Group 11 mono-metallic precursor compounds and use thereof in metal deposition
    1.
    发明授权
    Group 11 mono-metallic precursor compounds and use thereof in metal deposition 有权
    11族单金属前体化合物及其在金属沉积中的应用

    公开(公告)号:US09453036B2

    公开(公告)日:2016-09-27

    申请号:US13468601

    申请日:2012-05-10

    Abstract: The present application provides precursor compounds useful for deposition of a group 11 metal on a substrate, for example, a microelectronic device substrate, as well as methods of synthesizing such precursor compounds. The precursor compounds provided are mono-metallic compounds comprising a diaminocarbene (DAC) having the general formula: “DAC-M-X”, where the diaminocarbene is an optionally substituted, saturated N-heterocyclic diaminocarbene (sNHC) or an optionally substituted acyclic diaminocarbene, M is a group 11 metal, such as copper, silver or gold; and X is an anionic ligand. Also provided are methods of synthesizing the precursor compounds, metal deposition methods utilizing such precursor compounds, and to composite materials, such as, e.g., microelectronic device structures, and products formed by use of such precursors and deposition methods.

    Abstract translation: 本申请提供了可用于在基底上沉积11族金属的前体化合物,例如微电子器件底物,以及合成这些前体化合物的方法。 所提供的前体化合物是包含具有以下通式的二氨基卡宾(DAC)的单金属化合物:DAC-MX,其中二氨基碳烯是任选取代的饱和N-杂环二氨基卡宾(sNHC)或任选取代的非环状二氨基碳烯,M 是一组11金属,如铜,银或金; X是阴离子配体。 还提供了合成前体化合物的方法,利用这种前体化合物的金属沉积方法以及复合材料,例如微电子器件结构,以及通过使用这些前体和沉积方法形成的产物。

    ADAPTIVE CORRECTION SYSTEM
    3.
    发明申请
    ADAPTIVE CORRECTION SYSTEM 有权
    自适应校正系统

    公开(公告)号:US20100091081A1

    公开(公告)日:2010-04-15

    申请号:US12248442

    申请日:2008-10-09

    CPC classification number: B41J2/471 G03G15/043

    Abstract: Adaptive correction techniques are disclosed that adaptively correct aberrations which may arise in systems such as laser printers, for example. For laser printers, calibration data processing results may be detected by a detector that is disposed to correspond physically to the recording medium so that characteristics such as position and intensity of a laser beam at the detector corresponds to that of a laser beam at the recording medium. In this way, aberrations in system performance may be adaptively corrected while the system is performing operational processes.

    Abstract translation: 公开了自适应校正技术,其自适应地校正可能在诸如激光打印机的系统中出现的像差。 对于激光打印机,校准数据处理结果可以由被设置为与物理地对应于记录介质相对应的检测器来检测,使得在检测器处的​​激光束的位置和强度等特性对应于在记录介质处的激光束的特性 。 以这种方式,在系统执行操作过程时可以自适应地校正系统性能中的像差。

    GROUP 11 MONO-METALLIC PRECURSOR COMPOUNDS AND USE THEREOF IN METAL DEPOSITION
    5.
    发明申请
    GROUP 11 MONO-METALLIC PRECURSOR COMPOUNDS AND USE THEREOF IN METAL DEPOSITION 有权
    11组单金属前体化合物及其在金属沉积中的应用

    公开(公告)号:US20120323008A1

    公开(公告)日:2012-12-20

    申请号:US13468601

    申请日:2012-05-10

    Abstract: The present application provides precursor compounds useful for deposition of a group 11 metal on a substrate, for example, a microelectronic device substrate, as well as methods of synthesizing such precursor compounds. The precursor compounds provided are mono-metallic compounds comprising a diaminocarbene (DAC) having the general formula: “DAC-M-X”, where the diaminocarbene is an optionally substituted, saturated N-heterocyclic diaminocarbene (sNHC) or an optionally substituted acyclic diaminocarbene, M is a group 11 metal, such as copper, silver or gold; and X is an anionic ligand. Also provided are methods of synthesizing the precursor compounds, metal deposition methods utilizing such precursor compounds, and to composite materials, such as, e.g., microelectronic device structures, and products formed by use of such precursors and deposition methods.

    Abstract translation: 本申请提供了可用于在基底上沉积11族金属的前体化合物,例如微电子器件底物,以及合成这些前体化合物的方法。 提供的前体化合物是包含具有以下通式的二氨基卡宾(DAC)的单金属化合物:DAC-MX,其中二氨基碳烯是任选取代的饱和N-杂环二氨基卡宾(sNHC)或任选取代的非环状二氨基卡宾,M是 第11组金属,如铜,银或金; X是阴离子配体。 还提供了合成前体化合物的方法,利用这种前体化合物的金属沉积方法以及复合材料,例如微电子器件结构,以及通过使用这些前体和沉积方法形成的产物。

    Adaptive correction system
    6.
    发明授权
    Adaptive correction system 有权
    自适应校正系统

    公开(公告)号:US07907161B2

    公开(公告)日:2011-03-15

    申请号:US12248442

    申请日:2008-10-09

    CPC classification number: B41J2/471 G03G15/043

    Abstract: Adaptive correction techniques are disclosed that adaptively correct aberrations which may arise in systems such as laser printers, for example. For laser printers, calibration data processing results may be detected by a detector that is disposed to correspond physically to the recording medium so that characteristics such as position and intensity of a laser beam at the detector corresponds to that of a laser beam at the recording medium. In this way, aberrations in system performance may be adaptively corrected while the system is performing operational processes.

    Abstract translation: 公开了自适应校正技术,其自适应地校正可能在诸如激光打印机的系统中出现的像差。 对于激光打印机,校准数据处理结果可以由被设置为与物理地对应于记录介质相对应的检测器来检测,使得在检测器处的​​激光束的位置和强度等特性对应于在记录介质处的激光束的特性 。 以这种方式,在系统执行操作过程时可以自适应地校正系统性能中的像差。

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