公开(公告)号：US08141567B2

公开(公告)日：2012-03-27

申请号：US11625081

申请日：2007-01-19

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

IPC分类号： B08B3/04

CPC分类号： B08B3/00 ,  B08B7/00 ,  B08B2230/01 ,  G03F7/427

摘要： A processing apparatus includes: a tank configured to store water; vapor generating unit configured to turn the water supplied from the tank into vapor; a processing chamber in which vapor supplied from the vapor generating unit is used to remove residues from a workpiece; cooling unit; and filtering unit. The cooling unit cools waste liquid ejected from the processing chamber. The filtering unit is provided between the cooling unit and the tank, and the filtering unit filters the waste liquid cooled in the cooling unit. A processing method includes: supplying vapor into a processing chamber; removing residues from a workpiece using the vapor; cooling waste liquid containing the removed residues to precipitate the residues as solids; and filtering the waste liquid containing the precipitates.

摘要翻译： 一种处理装置，包括：储存器，用于储存水; 蒸汽发生单元，其构造成将从所述罐供给的水转化为蒸气; 处理室，其中从蒸汽发生单元供应的蒸汽用于从工件中除去残余物; 冷却单元 和过滤单元。 冷却单元冷却从处理室喷出的废液。 过滤单元设置在冷却单元和水箱之间，过滤单元对冷却单元中冷却的废液进行过滤。 一种处理方法包括：将蒸气供应到处理室中; 使用蒸气从工件去除残留物; 冷却含有去除的残余物的废液以将残留物沉淀为固体; 并过滤含有沉淀物的废液。

公开(公告)号：US20070277853A1

公开(公告)日：2007-12-06

申请号：US11625081

申请日：2007-01-19

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

IPC分类号： B08B3/14 ,  B08B3/10 ,  B08B7/04

CPC分类号： B08B3/00 ,  B08B7/00 ,  B08B2230/01 ,  G03F7/427

摘要： A processing apparatus includes: a tank configured to store water; vapor generating unit configured to turn the water supplied from the tank into vapor; a processing chamber in which vapor supplied from the vapor generating unit is used to remove residues from a workpiece; cooling unit; and filtering unit. The cooling unit cools waste liquid ejected from the processing chamber. The filtering unit is provided between the cooling unit and the tank, and the filtering unit filters the waste liquid cooled in the cooling unit. A processing method includes: supplying vapor into a processing chamber; removing residues from a workpiece using the vapor; cooling waste liquid containing the removed residues to precipitate the residues as solids; and filtering the waste liquid containing the precipitates.

摘要翻译： 一种处理装置，包括：储存器，用于储存水; 蒸汽发生单元，其构造成将从所述罐供给的水转化为蒸气; 处理室，其中从蒸汽发生单元供应的蒸汽用于从工件中除去残余物; 冷却单元 和过滤单元。 冷却单元冷却从处理室喷出的废液。 过滤单元设置在冷却单元和水箱之间，过滤单元对冷却单元中冷却的废液进行过滤。 一种处理方法包括：将蒸气供应到处理室中; 使用蒸气从工件去除残留物; 冷却含有去除的残余物的废液以将残留物沉淀为固体; 并过滤含有沉淀物的废液。

公开(公告)号：US08517035B2

公开(公告)日：2013-08-27

申请号：US11625592

申请日：2007-01-22

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

IPC分类号： B08B3/00

CPC分类号： B08B3/022 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67051 ,  Y10T137/0318

摘要： A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet.The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.

摘要翻译： 一种处理装置，包括：处理室，被配置为容纳工件; 设置在所述处理室中的第一喷嘴，所述第一喷嘴将蒸气喷射到所述工件上; 封闭处理室的墙壁; 设置在壁内的流体通道; 流体入口; 和流体出口。 流体入口设置成与流体通道连通。 流体出口设置成与流体通道连通，流体流入流体入口，通过流体通道并从流体出口流出。 一种用于处理在处理室中移动的工件的处理方法，所述处理方法包括：使流体从第一喷嘴朝向工件排出，同时使流体流过设置在壁内部的流体通道，所述流体通道围绕处理室。

公开(公告)号：US20070246085A1

公开(公告)日：2007-10-25

申请号：US11625026

申请日：2007-01-19

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

IPC分类号： B08B3/00

CPC分类号： B08B3/022 ,  B08B5/023 ,  C03C17/32 ,  C03C2218/33 ,  H01L21/6708 ,  H05K3/26 ,  H05K2203/075 ,  H05K2203/1509

摘要： A processing apparatus includes: a processing chamber configured to process a workpiece; a moving unit configured to move the workpiece in the processing chamber; a first nozzle; a partition member; an inlet provided in communication with the downstream space; and an outlet provided in communication with the upstream space. The first nozzle has a discharge port configured to discharge a processing liquid or a processing gas. The discharge port is opposed to a moving path of the workpiece and the processing liquid or the processing gas is discharged from the discharge port in a discharge direction directed to an upstream side of a moving direction of the workpiece relative to a direction perpendicular to the moving direction. The partition member partitions a space above the moving path in the processing chamber, and the space is partitioned at a position of the first nozzle into an upstream space on the upstream side of the moving direction and a downstream space on a downstream side of the moving direction.

