N33/53
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
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公开(公告)号：US06706875B1
公开(公告)日：2004-03-16
申请号：US09716507
申请日：2000-11-20
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C07H2100
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。本发明的方法将高通量工艺步骤与高分辨率光刻技术相结合 聚合物阵列的制造。
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公开(公告)号：US06307042B1
公开(公告)日：2001-10-23
申请号：US09244568
申请日：1999-02-04
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
IPC分类号： C12Q168
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20100331217A1
公开(公告)日：2010-12-30
申请号：US12634475
申请日：2009-12-09
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Quoc Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard P. Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/0061 , B01J2219/00612 , B01J2219/00621 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14 , Y02P20/55 , Y10S436/809
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US20050181396A1
公开(公告)日：2005-08-18
申请号：US11016629
申请日：2004-12-17
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
IPC分类号： B01J19/00 , C07B61/00 , C07H21/00 , C07K1/04 , C40B40/06 , C40B40/10 , C40B60/14 , C12Q1/68 , B05D3/00 , C12M1/34
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
摘要翻译： 本发明提供了用于大规模制备聚合物序列阵列的新方法，其中每个阵列包括具有已知单体序列的多个不同的位置不同的聚合物序列。 本发明的方法将高通量处理步骤与高分辨率光刻技术结合在聚合物阵列的制造中。
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公开(公告)号：US6150147A
公开(公告)日：2000-11-21
申请号：US19881
申请日：1998-02-06
申请人： Martin J. Goldberg , Mel Yamamoto , Glenn H. McGall , Steven J. Woodman , Eric Spence , Lisa T. Kajisa
发明人： Martin J. Goldberg , Mel Yamamoto , Glenn H. McGall , Steven J. Woodman , Eric Spence , Lisa T. Kajisa
IPC分类号： G01N33/53 , B01J19/00 , C07B61/00 , C07H21/00 , C07K1/04 , C12M1/00 , C12N15/09 , C12Q1/68 , C40B40/06 , C40B40/18 , C40B60/14 , G01N33/566 , G01N37/00 , C12N13/00 , H01G3/00
CPC分类号： B82Y30/00 , B01J19/0046 , C07H21/00 , C07K1/045 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00608 , B01J2219/00612 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00745 , C07B2200/11 , C40B40/06 , C40B40/18 , C40B60/14 , Y02P20/55
摘要： The present invention provides modified methods and apparatus for the preparation of arrays of material wherein each array includes a preselected collection of polymers, small molecules or inorganic materials associated with a surface of a substrate. The methods of the invention provide for modifications to general apparatus, flow cell geometries and solutions used in array fabrication.
摘要翻译： 本发明提供了用于制备材料阵列的改进方法和装置，其中每个阵列包括与基底表面相关联的聚合物，小分子或无机材料的预选集合。 本发明的方法提供对在阵列制造中使用的一般装置，流动池几何形状和解决方案的修改。
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公开(公告)号：US20060008840A1
公开(公告)日：2006-01-12
申请号：US11224052
申请日：2005-09-13
申请人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
发明人： Martin Goldberg , Martin Diggelman , Earl Hubbell , Glenn McGall , Nam Ngo , MacDonald Morris , Mel Yamamoto , Jennifer Tan , Richard Rava
CPC分类号： C07K1/047 , B01J19/0046 , B01J2219/00432 , B01J2219/00527 , B01J2219/00529 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00689 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B82Y30/00 , C07B2200/11 , C07H21/00 , C40B40/06 , C40B40/10 , C40B60/14
摘要： The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
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