公开(公告)号：US07789782B2

公开(公告)日：2010-09-07

申请号：US12008867

申请日：2008-01-15

Applicant: Minoru Komada ,  Hitoshi Ohara ,  Takayuki Morimoto ,  Yoshinori Iwasaki ,  Syuuji Hamaguchi ,  Shouhei Adachi

Inventor： Minoru Komada ,  Hitoshi Ohara ,  Takayuki Morimoto ,  Yoshinori Iwasaki ,  Syuuji Hamaguchi ,  Shouhei Adachi

IPC: F16G1/24

CPC classification number: F16G13/04

Abstract: In a silent chain comprising interleaved and relatively pivotable rows of link plates, protrusions formed in the link plates contact relatively pivotable link plates in adjacent rows so that the area of contact is reduced. The protrusions can be annular, or they can be in the form of arcs that are of a size and position such that the arcuate protrusions of each plate do not interfere with the arcuate protrusions of an adjacent plate as the chain bends during use. The plates can have rectangular protrusions, or arcuate protrusions each consisting of an arc-shaped collection of dot-shaped protrusions.

Abstract translation: 在包括交错和相对可枢转的连杆板排的无声链中，形成在链板中的突起接触相邻行中的相对可枢转的连接板，使得接触面积减小。 突起可以是环形的，或者它们可以是弧形，其尺寸和位置使得当链条在使用期间弯曲时，每个板的弓形突起不会干扰相邻板的弓形突起。 板可以具有矩形突起，或者圆弧形突起，每个突起均由点状突起的弧形收集组成。

公开(公告)号：US20090280266A1

公开(公告)日：2009-11-12

申请号：US12509601

申请日：2009-07-27

Applicant: Minoru KOMADA

Inventor： Minoru KOMADA

IPC: C23C14/14 ,  C23C14/22

CPC classification number: B32B27/08 ,  C23C14/10 ,  Y10T428/31663 ,  Y10T428/31667

Abstract: An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:160 to 190:30 to 50, a peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1030 to 1060 cm−1, a film density in a range of 2.5 to 2.7 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxi-nitride film having an atomic ratio in a range of Si:O:N:C=100:80 to 110:40 to 70:30 to 50, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration in a range of 900 to 1000 cm−1, a film density in a range of 2.7 to 3.0 g/cm3, and a distance between grains of 30 nm or shorter.

Abstract translation: 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法，以及叠层材料，用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明，提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜，其中阻挡层是原子比在Si：O：C = 100：160〜190：30〜50，由于Si-O-Si伸缩振动在1030〜1060cm -1之间的红外线吸收的峰值位置，膜密度在2.5〜2.7g / cm 3的范围内， 颗粒之间的距离为30nm或更短。 另外，在衬底膜的至少一个表面上设置有阻挡层的阻挡膜，其中阻挡层是原子比在Si：O：N：C的范围内的氧化硅氮化物膜 = 100:80〜110:40〜70:30〜50，由于Si-O伸缩振动和Si-N伸缩振动在900〜1000cm -1范围内的红外线吸收的最大峰值，膜密度 在2.7〜3.0g / cm 3的范围内，粒子间的距离为30nm以下。

公开(公告)号：US07288311B2

公开(公告)日：2007-10-30

申请号：US10774709

申请日：2004-02-09

Applicant: Sayaka Kawashima ,  Minoru Komada ,  Shinya Satou

Inventor： Sayaka Kawashima ,  Minoru Komada ,  Shinya Satou

IPC: B32B7/02 ,  B32B9/04 ,  B32B19/00

CPC classification number: C23C16/30 ,  Y10T428/24942 ,  Y10T428/2495 ,  Y10T428/24992 ,  Y10T428/31504

Abstract: A barrier film is provided having extremely high barrier properties and a good transparency as part of a laminated material having use as a packaging container which may possess an image display medium, the high barrier properties and good transparency which are achieved with a barrier film comprised of a base material film and a barrier layer deposited on at least one side surface of the base material film, with the barrier layer comprising a water repellent layer and a dense layer, the water repellent layer being a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:40 to 120:80 to 160, and the thickness in a range of 2 to 300 nm, and the dense layer being a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:100 to 200:5 to 100, and the thickness in a range of 5 to 300 nm.

