-
公开(公告)号：US10478228B2
公开(公告)日：2019-11-19
申请号：US15316758
申请日：2016-11-01
申请人： Min-na Kim , Il-jin Jeon
发明人： Min-na Kim , Il-jin Jeon , Chang-hoon Jeon
摘要： A screw assembly for a spinal implant comprises a first unit including insertion holes and an inner space, a rod having a side whose outer circumference surface is positioned on the insertion holes of the first unit and another side whose outer circumference surface is positioned on insertion holes of another first unit positioned adjacent to the first unit, a second unit having an upper portion rotatably received in a lower portion of the inner space and a lower portion screwed to a vertebral body, a third unit screwed to an upper portion of the inner space to hold the rod, and a fourth unit positioned between the inner space and the upper portion of the second unit and including a pressure cap seated in the inner space.
-
公开(公告)号：US20190247096A1
公开(公告)日：2019-08-15
申请号：US15316758
申请日：2016-11-01
申请人： Min-na KIM , Il-jin JEON
发明人： Min-na KIM , Il-jin JEON , Chang-hoon JEON
摘要： The present invention relates to a screw assembly for a spinal implant comprising a first unit including insertion holes positioned opposite each other, cut from an edge of an upper end of the first unit, and forming an inner space, the first unit penetrated from top to bottom, a rod having a side whose outer circumference surface is positioned on the insertion holes of the first unit and another side whose outer circumference surface is positioned on an insertion holes of another first unit positioned adjacent to the first unit, a second unit having an upper portion rotatably received in a lower portion of the inner space and a lower portion screwed to a vertebral body of a spine not to be released; a third unit screwed to an upper portion of the inner space to hold the rod, and a fourth unit positioned between the inner space and the upper portion of the second unit to restrict a rotation of the second unit and including a pressure cap seated in the inner space while pressing an outer surface of an upper portion of a hall joint head disposed on the upper portion of the second unit and having an upper portion contacting the outer circumference surface of the rod to be pressurized by a coupling force of the third unit coupled with the first unit.
-
公开(公告)号：US09152256B2
公开(公告)日：2015-10-06
申请号：US13129355
申请日：2009-11-13
申请人： Gap Young Kim , Hyun Min Na , Hyuk Jin Hong
发明人： Gap Young Kim , Hyun Min Na , Hyuk Jin Hong
IPC分类号： G06F3/041
CPC分类号： G06F3/041 , G06F2203/04103
摘要： A touch screen and a method for manufacturing the touch screen are provided. The touch screen can include: an ITO (Indium Tin Oxide) film deposited on the upper surface of a flexible plastic film; a primary metal layer deposited on the ITO film; and a secondary metal film plated on the primary metal layer. The touch screen is durable and has excellent sensitivity.
摘要翻译： 提供触摸屏和制造触摸屏的方法。 触摸屏可以包括：沉积在柔性塑料膜的上表面上的ITO（氧化铟锡）膜; 沉积在ITO膜上的初级金属层; 以及镀在一次金属层上的二次金属膜。 触摸屏耐用，灵敏度高。
-
4.发明授权Loading device of chemical mechanical polishing equipment for semiconductor wafers 有权半导体晶圆化学机械抛光设备装载装置公开(公告)号：US07892069B2
公开(公告)日：2011-02-22
申请号：US12088751
申请日：2006-07-21
申请人： Young Min Na , Chang Il Kim , Young Su Heo
发明人： Young Min Na , Chang Il Kim , Young Su Heo
IPC分类号： B24B49/00
CPC分类号： B24B37/345
摘要： A loading device of chemical mechanical polishing (CMP) equipment for processing semiconductor wafers is provided. The loading device includes a loading cup having a cup-like bath, a cup plate installed in the bath, and a loading plate supported on the cup plate for absorbing shock and seating the wafer. A driving device and a driving shaft horizontally pivot and vertically move the loading cup between a platen of a polishing apparatus and a spindle. An arm connects the loading cup and the driving shaft. At least one through hole is located in a mutually corresponding position of the bath, the cup plate, and the loading plate of the loading cup. A probe assembly optically detects a polished thickness at a polished point on the wafer.
