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公开(公告)号：US09638664B2
公开(公告)日：2017-05-02
申请号：US13994086
申请日：2012-03-06
申请人： Piotr Glowacki , Guy James Reynolds
发明人： Piotr Glowacki , Guy James Reynolds
CPC分类号： G01N27/62 , A61C19/04 , G01N27/70 , H05H1/2406 , H05H2001/2412 , H05H2245/122
摘要： A method of material analysis, including; placing an electrode in proximity to the material; applying a voltage signal to generate plasma, preferably Dielectric Barrier Discharge in Air, between the material and the electrode; moving the electrode relative to the surface; monitoring an electrical signal associated with the microdischarge; and detecting a change in a physical characteristic of the material through variation in the monitored signal.
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公开(公告)号：US08910590B2
公开(公告)日：2014-12-16
申请号：US13201280
申请日：2010-02-12
申请人： Conor Nicholas Martin , Guy Reynolds , Piotr Glowacki , Satyanarayan Barik , Patrick Po-Tsang Chen , Marie-Pierre Francoise Wintrebert Ep Fouquet
发明人： Conor Nicholas Martin , Guy Reynolds , Piotr Glowacki , Satyanarayan Barik , Patrick Po-Tsang Chen , Marie-Pierre Francoise Wintrebert Ep Fouquet
IPC分类号： H01J37/32 , H01L21/28 , C23C16/30 , C23C16/452 , C23C16/455 , C30B29/40 , H01L21/02 , C30B25/10 , C30B25/16
CPC分类号： H01J37/32449 , C23C16/303 , C23C16/452 , C23C16/45523 , C30B25/105 , C30B25/165 , C30B29/403 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32633 , H01L21/0237 , H01L21/02521 , H01L21/0262 , Y10T137/8593
摘要： An apparatus for depositing a group III metal nitride film on a substrate, the apparatus comprising a plasma generator to generate a nitrogen plasma from a nitrogen source, a reaction chamber in which to react a reagent comprising a group III metal with a reactive nitrogen species derived from the nitrogen plasma so as to deposit a group III metal nitride on the substrate, a plasma inlet to facilitate the passage of nitrogen plasma from the plasma generator into the reaction chamber and a baffle having one or more flow channels for passage of the nitrogen plasma. The baffle is located between the plasma inlet and the substrate and prevents a direct line of passage for nitrogen plasma between the plasma inlet and the substrate.
摘要翻译： 一种用于在基板上沉积III族金属氮化物膜的装置，该装置包括用于从氮源产生氮等离子体的等离子体发生器，其中使包含III族金属的试剂与衍生的反应性氮物质反应的反应室 从氮等离子体中沉积第III族金属氮化物到基板上，等离子体入口以促进氮等离子体从等离子体发生器通入反应室，以及具有一个或多个流动通道以使氮等离子体通过的挡板 。 挡板位于等离子体入口和基板之间，并且防止等离子体入口和基板之间的氮等离子体的直通通道。
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公开(公告)号：US20120070963A1
公开(公告)日：2012-03-22
申请号：US13201280
申请日：2010-02-12
申请人： Conor Nicholas Martin , Guy Raynolds , Piotr Glowacki , Satyanarayan Barik , Patrick po-Tsang Chen , Marie-Pierre Francoise Trebert Ep Fouquet
发明人： Conor Nicholas Martin , Guy Raynolds , Piotr Glowacki , Satyanarayan Barik , Patrick po-Tsang Chen , Marie-Pierre Francoise Trebert Ep Fouquet
CPC分类号： H01J37/32449 , C23C16/303 , C23C16/452 , C23C16/45523 , C30B25/105 , C30B25/165 , C30B29/403 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32633 , H01L21/0237 , H01L21/02521 , H01L21/0262 , Y10T137/8593
摘要： An apparatus for depositing a group III metal nitride film on a substrate, the apparatus comprising a plasma generator to generate a nitrogen plasma from a nitrogen source, a reaction chamber in which to react a reagent comprising a group III metal with a reactive nitrogen species derived from the nitrogen plasma so as to deposit a group III metal nitride on the substrate, a plasma inlet to facilitate the passage of nitrogen plasma from the plasma generator into the reaction chamber and a baffle having one or more flow channels for passage of the nitrogen plasma. The baffle is located between the plasma inlet and the substrate and prevents a direct line of passage for nitrogen plasma between the plasma inlet and the substrate.
摘要翻译： 一种用于在基板上沉积III族金属氮化物膜的装置，该装置包括用于从氮源产生氮等离子体的等离子体发生器，其中使包含III族金属的试剂与衍生的反应性氮物质反应的反应室 从氮等离子体中沉积第III族金属氮化物到基板上，等离子体入口以促进氮等离子体从等离子体发生器通入反应室，以及具有一个或多个流动通道以使氮等离子体通过的挡板 。 挡板位于等离子体入口和基板之间，并且防止等离子体入口和基板之间的氮等离子体的直通通道。
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公开(公告)号：US20150112300A1
公开(公告)日：2015-04-23
申请号：US14474060
申请日：2014-08-29
CPC分类号： A61K9/0009 , A61K33/06 , A61K33/16 , A61K33/42 , A61N1/0404 , A61N1/327 , A61N1/40 , A61N1/44
摘要： A method of enhanced trans-tissue delivery of therapeutic substances including; placing an electrode in proximity to human or animal tissue covered with material of sufficient concentration of such substances; applying a voltage signal to generate plasma, preferably Dielectric Barrier Discharge in Air, between the tissue and the electrode.
摘要翻译： 一种增强治疗物质的跨组织递送的方法，包括： 将电极放置在覆盖有足够浓度的这种物质的材料的人或动物组织附近; 施加电压信号以在组织和电极之间产生等离子体，优选在空气中的介电阻挡放电。
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公开(公告)号：US20130285639A1
公开(公告)日：2013-10-31
申请号：US13994086
申请日：2012-03-06
申请人： Piotr Glowacki , Guy James Reynolds
发明人： Piotr Glowacki , Guy James Reynolds
IPC分类号： G01N27/62
CPC分类号： G01N27/62 , A61C19/04 , G01N27/70 , H05H1/2406 , H05H2001/2412 , H05H2245/122
摘要： A method of material analysis, including; placing an electrode in proximity to the material; applying a voltage signal to generate plasma, preferably Dielectric Barrier Discharge in Air, between the material and the electrode; moving the electrode relative to the surface; monitoring an electrical signal associated with the microdischarge; and detecting a change in a physical characteristic of the material through variation in the monitored signal.
摘要翻译： 材料分析方法，包括 将电极放置在材料附近; 施加电压信号以在材料和电极之间产生等离子体，优选在空气中的介电阻挡放电; 相对于表面移动电极; 监测与微放电相关联的电信号; 以及通过监视信号的变化来检测材料的物理特性的变化。
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