Abstract translation: 提供了具有非常高的阻隔性和良好透明性的阻挡膜，作为可以具有图像显示介质的包装容器的层压材料的一部分，高阻隔性和良好的透明性，其通过由 基材膜和阻挡层，其沉积在所述基材膜的至少一个侧表面上，所述阻挡层包含防水层和致密层，所述防水层为氧化硅碳化物膜，所述氧化硅碳化物膜的原子百分比为 Si：O：C在100:40至120:80至160的范围内，厚度在2至300nm的范围内，致密层是具有Si：O原子百分比的氧化硅碳化物膜， C在100:100至200:5至100的范围内，厚度在5至300nm的范围内。

公开(公告)号：US20070138303A1

公开(公告)日：2007-06-21

申请号：US11604195

申请日：2006-11-27

Applicant: Hiroyuki Asakura ,  Kiyoshi Imaizumi ,  Takeshi Iihara ,  Kazuyuki Takasawa ,  Minoru Komada

Inventor： Hiroyuki Asakura ,  Kiyoshi Imaizumi ,  Takeshi Iihara ,  Kazuyuki Takasawa ,  Minoru Komada

IPC: G06K19/06

CPC classification number: G06K19/07749 ,  Y10T428/24917

Abstract: A noncontact IC tag 1 comprises a base film 11, a noncontact IC circuit 2, 3 formed on the base film 11, and a plastic film or paper serving as a surfacing sheet 4, having a non-conductive, lustrous metal film 6m formed by deposition, laminated to the base film 11 on the side of the noncontact IC tag circuit 2, 3. The surface roughness of the non-conductive, lustrous metal film 6m, determined by atomic force microscopy, is more than 10 nm and 100 nm or less as indicated by the center line average height Ra. In the case where the non-conductive, lustrous metal film 6m is formed on the outer surface of the surfacing sheet 4, a concealing layer 4a may further be formed on the inner surface of the surfacing sheet 4 in order to enhance concealing properties.

Abstract translation: 非接触IC标签1包括基膜11，形成在基膜11上的非接触IC电路2,3和用作表面片4的塑料膜或纸，其具有形成的非导电，有光泽的金属膜6μm 通过沉积层压到非接触式IC标签电路2,3侧的基膜11上。 通过原子力显微镜测定的非导电光泽金属膜6μm的表面粗糙度大于10nm和100nm以下，如中心线平均高度Ra所示。 在表面材料4的外表面上形成非导电性光泽金属膜6μm的情况下，还可以在表面处理片4的内表面上形成隐蔽层4a，以增强隐蔽性 。

公开(公告)号：US20070059491A1

公开(公告)日：2007-03-15

申请号：US11595769

申请日：2006-11-10

Applicant: Sayaka Kawashima ,  Minoru Komada ,  Keiji Tokunaga

Inventor： Sayaka Kawashima ,  Minoru Komada ,  Keiji Tokunaga

IPC: G11B5/64

CPC classification number: C23C14/024 ,  H01L27/322 ,  H01L51/5253 ,  H01L2251/5338 ,  Y10S428/917 ,  Y10T428/12007 ,  Y10T428/12493 ,  Y10T428/24355 ,  Y10T428/24479

Abstract: The main object of the present invention is to provide a gas barrier substrate having a high gas barrier property without a ruggedness, a pin hole or the like in the gas barrier layer. The present invention solves the problem by providing a gas barrier substrate having a base material, a planarization layer formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer.

公开(公告)号：US20060029757A1

公开(公告)日：2006-02-09

申请号：US11078505

申请日：2005-03-11

Applicant: Minoru Komada

Inventor： Minoru Komada

IPC: B32B27/08

CPC classification number: B32B27/08 ,  Y10T428/1059 ,  Y10T428/1064 ,  Y10T428/1068 ,  Y10T428/1352 ,  Y10T428/3154 ,  Y10T428/31663

Abstract: [Object] It is an object of the present invention to provide a gas barrier film improved in gas barrier characteristics by decreasing the adsorbent of the surface of a gas barrier layer to water and the like. [Means of Solution] The present invention attains the above object by providing a gas barrier film comprising a substrate, a gas barrier layer which is a vacuum deposition film, formed on one surface or both surfaces of the above substrate, and a water-repellent layer which is a film having water repellency, formed on the above gas barrier layer.