摘要翻译： 提供了用于处理半导体晶片的化学机械抛光（CMP）设备的装载装置。 装载装置包括具有杯形浴的装载杯，安装在浴中的杯板，以及支撑在杯板上用于吸收冲击和安放晶片的装载板。 驱动装置和驱动轴水平地枢转并且将加载杯垂直移动在抛光装置的压板和主轴之间。 手臂连接装载杯和驱动轴。 至少一个通孔位于浴槽，杯板和装载杯的装载板的相应对应位置。 探针组件在晶片的抛光点处光学地检测抛光的厚度。
-
5.发明申请INFLAMMABLE MAT BOARD FOR ARCHITECTURE AND METHOD FOR MANUFACTURING THE SAME 审中-公开用于建筑的不可抗力的木板及其制造方法公开(公告)号：US20120251837A1
公开(公告)日：2012-10-04
申请号：US13384141
申请日：2010-01-14
申请人： Sung-Min Na
发明人： Sung-Min Na
CPC分类号： B23K11/243 , D04H1/4234 , D04H1/587 , D04H1/645 , E04B1/942 , Y10T29/14 , Y10T428/12347 , Y10T428/12424 , Y10T442/20 , Y10T442/339 , Y10T442/655
摘要： The present invention relates to an inflammable mat board for an architecture and a method for manufacturing the same, and in particular to a mat board which is characterized in that in an inflammable mat board for architecture, a mat shaped board is manufactured in such a way that a metallic thread made from an iron, a nonferrous metal, a waste can and a waste tin plate, etc. is tangled like a cotton ball in a thin sheet shape, so it is possible to recycle materials, and an inflammability can be enhanced, and a heat insulation effect can be maximized, and a recycling rate can be enhanced in terms of a material management, and the production of wastes can be advantageously minimized, thus contributing a lot to a green growth policy of the world.
摘要翻译： 本发明涉及一种用于建筑的可燃性垫板及其制造方法，特别涉及一种垫板，其特征在于，在用于建筑的易燃垫板中，以这种方式制造垫形板 由铁，有色金属，废物罐和废锡板等制成的金属线与薄片状的棉球缠结，可以回收材料，并且可以提高易燃性 能够最大化隔热效果，能够在物料管理方面提高回收利用率，能够有利地减少废弃物的生成，从而对世界绿色增长政策有很大贡献。
-
6.发明申请Loading Device of Chemical Mechanical Polishing Equipment for Semiconductor Wafers 有权半导体晶片化学机械抛光设备的装载装置公开(公告)号：US20090130955A1
公开(公告)日：2009-05-21
申请号：US12088751
申请日：2006-07-21
申请人： Young Min Na , Chang Il Kim , Young Su Heo
发明人： Young Min Na , Chang Il Kim , Young Su Heo
CPC分类号： B24B37/345
摘要： A loading device of chemical mechanical polishing (CMP) equipment for processing semiconductor wafers is provided. The loading device includes a loading cup having a cup-like bath, a cup plate installed in the bath, and a loading plate supported on the cup plate for absorbing shock and seating the wafer. A driving device and a driving shaft horizontally pivot and vertically move the loading cup between a platen of a polishing apparatus and a spindle. An arm connects the loading cup and the driving shaft. At least one through hole is located in a mutually corresponding position of the bath, the cup plate, and the loading plate of the loading cup. A probe assembly optically detects a polished thickness at a polished point on the wafer.
摘要翻译： 提供了用于处理半导体晶片的化学机械抛光（CMP）设备的装载装置。 装载装置包括具有杯形浴的装载杯，安装在浴中的杯板，以及支撑在杯板上用于吸收冲击和安放晶片的装载板。 驱动装置和驱动轴水平地枢转并且将加载杯垂直移动在抛光装置的压板和主轴之间。 手臂连接装载杯和驱动轴。 至少一个通孔位于浴槽，杯板和装载杯的装载板的相应对应位置。 探针组件在晶片的抛光点处光学地检测抛光的厚度。
-
公开(公告)号：US20080061034A1
公开(公告)日：2008-03-13
申请号：US11852012
申请日：2007-09-07
申请人： Dae-Sik JUNN , Jeong-Beom LEE , Sung-Ho CHA , Sung-Min NA , Myung-Gon SONG , Duck-Ho KIM , Kyoung-Jin LIM
发明人： Dae-Sik JUNN , Jeong-Beom LEE , Sung-Ho CHA , Sung-Min NA , Myung-Gon SONG , Duck-Ho KIM , Kyoung-Jin LIM
IPC分类号： H01L21/3065
CPC分类号： H01J37/3299 , H01J37/32091 , H01J37/32743 , H01J37/32752 , H01J37/32935 , H01J2237/334 , H01L21/67253 , H01L21/67259 , H01L21/681 , H01L21/68785
摘要： An etching apparatus includes a chamber, a substrate support in the chamber, a substrate-screening unit over the substrate support, wherein a diameter of the substrate-screening unit is smaller than as or equals to a substrate, a gas injection means injecting gases onto a periphery of the substrate, a power supply unit providing an RF (radio frequency) power into the chamber, and a plurality of sensors sensing intervals between the substrate support and the substrate-screening unit.
