摘要:
A method for preventing contaminating gaseous substances (18) from passing through an opening (17b) in a housing (4a) of an EUV lithography apparatus (1), wherein at least one optical element for guiding EUV radiation (6) is arranged in the housing (4a). The method involves: generating at least one gas flow (21a, 21b) which deflects the contaminating substances (18, 18′), and in particular is directed counter to the flow direction (Z) thereof, in the region of the opening (17b). The gas flow (21a, 21b) and the EUV radiation (6) are generated in pulsed fashion and the pulse rate of the gas flow (21a, 21b) is defined in a manner dependent on the pulse rate of the contaminating substances (18, 18′) released under the action of the pulsed EUV radiation (6), wherein both pulse rates are preferably equal in magnitude, and wherein, in the region of the opening (17b), the gas pulses temporally overlap the pulses of the contaminating substances (18, 18′). An associated EUV lithography apparatus at which the method can be carried out is also disclosed.
摘要:
Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10−4 Torr or of more than 10−3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 Å/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.
摘要:
A throttle valve positioning device is disclosed, The device has a housing with a bearing for a throttle valve shaft and a throttle valve support, within which a throttle valve pivots which sits on the throttle valve shaft, running into a shaft passage in the support. With the device, air leakage may be avoided, such that the periphery of the throttle valve is arranged at a separation from a passage for the throttle valve shaft in. the throttle valve support.
摘要:
A signal converter for converting a start signal into an end signal includes means for copying the start signal to obtain a plurality of copied start signals, wherein a copied start signal may be fed into a processing branch as a branch signal. Further, the signal converter includes a first branch processing means in a first processing branch for processing a first branch signal according to a first processing regulation to obtain a first processed branch signal. Further, the signal converter includes a second branch processing means in a second processing branch for processing a second branch signal according to a second processing regulation to obtain a second processed branch signal, wherein the second processing regulation is different from the first processing regulation and wherein the first processing regulation and the second processing regulation are implemented to cause a low-pass polyphase filtering of the copied start signals. Finally, the signal converter includes selection means for sequentially selecting the first processed branch signal and then the second processed branch signal in order to obtain the end signal.
摘要:
A signal processor for processing a receiving signal having a first usable frequency band and a second usable frequency band includes a first mixer for mixing the receiving signal with a first local oscillator signal, wherein a frequency of the first local oscillator signal is asymmetrical between the first usable frequency band and the second usable frequency band. The first mixer is implemented to obtain an in-phase signal and a quadrature signal, having a first signal portion representing a mixed image of the first usable frequency band, and having a second signal portion representing a mixed image of the second usable frequency band. The signal processor comprises a second mixer) for mixing the in-phase signal and the quadrature signal by using the second local oscillator signal. A frequency of the second local oscillator signal is selected such that the mixed image of the first usable frequency band and the mixed image of the second usable frequency band are at least partly image bands of each other with regard to the second local oscillator signal. The second mixer is implemented to separately provide information content of the first usable frequency band and the second usable frequency band at its output, for obtaining a first output signal, which substantially comprises information content of the first usable frequency band, and for obtaining a second output signal which substantially comprises information content of the second usable frequency band.
摘要:
A signal processor for processing a receiving signal having a first usable frequency band and a second usable frequency band includes a first mixer for mixing the receiving signal with a first local oscillator signal, wherein a frequency of the first local oscillator signal is asymmetrical between the first usable frequency band and the second usable frequency band. The first mixer is implemented to obtain an in-phase signal and a quadrature signal, having a first signal portion representing a mixed image of the first usable frequency band, and having a second signal portion representing a mixed image of the second usable frequency band. The signal processor comprises a second mixer) for mixing the in-phase signal and the quadrature signal by using the second local oscillator signal. A frequency of the second local oscillator signal is selected such that the mixed image of the first usable frequency band and the mixed image of the second usable frequency band are at least partly image bands of each other with regard to the second local oscillator signal. The second mixer is implemented to separately provide information content of the first usable frequency band and the second usable frequency band at its output, for obtaining a first output signal, which substantially comprises information content of the first usable frequency band, and for obtaining a second output signal which substantially comprises information content of the second usable frequency band.
摘要:
A system for determining the position of an object, comprising a reference transmitter device (202) disposed in a fixed position, the reference transmitter device (202) having a reference time supplying means for supplying a reference time signal that indicates a reference time, at least two transmitter/receiver devices (302) disposed in fixed positions with respect to each other and to the reference transmitter device (202), each transmitter/receiver device (302) having a time supplying means for supplying a time signal indicating a time, a receiver means for receiving the reference time signal from the reference transmitter device (202) and a synchronization means for processing the time signal and the reference time signal, as well as a position determining device (502) on the object for determining the position of the object.
摘要:
An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) includes a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.
摘要:
A next processing pin is applied as a follow-on pin to a stone, wherein the stone is held by a preceding pin and fixed to the stone by way of a first adhesive bonding location. The preceding pin is separated from the stone. The follow-on pin is fixed to the stone by way of a second adhesive bonding location spaced from the first adhesive bonding location. The follow-on pin frontally receives a fluid adhesive at a spacing from the stone and the spacing between the adhesive-coated front end and the stone is reduced until the adhesive front end contacts the stone. The adhesive is hardened at the contact location as the second adhesive bonding location and heat is transferred by way of the preceding pin to the first adhesive bonding location A force component is exerted on the preceding pin to release the pin from the stone and to hold the stone with the next pin.