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公开(公告)号:US20100221882A1
公开(公告)日:2010-09-02
申请号:US12662962
申请日:2010-05-13
IPC分类号: H01L21/336
CPC分类号: B82B1/005 , B82Y10/00 , H01L21/0237 , H01L21/02392 , H01L21/02521 , H01L21/02543 , H01L21/02546 , H01L21/02603 , H01L21/02639 , H01L21/02645 , H01L21/02653 , H01L27/10808 , H01L27/10873 , H01L29/0665 , H01L29/0669 , H01L29/0673 , H01L29/0676 , H01L29/732 , H01L29/7371 , H01L29/78642 , H01L29/78681 , H01L29/78696 , H01L33/02 , H01L33/18 , H01L33/20 , H01L33/24 , Y10S977/762 , Y10S977/938
摘要: The present invention relates to semiconductor devices comprising semiconductor nanoelements. In particular the invention relates to devices having a volume element having a larger diameter than the nanoelement arranged in epitaxial connection to the nanoelement. The volume element is being doped in order to provide a high charge carrier injection into the nanoelement and a low access resistance in an electrical connection. The nanoelement may be upstanding from a semiconductor substrate. A concentric layer of low resistivity material forms on the volume element forms a contact.
摘要翻译: 本发明涉及包含半导体纳米元件的半导体器件。 具体地说,本发明涉及一种具有体积元件的装置,该体积元件的直径大于与纳米元件外延连接的纳米元件的直径。 体积元件正在被掺杂以便提供高电荷载流子注入纳米元件和电连接中的低访问阻力。 纳米元件可以从半导体衬底直立。 在体积元件上形成的低电阻率材料的同心层形成接触。