中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

24 records (took 0.013 seconds)

    Method of determining an overlap distance of an optical head and digital exposure device using the method
    5.
    发明授权
    Method of determining an overlap distance of an optical head and digital exposure device using the method 有权
    使用该方法确定光学头和数字曝光装置的重叠距离的方法

    公开(公告)号：US08625109B2

    公开(公告)日：2014-01-07

    申请号：US12902745

    申请日：2010-10-12

    Applicant: Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

    Inventor： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

    IPC: G01B11/14 ,  G03B27/32 ,  G03F9/00 ,  G03C5/00

    CPC classification number: G01B11/14 ,  G03F7/70291 ,  G03F7/70475

    Abstract: An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.

    Abstract translation: 公开了一种用于确定光学头的重叠距离的装置和方法。 可以测量每个光点的位置和光量分布，其可以从光学头到基底提供。 高斯分布可以应用于位置和光量分布，以计算每个光点的补偿模型。 如果光头使用补偿模型沿着衬底的第一方向扫描，则可以计算对应于衬底的每个第一区域的第一累积光量。 如果光头沿着使用补偿模型在第二方向上以第一距离移动的第一方向进行扫描，则计算与每个第一区域重叠的每个第二区域对应的第二累积光量。 可以基于第一和第二累积光量的相加的均匀性来确定重叠距离。

    Digital exposure method and digital exposure device for performing the method
    6.
    发明授权
    Digital exposure method and digital exposure device for performing the method 有权
    用于执行该方法的数字曝光方法和数字曝光装置

    公开(公告)号：US08477288B2

    公开(公告)日：2013-07-02

    申请号：US12906623

    申请日：2010-10-18

    Applicant: Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

    Inventor： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

    IPC: G03B27/54 ,  G03B27/42

    CPC classification number: G03B27/526 ,  G03B27/52 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70541

    Abstract: A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.

    Abstract translation: 公开了一种用于执行该方法的数字曝光方法和数字曝光装置。 在该方法中，与形成在基板上的多个图案中的每一个对应地生成图形数据系统文件。 然后，从图形数据系统文件生成数字微镜装置开/关数据。 然后，响应于数字微镜装置的开/关数据曝光基板。 因此，可以同时执行用于形成显示面板的第一图案的第一曝光和用于形成基板和每个显示面板的识别号和去除基板的边缘部分的第二曝光，以简化曝光过程 降低成本

    Maskless exposure apparatus and stitching exposure method using the same
    9.
    发明授权
    Maskless exposure apparatus and stitching exposure method using the same 有权
    无掩模曝光装置和使用其的缝合曝光方法

    公开(公告)号：US09019471B2

    公开(公告)日：2015-04-28

    申请号：US13064679

    申请日：2011-04-08

    Applicant: Jeong Min Kim ,  Sang Don Jang ,  Sang Woo Bae

    Inventor： Jeong Min Kim ,  Sang Don Jang ,  Sang Woo Bae

    IPC: G03B27/42 ,  G03F7/20

    CPC classification number: G03F7/2051 ,  G03F7/70291 ,  G03F7/70475

    Abstract: Disclosed herein are a maskless exposure apparatus configured to perform exposure by tilting a beam spot array with respect to a scan direction (Y-axis direction) thus preventing stitching stripes and a stitching method using the same. A step distance, in which exposure dose uniformity in a stitching area is within a tolerance range, is calculated using actual position data of beam spots constituting the beam spot array on an exposure plane, and if necessary, using beam power data and/or beam size data. As exposure is performed based on image data conforming to the step distance, the stitching area has a uniform exposure dose, enabling exposure without stitching stripes.

    Abstract translation: 这里公开了一种无掩模曝光装置，其被配置为通过相对于扫描方向（Y轴方向）倾斜光束阵列来进行曝光，从而防止缝合条纹和使用其的缝合方法。 使用在曝光平面上构成束斑阵列的光束点的实际位置数据计算缝合区域中的曝光剂量均匀性在公差范围内的步距，并且如果需要，使用光束功率数据和/或光束 大小数据。 当基于符合步距的图像数据进行曝光时，缝合区域具有均匀的曝光量，能够在不缝合条纹的情况下进行曝光。

Patent Agency Ranking