SYSTEMS AND PROCESSES FOR PRODUCING FIXED-NITROGEN COMPOUNDS

    公开(公告)号:US20210331135A1

    公开(公告)日:2021-10-28

    申请号:US17240768

    申请日:2021-04-26

    Applicant: Nitricity Inc.

    Abstract: Systems and methods for producing nitrates, nitric acid, salts thereof, or a mixture thereof are disclosed. The systems may include a feed conduit configured for receiving a feed stream comprising molecular oxygen and molecular nitrogen; an inlet conduit configured for receiving an inlet stream; a plasma reactor fluidically coupled to the inlet conduit, the plasma reactor fluidically coupled to a reactor-outlet conduit configured for receiving the reactor-outlet stream, the plasma reactor configured to produce oxidized nitrogen species; and an absorber fluidically coupled to the reactor-outlet conduit, the absorber configured to receive the reactor outlet stream and to produce nitrates, nitrites, nitric acid, salts thereof, or a mixture thereof from the reactor outlet stream. A recycle conduit may be fluidically coupled to the absorber and the inlet conduit, wherein the recycle conduit is configured to receive the gas-phase stream from the absorber and provide the gas-phase stream to the inlet conduit.

    PLASMA POWER SUPPLY USING AN INTERMITTENT POWER SOURCE

    公开(公告)号:US20230191356A1

    公开(公告)日:2023-06-22

    申请号:US18082797

    申请日:2022-12-16

    CPC classification number: B01J19/088 B01J35/0033 B01J2219/0894

    Abstract: Aspects of the present disclosure involve a power supply circuit for powering a plasma reactor and more specifically initiating and maintain a plasma therein, and that can operate with power from an intermittent power source. The power supply may include an auxiliary-power supply or trigger circuit, in addition to a primary-power supply circuit, which can reduce the need for high-voltage equipment in the high-power section of the power supply. In one particular use, the power supply includes a high-voltage power output that may be used for generating a plasma between electrodes, for example, in a nitrogen-fixation plasma system. The power supply circuit may provide the flexibility to power a plasma reactor using an intermittent power source, such as solar, wind, and/or a periodic low-cost power grid, while reducing wasteful power conditioning, lowering the cost of operation, and increasing the efficiency of chemical production from the renewable energy.

    Systems and processes for producing fixed-nitrogen compounds

    公开(公告)号:US12186728B2

    公开(公告)日:2025-01-07

    申请号:US17240768

    申请日:2021-04-26

    Applicant: Nitricity Inc.

    Abstract: Systems and methods for producing nitrates, nitric acid, salts thereof, or a mixture thereof are disclosed. The systems may include a feed conduit configured for receiving a feed stream comprising molecular oxygen and molecular nitrogen; an inlet conduit configured for receiving an inlet stream; a plasma reactor fluidically coupled to the inlet conduit, the plasma reactor fluidically coupled to a reactor-outlet conduit configured for receiving the reactor-outlet stream, the plasma reactor configured to produce oxidized nitrogen species; and an absorber fluidically coupled to the reactor-outlet conduit, the absorber configured to receive the reactor outlet stream and to produce nitrates, nitrites, nitric acid, salts thereof, or a mixture thereof from the reactor outlet stream. A recycle conduit may be fluidically coupled to the absorber and the inlet conduit, wherein the recycle conduit is configured to receive the gas-phase stream from the absorber and provide the gas-phase stream to the inlet conduit.

    DURABLE AND SERVICEABLE PLASMA REACTOR FOR FERTILIZER PRODUCTION

    公开(公告)号:US20230126050A1

    公开(公告)日:2023-04-27

    申请号:US17970075

    申请日:2022-10-20

    Applicant: Nitricity Inc.

    Abstract: Aspects of the present disclosure involve a gliding-arc type plasma reactor for use in nitrogen-based fertilizer production. The plasma reactor may include a pair of electrodes oriented in a plane within an enclosure. A pair of sheaths may attach to a corresponding electrode, with each included a strike point surface oriented to face the other sheath. The electrodes may further include an inner channel through which a cooling fluid may be pumped for heat control. A gas injection system may also be included to inject a gas into the chamber for interacting with the plasma arc and may or may not include an adjustable nozzle. The nozzle may direct air flow, including the gas, at a location at which the plasma arc may occur. The device provides for a long lifetime of components within the device and easy replacement and maintenance of the components of high-wear items.

Patent Agency Ranking