公开(公告)号：US08797542B2

公开(公告)日：2014-08-05

申请号：US13292192

申请日：2011-11-09

申请人： Takumi Tokimitsu ,  Yoshiyuki Kuramoto

发明人： Takumi Tokimitsu ,  Yoshiyuki Kuramoto

IPC分类号： G01B9/02

CPC分类号： G01B9/02007 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/0207 ,  G01B9/02083 ,  G01B2290/45

摘要： A measurement apparatus which measures a distance between a reference surface and a test surface, comprises a light source unit including a plurality of light sources each corresponding to one of a plurality of wavelength scanning ranges and each continuously scans a wavelength of generated light in the corresponding wavelength scanning range, an interferometer unit which splits light emitted by each of the plurality of light sources into reference light and test light, and detects, as an interference signal, an interference fringe formed by the reference light and the test light, and a processor which determines a slope of a phase of the interference signal with respect to wave number of the light based on the interference signal detected by the interferometer unit for each of the plurality of wavelength scanning ranges, and determines the distance from the slope of the phase.

摘要翻译： 测量参考表面和测试表面之间的距离的测量装置包括光源单元，其包括多个光源，每个光源对应于多个波长扫描范围中的一个，并且每个光源单元连续地扫描相应的 波长扫描范围，将由所述多个光源中的每一个发射的光分解为参考光和测试光的干涉仪单元，并且检测由所述参考光和所述测试光形成的干涉条纹作为干涉信号;以及处理器 其基于由所述干涉仪单元为所述多个波长扫描范围中的每一个检测的干涉信号，确定相对于所述光的波数的所述干扰信号的相位的斜率，并且确定所述相位的斜率的距离。

公开(公告)号：US20130070256A1

公开(公告)日：2013-03-21

申请号：US13611156

申请日：2012-09-12

申请人： Takumi Tokimitsu

发明人： Takumi Tokimitsu

IPC分类号： G01B11/14

CPC分类号： G01B9/02004 ,  G01B9/02007 ,  G01B9/02027 ,  G01B9/02087

摘要： A measuring apparatus includes a light source unit configured to continuously scan wavelengths of a plurality of types of beams at different speeds in a plurality of discrete wavelength scanning ranges, a beam synthesizer, an interferometer unit configured to detect as an interference signal an interference fringe formed by a reference beam reflected on a reference surface and a target beam reflected on a target surface, and a processor configured to determine the absolute distance based upon the interference signal detected by the interferometer unit. The interferometer unit includes a single optical detector. The processor obtains the absolute distance for each of the plurality of types of beams through a frequency analysis of a synthesized interference signal, and outputs one absolute distance by operating a plurality of absolute distances that have been obtained.

摘要翻译： 一种测量装置，包括：光源单元，被配置为在多个离散波长扫描范围内以不同速度连续扫描多种类型的波束的波长;波束合成器;干涉仪单元，被配置为检测形成的干涉条纹 通过在参考表面上反射的参考光束和在目标表面上反射的目标光束，以及处理器，被配置为基于由干涉仪单元检测到的干涉信号来确定绝对距离。 干涉仪单元包括单个光学检测器。 处理器通过合成干扰信号的频率分析获得多个类型的波束中的每一个的绝对距离，并且通过操作已经获得的多个绝对距离来输出一个绝对距离。

公开(公告)号：US20090225298A1

公开(公告)日：2009-09-10

申请号：US12399587

申请日：2009-03-06

申请人： Takumi Tokimitsu

发明人： Takumi Tokimitsu

IPC分类号： G03F7/20 ,  G02B5/00 ,  G02B5/28 ,  G03B27/72

CPC分类号： G03B27/72 ,  G02B1/115 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70566 ,  G03F7/70966

摘要： The present invention provides an optical element which is used for light having a wavelength not more than 250 nm, and receives a light beam at a maximum incident angle not less than 55°, wherein the optical element includes an optical thin film in an effective aperture thereof, and a film thickness distribution of the optical thin film in the effective aperture includes a distribution in which a thickness of the optical thin film in an outermost periphery of the effective aperture is 1.10 times (inclusive) to 1.25 times (inclusive) a thickness of the optical thin film at a midpoint between an optical axis and the outermost periphery of the effective aperture.

