公开(公告)号：US08294125B2

公开(公告)日：2012-10-23

申请号：US12634444

申请日：2009-12-09

Applicant: Liqun Han ,  Marian Mankos ,  Xinrong Jiang ,  Rex Runyon ,  John Greene

Inventor： Liqun Han ,  Marian Mankos ,  Xinrong Jiang ,  Rex Runyon ,  John Greene

IPC: H01J37/20 ,  H01J37/29 ,  G01N23/225

CPC classification number: H01J37/09 ,  G01B15/00 ,  H01J37/28 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/2817 ,  H01L22/12

Abstract: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.

Abstract translation: 一个实施例涉及一种用于缺陷检查和/或检查基板或用于测量基板上的特征的关键尺寸的电子束装置。 该装置包括电子枪和电子柱。 电子枪包括被配置为产生用于电子束的电子的电子源和可调节的光束限制孔，其被配置为从一定范围的孔径尺寸中选择和使用一个孔径尺寸。 另一实施例涉及在装置中提供电子束。 有利地，所公开的装置和方法在保持高光束电流的同时减少斑点模糊，以便获得高灵敏度和高吞吐量。

公开(公告)号：US20110069306A1

公开(公告)日：2011-03-24

申请号：US12994793

申请日：2009-05-29

Applicant: Paul Doyle ,  Guoheng Zhao ,  Alexander Belyaev ,  J. Rex Runyon

Inventor： Paul Doyle ,  Guoheng Zhao ,  Alexander Belyaev ,  J. Rex Runyon

IPC: G01N21/88 ,  G01R31/26

CPC classification number: H01L21/6838

Abstract: A tool for investigating a substrate, where the tool has a tool head for investigating the substrate, a chuck for disposing an upper surface of the substrate in proximity to the tool head, and an air bearing disposed on the tool head adjacent the substrate. The air bearing has a pressure source and a vacuum source, where the vacuum source draws the substrate toward the air bearing and the pressure source prevents the substrate from physically contacting the air bearing. The pressure source and the vacuum source work in cooperation to dispose the upper surface of the substrate at a known distance from the tool head. By using the air bearing as part of the tool in this manner, registration of the substrate to the tool head is accomplished relative to the upper surface of the substrate, not the back side of the substrate.

Abstract translation: 一种用于调查基板的工具，其中该工具具有用于检查基板的工具头，用于将基板的上表面设置在工具头附近的卡盘以及设置在与基板相邻的工具头上的空气轴承。 空气轴承具有压力源和真空源，其中真空源将基板拉向空气轴承，并且压力源防止基板物理接触空气轴承。 压力源和真空源协同工作，将衬底的上表面设置在与工具头一段已知距离处。 通过以这种方式使用空气轴承作为工具的一部分，基板相对于基板的上表面而不是基板的背面完成对准工具头。

公开(公告)号：US20110114838A1

公开(公告)日：2011-05-19

申请号：US12634444

申请日：2009-12-09

Applicant: Liqun HAN ,  Marian MANKOS ,  Xinrong JIANG ,  Rex RUNYON ,  John GREENE

Inventor： Liqun HAN ,  Marian MANKOS ,  Xinrong JIANG ,  Rex RUNYON ,  John GREENE

IPC: G01N23/00

CPC classification number: H01J37/09 ,  G01B15/00 ,  H01J37/28 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/2817 ,  H01L22/12

Abstract: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.

Abstract translation: 一个实施例涉及一种用于缺陷检查和/或检查基板或用于测量基板上的特征的关键尺寸的电子束装置。 该装置包括电子枪和电子柱。 电子枪包括被配置为产生用于电子束的电子的电子源和可调节的光束限制孔，其被配置为从一定范围的孔径尺寸中选择和使用一个孔径尺寸。 另一实施例涉及在装置中提供电子束。 有利地，所公开的装置和方法在保持高光束电流的同时减少斑点模糊，以便获得高灵敏度和高吞吐量。

公开(公告)号：US06686995B2

公开(公告)日：2004-02-03

申请号：US10163762

申请日：2002-06-04

Applicant: Dieter E. Wilk ,  Anlun Tang ,  Eric N. Vella ,  Rex Runyon ,  Jamie Michael Sullivan ,  Ralph Thomas Johnson

Inventor： Dieter E. Wilk ,  Anlun Tang ,  Eric N. Vella ,  Rex Runyon ,  Jamie Michael Sullivan ,  Ralph Thomas Johnson

IPC: G01N2188

CPC classification number: G02B27/46 ,  G01N21/95623

Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square. The PSF provides selective filtering in two directions. In other words, the PSF provides two dimensional filtering.