Abstract translation: 本发明的目的是提供一种通过将阻气层的表面的吸附剂减少到水等而提高阻气性的阻气膜。 解决方案本发明通过提供一种阻气膜实现上述目的，提供一种气体阻隔膜，该阻气膜包括形成在上述基板的一个表面或两个表面上的基板，作为真空沉积膜的阻气层，以及防水 层，其是具有防水性的膜，形成在上述阻气层上。

公开(公告)号：US20060024512A1

公开(公告)日：2006-02-02

申请号：US11149448

申请日：2005-06-09

Applicant: Yoshihiro Kishimoto ,  Minoru Komada

Inventor： Yoshihiro Kishimoto ,  Minoru Komada

IPC: B32B25/20 ,  B32B9/04

CPC classification number: B32B27/308 ,  B32B3/18 ,  B32B13/12 ,  B32B2255/10 ,  B32B2255/26 ,  B32B2255/28 ,  B32B2307/412 ,  B32B2307/422 ,  B32B2307/538 ,  B32B2307/71 ,  B32B2307/7242 ,  B32B2307/7265 ,  B32B2457/20 ,  H01J2211/44 ,  Y10T428/1045 ,  Y10T428/31663

Abstract: A filter substrate including a transparent support substrate 11, a pattern layer 13, a first overcoat layer 15 formed of a reaction product prepared by a chemical reaction mainly based on hydrolysis of a starting material comprising at least a material selected from aminoalkyldialkoxysilanes, aminoalkyltrialkoxysilanes, and composites composed mainly of said compounds, and a first transparent inorganic thin-film layer 17 stacked on top of one another. The surface of the first transparent inorganic thin-film layer 17 has an Ra (average roughness) value of not more than 5 nm and an Rmax (maximum roughness) value of not more than 80 nm. A color display includes the filter substrate, and a transparent electrode layer, a luminescent layer, and a second electrode layer stacked in that order on the filter substrate. The filter substrate has excellent environmental resistance and does not adversely affect the luminance of the display.

Abstract translation: 一种过滤器基板，包括透明支撑基板11，图案层13，由主要基于水解原料的化学反应制备的反应产物形成的第一外涂层15，所述起始材料至少包含选自氨基烷基二烷氧基硅烷，氨基烷基三烷氧基硅烷和 主要由所述化合物组成的复合材料和堆叠在彼此顶部的第一透明无机薄膜层17。 第一透明无机薄膜层17的表面的Ra（平均粗糙度）值不大于5nm，Rmax（最大粗糙度）值不大于80nm。 彩色显示器包括过滤器基板，以及在过滤器基板上依次层叠的透明电极层，发光层和第二电极层。 过滤器基板具有优异的耐环境性，并且不会不利地影响显示器的亮度。

公开(公告)号：US20050084708A1

公开(公告)日：2005-04-21

申请号：US10755931

申请日：2004-01-13

Applicant: Daisaku Haoto ,  Kenji Tanaka ,  Minoru Komada

Inventor： Daisaku Haoto ,  Kenji Tanaka ,  Minoru Komada

IPC: G02B5/20 ,  H01L27/32 ,  H01L51/50 ,  H01L51/52 ,  H05B33/00 ,  H05B33/04 ,  H05B33/12 ,  H05B33/14

CPC classification number: H01L51/5256 ,  H01L27/322 ,  Y10T428/24942

Abstract: The main object is to provide an organic EL display panel capable of achieving the electromagnetic wave blocking effect without providing newly an electromagnetic wave blocking layer, and to provide an organic EL display panel having a barrier film with an uniform composition even in the case it is produced using an in line type device, capable of preventing the light emission deterioration of the organic EL due to the gas outputted from the base member, such as the oxygen and the moisture. The organic EL display panel comprises a base member, an organic EL element, and a barrier layer provided between the base member and the organic EL element, wherein the barrier layer comprises two kinds of laminated inorganic films, the inorganic film on the base member side out of the two kinds of the inorganic films is an inorganic oxide film having the conductivity, and the inorganic film on the organic EL element side is an inorganic film having the gas barrier property and the insulation property.

