PRINTED CIRCUIT BOARD
    4.
    发明申请
    PRINTED CIRCUIT BOARD 失效
    印刷电路板

    公开(公告)号:US20120051001A1

    公开(公告)日:2012-03-01

    申请号:US12916615

    申请日:2010-10-31

    IPC分类号: H05K1/00

    CPC分类号: H05K1/0225 H05K1/0243

    摘要: A PCB includes a number of insulation layers, a number of circuit layers, a signal-interfering component, and a signal-sensitive component. The circuit layers and the insulation layers are stacked alternately. The circuit layers include at least two first circuit layers, a second circuit layer, and a ground layer. The ground layer has a first side and a second side facing away the first side. The first circuit layers are positioned near the first side and include an outmost first circuit layer and at least one inner first circuit layer positioned between the outmost first circuit layer and the ground layer. The second circuit layer is positioned near the second side. The signal-interfering component is positioned on the outmost first circuit layer. The signal-sensitive component is positioned on the second circuit layer. Each inner first circuit layer defines a copper-remove area corresponding to an orthogonal projection of the signal-interfering component thereon.

    摘要翻译: PCB包括多个绝缘层,多个电路层,信号干扰部件和信号敏感部件。 电路层和绝缘层交替堆叠。 电路层包括至少两个第一电路层,第二电路层和接地层。 接地层具有朝向第一侧的第一侧和第二侧。 第一电路层位于第一侧附近,并且包括位于最外层的第一电路层和接地层之间的最外层的第一电路层和至少一个内部第一电路层。 第二电路层位于第二侧附近。 信号干扰部件位于最外侧的第一电路层。 信号敏感部件位于第二电路层上。 每个内部第一电路层限定对应于其上的信号干扰部件的正交投影的铜去除区域。

    System and method of microscopic imaging and soft tissue tension measurements
    5.
    发明授权
    System and method of microscopic imaging and soft tissue tension measurements 有权
    微观成像和软组织张力测量的系统和方法

    公开(公告)号:US07998094B1

    公开(公告)日:2011-08-16

    申请号:US12426012

    申请日:2009-04-17

    IPC分类号: A61B5/103 A61B5/117

    CPC分类号: A61B5/0059 A61B5/4519

    摘要: An apparatus and method for examining fiber tension, fiber stress, sarcomere length, etc. in muscle fibers and tension and stress in ligament or tendon tissues as well as brain or nerve fibers by applying a lifting force to lift the fiber or tissue a lifting distance, measuring the lifting force and distance and calculating the axial tension on the fiber bundle or tissue. The apparatus and method also make it possible to illuminate and view the fiber bundle or tissue to examine and characterize visually observable properties.

    摘要翻译: 通过施加提升力提升纤维或组织提升距离,检查肌纤维中的纤维张力,纤维应力,肌节长度等在韧带或腱组织以及脑或神经纤维中的张力和应力的装置和方法 测量提升力和距离并计算纤维束或组织上的轴向张力。 该装置和方法还使得可以照亮和观察纤维束或组织以检查和表征视觉可观察的性质。

    Enzymatic Assays Using Umbelliferone Substrates with Cyclodextrins in Droplets of Oil
    6.
    发明申请
    Enzymatic Assays Using Umbelliferone Substrates with Cyclodextrins in Droplets of Oil 有权
    使用伞形酮底物与环糊精在油滴中的酶检测

    公开(公告)号:US20110118132A1

    公开(公告)日:2011-05-19

    申请号:US13012831

    申请日:2011-01-25

    IPC分类号: C40B30/00 C12Q1/00

    CPC分类号: C12Q1/00

    摘要: The invention is directed to droplet actuator devices and assay methods. The method may include, among other things, a method of conducting enzymatic assays using umbelliferone substrates with cyclodextrins in droplets in oil, the method including incubating a droplet in oil, the droplet preferably comprising an umbelliferone substrate, a sample, and a cyclodextrin compound. The methods may further include a method of substantially eliminating cross-contamination between droplets in enzymatic containing substrate-based bioassays. The method may include immobilization of the enzymatic substrate including forming an inclusion complex with the substrate for stabilizing the substrate within an aqueous environment, wherein the inclusion complex may be formed using cyclodextrins. In yet another embodiment, the invention may provide a method of enhancing hydrolysis of enzymatic substrates. The methods may further include a method of forming an inclusion complex with the substrate for stabilizing the substrate within an aqueous environment, wherein the substrate may be a 4-MU- or HMU containing substrate. The inclusion complex may be formed using cyclodextrin.