摘要翻译： 一种处理装置，包括：处理室，被配置为处理工件; 移动单元，构造成在处理室中移动工件; 第一个喷嘴; 分隔构件; 与下游空间连通的入口; 以及与上游空间连通的出口。 第一喷嘴具有排出处理液或处理气体的排出口。 排出口与工件的移动路径相对，并且处理气体或处理气体沿着与工件的移动方向的上游侧相对于垂直于移动的方向的排放方向从排出口排出 方向。 分隔构件分隔处理室中的移动路径上方的空间，并且将空间在第一喷嘴的位置分隔成在移动方向的上游侧的上游空间和移动的下游侧的下游空间 方向。

公开(公告)号：US20070246097A1

公开(公告)日：2007-10-25

申请号：US11625592

申请日：2007-01-22

申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

IPC分类号： F17D3/00

CPC分类号： B08B3/022 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67051 ,  Y10T137/0318

摘要： A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet. The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.

摘要翻译： 一种处理装置，包括：处理室，被配置为容纳工件; 设置在所述处理室中的第一喷嘴，所述第一喷嘴将蒸气喷射到所述工件上; 封闭处理室的墙壁; 设置在壁内的流体通道; 流体入口; 和流体出口。 流体入口设置成与流体通道连通。 流体出口设置成与流体通道连通，流体流入流体入口，通过流体通道并从流体出口流出。 一种用于处理在处理室中移动的工件的处理方法，所述处理方法包括：使流体从第一喷嘴朝向工件排出，同时使流体流过设置在壁内部的流体通道，所述流体通道围绕处理室。

公开(公告)号：US20070256711A1

公开(公告)日：2007-11-08

申请号：US11683582

申请日：2007-03-08

申请人： Toshihide HAYASHI ,  Tsutomu Makino ,  Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito

发明人： Toshihide HAYASHI ,  Tsutomu Makino ,  Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito

IPC分类号： B08B3/00

CPC分类号： B08B1/02 ,  B08B3/022 ,  G03F7/422 ,  G03F7/427 ,  H01L21/67046 ,  H01L21/67051

摘要： A cleaning apparatus to remove organic substances deposited onto a substrate, the apparatus includes a transport unit configured to transport the substrate, a water steam ejection unit configured to eject a heated water steam to a face of the substrate to be transported deposited with the organic substances, and a physical force applying unit configured to apply a physical force to the organic substances deposited onto the substrate to be transported.

摘要翻译： 一种用于去除沉积在基底上的有机物质的清洁装置，该装置包括构造成输送基底的输送单元，水蒸汽喷射单元，其构造成将被加热的水蒸汽喷射到待运输的基底的面上，沉积有机物质 以及物理力施加单元，其构造成对被运送的基板上沉积的有机物质施加物理力。

公开(公告)号：US20080233452A1

公开(公告)日：2008-09-25

申请号：US11858533

申请日：2007-09-20

申请人： Naoya Hayamizu ,  Yukihiro Shibata ,  Akiko Saito ,  Jun Momma ,  Hideo Oota

发明人： Naoya Hayamizu ,  Yukihiro Shibata ,  Akiko Saito ,  Jun Momma ,  Hideo Oota

IPC分类号： H01M8/10

CPC分类号： H01M8/1025 ,  C08G65/405 ,  C08G65/4056 ,  C08G65/4087 ,  C08J5/2256 ,  C08J2371/12 ,  H01M4/8605 ,  H01M8/0289 ,  H01M8/1011 ,  H01M2300/0082 ,  Y02E60/523 ,  Y02P70/56

摘要： A polyelectrolyte material includes as a main chain: a benzene ring; an ether; and a carbonyl group. A part of the benzene ring is sulfonated. A method for manufacturing a polyelectrolyte material includes: synthesizing disulfonyl difluorobenzophenone; and polymerizing the disulfonyl difluorobenzophenone, 4,4′-difluorobenzophenone, and phenolphthalein with a crown ether as a catalyst. The synthesizing is performed by reacting 4,4′-difluorobenzophenone with fuming sulfuric acid, performing salting-out the reaction product, and recrystallizing the salting-out product.