Abstract translation: 主要目的是提供一种能够实现电磁波阻挡效果而不提供电磁波阻挡层的有机EL显示面板，并且提供具有均匀组成的阻挡膜的有机EL显示面板，即使在它是 使用在线型装置制造的，能够防止由于基底部件输出的气体（例如氧气和水分）引起的有机EL的发光劣化。 有机EL显示面板包括基底构件，有机EL元件和设置在基底构件和有机EL元件之间的阻挡层，其中阻挡层包括两种层叠无机膜，基底构件侧的无机膜 两种无机膜中的两种是具有导电性的无机氧化物膜，有机EL元件侧的无机膜是具有阻气性和绝缘性的无机膜。

公开(公告)号：US08673404B2

公开(公告)日：2014-03-18

申请号：US12509601

申请日：2009-07-27

Applicant: Minoru Komada

Inventor： Minoru Komada

IPC: C23C16/10 ,  C23C16/08 ,  C23C16/24 ,  B32B27/08 ,  H05H1/24

CPC classification number: B32B27/08 ,  C23C14/10 ,  Y10T428/31663 ,  Y10T428/31667

Abstract: An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:160 to 190:30 to 50, a peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1030 to 1060 cm−1, a film density in a range of 2.5 to 2.7 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxi-nitride film having an atomic ratio in a range of Si:O:N:C=100:80 to 110:40 to 70:30 to 50, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration in a range of 900 to 1000 cm−1, a film density in a range of 2.7 to 3.0 g/cm3, and a distance between grains of 30 nm or shorter.

Abstract translation: 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法，以及叠层材料，用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明，提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜，其中阻挡层是原子比在Si：O：C = 100：160〜190：30〜50，由于Si-O-Si伸缩振动在1030〜1060cm -1之间的红外线吸收的峰值位置，膜密度在2.5〜2.7g / cm 3的范围内， 颗粒之间的距离为30nm或更短。 另外，在衬底膜的至少一个表面上设置有阻挡层的阻挡膜，其中阻挡层是原子比在Si：O：N：C的范围内的氧化硅氮化物膜 = 100:80〜110:40〜70:30〜50，由于Si-O伸缩振动和Si-N伸缩振动在900〜1000cm -1范围内的红外线吸收的最大峰值，膜密度 在2.7〜3.0g / cm 3的范围内，粒子间的距离为30nm以下。

公开(公告)号：US20100075082A1

公开(公告)日：2010-03-25

申请号：US12631991

申请日：2009-12-07

Applicant: Minoru KOMADA ,  Yoshihiro KISHIMOTO

Inventor： Minoru KOMADA ,  Yoshihiro KISHIMOTO

IPC: B32B1/02 ,  B32B27/06 ,  C23C14/34 ,  C23C14/35 ,  C23C14/36

CPC classification number: C23C14/10 ,  B32B27/00 ,  B32B33/00 ,  B32B2307/7244 ,  B32B2553/00 ,  C23C14/0676 ,  H01L21/02126 ,  H01L21/02266 ,  H01L21/3143 ,  H01L21/31633 ,  Y10T428/1064 ,  Y10T428/1334 ,  Y10T428/1352 ,  Y10T428/265 ,  Y10T428/28 ,  Y10T428/31667

Abstract: An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:140 to 170:20 to 40, peak position of infrared-ray absorption due to Si—O—Si stretching vibration between 1060 to 1090 cm−1, a film density in a range of 2.6 to 2.8 g/cm3, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, has a composition wherein the barrier layer is a silicon oxi-nitride film, and the silicon oxi-nitride film has an atomic ratio in a range of Si:O:N:C=100:60 to 90:60 to 90:20 to 40, a maximum peak of infrared-ray absorption due to Si—O stretching vibration and Si—N stretching vibration is in a range of 820 to 930 cm−1, a film density is in a range of 2.9 to 3.2 g/cm3, and a distance between grains is 30 nm or shorter.

Abstract translation: 本发明的目的是提供一种具有极高的阻隔性和更好的透明度的阻挡膜及其制造方法，以及叠层材料，用于包装的容器和使用阻挡膜的图像显示介质。 根据本发明，提供了一种在基材膜的至少一个表面上设置有阻挡层的阻挡膜，其中阻挡层是原子比在Si：O：C = 100：140〜170：20〜40，由于Si-O-Si伸长振动在1060〜1090cm -1之间的红外线吸收的峰值位置，膜密度在2.6〜2.8g / cm 3范围内， 颗粒之间的距离为30nm或更短。 另外，提供了在基板薄膜的至少一个表面上设置有阻挡层的阻挡膜，具有其中阻挡层为硅氧化氮膜的组成，硅氧化氮膜具有原子比 在Si：O:N:C = 100:60至90:60至90:20至40的范围内，由于Si-O伸缩振动和Si-N伸缩振动导致的红外线吸收的最大峰值为 范围为820〜930cm -1，膜密度为2.9〜3.2g / cm 3，晶粒间距离为30nm以下。