Abstract translation: 公开了一种用于选择性地过滤在光学系统内被检查的样品发出的光的空间部分的机构。 在一个实施例中，可编程空间滤波器（PSF）由与UV波长范围的一部分中的光兼容的材料构成。 在具体实施方案中，PSF由诸如聚合物稳定的液晶材料的UV相容材料构成。 在另一方面，PSF还包括由UV级玻璃形成的一对板。 PSF还可以包括相对薄的第一和第二ITO层，其导致约100和约300Ω/平方之间的薄层电阻。 PSF在两个方向提供选择性滤波。 换句话说，PSF提供二维滤波。

公开(公告)号：US06686994B2

公开(公告)日：2004-02-03

申请号：US10163398

申请日：2002-06-04

Applicant: Dieter Wilk ,  Anlun Tang ,  Eric N. Vella ,  Rex Runyon ,  Jamie M. Sullivan

Inventor： Dieter Wilk ,  Anlun Tang ,  Eric N. Vella ,  Rex Runyon ,  Jamie M. Sullivan

IPC: G01N2188

CPC classification number: G01N21/95623 ,  G02B27/46 ,  G02F2001/13775 ,  G02F2203/055

Abstract: Disclosed are mechanisms for selectively filtering spatial portions of light emanating from a sample under inspection within an optical system. In one embodiment, a programmable spatial filter (PSF) is constructed from materials that are compatible with light in a portion of the UV wavelength range. In a specific implementation, the PSF is constructed from a UV compatible material, such as a polymer stabilized liquid crystal material. In a further aspect, the PSF also includes a pair of plates that are formed from a UV grade glass. The PSF may also include a relatively thin first and second ITO layer that results in a sheet resistance between about 100 and about 300 &OHgr; per square.

Abstract translation: 公开了一种用于选择性地过滤在光学系统内被检查的样品发出的光的空间部分的机构。 在一个实施例中，可编程空间滤波器（PSF）由与UV波长范围的一部分中的光兼容的材料构成。 在具体实施方案中，PSF由诸如聚合物稳定的液晶材料的UV相容材料构成。 在另一方面，PSF还包括由UV级玻璃形成的一对板。 PSF还可以包括相对薄的第一和第二ITO层，其导致约100和约300Ω/平方之间的薄层电阻。

公开(公告)号：US20120062877A1

公开(公告)日：2012-03-15

申请号：US13226032

申请日：2011-09-06

Applicant: Paul Doyle ,  Guoheng Zhao ,  Alexander Belyaev ,  J. Rex Runyon ,  Christian H. Wolters ,  Howard W. Dando ,  Mehdi Vaez-Iravani

Inventor： Paul Doyle ,  Guoheng Zhao ,  Alexander Belyaev ,  J. Rex Runyon ,  Christian H. Wolters ,  Howard W. Dando ,  Mehdi Vaez-Iravani

IPC: G01N21/88 ,  G01R31/26

CPC classification number: H01L21/6838

Abstract: A tool for investigating a substrate, where the tool has a tool head for investigating the substrate, a chuck for disposing an upper surface of the substrate in proximity to the tool head, and an air bearing disposed on the tool head adjacent the substrate. The air bearing has a pressure source and a vacuum source, where the vacuum source draws the substrate toward the air bearing and the pressure source prevents the substrate from physically contacting the air bearing. The pressure source and the vacuum source work in cooperation to dispose the upper surface of the substrate at a known distance from the tool head. By using the air bearing as part of the tool in this manner, registration of the substrate to the tool head is accomplished relative to the upper surface of the substrate, not the back side of the substrate.

Abstract translation: 一种用于调查基板的工具，其中该工具具有用于检查基板的工具头，用于将基板的上表面设置在工具头附近的卡盘以及设置在与基板相邻的工具头上的空气轴承。 空气轴承具有压力源和真空源，其中真空源将基板拉向空气轴承，并且压力源防止基板物理接触空气轴承。 压力源和真空源协同工作，将衬底的上表面设置在与工具头一段已知距离处。 通过以这种方式使用空气轴承作为工具的一部分，基板相对于基板的上表面而不是基板的背面完成对准工具头。

公开(公告)号：US20090225399A1

公开(公告)日：2009-09-10

申请号：US12042252

申请日：2008-03-04

Applicant: Guoheng Zhao ,  Rex Runyon ,  Mehdi Vaez-Iravani

Inventor： Guoheng Zhao ,  Rex Runyon ,  Mehdi Vaez-Iravani

IPC: G02B26/08 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2201/10 ,  G01N2201/104 ,  G02B26/123 ,  Y10S359/90