摘要翻译： 蚀刻装置包括腔室，腔室中的衬底支撑件，衬底支撑件上方的衬底筛选单元，其中衬底筛选单元的直径小于或等于衬底;气体注入装置，将气体注入到 所述基板的周边，向所述室提供RF（射频）功率的电源单元以及检测所述基板支撑件和所述基板检测单元之间的间隔的多个传感器。
-
8.发明授权Method of texturing polycrystalline iron/gallium alloys and compositions thereof 有权多晶铁/镓合金的纹理方法及其组合物公开(公告)号：US08591669B2
公开(公告)日：2013-11-26
申请号：US11286078
申请日：2005-11-23
申请人： Suok Min Na , Alison Behre Flatau
发明人： Suok Min Na , Alison Behre Flatau
IPC分类号： H01F1/01
CPC分类号： C22C38/002 , H01L41/20
摘要： The present disclosure is directed to a method of shaping a starting material of polycrystalline Fe—Ga alloy sheet of varying texture or crystal orientation. The method includes texturing the surface of the Fe—Ga alloy sheet to re-orient polycrystalline Fe—Ga crystals of the polycrystalline Fe—Ga alloy sheet to increase the uniformity of the crystal orientation of the Fe—Ga alloy sheet. The texturing step includes: initially deforming the Fe—Ga alloy sheet by hot rolling; subsequently deforming the previously hot rolled Fe—Ga alloy sheet by warm rolling; and annealing the previously warm rolled Fe—Ga alloy sheet. The method provides an alloy having a saturation magnetostriction potential greater than 60 ppm in applied fields of between 200-600 Oersted. During the annealing step H2S gas is added to introduce sulfur for promoting surface-energy-induced selective growth of {110} grain. The annealing step is performed in an atmosphere of argon gas.
摘要翻译： 本公开涉及一种成形具有不同结构或晶体取向的多晶Fe-Ga合金片材的原料的方法。 该方法包括对Fe-Ga合金薄片的表面进行纹理化以重新定向多晶Fe-Ga合金薄片的多晶Fe-Ga晶体，以增加Fe-Ga合金薄片的晶体取向的均匀性。 变形步骤包括：首先通过热轧使Fe-Ga合金板变形; 随后通过温轧使先前热轧的Fe-Ga合金板变形; 并对先前热轧的Fe-Ga合金板退火。 该方法提供了在200-600奥斯特施加的场中具有大于60ppm的饱和磁致伸缩电位的合金。 在退火步骤期间，添加H2S气体以引入硫以促进{110}晶粒的表面能诱导的选择性生长。 退火步骤在氩气气氛中进行。
-
公开(公告)号：US20120038564A1
公开(公告)日：2012-02-16
申请号：US13129355
申请日：2009-11-13
申请人： Gap Young Kim , Hyun Min Na , Hyuk Jin Hong
发明人： Gap Young Kim , Hyun Min Na , Hyuk Jin Hong
CPC分类号： G06F3/041 , G06F2203/04103
摘要： In an embodiment of the present invention, a touch screen is provided, the touch screen characterized by: an indium tin oxide (ITO) film deposited on a top surface of a flexible plastic film; a first metal layer deposited on the ITO film, and a second metal layer plated on the first metal layer. According to the embodiment of the present invention, the touch screen and the method of manufacturing the same having the excellent sensitivity while securing durability may be provided.
摘要翻译： 在本发明的实施例中，提供一种触摸屏，其特征在于：在柔性塑料薄膜的顶表面上沉积氧化铟锡（ITO）薄膜; 沉积在ITO膜上的第一金属层和镀在第一金属层上的第二金属层。 根据本发明的实施例，可以提供在确保耐用性的同时具有优异的灵敏度的触摸屏及其制造方法。
-
公开(公告)号：US20110304568A1
公开(公告)日：2011-12-15
申请号：US13129362
申请日：2009-11-13
申请人： Gap Young Kim , Hyun Min Na , Hyuk Jin Hong
发明人： Gap Young Kim , Hyun Min Na , Hyuk Jin Hong
CPC分类号： G06F3/045
摘要： A touch screen according to an embodiment of the present invention includes: a transparent conductive material deposited on a top surface of a flexible plastic film; and a metal layer vacuum-deposited on the transparent conductive film. According to the embodiment of the present invention, the touch screen capable of providing the excellent flexibility and simplifying the manufacturing process, and the method of manufacturing the same can be provided.
摘要翻译： 根据本发明的实施例的触摸屏包括：沉积在柔性塑料膜的顶表面上的透明导电材料; 以及真空沉积在透明导电膜上的金属层。 根据本发明的实施例，可以提供能够提供优异的灵活性和简化制造过程的触摸屏及其制造方法。
-
-
-
-
-
-
-
-
-
搜索结果
14 条记录 (耗时 0.014 秒)