    摘要翻译: 本发明涉及液滴致动器装置和测定方法。 该方法尤其可以包括使用具有环糊精的伞形酮底物在油中的液滴进行酶测定的方法,所述方法包括将液滴在油中孵育,所述液滴优选包含伞形酮底物,样品和环糊精化合物。 所述方法还可以包括基本上消除含酶底物生物测定中的液滴之间的交叉污染的方法。 该方法可以包括固定酶底物,包括与底物形成包合物以使其在水性环境中稳定,其中包合物可以使用环糊精形成。 在另一个实施方案中,本发明可提供增强酶底物水解的方法。 所述方法还可以包括在水性环境中与基材形成包含配合物以稳定基材的方法,其中所述基材可以是含有4-MU-或HMU的底物。 包合物可以使用环糊精形成。

    METHOD AND APPARATUS OF CLOCK TRANSMISSION BETWEEN NETWORKS
    8.
    发明申请
    METHOD AND APPARATUS OF CLOCK TRANSMISSION BETWEEN NETWORKS 有权
    网络之间的时钟传输方法与装置

    公开(公告)号:US20090207863A1

    公开(公告)日:2009-08-20

    申请号:US12433285

    申请日:2009-04-30

    IPC分类号: H04J3/00

    摘要: A method of clock transmission between networks and an apparatus of clock transmission are disclosed, in which a second group of information corresponding to a clock transferred by a first network equipment based on a first protocol, and the second group of information corresponding to a clock transferred by a second network equipment based on a second protocol are acquired, and a source selection is performed in a united way by adopting a source selection manner based on the second protocol according to the second group of information. Therefore, the equipment in different types of networks can conveniently select a clock with a higher class from clocks transferred based on different protocols, so as to realize a normalization management on the clocks transferred based on different protocols.

    摘要翻译: 公开了一种网络之间的时钟传输方法和时钟传输装置,其中对应于由第一网络设备基于第一协议传送的时钟的第二组信息和对应于传送的时钟的第二组信息 获取基于第二协议的第二网络设备,并且根据第二组信息采用基于第二协议的源选择方式,以统一的方式执行源选择。 因此,不同类型网络中的设备可以方便地从基于不同协议传输的时钟中选择具有较高等级的时钟,从而实现基于不同协议传输的时钟的归一化管理。

    Projection display system of quasi-axial optical imagery
    9.
    发明申请
    Projection display system of quasi-axial optical imagery 审中-公开
    准轴光学图像投影显示系统

    公开(公告)号:US20080151199A1

    公开(公告)日:2008-06-26

    申请号:US11644395

    申请日:2006-12-21

    IPC分类号: G03B21/20

    CPC分类号: G03B21/20 G03B21/28

    摘要: A quasi-axial optical imagery projection system is disclosed in this paper. The system includes optical imagery sets; each may be lenses, mirrors, or a combination of both. The system also has a light source close to an imager, which may be a planar mask with a pattern, a LCD imager, or other suitable imagers. The system also has a display screen. Both the imager and the display screen are set at acute angles with respect to an optical axis so that what is projected on the display screen is a magnified image of the imager by a magnification factor that has a transverse component and a longitudinal component. This quasi-axial projection system may be made thinner than other rear projection system of comparable screen size.

    摘要翻译: 本文公开了一种准轴向光学投影系统。 该系统包括光学图像集; 每个可以是透镜,镜子或两者的组合。 该系统还具有靠近成像器的光源,其可以是具有图案的平面掩模,LCD成像器或其他合适的成像器。 该系统还具有显示屏。 成像器和显示屏都相对于光轴设置成锐角,使得在显示屏上投影的是通过具有横向分量和纵向分量的放大因子的成像器的放大图像。 该准轴向投影系统可以制成比具有相当的屏幕尺寸的其它后投影系统更薄。

    Method of fabricating semiconductor devices and method of removing a spacer
    10.
    发明授权
    Method of fabricating semiconductor devices and method of removing a spacer 有权
    制造半导体器件的方法和去除间隔物的方法

    公开(公告)号:US07338910B2

    公开(公告)日:2008-03-04

    申请号:US11162952

    申请日:2005-09-29

    IPC分类号: H01L21/302 H01L21/461

    摘要: A method of fabricating a semiconductor device is disclosed. The method includes defining an electrode on a semiconductor substrate; forming a spacer on at least one sidewall of the electrode; performing a process operation on the semiconductor substrate using the spacer as a mask and forming a material layer on the top or the surface of the semiconductor substrate and the electrode; and removing the spacer by steps of performing a wet etching process at a temperature in a range of 100° C. to 150° C. to etch the spacer using an acid solution containing phosphoric acid as an etchant. With respect to another aspect, a method of removing a spacer is also disclosed. The method includes performing a wet etching process at a temperature in a range of 100° C. to 150° C. to etch the spacer using an acid solution containing phosphoric acid as an etchant.

    摘要翻译: 公开了制造半导体器件的方法。 该方法包括在半导体衬底上限定电极; 在所述电极的至少一个侧壁上形成间隔物; 在所述半导体衬底上使用所述间隔件作为掩模进行处理操作,并在所述半导体衬底和所述电极的顶部或表面上形成材料层; 并且通过在100℃至150℃的温度范围内进行湿蚀刻工艺的步骤去除间隔物,以使用含有磷酸作为蚀刻剂的酸溶液蚀刻间隔物。 关于另一方面,还公开了一种去除间隔物的方法。 该方法包括在100℃至150℃范围内的温度下进行湿蚀刻工艺,以使用含有磷酸作为蚀刻剂的酸溶液蚀刻间隔物。