Abstract: A multi-spot scanning technique using a spot array having a predetermined gap between spots can advantageously provide scalability to a large number of spots as well as the elimination of cross-talk between channels. The multi-spot scanning technique can select a number of spots for the spot array (1D or 2D), determine a separation between the spots to minimize crosstalk, and perform a scan on a wafer using the spot array and a full field of view (FOV). Performing the scan includes performing a plurality of scan line cycles, wherein each scan line cycle can fill in gaps left by previous scan line cycles. This “delay and fill” scan allows large spacing between spots, thereby eliminating cross-talk at the detector plane. In one embodiment, the scan is begun and ended outside a desired scan area on the wafer to ensure full scan coverage.

Abstract translation: 使用具有点之间的预定间隙的点阵列的多点扫描技术可以有利地提供大量斑点的可扩展性以及消除通道之间的串扰。 多点扫描技术可以选择点阵列（1D或2D）的多个斑点，确定斑点之间的间隔以最小化串扰，并使用斑点阵列和全视场对晶片进行扫描（ FOV）。 执行扫描包括执行多个扫描线周期，其中每个扫描线周期可以填充先前扫描线周期留下的间隙。 这种“延迟和填充”扫描允许斑点之间的大间距，从而消除检测器平面处的串扰。 在一个实施例中，扫描开始并在晶片上期望的扫描区域外部结束以确保全扫描覆盖。

公开(公告)号：US08461526B2

公开(公告)日：2013-06-11

申请号：US12958174

申请日：2010-12-01

Applicant: Marian Mankos ,  Liqun Han ,  Xinrong Jiang ,  Rex Runyon ,  Carmela Moreno

Inventor： Marian Mankos ,  Liqun Han ,  Xinrong Jiang ,  Rex Runyon ,  Carmela Moreno

IPC: G01N23/00

CPC classification number: H01J37/04 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/186 ,  H01J2237/24535

Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

Abstract translation: 在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

公开(公告)号：US20120138791A1

公开(公告)日：2012-06-07

申请号：US12958174

申请日：2010-12-01

Applicant: Marian MANKOS ,  Liqun HAN ,  Xinrong JIANG ,  Rex RUNYON ,  Carmela MORENO

Inventor： Marian MANKOS ,  Liqun HAN ,  Xinrong JIANG ,  Rex RUNYON ,  Carmela MORENO

IPC: G01N23/00 ,  H01J1/50

CPC classification number: H01J37/04 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/186 ,  H01J2237/24535

Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.

Abstract translation: 在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。 发射电子的源被定位在第一真空室内。 光束限制孔被配置成通过发射电子的有限角度范围。 磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。 物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。 可控制偏转器被配置为在衬底表面的区域上扫描束斑。 还公开了其它特征和实施例。

公开(公告)号：US08194301B2

公开(公告)日：2012-06-05

申请号：US12042252

申请日：2008-03-04

Applicant: Guoheng Zhao ,  Rex Runyon ,  Mehdi Vaez-Iravani

Inventor： Guoheng Zhao ,  Rex Runyon ,  Mehdi Vaez-Iravani

IPC: G02B26/08

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2201/10 ,  G01N2201/104 ,  G02B26/123 ,  Y10S359/90

Abstract: A multi-spot scanning technique using a spot array having a predetermined gap between spots can advantageously provide scalability to a large number of spots as well as the elimination of cross-talk between channels. The multi-spot scanning technique can select a number of spots for the spot array (1D or 2D), determine a separation between the spots to minimize crosstalk, and perform a scan on a wafer using the spot array and a full field of view (FOV). Performing the scan includes performing a plurality of scan line cycles, wherein each scan line cycle can fill in gaps left by previous scan line cycles. This “delay and fill” scan allows large spacing between spots, thereby eliminating cross-talk at the detector plane. In one embodiment, the scan is begun and ended outside a desired scan area on the wafer to ensure full scan coverage.

Abstract translation: 使用具有点之间的预定间隙的点阵列的多点扫描技术可以有利地提供大量斑点的可扩展性以及消除通道之间的串扰。 多点扫描技术可以为斑点阵列（1D或2D）选择多个斑点，确定斑点之间的距离以最小化串扰，并使用斑点阵列和全视场对晶片进行扫描（ FOV）。 执行扫描包括执行多个扫描线周期，其中每个扫描线周期可以填充先前扫描线周期留下的间隙。 这种“延迟和填充”扫描允许斑点之间的大间距，从而消除检测器平面处的串扰。 在一个实施例中，扫描开始并在晶片上期望的扫描区域外部结束以确保全扫描覆盖。