摘要翻译： 本发明提供一种光学元件，其用于波长不大于250nm的光并且以不小于55°的最大入射角接收光束，其中所述光学元件包括有效孔径中的光学薄膜 并且有效孔径中的光学薄膜的膜厚分布包括其中有效孔径的最外周中的光学薄膜的厚度为1.10倍（包含）至1.25倍（含）厚度的分布， 在光轴和有效孔的最外周之间的中点处的光学薄膜。

公开(公告)号：US20090041934A1

公开(公告)日：2009-02-12

申请号：US12182054

申请日：2008-07-29

申请人： Takumi Tokimitsu

发明人： Takumi Tokimitsu

IPC分类号： B05D5/06

CPC分类号： G02B27/286 ,  G02B13/143 ,  G03F7/70958

摘要： A method for manufacturing a projection optics that includes a plurality of optical elements composed of an amorphous material is provided. The method includes preparing a plurality of optical-thin-film candidates having various transmission characteristics, measuring transmission characteristics of the plurality of optical elements, calculating a transmission characteristic of the projection optics supposing that a certain optical-thin-film candidate of the plurality of optical-thin-film candidates is formed on a surface of each of the optical elements, selecting an optical thin film to be formed on the surface of each of the optical elements from the plurality of optical-thin-film candidates based on the calculated transmission characteristic, and forming the selected optical thin film on the surface of each of the optical elements.

摘要翻译： 提供一种制造包括由非晶材料构成的多个光学元件的投影光学器件的方法。 该方法包括制备具有各种传输特性的多个光学薄膜候选物，测量多个光学元件的透射特性，计算投影光学器件的透射特性，假设多个光学元件中的某些光学薄膜候选 在每个光学元件的表面上形成光学薄膜候选，基于所计算的透射率从多个光学薄膜候选中选择要在每个光学元件的表面上形成的光学薄膜 并且在每个光学元件的表面上形成所选择的光学薄膜。

公开(公告)号：US08437004B2

公开(公告)日：2013-05-07

申请号：US12908405

申请日：2010-10-20

申请人： Yuhei Sumiyoshi ,  Takumi Tokimitsu ,  Hiroyuki Yuuki

发明人： Yuhei Sumiyoshi ,  Takumi Tokimitsu ,  Hiroyuki Yuuki

IPC分类号： G01N21/55 ,  G01N21/88

CPC分类号： G01N21/645 ,  G01N21/4738 ,  G01N21/55 ,  G01N2201/0631 ,  G02B27/0927 ,  G02B27/0994

摘要： A detection apparatus which illuminates a sample and detects light reflected by the sample, comprises a light source, a columnar reflecting member having a columnar reflecting surface which reflects light having entered a first end of the columnar reflecting member by a plurality of number of times, and emits the light from a second end of the columnar reflecting member, a mirror which reflects light radiated by the light source so as to guide to the first end and a detector, wherein the sample is illuminated with the light emitted from the second end, and the detector is configured to detect the light which has been reflected by the sample and has passed through the columnar reflecting member, and a reflecting surface of the mirror is a concave surface, and a shape of a reflecting surface of the mirror on a section perpendicular to an axis of the columnar reflecting member is concave.

摘要翻译： 照射样品并检测由样品反射的光的检测装置包括光源，柱状反射部件，具有将已经进入柱状反射部件的第一端的光反射多次的柱状反射面， 并从柱状反射构件的第二端发射光，反射由光源辐射的光以引导到第一端的反射镜和检测器，其中样品被从第二端发射的光照射， 并且所述检测器被配置为检测已经被所述样品反射并且已经通过所述柱状​​反射部件的光，并且所述反射镜的反射表面是凹面，并且所述反射镜的反射面的形状在所述部分 垂直于柱状反射构件的轴线是凹的。

公开(公告)号：US20120113434A1

公开(公告)日：2012-05-10

申请号：US13292192

申请日：2011-11-09

申请人： Takumi TOKIMITSU ,  Yoshiyuki KURAMOTO

发明人： Takumi TOKIMITSU ,  Yoshiyuki KURAMOTO

IPC分类号： G01B11/02

CPC分类号： G01B9/02007 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/0207 ,  G01B9/02083 ,  G01B2290/45

摘要： A measurement apparatus which measures a distance between a reference surface and a test surface, comprises a light source unit including a plurality of light sources each corresponding to one of a plurality of wavelength scanning ranges and each continuously scans a wavelength of generated light in the corresponding wavelength scanning range, an interferometer unit which splits light emitted by each of the plurality of light sources into reference light and test light, and detects, as an interference signal, an interference fringe formed by the reference light and the test light, and a processor which determines a slope of a phase of the interference signal with respect to wave number of the light based on the interference signal detected by the interferometer unit for each of the plurality of wavelength scanning ranges, and determines the distance from the slope of the phase.