摘要翻译： 聚电解质材料包括主链：苯环; 一个醚 和羰基。 苯环的一部分被磺化。 聚电解质材料的制造方法包括：合成二磺酰基二氟二苯甲酮; 并用冠醚作为催化剂使二磺酰基二氟二苯甲酮，4,4'-二氟二苯甲酮和酚酞聚合。 合成通过使4,4'-二氟二苯甲酮与发烟硫酸反应，进行反应产物盐析，并重结晶盐析产物。

公开(公告)号：US20080076009A1

公开(公告)日：2008-03-27

申请号：US11689208

申请日：2007-03-21

申请人： Akiko Saito ,  Jun Momma ,  Naoya Hayamizu ,  Yukihiro Shibata ,  Hideo Oota ,  Kazuhiro Yasuda ,  Yoshihiko Nakano

发明人： Akiko Saito ,  Jun Momma ,  Naoya Hayamizu ,  Yukihiro Shibata ,  Hideo Oota ,  Kazuhiro Yasuda ,  Yoshihiko Nakano

IPC分类号： H01M2/14 ,  B05D5/12 ,  H01M8/00

CPC分类号： H01M8/1016 ,  H01M8/0289 ,  H01M8/0293 ,  H01M8/04197 ,  H01M8/1011 ,  H01M2300/0094 ,  Y02E60/523 ,  Y02P70/56 ,  Y10T29/49002

摘要： A solid electrolyte membrane includes: a porous material layer and an inorganic material layer. The porous material layer has a through-hole that is filled with an electrolyte. The inorganic material layer is provided so as to face to at least either side of a principal surface of the porous material layer and has an opening that is filled with an electrolyte. A solid electrolyte membrane alternatively includes: a first porous layer and a second porous layer. The first porous layer has a through-hole that is filled with an electrolyte. The second porous layer is provided so as to face to at least either side of a principal surface of the first porous layer and has an opening that is filled with an electrolyte. The average diameter of the opening is smaller than the average diameter of the through-hole.

摘要翻译： 固体电解质膜包括：多孔材料层和无机材料层。 多孔材料层具有填充有电解质的通孔。 无机材料层设置成面向多孔材料层的主表面的至少任一侧，并且具有填充有电解质的开口。 固体电解质膜可选地包括：第一多孔层和第二多孔层。 第一多孔层具有填充有电解质的通孔。 第二多孔层设置成面向第一多孔层的主表面的至少任一侧，并具有填充有电解质的开口。 开口的平均直径小于通孔的平均直径。

公开(公告)号：US08105728B2

公开(公告)日：2012-01-31

申请号：US11858533

申请日：2007-09-20

申请人： Naoya Hayamizu ,  Yukihiro Shibata ,  Akiko Saito ,  Jun Momma ,  Hideo Oota

发明人： Naoya Hayamizu ,  Yukihiro Shibata ,  Akiko Saito ,  Jun Momma ,  Hideo Oota

IPC分类号： H01M8/10

CPC分类号： H01M8/1025 ,  C08G65/405 ,  C08G65/4056 ,  C08G65/4087 ,  C08J5/2256 ,  C08J2371/12 ,  H01M4/8605 ,  H01M8/0289 ,  H01M8/1011 ,  H01M2300/0082 ,  Y02E60/523 ,  Y02P70/56

摘要： A polyelectrolyte material includes as a main chain: a benzene ring; an ether; and a carbonyl group. A part of the benzene ring is sulfonated. A method for manufacturing a polyelectrolyte material includes: synthesizing disulfonyl difluorobenzophenone; and polymerizing the disulfonyl difluorobenzophenone, 4,4′-difluorobenzophenone, and phenolphthalein with a crown ether as a catalyst. The synthesizing is performed by reacting 4,4′-difluorobenzophenone with fuming sulfuric acid, performing salting-out the reaction product, and recrystallizing the salting-out product.

摘要翻译： 聚电解质材料包括主链：苯环; 一个醚 和羰基。 苯环的一部分被磺化。 聚电解质材料的制造方法包括：合成二磺酰基二氟二苯甲酮; 并用冠醚作为催化剂使二磺酰基二氟二苯甲酮，4,4'-二氟二苯甲酮和酚酞聚合。 合成通过使4,4'-二氟二苯甲酮与发烟硫酸反应，进行反应产物盐析，并重结晶盐析产物。

公开(公告)号：US08716943B2

公开(公告)日：2014-05-06

申请号：US13027788

申请日：2011-02-15

申请人： Tsuyoshi Oyaizu ,  Seiko Kawashima ,  Haruki Takei ,  Akiko Saito

发明人： Tsuyoshi Oyaizu ,  Seiko Kawashima ,  Haruki Takei ,  Akiko Saito

IPC分类号： H05B37/02 ,  F21S4/00

CPC分类号： H05B33/0884 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48137 ,  H01L2224/73265 ,  H01L2924/181 ,  H05B33/0803 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

摘要： According to one embodiment, a light-emitting device includes a substrate including an insulating surface, a plurality of light-emitting elements mounted on the surface of the substrate and electrically connected to each other, a positive power feeding conductor and a negative power feeding conductor mounted on the surface of the substrate to feed power to the light-emitting elements, lead-out terminals leading from the power feeding conductors, to the outside of an mounting area of the light-emitting elements, and an anti-noise part connected to the lead-out terminals and arranged outside the mounting area.

摘要翻译： 根据一个实施例，一种发光装置包括：基板，包括绝缘表面;多个发光元件，安装在基板的表面上并彼此电连接，正电力馈送导体和负电力供电导体 安装在基板的表面上，以将功率馈送到发光元件，从馈电导体引出的引出端到发光元件的安装区域的外部，以及连接到 引出端子并布置在安装区域外部。