摘要翻译： 测量参考表面和测试表面之间的距离的测量装置包括光源单元，其包括多个光源，每个光源对应于多个波长扫描范围中的一个，并且每个光源单元连续地扫描相应的 波长扫描范围，将由所述多个光源中的每一个发射的光分解为参考光和测试光的干涉仪单元，并且检测由所述参考光和所述测试光形成的干涉条纹作为干涉信号;以及处理器 其基于由所述干涉仪单元为所述多个波长扫描范围中的每一个检测的干涉信号，确定相对于所述光的波数的所述干扰信号的相位的斜率，并且确定所述相位的斜率的距离。

公开(公告)号：US20110109908A1

公开(公告)日：2011-05-12

申请号：US12908405

申请日：2010-10-20

申请人： Yuhei Sumiyoshi ,  Takumi Tokimitsu ,  Hiroyuki Yuuki

发明人： Yuhei Sumiyoshi ,  Takumi Tokimitsu ,  Hiroyuki Yuuki

IPC分类号： G01N21/55

CPC分类号： G01N21/645 ,  G01N21/4738 ,  G01N21/55 ,  G01N2201/0631 ,  G02B27/0927 ,  G02B27/0994

摘要： A detection apparatus which illuminates a sample and detects light reflected by the sample, comprises a light source, a columnar reflecting member having a columnar reflecting surface which reflects light having entered a first end of the columnar reflecting member by a plurality of number of times, and emits the light from a second end of the columnar reflecting member, a mirror which reflects light radiated by the light source so as to guide to the first end and a detector, wherein the sample is illuminated with the light emitted from the second end, and the detector is configured to detect the light which has been reflected by the sample and has passed through the columnar reflecting member, and a reflecting surface of the mirror is a concave surface, and a shape of a reflecting surface of the mirror on a section perpendicular to an axis of the columnar reflecting member is concave.

摘要翻译： 照射样品并检测由样品反射的光的检测装置包括光源，柱状反射部件，具有将已经进入柱状反射部件的第一端的光反射多次的柱状反射面， 并从柱状反射构件的第二端发射光，反射由光源辐射的光以引导到第一端的反射镜和检测器，其中样品被从第二端发射的光照射， 并且所述检测器被配置为检测已经被所述样品反射并且已经通过所述柱状​​反射部件的光，并且所述反射镜的反射表面是凹面，并且所述反射镜的反射面的形状在所述部分 垂直于柱状反射构件的轴线是凹的。

公开(公告)号：US20070246356A1

公开(公告)日：2007-10-25

申请号：US11735663

申请日：2007-04-16

申请人： Takumi TOKIMITSU

发明人： Takumi TOKIMITSU

IPC分类号： C23C14/00

CPC分类号： C23C14/3464 ,  C23C14/546 ,  H01J37/32935 ,  H01J37/34

摘要： A sputtering apparatus is disclosed which enables highly accurate monitor control of a film thickness and allows enhanced flexibility in design. The apparatus includes a substrate placement area in which a substrate is placed, a particle emission area in which a target is placed and sputter particles from the target are emitted, and a sensor placement area in which a sensor is placed for measuring a thickness of a film formed on the substrate. The substrate placement area and the sensor placement area are provided in a positional relationship having symmetry with respect to a center line of the particle emission area.

摘要翻译： 公开了一种溅射装置，其能够高度准确地监测膜厚度并且允许增强的设计灵活性。 该装置包括其中放置基板的基板放置区域，放置目标物的颗粒发射区域和来自目标物体的溅射颗粒的发射区域，以及传感器放置区域，其中放置传感器以测量厚度 在基板上形成的膜。 衬底放置区域和传感器放置区域以关于颗粒发射区域的中心线对称的位置关系提供。

公开(公告)号：US08179520B2

公开(公告)日：2012-05-15

申请号：US12399587

申请日：2009-03-06

申请人： Takumi Tokimitsu

发明人： Takumi Tokimitsu

IPC分类号： G03B27/72 ,  G02B5/30

CPC分类号： G03B27/72 ,  G02B1/115 ,  G02B5/3083 ,  G02B27/0025 ,  G03F7/70566 ,  G03F7/70966

摘要： The present invention provides an optical element which is used for light having a wavelength not more than 250 nm, and receives a light beam at a maximum incident angle not less than 55°, wherein the optical element includes an optical thin film in an effective aperture thereof, and a film thickness distribution of the optical thin film in the effective aperture includes a distribution in which a thickness of the optical thin film in an outermost periphery of the effective aperture is 1.10 times (inclusive) to 1.25 times (inclusive) a thickness of the optical thin film at a midpoint between an optical axis and the outermost periphery of the effective aperture.

摘要翻译： 本发明提供一种光学元件，其用于波长不大于250nm的光并且以不小于55°的最大入射角接收光束，其中所述光学元件包括有效孔径中的光学薄膜 并且有效孔径中的光学薄膜的膜厚分布包括其中有效孔径的最外周中的光学薄膜的厚度为1.10倍（包含）至1.25倍（含）厚度的分布， 在光轴和有效孔的最外周之间的中点处的光学薄膜。